JP2006350327A5 - - Google Patents

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Publication number
JP2006350327A5
JP2006350327A5 JP2006154103A JP2006154103A JP2006350327A5 JP 2006350327 A5 JP2006350327 A5 JP 2006350327A5 JP 2006154103 A JP2006154103 A JP 2006154103A JP 2006154103 A JP2006154103 A JP 2006154103A JP 2006350327 A5 JP2006350327 A5 JP 2006350327A5
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JP
Japan
Prior art keywords
dielectric film
storage electrode
insulating layer
electrode
contact hole
Prior art date
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Granted
Application number
JP2006154103A
Other languages
English (en)
Japanese (ja)
Other versions
JP5250738B2 (ja
JP2006350327A (ja
Filing date
Publication date
Priority claimed from KR1020050047861A external-priority patent/KR101137735B1/ko
Priority claimed from KR1020050051910A external-priority patent/KR20060131454A/ko
Application filed filed Critical
Publication of JP2006350327A publication Critical patent/JP2006350327A/ja
Publication of JP2006350327A5 publication Critical patent/JP2006350327A5/ja
Application granted granted Critical
Publication of JP5250738B2 publication Critical patent/JP5250738B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006154103A 2005-06-03 2006-06-02 表示装置、その製造方法、及びその製造方法で使用されるマスク Active JP5250738B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020050047861A KR101137735B1 (ko) 2005-06-03 2005-06-03 표시장치, 표시장치의 제조 방법 및 마스크
KR10-2005-0047861 2005-06-03
KR1020050051910A KR20060131454A (ko) 2005-06-16 2005-06-16 표시장치의 제조 방법 및 표시장치의 박막을 패터닝하기위한 마스크
KR10-2005-0051910 2005-06-16

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012108418A Division JP5501402B2 (ja) 2005-06-03 2012-05-10 表示装置及びマスク

Publications (3)

Publication Number Publication Date
JP2006350327A JP2006350327A (ja) 2006-12-28
JP2006350327A5 true JP2006350327A5 (enExample) 2009-07-16
JP5250738B2 JP5250738B2 (ja) 2013-07-31

Family

ID=36940471

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006154103A Active JP5250738B2 (ja) 2005-06-03 2006-06-02 表示装置、その製造方法、及びその製造方法で使用されるマスク
JP2012108418A Active JP5501402B2 (ja) 2005-06-03 2012-05-10 表示装置及びマスク

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012108418A Active JP5501402B2 (ja) 2005-06-03 2012-05-10 表示装置及びマスク

Country Status (4)

Country Link
US (2) US8040444B2 (enExample)
EP (1) EP1729169B1 (enExample)
JP (2) JP5250738B2 (enExample)
TW (1) TWI420246B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090078527A (ko) * 2008-01-15 2009-07-20 삼성전자주식회사 표시 기판
JP2010199518A (ja) * 2009-02-27 2010-09-09 Oki Semiconductor Co Ltd 半導体装置の製造方法
TWI413831B (zh) * 2009-03-09 2013-11-01 Pixel Qi Corp 平常黑半穿透液晶顯示器
US8314907B2 (en) * 2009-07-28 2012-11-20 Pixel Qi Corporation Transflective display sub-pixel structures with transmissive area having different sizes and reflective area having equal sizes
US8698716B2 (en) 2010-05-18 2014-04-15 Pixel Qi Corporation Low power consumption transflective liquid crystal displays
US8830426B2 (en) 2010-11-17 2014-09-09 Pixel Qi Corporation Color shift reduction in transflective liquid crystal displays
CN102645839B (zh) * 2011-06-15 2013-11-27 北京京东方光电科技有限公司 一种掩模板及其制造方法
JP6173049B2 (ja) * 2013-06-04 2017-08-02 三菱電機株式会社 表示パネル及びその製造方法、並びに、液晶表示パネル
EP2863291A1 (en) * 2013-10-18 2015-04-22 Applied Materials, Inc. Transparent body for a touch panel manufacturing method and system for manufacturing a transparent body for a touch screen panel
WO2016150730A1 (en) * 2015-03-20 2016-09-29 Koninklijke Philips N.V. High-intensity discharge lamp
CN105068373B (zh) * 2015-09-11 2019-05-31 武汉华星光电技术有限公司 Tft基板结构的制作方法
US10459331B2 (en) * 2017-03-13 2019-10-29 Wuhan China Star Optoelectronics Technology Co., Ltd. Mask structure and COA type array substrate

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100590753B1 (ko) 1999-02-27 2006-06-15 삼성전자주식회사 액정표시장치용박막트랜지스터기판및그제조방법
TWI255957B (en) * 1999-03-26 2006-06-01 Hitachi Ltd Liquid crystal display device and method of manufacturing the same
JP3844913B2 (ja) * 1999-06-28 2006-11-15 アルプス電気株式会社 アクティブマトリックス型液晶表示装置
JP4403329B2 (ja) * 1999-08-30 2010-01-27 ソニー株式会社 液晶表示装置の製造方法
JP2001324725A (ja) * 2000-05-12 2001-11-22 Hitachi Ltd 液晶表示装置およびその製造方法
KR100848099B1 (ko) * 2002-05-27 2008-07-24 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 기판
JP2002214641A (ja) * 2001-01-15 2002-07-31 Toshiba Corp 平面表示装置用アレイ基板の製造方法
JP4651826B2 (ja) * 2001-01-31 2011-03-16 Ｎｅｃ液晶テクノロジー株式会社 反射型表示装置及びその製造方法
KR100729767B1 (ko) 2001-01-31 2007-06-20 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법
JP2003152086A (ja) 2001-11-15 2003-05-23 Semiconductor Energy Lab Co Ltd 半導体装置
KR100443831B1 (ko) * 2001-12-20 2004-08-09 엘지.필립스 엘시디 주식회사 액정표시소자의 제조 방법
KR100475111B1 (ko) * 2001-12-28 2005-03-10 엘지.필립스 엘시디 주식회사 액정표시장치의 제조방법
JP3857142B2 (ja) 2002-01-11 2006-12-13 シャープ株式会社 液晶用マトリクス基板の製造方法
JP2003215635A (ja) * 2002-01-21 2003-07-30 Matsushita Electric Ind Co Ltd 液晶表示装置およびその製造方法
KR20030074991A (ko) 2002-03-15 2003-09-22 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 어레이 기판
US7042149B2 (en) * 2002-06-13 2006-05-09 Tfpd Corporation Circuit array substrate for display device
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
KR100498543B1 (ko) * 2002-11-07 2005-07-01 엘지.필립스 엘시디 주식회사 액정표시장치용 어레이 기판 및 그 제조방법
KR100929675B1 (ko) * 2003-03-24 2009-12-03 삼성전자주식회사 다중 도메인 액정 표시 장치 및 그 박막 트랜지스터 기판
JP4417072B2 (ja) * 2003-03-28 2010-02-17 シャープ株式会社 液晶表示装置用基板及びそれを用いた液晶表示装置
KR100698047B1 (ko) * 2003-04-19 2007-03-23 엘지.필립스 엘시디 주식회사 횡전계형 액정 표시 장치 및 그 제조 방법

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