JP4541849B2 - 位置決め装置 - Google Patents

位置決め装置 Download PDF

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Publication number
JP4541849B2
JP4541849B2 JP2004337357A JP2004337357A JP4541849B2 JP 4541849 B2 JP4541849 B2 JP 4541849B2 JP 2004337357 A JP2004337357 A JP 2004337357A JP 2004337357 A JP2004337357 A JP 2004337357A JP 4541849 B2 JP4541849 B2 JP 4541849B2
Authority
JP
Japan
Prior art keywords
electromagnet
moving body
magnetic
stage
current value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004337357A
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English (en)
Japanese (ja)
Other versions
JP2006147919A (ja
JP2006147919A5 (enExample
Inventor
吉洋 平田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004337357A priority Critical patent/JP4541849B2/ja
Priority to US11/282,713 priority patent/US7385318B2/en
Publication of JP2006147919A publication Critical patent/JP2006147919A/ja
Publication of JP2006147919A5 publication Critical patent/JP2006147919A5/ja
Application granted granted Critical
Publication of JP4541849B2 publication Critical patent/JP4541849B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2004337357A 2004-11-22 2004-11-22 位置決め装置 Expired - Fee Related JP4541849B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004337357A JP4541849B2 (ja) 2004-11-22 2004-11-22 位置決め装置
US11/282,713 US7385318B2 (en) 2004-11-22 2005-11-21 Positioning system, magnetic bearing, and method of controlling the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004337357A JP4541849B2 (ja) 2004-11-22 2004-11-22 位置決め装置

Publications (3)

Publication Number Publication Date
JP2006147919A JP2006147919A (ja) 2006-06-08
JP2006147919A5 JP2006147919A5 (enExample) 2008-01-17
JP4541849B2 true JP4541849B2 (ja) 2010-09-08

Family

ID=36573401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004337357A Expired - Fee Related JP4541849B2 (ja) 2004-11-22 2004-11-22 位置決め装置

Country Status (2)

Country Link
US (1) US7385318B2 (enExample)
JP (1) JP4541849B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5233483B2 (ja) * 2008-07-31 2013-07-10 株式会社ニコン ステージ装置及び露光装置並びにデバイス製造方法
US8358039B2 (en) 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
JP2014064025A (ja) * 2013-11-18 2014-04-10 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2025154016A (ja) * 2024-03-29 2025-10-10 ダイキン工業株式会社 磁気ユニット、圧縮機及び冷凍装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06100164A (ja) * 1992-08-27 1994-04-12 Hitachi Ltd 磁気的に結合された搬送装置
JP3800616B2 (ja) * 1994-06-27 2006-07-26 株式会社ニコン 目標物移動装置、位置決め装置及び可動ステージ装置
US5925956A (en) * 1995-06-30 1999-07-20 Nikon Corporation Stage construction incorporating magnetically levitated movable stage
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2001057325A (ja) * 1999-08-17 2001-02-27 Nikon Corp ステージ装置及び露光装置
JP2001107961A (ja) * 1999-10-07 2001-04-17 Mitsubishi Electric Corp 電磁石駆動装置
US6355994B1 (en) * 1999-11-05 2002-03-12 Multibeam Systems, Inc. Precision stage
US6731372B2 (en) * 2001-03-27 2004-05-04 Nikon Corporation Multiple chamber fluid mount
FR2829200B1 (fr) * 2001-09-06 2004-12-31 Mecanique Magnetique Sa Dispositif et procede de compensation automatique de perturbations synchrones
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP4280543B2 (ja) 2002-05-08 2009-06-17 キヤノン株式会社 移動体機構および露光装置
JP2004172557A (ja) 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法

Also Published As

Publication number Publication date
JP2006147919A (ja) 2006-06-08
US20060119190A1 (en) 2006-06-08
US7385318B2 (en) 2008-06-10

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