JP2005530170A - 光学アセンブリ及びその製造方法 - Google Patents

光学アセンブリ及びその製造方法 Download PDF

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Publication number
JP2005530170A
JP2005530170A JP2004514960A JP2004514960A JP2005530170A JP 2005530170 A JP2005530170 A JP 2005530170A JP 2004514960 A JP2004514960 A JP 2004514960A JP 2004514960 A JP2004514960 A JP 2004514960A JP 2005530170 A JP2005530170 A JP 2005530170A
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JP
Japan
Prior art keywords
optical assembly
along
rays
optical
sample
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Pending
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JP2004514960A
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English (en)
Japanese (ja)
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JP2005530170A5 (enExample
Inventor
ペテル、ホーゴ
オーレリアン、ダリエ
セルジオ、ロドリゲス
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XENOCS
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XENOCS
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Priority claimed from FR0207546A external-priority patent/FR2841371B1/fr
Priority claimed from FR0300623A external-priority patent/FR2850171B1/fr
Application filed by XENOCS filed Critical XENOCS
Publication of JP2005530170A publication Critical patent/JP2005530170A/ja
Publication of JP2005530170A5 publication Critical patent/JP2005530170A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Prostheses (AREA)
  • Glass Compositions (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
JP2004514960A 2002-06-19 2003-06-19 光学アセンブリ及びその製造方法 Pending JP2005530170A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0207546A FR2841371B1 (fr) 2002-06-19 2002-06-19 Ensemble optique et procede associe
FR0300623A FR2850171B1 (fr) 2003-01-21 2003-01-21 Dispositif optique pour applications rayons x
PCT/FR2003/001896 WO2004001770A1 (fr) 2002-06-19 2003-06-19 Ensemble optique et procede associe

Publications (2)

Publication Number Publication Date
JP2005530170A true JP2005530170A (ja) 2005-10-06
JP2005530170A5 JP2005530170A5 (enExample) 2006-08-03

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004514960A Pending JP2005530170A (ja) 2002-06-19 2003-06-19 光学アセンブリ及びその製造方法
JP2004514950A Pending JP2005530168A (ja) 2002-06-19 2003-06-19 Ｘ線用光学装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2004514950A Pending JP2005530168A (ja) 2002-06-19 2003-06-19 Ｘ線用光学装置

Country Status (8)

Country Link
US (2) US7248670B2 (enExample)
EP (3) EP1732087A3 (enExample)
JP (2) JP2005530170A (enExample)
CN (2) CN1332399C (enExample)
AT (2) ATE421152T1 (enExample)
AU (2) AU2003260613A1 (enExample)
DE (3) DE20320792U1 (enExample)
WO (2) WO2004001770A1 (enExample)

Cited By (3)

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WO2022153979A1 (ja) * 2021-01-12 2022-07-21 国立大学法人東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
WO2022153978A1 (ja) * 2021-01-12 2022-07-21 国立大学法人東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7564522B2 (ja) 2021-01-12 2024-10-09 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー

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JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
US7741626B2 (en) * 2008-09-12 2010-06-22 Cymer, Inc. Spectral purity filters and methods therefor
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
US8249220B2 (en) * 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8488740B2 (en) * 2010-11-18 2013-07-16 Panalytical B.V. Diffractometer
FR2967887B1 (fr) 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
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US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
CN102903413B (zh) * 2012-10-30 2015-06-03 同济大学 一种在小尺寸背光下工作的四通道kb显微成像系统
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US9692202B2 (en) * 2013-11-07 2017-06-27 Macom Technology Solutions Holdings, Inc. Lasers with beam shape and beam direction modification
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JP6202684B2 (ja) * 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
CN105092618A (zh) * 2015-09-18 2015-11-25 北京师范大学 一种微束能量色散的x射线衍射仪及其使用方法
CN105873344A (zh) * 2016-03-22 2016-08-17 中国工程物理研究院流体物理研究所 一种基于横向梯度多层膜反射元件的x射线单能成像方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
CN106706157B (zh) * 2017-01-11 2023-06-13 中国工程物理研究院激光聚变研究中心 一种基于准同视轴的icf热斑电子温度探测设备
EP3987279B1 (de) * 2019-06-24 2023-11-08 SMS Group GmbH Vorrichtung und verfahren zum bestimmen der werkstoffeigenschaften eines polykristallinen produkts
CN115389537A (zh) * 2022-08-26 2022-11-25 同济大学 一种具有高通量的小焦斑中子聚焦系统
CN119688594B (zh) * 2025-02-24 2025-06-20 泸州市镀膜科技有限公司 一种用于电容器金属化薄膜加工的缺陷检测系统

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022153979A1 (ja) * 2021-01-12 2022-07-21 国立大学法人東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
WO2022153978A1 (ja) * 2021-01-12 2022-07-21 国立大学法人東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP2022108209A (ja) * 2021-01-12 2022-07-25 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP2022108210A (ja) * 2021-01-12 2022-07-25 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7564522B2 (ja) 2021-01-12 2024-10-09 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637878B2 (ja) 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637879B2 (ja) 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー

Also Published As

Publication number Publication date
DE60308645D1 (de) 2006-11-09
CN1662999A (zh) 2005-08-31
EP1514279B1 (fr) 2009-01-14
WO2004001769A1 (fr) 2003-12-31
CN1675720A (zh) 2005-09-28
ATE421152T1 (de) 2009-01-15
US7248670B2 (en) 2007-07-24
DE60325853D1 (de) 2009-03-05
EP1468428B1 (fr) 2006-09-27
DE60308645T2 (de) 2007-10-18
EP1732087A3 (fr) 2007-03-28
EP1732087A2 (fr) 2006-12-13
EP1514279A1 (fr) 2005-03-16
JP2005530168A (ja) 2005-10-06
US20050117239A1 (en) 2005-06-02
EP1468428A1 (fr) 2004-10-20
AU2003260613A1 (en) 2004-01-06
AU2003264670A1 (en) 2004-01-06
US20060018429A1 (en) 2006-01-26
DE20320792U1 (de) 2005-05-04
US7430277B2 (en) 2008-09-30
ATE341083T1 (de) 2006-10-15
CN1324613C (zh) 2007-07-04
WO2004001770A1 (fr) 2003-12-31
WO2004001769A8 (fr) 2005-01-06
CN1332399C (zh) 2007-08-15

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