JP2006070319A - 樹脂めっき方法 - Google Patents
樹脂めっき方法 Download PDFInfo
- Publication number
- JP2006070319A JP2006070319A JP2004254747A JP2004254747A JP2006070319A JP 2006070319 A JP2006070319 A JP 2006070319A JP 2004254747 A JP2004254747 A JP 2004254747A JP 2004254747 A JP2004254747 A JP 2004254747A JP 2006070319 A JP2006070319 A JP 2006070319A
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- JP
- Japan
- Prior art keywords
- resin
- plating
- plating method
- resin material
- ozone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
- H05K2203/0796—Oxidant in aqueous solution, e.g. permanganate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
Abstract
【解決手段】 樹脂素材に対してめっき皮膜を樹脂めっき方法において、樹脂素材をオゾン溶液で処理する工程と、銀、コバルト、ニッケル、ルテニウム、セリウム、鉄、マンガン、ロジウム触媒から選択される金属触媒の1種以上を吸着させる工程とを含むことを特徴とする樹脂めっき方法。
【選択図】 図1
Description
ABS樹脂基板を50〜100ppmのオゾン水で2〜10分間処理した(ステップ01)。次に、NaOH:50g/Lの水溶液中で、60℃、3分間アルカリ脱脂処理を行った(ステップ02)。樹脂基板が十分清浄な場合はこのアルカリ脱脂処理は省略できる。次に、Ag触媒:0.5g/L水溶液中で30℃、30分間のAg触媒浴を行った(ステップ03)。次に、硫酸銅:3g/L、ホルマリン:2g/L、NaOH:2g/Lのめっき液中で、30℃、10分間の化学銅めっきを行った(ステップ04)。次に、硫酸銅:200g/L、硫酸:50g/L、塩酸:0.125g/L、添加剤のめっき液中で、30℃、30分間、2.0A/dm2の電気めっきを行った(ステップ05)。これらの操作により、ABS樹脂基板上に100μmの銅めっき層を析出させた。
オゾン水処理に代えて、クロム酸処理を行い、銀触媒に代えてパラジウム触媒を用いて、実施例1と同様の銅めっきを行った。
オゾン水処理に代えて、クロム酸処理を行い、銀触媒を用いて、実施例1と同様の銅めっきを行った。
ABS樹脂基板に代えて、エポキシ樹脂基板を用いて、実施例1と同様の銅めっきを行った。
オゾン水処理に代えて、過マンガン酸処理を行い、銀触媒に代えてパラジウム触媒を用いて、実施例2と同様の銅めっきを行った。
オゾン水処理に代えて、過マンガン酸処理を行い、銀触媒を用いて、実施例2と同様の銅めっきを行った。
Claims (12)
- 樹脂素材に対してめっき皮膜を形成する方法において、樹脂素材をオゾン溶液で処理する工程と、銀、コバルト、ニッケル、ルテニウム、セリウム、鉄、マンガン、ロジウム触媒から選択される金属触媒の1種以上を吸着させる工程とを含むことを特徴とする樹脂めっき方法。
- 前記樹脂素材をオゾン溶液で処理する工程と、前記金属触媒を吸着させる工程との間に、樹脂素材表面のアルカリ脱脂工程を含むことを特徴とする請求項1に記載の樹脂めっき方法。
- 前記金属触媒を吸着させる工程の後に、化学めっき工程を含むことを特徴とする請求項1又は2に記載の樹脂めっき方法。
- 前記化学めっき工程の後に、電気めっき工程を含むことを特徴とする請求項3に記載の樹脂めっき方法。
- 前記金属触媒を吸着させる工程の後に、化学めっき工程を行うことなく、電気めっき工程を含むことを特徴とする請求項1又は2に記載の樹脂めっき方法。
- 前記オゾン溶液が50ppm以上の高濃度オゾン水であることを特徴とする請求項1乃至5のいずれかに記載の樹脂めっき方法。
- 前記オゾン溶液処理の時間が2〜10分であることを特徴とする請求項1乃至6のいずれかに記載の樹脂めっき方法。
- 前記金属触媒が銀触媒であることを特徴とする請求項1乃至7のいずれかに記載の樹脂めっき方法。
- 請求項1乃至6のいずれかに記載の樹脂めっき方法を用いて、めっきされた自動車部品。
- 請求項1乃至6のいずれかに記載の樹脂めっき方法を用いて、めっきされた電気部品。
- 請求項1乃至6のいずれかに記載の樹脂めっき方法を用いて、プリント基板のスルホールめっき及び/又はビアホールめっきを行うことを特徴とするプリント回路基板めっき方法。
- 請求項1乃至6のいずれかに記載の樹脂めっき方法を用いて、めっきされたプリント回路基板。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004254747A JP2006070319A (ja) | 2004-09-01 | 2004-09-01 | 樹脂めっき方法 |
US11/214,971 US20060042954A1 (en) | 2004-09-01 | 2005-08-31 | Method for plating resin material |
CNB200510098203XA CN100519838C (zh) | 2004-09-01 | 2005-09-01 | 镀敷树脂材料的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004254747A JP2006070319A (ja) | 2004-09-01 | 2004-09-01 | 樹脂めっき方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006070319A true JP2006070319A (ja) | 2006-03-16 |
Family
ID=35941497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004254747A Pending JP2006070319A (ja) | 2004-09-01 | 2004-09-01 | 樹脂めっき方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20060042954A1 (ja) |
JP (1) | JP2006070319A (ja) |
CN (1) | CN100519838C (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007327131A (ja) * | 2006-06-09 | 2007-12-20 | Rohm & Haas Electronic Materials Llc | 樹脂表面への無電解めっき方法 |
JP2008294077A (ja) * | 2007-05-22 | 2008-12-04 | Toyota Motor Corp | 配線基板の製造方法及び配線基板 |
KR101129459B1 (ko) | 2007-05-22 | 2012-03-28 | 도요타지도샤가부시키가이샤 | 오존 처리용 수지 기판, 배선 기판 및 배선 기판의 제조 방법 |
JP2013253324A (ja) * | 2013-08-22 | 2013-12-19 | Kakihara Kogyo Kk | オゾン水処理を用いた樹脂めっき処理方法 |
JP2019203168A (ja) * | 2018-05-23 | 2019-11-28 | 奥野製薬工業株式会社 | 無電解めっきの前処理用組成物、無電解めっきの前処理方法、無電解めっき方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1793013B1 (en) * | 2005-12-05 | 2017-07-19 | Rohm and Haas Electronic Materials LLC | Metallization of dielectrics |
DE102007026082A1 (de) * | 2007-05-25 | 2008-11-27 | Gebr. Schmid Gmbh & Co. | Verfahren zur Behandlung von flachen Substraten sowie Verwendung des Verfahrens |
WO2010142567A1 (de) * | 2009-06-08 | 2010-12-16 | Basf Se | Verwendung von ionischen flüssigkeiten zur vorbehandlung von kunststoffoberflächen zur metallisierung |
JP4918123B2 (ja) * | 2009-09-17 | 2012-04-18 | トヨタ自動車株式会社 | 無電解めっき素材の製造方法 |
JP5642432B2 (ja) * | 2010-06-09 | 2014-12-17 | トヨタ自動車株式会社 | 無電解めっき処理材の製造方法及びオゾンガス処理装置 |
JP6750293B2 (ja) * | 2016-04-28 | 2020-09-02 | 栗田工業株式会社 | プラスチック表面の処理方法 |
CN105839159B (zh) * | 2016-05-23 | 2018-08-03 | 中山恒亿电镀有限公司 | 一种聚乙烯塑料电镀工艺 |
US20190032220A1 (en) * | 2017-07-25 | 2019-01-31 | Rohm And Haas Electronic Materials Llc | Chrome-free etch solutions for chemically resistant polymer materials |
CN115282789B (zh) * | 2022-01-24 | 2023-09-29 | 浙江师范大学 | 一种ABS-Ni复合分离膜及其制备方法与应用 |
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JPH04187781A (ja) * | 1990-11-21 | 1992-07-06 | Sumitomo Metal Mining Co Ltd | 無電解めっき法 |
JPH06152126A (ja) * | 1992-11-09 | 1994-05-31 | Hitachi Chem Co Ltd | 配線板の製造方法 |
JPH10317153A (ja) * | 1997-05-14 | 1998-12-02 | Taiyo Ink Mfg Ltd | 光硬化性無電解めっき用プライマー組成物及びそれを用いた無電解めっき方法 |
JP2000124583A (ja) * | 1998-10-19 | 2000-04-28 | Nec Kansai Ltd | 配線基板の製造方法および配線基板構体 |
JP2001316834A (ja) * | 2000-04-28 | 2001-11-16 | Sony Corp | 無電解メッキ装置および導電膜の形成方法 |
JP2003027250A (ja) * | 2001-07-18 | 2003-01-29 | Toyota Motor Corp | 樹脂の無電解メッキ被膜形成方法 |
WO2003072851A1 (fr) * | 2002-02-28 | 2003-09-04 | Zeon Corporation | Procede de plaquage partiel, support en resine partiellement plaque, et procede de production d'une plaquette de circuit multicouche |
JP2004068119A (ja) * | 2002-08-08 | 2004-03-04 | Sumitomo Osaka Cement Co Ltd | 金属パターン膜の製造方法 |
JP2004131804A (ja) * | 2002-10-10 | 2004-04-30 | Toyota Motor Corp | 無電解めっき素材の前処理方法及びめっき被覆部材の製造方法 |
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IT1041350B (it) * | 1975-07-25 | 1980-01-10 | Alfachimici Spa | Soluzione attivante a base di argento per processi di ramatura anelettrica |
US5071517A (en) * | 1989-11-21 | 1991-12-10 | Solution Technology Systems | Method for directly electroplating a dielectric substrate and plated substrate so produced |
US5376248A (en) * | 1991-10-15 | 1994-12-27 | Enthone-Omi, Inc. | Direct metallization process |
KR100328807B1 (ko) * | 1998-05-08 | 2002-03-14 | 가네코 히사시 | 제조비용이 저렴하고 충분한 접착 강도가 수득될 수 있는 수지구조물 및 이의 제조 방법 |
JP4449246B2 (ja) * | 2001-04-12 | 2010-04-14 | トヨタ自動車株式会社 | 無電解めっき材の前処理方法 |
-
2004
- 2004-09-01 JP JP2004254747A patent/JP2006070319A/ja active Pending
-
2005
- 2005-08-31 US US11/214,971 patent/US20060042954A1/en not_active Abandoned
- 2005-09-01 CN CNB200510098203XA patent/CN100519838C/zh not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH04187781A (ja) * | 1990-11-21 | 1992-07-06 | Sumitomo Metal Mining Co Ltd | 無電解めっき法 |
JPH06152126A (ja) * | 1992-11-09 | 1994-05-31 | Hitachi Chem Co Ltd | 配線板の製造方法 |
JPH10317153A (ja) * | 1997-05-14 | 1998-12-02 | Taiyo Ink Mfg Ltd | 光硬化性無電解めっき用プライマー組成物及びそれを用いた無電解めっき方法 |
JP2000124583A (ja) * | 1998-10-19 | 2000-04-28 | Nec Kansai Ltd | 配線基板の製造方法および配線基板構体 |
JP2001316834A (ja) * | 2000-04-28 | 2001-11-16 | Sony Corp | 無電解メッキ装置および導電膜の形成方法 |
JP2003027250A (ja) * | 2001-07-18 | 2003-01-29 | Toyota Motor Corp | 樹脂の無電解メッキ被膜形成方法 |
WO2003072851A1 (fr) * | 2002-02-28 | 2003-09-04 | Zeon Corporation | Procede de plaquage partiel, support en resine partiellement plaque, et procede de production d'une plaquette de circuit multicouche |
JP2004068119A (ja) * | 2002-08-08 | 2004-03-04 | Sumitomo Osaka Cement Co Ltd | 金属パターン膜の製造方法 |
JP2004131804A (ja) * | 2002-10-10 | 2004-04-30 | Toyota Motor Corp | 無電解めっき素材の前処理方法及びめっき被覆部材の製造方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007327131A (ja) * | 2006-06-09 | 2007-12-20 | Rohm & Haas Electronic Materials Llc | 樹脂表面への無電解めっき方法 |
JP2008294077A (ja) * | 2007-05-22 | 2008-12-04 | Toyota Motor Corp | 配線基板の製造方法及び配線基板 |
KR101129459B1 (ko) | 2007-05-22 | 2012-03-28 | 도요타지도샤가부시키가이샤 | 오존 처리용 수지 기판, 배선 기판 및 배선 기판의 제조 방법 |
US8784638B2 (en) | 2007-05-22 | 2014-07-22 | Toyota Jidosha Kabushiki Kaisha | Resin board to be subjected to ozone treatment, wiring board, and method of manufacturing the wiring board |
JP2013253324A (ja) * | 2013-08-22 | 2013-12-19 | Kakihara Kogyo Kk | オゾン水処理を用いた樹脂めっき処理方法 |
JP2019203168A (ja) * | 2018-05-23 | 2019-11-28 | 奥野製薬工業株式会社 | 無電解めっきの前処理用組成物、無電解めっきの前処理方法、無電解めっき方法 |
JP7160306B2 (ja) | 2018-05-23 | 2022-10-25 | 奥野製薬工業株式会社 | 無電解めっきの前処理用組成物、無電解めっきの前処理方法、無電解めっき方法 |
Also Published As
Publication number | Publication date |
---|---|
US20060042954A1 (en) | 2006-03-02 |
CN100519838C (zh) | 2009-07-29 |
CN1743502A (zh) | 2006-03-08 |
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