JP2006147919A5 - - Google Patents

Download PDF

Info

Publication number
JP2006147919A5
JP2006147919A5 JP2004337357A JP2004337357A JP2006147919A5 JP 2006147919 A5 JP2006147919 A5 JP 2006147919A5 JP 2004337357 A JP2004337357 A JP 2004337357A JP 2004337357 A JP2004337357 A JP 2004337357A JP 2006147919 A5 JP2006147919 A5 JP 2006147919A5
Authority
JP
Japan
Prior art keywords
electromagnet
moving body
magnetic
detecting
current value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004337357A
Other languages
English (en)
Japanese (ja)
Other versions
JP4541849B2 (ja
JP2006147919A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004337357A priority Critical patent/JP4541849B2/ja
Priority claimed from JP2004337357A external-priority patent/JP4541849B2/ja
Priority to US11/282,713 priority patent/US7385318B2/en
Publication of JP2006147919A publication Critical patent/JP2006147919A/ja
Publication of JP2006147919A5 publication Critical patent/JP2006147919A5/ja
Application granted granted Critical
Publication of JP4541849B2 publication Critical patent/JP4541849B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004337357A 2004-11-22 2004-11-22 位置決め装置 Expired - Fee Related JP4541849B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004337357A JP4541849B2 (ja) 2004-11-22 2004-11-22 位置決め装置
US11/282,713 US7385318B2 (en) 2004-11-22 2005-11-21 Positioning system, magnetic bearing, and method of controlling the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004337357A JP4541849B2 (ja) 2004-11-22 2004-11-22 位置決め装置

Publications (3)

Publication Number Publication Date
JP2006147919A JP2006147919A (ja) 2006-06-08
JP2006147919A5 true JP2006147919A5 (enExample) 2008-01-17
JP4541849B2 JP4541849B2 (ja) 2010-09-08

Family

ID=36573401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004337357A Expired - Fee Related JP4541849B2 (ja) 2004-11-22 2004-11-22 位置決め装置

Country Status (2)

Country Link
US (1) US7385318B2 (enExample)
JP (1) JP4541849B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5233483B2 (ja) * 2008-07-31 2013-07-10 株式会社ニコン ステージ装置及び露光装置並びにデバイス製造方法
US8358039B2 (en) 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
JP2014064025A (ja) * 2013-11-18 2014-04-10 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2025154016A (ja) * 2024-03-29 2025-10-10 ダイキン工業株式会社 磁気ユニット、圧縮機及び冷凍装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06100164A (ja) * 1992-08-27 1994-04-12 Hitachi Ltd 磁気的に結合された搬送装置
JP3800616B2 (ja) * 1994-06-27 2006-07-26 株式会社ニコン 目標物移動装置、位置決め装置及び可動ステージ装置
US5925956A (en) * 1995-06-30 1999-07-20 Nikon Corporation Stage construction incorporating magnetically levitated movable stage
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2001057325A (ja) * 1999-08-17 2001-02-27 Nikon Corp ステージ装置及び露光装置
JP2001107961A (ja) * 1999-10-07 2001-04-17 Mitsubishi Electric Corp 電磁石駆動装置
US6355994B1 (en) * 1999-11-05 2002-03-12 Multibeam Systems, Inc. Precision stage
US6731372B2 (en) * 2001-03-27 2004-05-04 Nikon Corporation Multiple chamber fluid mount
FR2829200B1 (fr) * 2001-09-06 2004-12-31 Mecanique Magnetique Sa Dispositif et procede de compensation automatique de perturbations synchrones
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP4280543B2 (ja) 2002-05-08 2009-06-17 キヤノン株式会社 移動体機構および露光装置
JP2004172557A (ja) 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法

Similar Documents

Publication Publication Date Title
US6069417A (en) Stage having paired E/I core actuator control
TW200807172A (en) Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
TWI357096B (en) Lithographic apparatus and method
TW201223085A (en) Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method
EP2669931B1 (en) Driving system and driving method, light exposure device and light exposure method, and driving system designing method
JP2011211222A5 (enExample)
JP2015212775A5 (enExample)
JPWO2006068233A1 (ja) 磁気案内装置、ステージ装置、露光装置、及びデバイスの製造方法
JP2005251788A5 (enExample)
JPWO2006057263A1 (ja) 移動体システム、露光装置及びデバイス製造方法
JP2006147919A5 (enExample)
EP2905804B1 (en) Mobile body device, exposure device, and device manufacturing method
TWI228206B (en) Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method
US7157722B2 (en) Positioning device and method of initializing a positioning device
JPH10289943A (ja) ステージ装置およびデバイス製造方法
US10036965B2 (en) Stage apparatus, lithography apparatus, and device manufacturing method
JP2008078499A5 (enExample)
JP2012004201A (ja) 移動体装置、露光装置、デバイス製造方法、フラットパネルディスプレイの製造方法、及び移動体装置の制御方法
JPH10144603A (ja) ステージ装置およびこれを用いた露光装置
SG138458A1 (en) Lithographic apparatus and device manufacturing method
JP4541849B2 (ja) 位置決め装置
KR20120125187A (ko) 위치 결정 장치, 노광 장치 및 디바이스 제조 방법
JP2011037611A (ja) 移動体システム
JP2009300798A5 (enExample)
JP2017526955A (ja) リソグラフィ装置およびデバイス製造方法