JP2006261674A - 機能水供給システム、及び機能水供給方法 - Google Patents
機能水供給システム、及び機能水供給方法 Download PDFInfo
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 296
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000007789 gas Substances 0.000 claims description 103
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 51
- 239000007788 liquid Substances 0.000 claims description 40
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 238000004090 dissolution Methods 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 238000005192 partition Methods 0.000 claims description 7
- 238000011084 recovery Methods 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 abstract description 7
- 239000008367 deionised water Substances 0.000 description 13
- 229910021641 deionized water Inorganic materials 0.000 description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000003643 water by type Substances 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B5/00—Water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
- C02F1/685—Devices for dosing the additives
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/026—Treating water for medical or cosmetic purposes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0329—Mixing of plural fluids of diverse characteristics or conditions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2496—Self-proportioning or correlating systems
- Y10T137/2499—Mixture condition maintaining or sensing
- Y10T137/2509—By optical or chemical property
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
【解決手段】本発明のシステムにおいて、機能水生成器から生成された機能水が機能水供給管を通じて分配器に供給される。以後、機能水は、装置が工程進行中である際には装置に供給され、装置が工程進行しない際には機能水回収管を通じて機能水生成器に回収される。機能水供給管にはバッファタンクが設けられ、バッファタンクに連結された循環ラインで機能水の濃度が測定される。機能水の濃度が設定範囲を逸脱すると、搬送管を通じて機能水は機能水生成器に搬送される。
【選択図】図2
Description
120 インジェクタ
140 液体供給部
160 ガス供給部
180 接触器
200 機能水供給管
300 機能水回収管
400 分配器
500 バッファタンク
620 循環ライン
640 濃度計測器
700 機能水搬送管
800 制御器
Claims (12)
- 機能水で基板を処理する装置の機能水を供給するシステムにおいて、
機能水を生成する機能水生成器と、
前記機能水生成器から生成された機能水を前記装置に供給する機能水供給管と、
前記機能水供給管に設けられ、前記機能水生成器から生成された機能水を貯蔵するバッファタンクと、
前記バッファタンク内の機能水に溶解されたガスの濃度を測定する濃度計測器と、
前記バッファタンク内の機能水に溶解されたガスの濃度が設定範囲を逸脱した場合、前記バッファタンク内の機能水を前記機能水生成器に搬送させる機能水搬送管とを含むことを特徴とする機能水供給システム。 - 前記機能水供給システムは、
前記機能水供給管から機能水が供給されて複数の前記装置に機能水を分配する分配器と、
前記分配器から前記装置に分配されない機能水を前記機能水生成器に回収する機能水回収管とを含むことを特徴とする請求項1に記載の機能水供給システム。 - 前記機能水供給システムは前記バッファタンク内の機能水を循環させる循環管をさらに含み、
前記濃度計測器は前記循環管に設けられることを特徴とする請求項1に記載の機能水供給システム。 - 前記機能水はオゾン水、酸素水、または水素水のうち少なくともいずれか1つを含むことを特徴とする請求項1乃至請求項3のうちいずれか1項に記載の機能水供給システム。
- 前記機能水生成器は、
液体供給部と、
ガス供給部と、
前記液体供給部と前記ガス供給部から液体とガスとが供給され、前記液体に前記ガスを溶解させるインジェクタと、
前記インジェクタから排出される機能水が供給されて前記液体内の前記ガスの溶解を促進させる接触器とを含むことを特徴とする請求項1に記載の機能水供給システム。 - 前記ガス供給部には各々バルブが設けられ、前記インジェクタに互いに異なるガスを供給するように連結された複数のガス供給管を含み、
前記機能水供給システムは、選択されたガスが前記インジェクタに供給されるように前記ガス供給管に設けられた前記バルブを制御する制御器をさらに含むことを特徴とする請求項5に記載の機能水供給システム。 - 前記インジェクタは、
ベンチュリ効果により前記気体を前記液体に溶解させるように形状付けられることを特徴とする請求項5に記載の機能水供給システム。 - 前記接触器は、流入口及び流出口を有するボディーと、
微細な通孔が形成され、前記ボディー内に設けられる隔板とを含み、
前記機能水が前記隔板の通孔に分散移動する過程で前記機能水に溶解されたガスをさらに微粒子の気泡で分散拡大させて前記液体内の前記ガスの溶解率を向上させることを特徴とする請求項7に記載の機能水供給システム。 - 前記接触器は複数個提供され、
前記接触器は互いに直列に連結されることを特徴とする請求項8に記載の機能水供給システム。 - 機能水を用いて基板を処理する装置に機能水を供給する方法において、
機能水生成器から生成された機能水を前記装置に供給する前にバッファタンクに供給して、前記バッファタンク内の機能水に溶解されたガスの濃度を測定した後、その測定値が設定範囲内に属すれば、前記機能水を前記装置に供給し、前記測定値が前記設定範囲内に属しなければ、前記バッファタンク内の機能水を前記機能水生成器に搬送することを特徴とする機能水供給方法。 - 分配器を通じて前記機能水生成器から供給された機能水を複数の装置に分配し、前記分配器から前記装置に機能水の供給が行われないか、あるいは前記装置に供給されてから残った機能水は、再び前記機能水生成器に回収されることを特徴とする請求項10に記載の機能水供給方法。
- 前記バッファタンク内の機能水に溶解されたガスの濃度測定は前記バッファタンクに設けられた循環ライン内で行われることを特徴とする請求項10に記載の機能水供給方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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KR1020050022601A KR100625320B1 (ko) | 2005-03-18 | 2005-03-18 | 기판 세정 설비의 기능수 공급 장치 |
KR1020050111854A KR100737751B1 (ko) | 2005-11-22 | 2005-11-22 | 기판 세정 설비의 기능수 공급 장치 및 방법 |
KR1020050112503A KR100706665B1 (ko) | 2005-11-23 | 2005-11-23 | 기능수 공급 장치 및 기능수 공급 방법 |
Publications (2)
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JP2006261674A true JP2006261674A (ja) | 2006-09-28 |
JP4077845B2 JP4077845B2 (ja) | 2008-04-23 |
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JP2006071653A Active JP4077845B2 (ja) | 2005-03-18 | 2006-03-15 | 機能水供給システム、及び機能水供給方法 |
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US (1) | US7617836B2 (ja) |
JP (1) | JP4077845B2 (ja) |
TW (1) | TWI363382B (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008006432A (ja) * | 2006-05-29 | 2008-01-17 | Spg Techno Kk | 線状スリットを利用した気液混合溶解方法と気液混合溶解装置 |
JP2010199124A (ja) * | 2009-02-23 | 2010-09-09 | Nomura Micro Sci Co Ltd | オゾン水供給装置 |
WO2018116987A1 (ja) * | 2016-12-20 | 2018-06-28 | Dic株式会社 | 比抵抗値調整装置及び比抵抗値調整方法 |
JP2020175338A (ja) * | 2019-04-19 | 2020-10-29 | 株式会社荏原製作所 | 機能水濃度制御システム、及び機能水濃度制御方法 |
KR20220105178A (ko) * | 2021-01-18 | 2022-07-27 | 레독스생명공학(주) | 나노버블수 제조장치 |
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GB2471280B (en) * | 2009-06-22 | 2011-08-31 | Hydroventuri Ltd | Apparatus and method for introducing a gas into a liquid |
US9789448B2 (en) * | 2014-01-24 | 2017-10-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Process for treating fluid |
KR101933080B1 (ko) * | 2016-10-26 | 2018-12-28 | 세메스 주식회사 | 기판 처리 장치, 공정 유체 처리기 및 오존 분해 방법 |
US11772234B2 (en) | 2019-10-25 | 2023-10-03 | Applied Materials, Inc. | Small batch polishing fluid delivery for CMP |
CN113578082A (zh) * | 2020-04-30 | 2021-11-02 | 信纮科技股份有限公司 | 化学液体稀释系统 |
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JP2008006432A (ja) * | 2006-05-29 | 2008-01-17 | Spg Techno Kk | 線状スリットを利用した気液混合溶解方法と気液混合溶解装置 |
JP2010199124A (ja) * | 2009-02-23 | 2010-09-09 | Nomura Micro Sci Co Ltd | オゾン水供給装置 |
WO2018116987A1 (ja) * | 2016-12-20 | 2018-06-28 | Dic株式会社 | 比抵抗値調整装置及び比抵抗値調整方法 |
JPWO2018116987A1 (ja) * | 2016-12-20 | 2018-12-20 | Dic株式会社 | 比抵抗値調整装置及び比抵抗値調整方法 |
US11524267B2 (en) | 2016-12-20 | 2022-12-13 | Dic Corporation | Resistivity value regulating device and resistivity value regulating method |
JP2020175338A (ja) * | 2019-04-19 | 2020-10-29 | 株式会社荏原製作所 | 機能水濃度制御システム、及び機能水濃度制御方法 |
KR20220105178A (ko) * | 2021-01-18 | 2022-07-27 | 레독스생명공학(주) | 나노버블수 제조장치 |
KR102489104B1 (ko) * | 2021-01-18 | 2023-01-18 | 레독스생명공학(주) | 나노버블수 제조장치 |
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Publication number | Publication date |
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TW200634919A (en) | 2006-10-01 |
JP4077845B2 (ja) | 2008-04-23 |
US20060207777A1 (en) | 2006-09-21 |
TWI363382B (en) | 2012-05-01 |
US7617836B2 (en) | 2009-11-17 |
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