JP2006104575A5 - - Google Patents

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Publication number
JP2006104575A5
JP2006104575A5 JP2005274384A JP2005274384A JP2006104575A5 JP 2006104575 A5 JP2006104575 A5 JP 2006104575A5 JP 2005274384 A JP2005274384 A JP 2005274384A JP 2005274384 A JP2005274384 A JP 2005274384A JP 2006104575 A5 JP2006104575 A5 JP 2006104575A5
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JP
Japan
Prior art keywords
substrate support
high frequency
chamber wall
process chamber
coupled
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005274384A
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English (en)
Japanese (ja)
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JP2006104575A (ja
JP5033319B2 (ja
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Priority claimed from US10/946,403 external-priority patent/US7534301B2/en
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Publication of JP2006104575A publication Critical patent/JP2006104575A/ja
Publication of JP2006104575A5 publication Critical patent/JP2006104575A5/ja
Application granted granted Critical
Publication of JP5033319B2 publication Critical patent/JP5033319B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005274384A 2004-09-21 2005-09-21 プラズマ強化化学気相成長装置 Expired - Fee Related JP5033319B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/946,403 US7534301B2 (en) 2004-09-21 2004-09-21 RF grounding of cathode in process chamber
US10/946403 2004-09-21

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009112186A Division JP5037560B2 (ja) 2004-09-21 2009-05-01 プロセスチャンバのカソードの高周波接地

Publications (3)

Publication Number Publication Date
JP2006104575A JP2006104575A (ja) 2006-04-20
JP2006104575A5 true JP2006104575A5 (cg-RX-API-DMAC7.html) 2009-05-14
JP5033319B2 JP5033319B2 (ja) 2012-09-26

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ID=36072681

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2005274384A Expired - Fee Related JP5033319B2 (ja) 2004-09-21 2005-09-21 プラズマ強化化学気相成長装置
JP2009112186A Expired - Fee Related JP5037560B2 (ja) 2004-09-21 2009-05-01 プロセスチャンバのカソードの高周波接地

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009112186A Expired - Fee Related JP5037560B2 (ja) 2004-09-21 2009-05-01 プロセスチャンバのカソードの高周波接地

Country Status (5)

Country Link
US (2) US7534301B2 (cg-RX-API-DMAC7.html)
JP (2) JP5033319B2 (cg-RX-API-DMAC7.html)
KR (2) KR101441892B1 (cg-RX-API-DMAC7.html)
CN (2) CN102324367B (cg-RX-API-DMAC7.html)
TW (2) TWI392017B (cg-RX-API-DMAC7.html)

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