JP2006005207A - 半導体装置 - Google Patents

半導体装置 Download PDF

Info

Publication number
JP2006005207A
JP2006005207A JP2004180722A JP2004180722A JP2006005207A JP 2006005207 A JP2006005207 A JP 2006005207A JP 2004180722 A JP2004180722 A JP 2004180722A JP 2004180722 A JP2004180722 A JP 2004180722A JP 2006005207 A JP2006005207 A JP 2006005207A
Authority
JP
Japan
Prior art keywords
semiconductor
semiconductor layer
layer
electrode
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004180722A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006005207A5 (https=
Inventor
Hisashi Toyoda
久志 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
Original Assignee
Renesas Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Technology Corp filed Critical Renesas Technology Corp
Priority to JP2004180722A priority Critical patent/JP2006005207A/ja
Publication of JP2006005207A publication Critical patent/JP2006005207A/ja
Publication of JP2006005207A5 publication Critical patent/JP2006005207A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5449Dispositions of bond wires not being orthogonal to a side surface of the chip, e.g. fan-out arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/547Dispositions of multiple bond wires
    • H10W72/5473Dispositions of multiple bond wires multiple bond wires connected to a common bond pad
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • H10W72/9232Bond pads having multiple stacked layers with additional elements interposed between layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/932Plan-view shape, i.e. in top view
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Bipolar Transistors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
JP2004180722A 2004-06-18 2004-06-18 半導体装置 Pending JP2006005207A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004180722A JP2006005207A (ja) 2004-06-18 2004-06-18 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004180722A JP2006005207A (ja) 2004-06-18 2004-06-18 半導体装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007142792A Division JP2007266621A (ja) 2007-05-30 2007-05-30 半導体装置

Publications (2)

Publication Number Publication Date
JP2006005207A true JP2006005207A (ja) 2006-01-05
JP2006005207A5 JP2006005207A5 (https=) 2007-07-12

Family

ID=35773313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004180722A Pending JP2006005207A (ja) 2004-06-18 2004-06-18 半導体装置

Country Status (1)

Country Link
JP (1) JP2006005207A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007243140A (ja) * 2006-02-09 2007-09-20 Renesas Technology Corp 半導体装置、電子装置および半導体装置の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07130757A (ja) * 1993-10-28 1995-05-19 Sony Corp バイポーラトランジスタの製造方法
JP2004128142A (ja) * 2002-10-01 2004-04-22 Nec Compound Semiconductor Devices Ltd 半導体装置及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07130757A (ja) * 1993-10-28 1995-05-19 Sony Corp バイポーラトランジスタの製造方法
JP2004128142A (ja) * 2002-10-01 2004-04-22 Nec Compound Semiconductor Devices Ltd 半導体装置及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007243140A (ja) * 2006-02-09 2007-09-20 Renesas Technology Corp 半導体装置、電子装置および半導体装置の製造方法

Similar Documents

Publication Publication Date Title
CN102945848B (zh) 半导体器件
US5939753A (en) Monolithic RF mixed signal IC with power amplification
US7741656B2 (en) Semiconductor device and manufacturing the same
US8026575B2 (en) Semiconductor device, electronic device, and manufacturing method of the same
JP2001094094A (ja) 半導体装置およびその製造方法
JP2003152098A (ja) 無線周波数用集積回路
US20040198253A1 (en) Radio frequency monolithic integrated circuit and method for manufacturing the same
US12142686B2 (en) Field effect transistor
US20200013880A1 (en) Integrated circuit device with faraday shield
US20080251863A1 (en) High-voltage radio-frequency power device
TWI408779B (zh) 半導體裝置之形成方法及其結構
JP2004096119A (ja) 半導体装置およびその製造方法
JP2008258369A (ja) 半導体装置およびその製造方法
JP4626935B2 (ja) 半導体装置及びその製造方法
JP2004207602A (ja) 半導体装置およびその製造方法
JP2006210790A (ja) 半導体装置およびその製造方法
JP2006005207A (ja) 半導体装置
US6740953B2 (en) High frequency integrated devices
JP2011091214A (ja) 電界効果型トランジスタ
JP2007266621A (ja) 半導体装置
US20210336025A1 (en) Field-Effect Transistor
US20240405018A1 (en) Field-plated resistor
JP5374553B2 (ja) 半導体装置
Yoshida et al. An RF BiCMOS process using high f/sub SR/spiral inductor with premetal deep trenches and a dual recessed bipolar collector sink
JP2007053124A (ja) 半導体装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070530

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070530

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090318

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20100528

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110614

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120124