JP2006196887A - ケミカルメカニカルポリッシングのための選択的スラリー - Google Patents
ケミカルメカニカルポリッシングのための選択的スラリー Download PDFInfo
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- JP2006196887A JP2006196887A JP2005369099A JP2005369099A JP2006196887A JP 2006196887 A JP2006196887 A JP 2006196887A JP 2005369099 A JP2005369099 A JP 2005369099A JP 2005369099 A JP2005369099 A JP 2005369099A JP 2006196887 A JP2006196887 A JP 2006196887A
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- Prior art keywords
- carbon atoms
- polishing
- acid
- solution
- hydrophilic portion
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Abstract
【解決手段】水溶液は、酸化剤0〜25重量%;疎水性テール部、非イオン親水性部分及びアニオン親水性部分を有し、疎水性テール部が炭素原子6〜30個を有し、非イオン親水性部分が炭素原子10〜300個を有するものである多成分界面活性剤0.00002〜5重量%;非鉄金属のためのインヒビター0〜15重量%;砥粒0〜50重量%;非鉄金属のための錯化剤0〜20重量%;ならびに水を含む。
【選択図】 なし
Description
の化合物がある。
の化合物がある。
BTA=ベンゾトリアゾール。シリカは、AZ Electronic Materials製の、平均粒度50nmを有するKlebosol IIであった。ポリグリコールエーテルスルフェート=R(EO)33SO3Na(Rは脂肪アルコールであり、EOはエチレンオキシドである)の公称組成を有するCognis/Chemicals Group製のDisponil FES 77 IS。殺生物剤は、Rohm and Haas社製の、メチル−4−イソチアゾリン−3−オン50.0〜52.0%、プロパンジオール45.0〜47.0%及び関連反応生成物3%未満を有するNEOLONE(商標)であった。
BTA=ベンゾトリアゾール。殺生物剤=Rohm and Haas社製の、メチル−4−イソチアゾリン−3−オン9.5〜9.9%、水89.1〜89.5%及び関連反応生成物1.0%以下を有するKordek MLX(商標)であった。シリカは、AZ Electronic Materials製の、平均粒度50nmを有するKlebosol IIであった。ポリグリコールエーテルスルフェート=R(EO)33SO3Na(Rは脂肪アルコールであり、EOはエチレンオキシドである)の公称組成を有するCognis/Chemicals Group製のDisponil FES 77 IS
すべての溶液は、Rohm and Haas社製の、メチル−4−イソチアゾリン−3−オン9.5〜9.9%、水89.1〜89.5%及び関連反応生成物1.0%以下を有するKordek MLX(商標)殺生物剤を含有するものであった。BTA=ベンゾトリアゾール。シリカは、AZ Electronic Materials製の、平均粒度50nmを有するKlebosol IIであった。PEGS(ポリグリコールエーテルスルフェート)=R(EO)33SO3Na(Rは脂肪アルコールであり、EOはエチレンオキシドである)の公称組成を有するCognis/Chemicals Group製のDisponil FES 77 IS。CDO=NovellusのCORAL炭素ドープ酸化物
Claims (10)
- low−k絶縁材の存在下における選択的除去に有用な水溶液であって、酸化剤0〜25重量%;疎水性テール部、非イオン親水性部分及びアニオン親水性部分を有し、前記疎水性テール部が炭素原子6〜30個を有し、前記非イオン親水性部分が炭素原子10〜300個を有するものである多成分界面活性剤0.00002〜5重量%;非鉄金属のためのインヒビター0〜15重量%;砥粒0〜50重量%;非鉄金属のための錯化剤0〜20重量%;ならびに水を含む溶液。
- 前記非イオン親水性部分がポリエチレンオキシドを含有する、請求項1記載の溶液。
- 前記アニオン部分が、カルボン酸、スルホン酸、硫酸、ホスホン酸及びそれらの塩又はそれらの混合物の少なくとも一つを含有する、請求項1記載の溶液。
- low−k絶縁材の存在下における選択的除去に有用な水溶液であって、酸化剤0〜20重量%;疎水性テール部、非イオン親水性部分及びアニオン親水性部分を有し、前記疎水性テール部が炭素原子8〜20個を有し、前記非イオン親水性部分が炭素原子20〜200個を有するものである多成分界面活性剤0.00005〜2重量%;非鉄金属のためのインヒビター0.001〜15重量%;砥粒0〜40重量%;非鉄金属のための錯化剤0〜10重量%;ならびに水を含む溶液。
- 前記非イオン親水性部分がポリエチレンオキシドを含有する、請求項4記載の溶液。
- 前記アニオン部分が、カルボン酸、スルホン酸、硫酸、ホスホン酸及びそれらの塩又はそれらの混合物の少なくとも一つを含有する、請求項4記載の溶液。
- イミン誘導体化合物、ヒドラジン誘導体化合物及びそれらの混合物から選択されるバリヤ除去剤を0.1〜10重量%含む、請求項4記載の溶液。
- 前記疎水性部分が炭素原子12〜16個を含み、前記非イオン親水性部分が炭素原子25〜150個を含む、請求項4記載の溶液。
- 半導体基材から層の少なくとも一部を除去する方法であって、酸化剤0〜25重量%;疎水性テール部、非イオン親水性部分及びアニオン親水性部分を有し、前記疎水性テール部が炭素原子6〜30個を有し、前記非イオン親水性部分が炭素原子10〜300個を有するものである多成分界面活性剤0.00002〜5重量%;非鉄金属のためのインヒビター0〜15重量%;砥粒0〜50重量%;非鉄金属のための錯化剤0〜20重量%;ならびに水を含む研磨溶液で半導体基材を研磨する工程を含む、方法。
- 炭素ドープ酸化物層で研磨を止める、請求項9記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/019,882 US7790618B2 (en) | 2004-12-22 | 2004-12-22 | Selective slurry for chemical mechanical polishing |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006196887A true JP2006196887A (ja) | 2006-07-27 |
Family
ID=36585713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005369099A Pending JP2006196887A (ja) | 2004-12-22 | 2005-12-22 | ケミカルメカニカルポリッシングのための選択的スラリー |
Country Status (7)
Country | Link |
---|---|
US (1) | US7790618B2 (ja) |
JP (1) | JP2006196887A (ja) |
KR (1) | KR101107638B1 (ja) |
CN (1) | CN100378188C (ja) |
DE (1) | DE102005058271A1 (ja) |
FR (1) | FR2879618B1 (ja) |
TW (1) | TWI374172B (ja) |
Cited By (5)
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JP2008041781A (ja) * | 2006-08-02 | 2008-02-21 | Fujimi Inc | 研磨用組成物及び研磨方法 |
JP2009049401A (ja) * | 2007-08-03 | 2009-03-05 | Rohm & Haas Electronic Materials Cmp Holdings Inc | 選択的バリヤ研磨スラリー |
JP2009049402A (ja) * | 2007-08-03 | 2009-03-05 | Rohm & Haas Electronic Materials Cmp Holdings Inc | バリヤ除去ポリマー研磨スラリー |
JP2010153865A (ja) * | 2008-12-22 | 2010-07-08 | Rohm & Haas Electronic Materials Cmp Holdings Inc | バリヤ除去ポリマー研磨スラリー |
JP2020026473A (ja) * | 2018-08-10 | 2020-02-20 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びその製造方法並びに研磨方法並びに基板の製造方法 |
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TWI385226B (zh) * | 2005-09-08 | 2013-02-11 | 羅門哈斯電子材料Cmp控股公司 | 用於移除聚合物阻障之研磨漿液 |
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US20080105652A1 (en) * | 2006-11-02 | 2008-05-08 | Cabot Microelectronics Corporation | CMP of copper/ruthenium/tantalum substrates |
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EP2658943B1 (en) | 2010-12-28 | 2021-03-03 | Saint-Gobain Ceramics & Plastics, Inc. | Polishing slurry including zirconia particles and a method of using the polishing slurry |
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EP2754732B1 (en) * | 2013-01-15 | 2015-03-11 | ATOTECH Deutschland GmbH | Aqueous composition for etching of copper and copper alloys |
US20140264151A1 (en) * | 2013-03-15 | 2014-09-18 | Cabot Microelectronics Corporation | Aqueous cleaning composition for post copper chemical mechanical planarization |
CN108250978A (zh) * | 2016-12-28 | 2018-07-06 | 安集微电子科技(上海)股份有限公司 | 一种化学机械抛光液及其应用 |
WO2020091242A1 (ko) * | 2018-10-31 | 2020-05-07 | 영창케미칼 주식회사 | 구리 배리어층 연마용 슬러리 조성물 |
TW202248378A (zh) * | 2021-06-08 | 2022-12-16 | 南韓商東進世美肯股份有限公司 | 有機膜研磨組合物以及利用所述有機膜研磨組合物的研磨方法 |
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-
2004
- 2004-12-22 US US11/019,882 patent/US7790618B2/en active Active
-
2005
- 2005-12-06 DE DE102005058271A patent/DE102005058271A1/de not_active Ceased
- 2005-12-08 TW TW094143315A patent/TWI374172B/zh active
- 2005-12-15 KR KR1020050123712A patent/KR101107638B1/ko active IP Right Grant
- 2005-12-22 FR FR0513118A patent/FR2879618B1/fr active Active
- 2005-12-22 CN CNB2005101361633A patent/CN100378188C/zh active Active
- 2005-12-22 JP JP2005369099A patent/JP2006196887A/ja active Pending
Patent Citations (5)
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WO2003104343A2 (en) * | 2002-06-07 | 2003-12-18 | Cabot Microelectronics Corporation | Method for chemical mechanical polishing (cmp) of low-k dielectric materials |
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JP2008041781A (ja) * | 2006-08-02 | 2008-02-21 | Fujimi Inc | 研磨用組成物及び研磨方法 |
JP2009049401A (ja) * | 2007-08-03 | 2009-03-05 | Rohm & Haas Electronic Materials Cmp Holdings Inc | 選択的バリヤ研磨スラリー |
JP2009049402A (ja) * | 2007-08-03 | 2009-03-05 | Rohm & Haas Electronic Materials Cmp Holdings Inc | バリヤ除去ポリマー研磨スラリー |
JP2010153865A (ja) * | 2008-12-22 | 2010-07-08 | Rohm & Haas Electronic Materials Cmp Holdings Inc | バリヤ除去ポリマー研磨スラリー |
JP2020026473A (ja) * | 2018-08-10 | 2020-02-20 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びその製造方法並びに研磨方法並びに基板の製造方法 |
JP7120846B2 (ja) | 2018-08-10 | 2022-08-17 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びその製造方法並びに研磨方法並びに基板の製造方法 |
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Publication number | Publication date |
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CN1793274A (zh) | 2006-06-28 |
KR101107638B1 (ko) | 2012-01-25 |
US20060131275A1 (en) | 2006-06-22 |
KR20060071875A (ko) | 2006-06-27 |
CN100378188C (zh) | 2008-04-02 |
FR2879618B1 (fr) | 2010-06-25 |
FR2879618A1 (fr) | 2006-06-23 |
US7790618B2 (en) | 2010-09-07 |
TWI374172B (en) | 2012-10-11 |
TW200626690A (en) | 2006-08-01 |
DE102005058271A1 (de) | 2006-07-13 |
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