JP2006517054A - 銅裏面金属構造を備えるGaAs薄型ダイ - Google Patents

銅裏面金属構造を備えるGaAs薄型ダイ Download PDF

Info

Publication number
JP2006517054A
JP2006517054A JP2004557131A JP2004557131A JP2006517054A JP 2006517054 A JP2006517054 A JP 2006517054A JP 2004557131 A JP2004557131 A JP 2004557131A JP 2004557131 A JP2004557131 A JP 2004557131A JP 2006517054 A JP2006517054 A JP 2006517054A
Authority
JP
Japan
Prior art keywords
die
gaas substrate
backside metal
copper
gaas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004557131A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006517054A5 (https=
Inventor
ジェイ. エリオット、アレクサンダー
デール クローダー、ジェフリー
ジーン ミラー、モンテ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP USA Inc
Original Assignee
NXP USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NXP USA Inc filed Critical NXP USA Inc
Publication of JP2006517054A publication Critical patent/JP2006517054A/ja
Publication of JP2006517054A5 publication Critical patent/JP2006517054A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00Arrangements for thermal protection or thermal control
    • H10W40/70Fillings or auxiliary members in containers or in encapsulations for thermal protection or control
    • H10W40/77Auxiliary members characterised by their shape
    • H10W40/778Auxiliary members characterised by their shape in encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/351Materials of die-attach connectors
    • H10W72/352Materials of die-attach connectors comprising metals or metalloids, e.g. solders
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/59Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Die Bonding (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2004557131A 2002-11-27 2003-09-30 銅裏面金属構造を備えるGaAs薄型ダイ Pending JP2006517054A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/306,834 US6870243B2 (en) 2002-11-27 2002-11-27 Thin GaAs die with copper back-metal structure
PCT/US2003/030861 WO2004051733A1 (en) 2002-11-27 2003-09-30 Thin gaas die with copper back-metal structure

Publications (2)

Publication Number Publication Date
JP2006517054A true JP2006517054A (ja) 2006-07-13
JP2006517054A5 JP2006517054A5 (https=) 2006-11-24

Family

ID=32325776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004557131A Pending JP2006517054A (ja) 2002-11-27 2003-09-30 銅裏面金属構造を備えるGaAs薄型ダイ

Country Status (7)

Country Link
US (2) US6870243B2 (https=)
JP (1) JP2006517054A (https=)
KR (1) KR20050085143A (https=)
CN (1) CN1720610B (https=)
AU (1) AU2003277129A1 (https=)
TW (1) TWI339425B (https=)
WO (1) WO2004051733A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008028295A (ja) * 2006-07-25 2008-02-07 Toyota Central Res & Dev Lab Inc パワー半導体モジュール及びその製造方法

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6870243B2 (en) * 2002-11-27 2005-03-22 Freescale Semiconductor, Inc. Thin GaAs die with copper back-metal structure
US6833289B2 (en) * 2003-05-12 2004-12-21 Intel Corporation Fluxless die-to-heat spreader bonding using thermal interface material
US20050085084A1 (en) * 2003-10-16 2005-04-21 Chang Edward Y. Method of fabricating copper metallization on backside of gallium arsenide devices
US7221055B2 (en) * 2005-05-23 2007-05-22 Texas Instruments Incorporated System and method for die attach using a backside heat spreader
US7923842B2 (en) 2006-03-16 2011-04-12 Skyworks Solutions, Inc. GaAs integrated circuit device and method of attaching same
CN100449740C (zh) * 2006-06-19 2009-01-07 上海集成电路研发中心有限公司 降低半导体器件发热的散热方法、相应器件及其制造方法
WO2008060447A2 (en) * 2006-11-09 2008-05-22 Quantum Leap Packaging, Inc. Microcircuit package having ductile layer
US20090108437A1 (en) * 2007-10-29 2009-04-30 M/A-Com, Inc. Wafer scale integrated thermal heat spreader
JP5103245B2 (ja) * 2008-03-31 2012-12-19 ルネサスエレクトロニクス株式会社 半導体装置
US8987878B2 (en) * 2010-10-29 2015-03-24 Alpha And Omega Semiconductor Incorporated Substrateless power device packages
US8415805B2 (en) 2010-12-17 2013-04-09 Skyworks Solutions, Inc. Etched wafers and methods of forming the same
JP2013098481A (ja) * 2011-11-04 2013-05-20 Sumitomo Electric Device Innovations Inc 半導体装置
US8900969B2 (en) 2012-01-27 2014-12-02 Skyworks Solutions, Inc. Methods of stress balancing in gallium arsenide wafer processing
CN103377914A (zh) * 2012-04-18 2013-10-30 稳懋半导体股份有限公司 半导体元件背面铜金属的改良结构及其加工方法
US9093506B2 (en) 2012-05-08 2015-07-28 Skyworks Solutions, Inc. Process for fabricating gallium arsenide devices with copper contact layer
JP2014099547A (ja) * 2012-11-15 2014-05-29 Mitsubishi Electric Corp 電力半導体モジュールおよびその製造方法
US9530719B2 (en) 2014-06-13 2016-12-27 Skyworks Solutions, Inc. Direct die solder of gallium arsenide integrated circuit dies and methods of manufacturing gallium arsenide wafers
TWI660471B (zh) * 2017-10-06 2019-05-21 財團法人工業技術研究院 晶片封裝
US11133241B2 (en) 2019-06-28 2021-09-28 Stmicroelectronics, Inc. Semiconductor package with a cavity in a die pad for reducing voids in the solder
CN112989744B (zh) * 2021-02-08 2023-11-17 泰凌微电子(上海)股份有限公司 一种半导体芯片的封装设计方法以及装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04225536A (ja) * 1990-12-27 1992-08-14 Nikko Kyodo Co Ltd 化合物半導体装置の製造方法
JPH05243396A (ja) * 1992-03-02 1993-09-21 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
JPH06244320A (ja) * 1993-02-16 1994-09-02 Hitachi Ltd 樹脂封止型半導体装置
JPH09306932A (ja) * 1996-05-17 1997-11-28 Sanyo Electric Co Ltd 半導体装置の製造方法
JP2003045875A (ja) * 2001-07-30 2003-02-14 Nec Kagobutsu Device Kk 半導体装置およびその製造方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3755720A (en) * 1972-09-25 1973-08-28 Rca Corp Glass encapsulated semiconductor device
US3942186A (en) * 1973-10-09 1976-03-02 Westinghouse Electric Corporation High frequency, field-effect transistor
US4321099A (en) * 1979-11-13 1982-03-23 Nasa Method of fabricating Schottky barrier solar cell
US4543442A (en) * 1983-06-24 1985-09-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration GaAs Schottky barrier photo-responsive device and method of fabrication
JPS61174723A (ja) * 1985-01-30 1986-08-06 Mitsubishi Electric Corp 半導体装置の製造方法
US4929516A (en) * 1985-03-14 1990-05-29 Olin Corporation Semiconductor die attach system
US4872047A (en) * 1986-11-07 1989-10-03 Olin Corporation Semiconductor die attach system
US4989117A (en) * 1990-02-12 1991-01-29 Rogers Corporation Molded integrated circuit package incorporating thin decoupling capacitor
US5545289A (en) * 1994-02-03 1996-08-13 Applied Materials, Inc. Passivating, stripping and corrosion inhibition of semiconductor substrates
IT1274129B (it) * 1994-11-29 1997-07-15 Soriani & Moser Manufacturers Giostra di divertimento di tipo perfezionato
JP2757805B2 (ja) 1995-01-27 1998-05-25 日本電気株式会社 半導体装置
US5528076A (en) * 1995-02-01 1996-06-18 Motorola, Inc. Leadframe having metal impregnated silicon carbide mounting area
US5622305A (en) * 1995-05-10 1997-04-22 Lucent Technologies Inc. Bonding scheme using group VB metallic layer
US6105865A (en) * 1998-07-17 2000-08-22 Hardesty; Laurence Daniel Financial transaction system with retirement saving benefit
US6010966A (en) * 1998-08-07 2000-01-04 Applied Materials, Inc. Hydrocarbon gases for anisotropic etching of metal-containing layers
JP3690171B2 (ja) * 1999-03-16 2005-08-31 株式会社日立製作所 複合材料とその製造方法及び用途
US6609106B1 (en) * 1999-05-07 2003-08-19 Steven C. Robertson System and method for providing electronic multi-merchant gift registry services over a distributed network
US6211550B1 (en) * 1999-06-24 2001-04-03 Intersil Corporation Backmetal drain terminal with low stress and thermal resistance
US6426289B1 (en) * 2000-03-24 2002-07-30 Micron Technology, Inc. Method of fabricating a barrier layer associated with a conductor layer in damascene structures
TWI248384B (en) * 2000-06-12 2006-02-01 Hitachi Ltd Electronic device
US6551852B2 (en) * 2001-06-11 2003-04-22 Micron Technology Inc. Method of forming a recessed magnetic storage element
US6583500B1 (en) * 2002-02-11 2003-06-24 Texas Instruments Incorporated Thin tin preplated semiconductor leadframes
US6787910B2 (en) * 2002-07-23 2004-09-07 National Chiao Tung University Schottky structure in GaAs semiconductor device
US6870243B2 (en) * 2002-11-27 2005-03-22 Freescale Semiconductor, Inc. Thin GaAs die with copper back-metal structure
US20040146138A1 (en) * 2003-01-23 2004-07-29 Motorola, Inc. Large flat panel gallium arsenide arrays on silicon substrate for low dose X-ray digital imaging

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04225536A (ja) * 1990-12-27 1992-08-14 Nikko Kyodo Co Ltd 化合物半導体装置の製造方法
JPH05243396A (ja) * 1992-03-02 1993-09-21 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
JPH06244320A (ja) * 1993-02-16 1994-09-02 Hitachi Ltd 樹脂封止型半導体装置
JPH09306932A (ja) * 1996-05-17 1997-11-28 Sanyo Electric Co Ltd 半導体装置の製造方法
JP2003045875A (ja) * 2001-07-30 2003-02-14 Nec Kagobutsu Device Kk 半導体装置およびその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008028295A (ja) * 2006-07-25 2008-02-07 Toyota Central Res & Dev Lab Inc パワー半導体モジュール及びその製造方法

Also Published As

Publication number Publication date
AU2003277129A1 (en) 2004-06-23
US20050127480A1 (en) 2005-06-16
WO2004051733A1 (en) 2004-06-17
CN1720610B (zh) 2010-10-13
TW200416970A (en) 2004-09-01
US7092890B2 (en) 2006-08-15
TWI339425B (en) 2011-03-21
US6870243B2 (en) 2005-03-22
US20040099932A1 (en) 2004-05-27
CN1720610A (zh) 2006-01-11
KR20050085143A (ko) 2005-08-29

Similar Documents

Publication Publication Date Title
JP2006517054A (ja) 銅裏面金属構造を備えるGaAs薄型ダイ
KR970010678B1 (ko) 리드 프레임 및 이를 이용한 반도체 패키지
US6846704B2 (en) Semiconductor package and method for manufacturing the same
US6590281B2 (en) Crack-preventive semiconductor package
US5646829A (en) Resin sealing type semiconductor device having fixed inner leads
US20090189261A1 (en) Ultra-Thin Semiconductor Package
US7030496B2 (en) Semiconductor device having aluminum and metal electrodes and method for manufacturing the same
US10707158B2 (en) Package with vertical interconnect between carrier and clip
CN107615464A (zh) 电力用半导体装置的制造方法以及电力用半导体装置
CN103855122B (zh) 包括压缩应力的封装垂直功率器件及其制造方法
US8945992B2 (en) Power device package comprising metal tab die attach paddle (DAP) and method of fabricating the package
CN104733418A (zh) 管芯基板组装及其方法
US7811862B2 (en) Thermally enhanced electronic package
JPS59139636A (ja) ボンデイング方法
KR102371636B1 (ko) 양면 기판 반도체 제조 방법
JP2008543049A (ja) 半導体パッケージ及び同パッケージを形成する方法
US20240258372A1 (en) Electronic component and package including stress release structure as lateral edge portion of semiconductor body
CN216413053U (zh) 半导体元件封装结构
CN112786456B (zh) 半导体封装件以及相关方法
JPH0697349A (ja) 樹脂封止型半導体装置とその製造方法
JP2007242684A (ja) 積層型半導体装置及びデバイスの積層方法
JP2003068959A (ja) 半導体装置
JP3858857B2 (ja) 半導体装置
JP3145892B2 (ja) 樹脂封止型半導体装置
JP2026062974A (ja) 半導体装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061002

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061002

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090513

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090526

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090826

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100608

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20101102