JP2007107945A - 基板検査装置 - Google Patents

基板検査装置 Download PDF

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Publication number
JP2007107945A
JP2007107945A JP2005297291A JP2005297291A JP2007107945A JP 2007107945 A JP2007107945 A JP 2007107945A JP 2005297291 A JP2005297291 A JP 2005297291A JP 2005297291 A JP2005297291 A JP 2005297291A JP 2007107945 A JP2007107945 A JP 2007107945A
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JP
Japan
Prior art keywords
substrate
inspection
unit
micro
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005297291A
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English (en)
Japanese (ja)
Other versions
JP2007107945A5 (enrdf_load_stackoverflow
Inventor
Masaru Matsumoto
勝 松本
Osamu Nagami
理 永見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2005297291A priority Critical patent/JP2007107945A/ja
Priority to TW095135536A priority patent/TWI333544B/zh
Priority to KR1020060098486A priority patent/KR101305262B1/ko
Priority to CNA200610132214XA priority patent/CN1948955A/zh
Publication of JP2007107945A publication Critical patent/JP2007107945A/ja
Publication of JP2007107945A5 publication Critical patent/JP2007107945A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2005297291A 2005-10-12 2005-10-12 基板検査装置 Pending JP2007107945A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005297291A JP2007107945A (ja) 2005-10-12 2005-10-12 基板検査装置
TW095135536A TWI333544B (en) 2005-10-12 2006-09-26 Substrate inspection apparatus
KR1020060098486A KR101305262B1 (ko) 2005-10-12 2006-10-10 기판 검사 장치
CNA200610132214XA CN1948955A (zh) 2005-10-12 2006-10-12 基板检查装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005297291A JP2007107945A (ja) 2005-10-12 2005-10-12 基板検査装置

Publications (2)

Publication Number Publication Date
JP2007107945A true JP2007107945A (ja) 2007-04-26
JP2007107945A5 JP2007107945A5 (enrdf_load_stackoverflow) 2008-11-27

Family

ID=38018533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005297291A Pending JP2007107945A (ja) 2005-10-12 2005-10-12 基板検査装置

Country Status (4)

Country Link
JP (1) JP2007107945A (enrdf_load_stackoverflow)
KR (1) KR101305262B1 (enrdf_load_stackoverflow)
CN (1) CN1948955A (enrdf_load_stackoverflow)
TW (1) TWI333544B (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100932751B1 (ko) * 2007-09-28 2009-12-17 주식회사 탑 엔지니어링 어레이 테스트 장치
JP2011148593A (ja) * 2010-01-21 2011-08-04 Tokyo Electron Ltd 基板搬送装置及び基板搬送方法
JP2012145336A (ja) * 2011-01-06 2012-08-02 Olympus Corp 基板検査システム
WO2014050609A1 (ja) * 2012-09-28 2014-04-03 Ｊｘ日鉱日石エネルギー株式会社 不規則な凹凸表面を有する基板を検査する装置及びそれを用いた検査方法
JP2015152312A (ja) * 2014-02-10 2015-08-24 Ｗｉｔ株式会社 外観検査装置、外観検査方法、及びプログラム
CN109444157A (zh) * 2018-12-25 2019-03-08 苏州凡目视觉科技有限公司 一种划痕检测装置与方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402497B (zh) * 2008-04-22 2013-07-21 Shuz Tung Machinery Ind Co Ltd 龍門取像機構
JP5223615B2 (ja) * 2008-11-20 2013-06-26 株式会社Ｉｈｉ 薄板の浮上搬送状態検出方法及びその装置
CN101718828B (zh) * 2008-12-24 2012-08-08 四川虹欧显示器件有限公司 用于平板显示器的缺陷确认装置及其操作方法
JP5524139B2 (ja) * 2010-09-28 2014-06-18 東京エレクトロン株式会社 基板位置検出装置、これを備える成膜装置、および基板位置検出方法
JP6004517B2 (ja) * 2011-04-19 2016-10-12 芝浦メカトロニクス株式会社 基板検査装置、基板検査方法及び該基板検査装置の調整方法
CN102778460A (zh) * 2012-07-31 2012-11-14 法国圣戈班玻璃公司 一种检测基质内缺陷的方法
CN103896006A (zh) * 2012-12-27 2014-07-02 嘉兴市博宏新型建材有限公司 带挡板机构的给料皮带机
CN106403854B (zh) * 2016-11-16 2019-09-03 中国计量大学 一种摩擦驱动式刹车片平面度检测机构
US11079430B2 (en) * 2016-11-29 2021-08-03 Ns Technologies, Inc. Electronic component handler and electronic component tester
JP6595130B2 (ja) * 2017-06-07 2019-10-23 キヤノンマシナリー株式会社 欠陥検出装置、欠陥検出方法、ダイボンダ、半導体製造方法、および半導体装置製造方法
KR20190036007A (ko) * 2017-09-26 2019-04-04 삼성전자주식회사 그립 장치 및 이를 포함하는 기판 검사 시스템
TWI654584B (zh) * 2018-03-02 2019-03-21 由田新技股份有限公司 強化工件光學特徵之設備、方法、強化工件光學特徵之深度學習方法及非暫態電腦可讀取記錄媒體
CN110783223B (zh) * 2018-07-24 2024-04-16 泰克元有限公司 电子部件处理设备用拍摄装置
CN109192673B (zh) * 2018-08-27 2021-09-17 苏州精濑光电有限公司 一种晶圆检测方法
CN109597231A (zh) * 2019-01-29 2019-04-09 深圳市华星光电技术有限公司 液晶面板显示异常分析方法
JP7368141B2 (ja) * 2019-08-20 2023-10-24 東レエンジニアリング株式会社 ウエーハ外観検査装置および方法
CN118549460B (zh) * 2024-07-29 2024-11-19 柯尔微电子装备(厦门)有限公司 全自动晶圆表面检查机以及晶圆检查方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000009661A (ja) * 1998-06-26 2000-01-14 Ntn Corp フラットパネル検査装置
JP2001091474A (ja) * 1999-09-22 2001-04-06 Olympus Optical Co Ltd 欠陥検査システム
JP2004239728A (ja) * 2003-02-05 2004-08-26 Hitachi High-Technologies Corp パターン検査方法及び装置
JP2004331265A (ja) * 2003-05-01 2004-11-25 Olympus Corp 浮上ユニット及び基板検査装置
JP2005077109A (ja) * 2003-08-29 2005-03-24 Olympus Corp 欠陥検査装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000009661A (ja) * 1998-06-26 2000-01-14 Ntn Corp フラットパネル検査装置
JP2001091474A (ja) * 1999-09-22 2001-04-06 Olympus Optical Co Ltd 欠陥検査システム
JP2004239728A (ja) * 2003-02-05 2004-08-26 Hitachi High-Technologies Corp パターン検査方法及び装置
JP2004331265A (ja) * 2003-05-01 2004-11-25 Olympus Corp 浮上ユニット及び基板検査装置
JP2005077109A (ja) * 2003-08-29 2005-03-24 Olympus Corp 欠陥検査装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100932751B1 (ko) * 2007-09-28 2009-12-17 주식회사 탑 엔지니어링 어레이 테스트 장치
JP2011148593A (ja) * 2010-01-21 2011-08-04 Tokyo Electron Ltd 基板搬送装置及び基板搬送方法
CN102157424A (zh) * 2010-01-21 2011-08-17 东京毅力科创株式会社 基板输送装置及基板输送方法
CN102157424B (zh) * 2010-01-21 2014-09-24 东京毅力科创株式会社 基板输送装置及基板输送方法
TWI479592B (zh) * 2010-01-21 2015-04-01 Tokyo Electron Ltd 基板運送裝置及基板運送方法
JP2012145336A (ja) * 2011-01-06 2012-08-02 Olympus Corp 基板検査システム
WO2014050609A1 (ja) * 2012-09-28 2014-04-03 Ｊｘ日鉱日石エネルギー株式会社 不規則な凹凸表面を有する基板を検査する装置及びそれを用いた検査方法
JP2015152312A (ja) * 2014-02-10 2015-08-24 Ｗｉｔ株式会社 外観検査装置、外観検査方法、及びプログラム
CN109444157A (zh) * 2018-12-25 2019-03-08 苏州凡目视觉科技有限公司 一种划痕检测装置与方法

Also Published As

Publication number Publication date
CN1948955A (zh) 2007-04-18
TW200716970A (en) 2007-05-01
KR20070040722A (ko) 2007-04-17
TWI333544B (en) 2010-11-21
KR101305262B1 (ko) 2013-09-09

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