JP2005534163A5 - - Google Patents

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Publication number
JP2005534163A5
JP2005534163A5 JP2003577313A JP2003577313A JP2005534163A5 JP 2005534163 A5 JP2005534163 A5 JP 2005534163A5 JP 2003577313 A JP2003577313 A JP 2003577313A JP 2003577313 A JP2003577313 A JP 2003577313A JP 2005534163 A5 JP2005534163 A5 JP 2005534163A5
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JP
Japan
Prior art keywords
dielectric layer
semiconductor substrate
oxygen
aluminum
covering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003577313A
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English (en)
Japanese (ja)
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JP2005534163A (ja
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Publication date
Priority claimed from US10/099,794 external-priority patent/US6770923B2/en
Application filed filed Critical
Publication of JP2005534163A publication Critical patent/JP2005534163A/ja
Publication of JP2005534163A5 publication Critical patent/JP2005534163A5/ja
Pending legal-status Critical Current

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JP2003577313A 2002-03-15 2003-03-12 高ｋ誘電体膜及びその形成方法 Pending JP2005534163A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/099,794 US6770923B2 (en) 2001-03-20 2002-03-15 High K dielectric film
PCT/US2003/007717 WO2003079413A2 (en) 2002-03-15 2003-03-12 High k dielectric film and method for making

Publications (2)

Publication Number Publication Date
JP2005534163A JP2005534163A (ja) 2005-11-10
JP2005534163A5 true JP2005534163A5 (enExample) 2006-05-11

Family

ID=28039690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003577313A Pending JP2005534163A (ja) 2002-03-15 2003-03-12 高ｋ誘電体膜及びその形成方法

Country Status (7)

Country Link
US (1) US6770923B2 (enExample)
EP (1) EP1485941A2 (enExample)
JP (1) JP2005534163A (enExample)
KR (2) KR20040087343A (enExample)
AU (1) AU2003220232A1 (enExample)
TW (1) TWI278918B (enExample)
WO (1) WO2003079413A2 (enExample)

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