JP5683469B2 - 大型プラズマ処理チャンバのrf復路 - Google Patents
大型プラズマ処理チャンバのrf復路 Download PDFInfo
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Description
Claims (15)
- チャンバ側壁と、底部と、前記チャンバ側壁により支持される蓋アセンブリとを有して処理領域を画定するチャンバボディと、
前記チャンバボディの前記処理領域内に配置される基板支持アセンブリと、
前記基板支持アセンブリの周縁部に配置されるシャドウフレームと、
前記シャドウフレームに接続される第1端部と、前記チャンバ側壁に接続される第2端部とを有するRF復路であって、当該RF復路の前記第2端部は前記チャンバ側壁に容量結合され、前記RF復路の前記第2端部は絶縁体の中に挟まれる、RF復路と
を備える、処理チャンバ。 - 前記RF復路が可撓性のアルミニウム製ストラップを含む、請求項1に記載の処理チャンバ。
- 前記絶縁体はDC電流が前記RF復路を通って前記チャンバ側壁に流れるのを防止する、請求項1に記載の処理チャンバ。
- 前記絶縁体がセラミックであり、締結部材により前記チャンバ側壁及びRF復路に取り付けられる、請求項3に記載の処理チャンバ。
- 前記セラミック絶縁体及び前記RF復路の前記第2端部を被覆する誘電体カバーを更に備える、請求項4に記載の処理チャンバ。
- 前記シャドウフレームと前記基板支持アセンブリとの間に配置されるセラミック絶縁体を更に備える、請求項1に記載の処理チャンバ。
- 前記チャンバ側壁に取り付けられ、且つ前記基板支持アセンブリが基板搬出入位置にあるときに前記シャドウフレームを支持するように配置されるシャドウフレーム支持体を更に備える、請求項1に記載の処理チャンバ。
- チャンバ側壁と、底部と、前記チャンバ側壁により支持される蓋アセンブリとを有して、処理チャンバ内に処理領域を画定するチャンバボディと、
前記チャンバボディの前記処理領域内に配置される基板支持アセンブリと、
前記基板支持アセンブリの底面に取り付けられて、前記基板支持アセンブリの外周から外に向かって延在する延長ブロックと、
前記処理チャンバ内に配置されて、前記基板支持アセンブリが上昇位置にあるときに前記延長ブロックに係合するサイズを有する接地フレームと、
前記接地フレームに接続される第1端部と、前記チャンバ側壁に接続される第2端部とを有するRF復路と
を備える、処理チャンバ。 - 前記処理チャンバ内において前記接地フレームの下方に配置される側部ポンピングシールドを更に備える、請求項8に記載の処理チャンバ。
- 前記接地フレームが、前記延長ブロックに係合する第1側方部と、前記側部ポンピングシールド上に配置される第2側方部とを有している、請求項9に記載の処理チャンバ。
- 前記接地フレームと前記側部ポンピングシールドとの間に、前記基板支持アセンブリが上昇位置にあるときに前記接地フレームが前記延長ブロックにより支持される場合に画定されるギャップを更に備える、請求項9に記載の処理チャンバ。
- 前記延長ブロックの上面の、前記基板支持アセンブリの外側に配置される渦巻き型ラップを更に備える、請求項8に記載の処理チャンバ。
- 前記基板支持アセンブリの周縁部に配置されるシャドウフレームと前記基板支持アセンブリとの間に配置される絶縁体を更に備える、請求項9に記載の処理チャンバ。
- チャンバ側壁と、底部と、前記チャンバ側壁により支持される蓋アセンブリとを有して処理領域を画定するチャンバボディと、
前記チャンバボディの前記処理領域内において、第1位置と第2位置との間を移動可能に配置される基板支持アセンブリと、
前記基板支持アセンブリの周縁部に近接配置されるシャドウフレームと、
前記チャンバボディに接続されて、前記基板支持アセンブリが前記第2位置にあるときに前記シャドウフレームを支持するサイズを有するシャドウフレーム支持体と、
前記シャドウフレームに接続される第1端部と、前記チャンバ側壁に接続される第2端部とを有するRF復路と、
DC電流が、RF復路を通って前記チャンバ側壁に達するのを防止する第1絶縁体であって、前記RF復路の前記第2端部は前記第1絶縁体の中に挟まれて前記チャンバ側壁に容量結合される、第1絶縁体と
を備える、処理チャンバ。 - 前記シャドウフレームと前記基板支持アセンブリとの間に配置された第2絶縁体を備える、請求項14に記載の処理チャンバ。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10425408P | 2008-10-09 | 2008-10-09 | |
US61/104,254 | 2008-10-09 | ||
US11474708P | 2008-11-14 | 2008-11-14 | |
US61/114,747 | 2008-11-14 | ||
PCT/US2009/060230 WO2010042860A2 (en) | 2008-10-09 | 2009-10-09 | Rf return path for large plasma processing chamber |
Publications (3)
Publication Number | Publication Date |
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JP2012505313A JP2012505313A (ja) | 2012-03-01 |
JP2012505313A5 JP2012505313A5 (ja) | 2014-05-22 |
JP5683469B2 true JP5683469B2 (ja) | 2015-03-11 |
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JP2011531218A Active JP5683469B2 (ja) | 2008-10-09 | 2009-10-09 | 大型プラズマ処理チャンバのrf復路 |
Country Status (6)
Country | Link |
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US (1) | US20100089319A1 (ja) |
JP (1) | JP5683469B2 (ja) |
KR (1) | KR101641130B1 (ja) |
CN (1) | CN102177769B (ja) |
TW (1) | TWI495402B (ja) |
WO (1) | WO2010042860A2 (ja) |
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2009
- 2009-10-09 JP JP2011531218A patent/JP5683469B2/ja active Active
- 2009-10-09 TW TW098134399A patent/TWI495402B/zh not_active IP Right Cessation
- 2009-10-09 US US12/576,991 patent/US20100089319A1/en not_active Abandoned
- 2009-10-09 KR KR1020117010552A patent/KR101641130B1/ko active IP Right Grant
- 2009-10-09 WO PCT/US2009/060230 patent/WO2010042860A2/en active Application Filing
- 2009-10-09 CN CN200980140428.3A patent/CN102177769B/zh active Active
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KR20110069854A (ko) | 2011-06-23 |
TWI495402B (zh) | 2015-08-01 |
KR101641130B1 (ko) | 2016-07-20 |
CN102177769B (zh) | 2016-02-03 |
WO2010042860A3 (en) | 2010-07-15 |
US20100089319A1 (en) | 2010-04-15 |
WO2010042860A2 (en) | 2010-04-15 |
TW201031284A (en) | 2010-08-16 |
CN102177769A (zh) | 2011-09-07 |
JP2012505313A (ja) | 2012-03-01 |
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