JP2006521020A - 半導体装置およびその製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 220
- 238000004519 manufacturing process Methods 0.000 title claims description 56
- 239000000758 substrate Substances 0.000 claims abstract description 98
- 239000012535 impurity Substances 0.000 claims abstract description 33
- 238000002955 isolation Methods 0.000 claims description 25
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 229910021341 titanium silicide Inorganic materials 0.000 description 7
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- 230000015556 catabolic process Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
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- 230000015572 biosynthetic process Effects 0.000 description 3
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
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- 229910052796 boron Inorganic materials 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229910003811 SiGeC Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- H01L29/76—Unipolar devices, e.g. field effect transistors
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Abstract
【解決手段】半導体装置は、トレンチが形成された半導体基板と、トレンチ内に埋め込まれ、互いに同じ導電型の不純物を含む半導体からなるソース領域及びドレイン領域と、トレンチ内に埋め込まれ、且つ上記ソース領域と上記ドレイン領域との間に設けられた半導体FINと、半導体FINの側面から上面に亘って設けられたゲート絶縁膜と、ゲート絶縁膜の上に設けられたゲート電極と、トレンチ内に設けられ、ソース領域及びドレイン領域を囲む第1の絶縁膜とを備えている。
Description
IEDM Technical Digest pp.437-440 (2001) (J. Kedzierski他)
以下、本発明の第1の実施形態について、図面を参照しながら説明する。
わち、シリコン基板)の表面から突出していない平坦なFINFETを形成する
ことができ、プレーナーMOSFETとの集積を容易に行える。例えば、図11(a)〜(c)に示すサリサイド工程や、配線工程、層間絶縁膜を形成する工程などをFINFET形成領域とプレーナMOSFETの形成領域とで共通化することができる。
以下、本発明の第2の実施形態に係るFINFETについて、図面を参照しながら説明する。
2 第2の絶縁膜
3 高濃度不純物領域
4 分離用絶縁膜
5 第1の絶縁膜
6、54 半導体FIN
6a、54a 半導体層
7、50、56 レジスト
8、55、78 ゲート絶縁膜
9、57、79 第1ゲート電極
10、58 ソース・LDD領域
11、59 ドレイン・LDD領域
12、13、60、61 ゲート側壁絶縁膜
14、17、62、84 ソース領域
15、18、63、85 ドレイン領域
16、64、86 第2ゲート電極
19 素子分離用絶縁膜
49 絶縁膜
52 高濃度不純物領域
53 第1の絶縁膜
65、87 ソース電極
66、88 ドレイン電極
100 トレンチ
Claims (11)
- トレンチが形成された半導体基板と、
上記トレンチ内に埋め込まれ、互いに同じ導電型の不純物を含む半導体からなるソース領域及びドレイン領域と、
上記トレンチ内に埋め込まれ、且つ上記ソース領域と上記ドレイン領域との間に設けられた半導体FINと、
上記半導体FINの側面から上面に亘って設けられたゲート絶縁膜と、
上記トレンチ内であって、上記半導体FINの両側方の領域に向かって下方に突出した終端部分を有し、上記ゲート絶縁膜の上に設けられたゲート電極とを備えている半導体装置。 - 請求項1に記載の半導体装置において、
上記半導体FINは、Si、Si1-xGex(0<x≦1)、 Si1-y-zGeyCz(0<y<1,0<z<1,0<y+z<1)のうちから選ばれた1つの材料からなる、半導体装置。 - 請求項1に記載の半導体装置において、
上記ゲート電極は上記ゲート絶縁膜の上から上記半導体基板の上方に亘って設けられており、
上記半導体基板のうち上記トレンチの側壁部分と上記ゲート電極のうち上記半導体FINの側面上方に設けられた部分との間には、分離用絶縁膜がさらに設けられ、
上記半導体基板のうち上記トレンチが形成されていない部分と上記ゲート電極との間には、絶縁膜がさらに設けられている、半導体装置。 - 請求項1に記載の半導体装置において、
上記ゲート電極は上記ゲート絶縁膜の上から上記半導体基板の上方に亘って設けられており、
上記ゲート絶縁膜は、上記半導体FINの側面及び上面上から上記半導体基板のうち上記トレンチが形成されていない部分に亘って設けられ、上記半導体基板のうち上記トレンチが形成されていない部分では、上記半導体基板と上記ゲート電極とに挟まれている、半導体装置。 - 請求項1〜4のうちいずれか1つに記載の半導体装置において、
上記半導体FINは、上記トレンチの底面から見て凸状に形成されている、半導体装置。 - トレンチが形成された半導体基板と、上記トレンチ内に埋め込まれ、互いに同じ導電型の不純物を含む半導体からなる第1のソース領域及び第1のドレイン領域と、上記トレンチ内に埋め込まれ、且つ上記第1のソース領域と上記第1のドレイン領域との間に設けられた半導体FINと、上記半導体FINの側面から上面に亘って設けられた第1のゲート絶縁膜と、上記トレンチ内であって、上記半導体FINの両側方の領域に向かって下方に突出した終端部分を有し、上記ゲート絶縁膜の上に設けられた第1のゲート電極とを有する第1の電界効果トランジスタと、
上記半導体基板上に設けられた第2のゲート絶縁膜と、上記第2のゲート絶縁膜上に設けられた第2のゲート電極と、不純物を含み、上記半導体基板のうち上記第2のゲート電極の側下方に位置する領域に設けられた第2のソース領域及び第2のドレイン領域とを有する第2の電界効果トランジスタと
を備えている半導体装置。 - 請求項6に記載の半導体装置において、
上記第1のゲート電極は上記第1のゲート絶縁膜の上から上記半導体基板の上方に亘って設けられており、
上記第1の電界効果トランジスタは、
上記半導体基板のうち上記トレンチの側壁部分と上記第1のゲート電極のうち上記半導体FINの側面上方に設けられた部分との間に形成された分離用絶縁膜と、
上記半導体基板と上記第1のゲート電極との間に形成された第2の絶縁膜と
をさらに有している、半導体装置。 - 請求項6に記載の半導体装置において、
上記第1のゲート電極は上記第1のゲート絶縁膜の上から上記半導体基板の上方に亘って設けられており、
上記第1のゲート絶縁膜は、上記半導体FINの側面及び上面上から上記半導体基板のうち上記トレンチが形成されていない部分に亘って設けられ、上記半導体基板のうち上記トレンチが形成されていない部分では、上記半導体基板と上記第1のゲート電極とに挟まれている、半導体装置。 - トレンチが形成された半導体基板と、上記半導体基板のうち上記トレンチ内に埋め込まれ、互いに同じ導電型の不純物を含む半導体からなるソース領域及びドレイン領域と、上記トレンチ内に埋め込まれ、且つ上記ソース領域と上記ドレイン領域との間に設けられた半導体FINと、上記半導体FINの側面から上面に亘って設けられたゲート絶縁膜と、上記ゲート絶縁膜の上に設けられたゲート電極とを備えている半導体装置の製造方法であって、
上記半導体基板に上記トレンチを形成する工程(a)と、
上記トレンチの側壁に絶縁膜を形成する工程(b)と、
上記絶縁膜をマスクとして、上記半導体FINを含む半導体層を上記トレンチ内に形成する工程(c)と、
上記絶縁膜を除去する工程(d)と、
上記半導体層のうち上記半導体FINとなる部分の上面上から側面上に亘ってゲート絶縁膜を形成する工程(e)と、
上記ゲート絶縁膜の上にゲート電極を形成する工程(f)と、
上記ゲート電極をマスクとして上記半導体層に不純物を導入し、上記半導体層のうち上記ゲート電極の側下方に位置する領域にソース領域およびドレイン領域を形成し、上記ソース領域と上記ドレイン領域に挟まれ、且つ上記ゲート電極の直下方に位置する領域に半導体FINを形成する工程(g)と
を含んでいる半導体装置の製造方法。 - 請求項9に記載の半導体装置の製造方法において、
上記工程(f)で、上記ゲート電極は上記ゲート絶縁膜の上から上記半導体基板の上方に亘って設けられており、
上記トレンチの側壁部分に分離用絶縁膜を形成する工程(h)と、
上記半導体基板上に絶縁膜を形成する工程(i)と
をさらに含んでいる、半導体装置の製造方法。 - 請求項9に記載の半導体装置の製造方法において、
上記ゲート電極は上記ゲート絶縁膜の上から上記半導体基板の上方に亘って設けられており、
上記工程(e)で形成される上記ゲート絶縁膜は、上記半導体層のうち上記半導体FINとなる部分の側面及び上面上から上記半導体基板のうち上記トレンチが形成されていない部分に亘って設けられ、
上記工程(f)では、上記ゲート電極の一部が、上記半導体基板と共に上記ゲート絶縁膜を挟むように設けられる、半導体装置の製造方法。
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US6949768B1 (en) * | 2004-10-18 | 2005-09-27 | International Business Machines Corporation | Planar substrate devices integrated with finfets and method of manufacture |
CN100392859C (zh) * | 2004-11-03 | 2008-06-04 | 中国科学院微电子研究所 | 一种鱼脊形场效应晶体管的结构和制备方法 |
KR100610421B1 (ko) * | 2005-03-25 | 2006-08-08 | 주식회사 하이닉스반도체 | 반도체 소자의 제조 방법 |
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KR20050106492A (ko) | 2005-11-09 |
US7986002B2 (en) | 2011-07-26 |
US8486788B2 (en) | 2013-07-16 |
KR100769418B1 (ko) | 2007-10-22 |
WO2004084292A1 (en) | 2004-09-30 |
JP4922753B2 (ja) | 2012-04-25 |
US20110244645A1 (en) | 2011-10-06 |
CN1762047A (zh) | 2006-04-19 |
US20060208300A1 (en) | 2006-09-21 |
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