DE60308645D1 - Optische anordnung und verfahren dazu - Google Patents

Optische anordnung und verfahren dazu

Info

Publication number
DE60308645D1
DE60308645D1 DE60308645T DE60308645T DE60308645D1 DE 60308645 D1 DE60308645 D1 DE 60308645D1 DE 60308645 T DE60308645 T DE 60308645T DE 60308645 T DE60308645 T DE 60308645T DE 60308645 D1 DE60308645 D1 DE 60308645D1
Authority
DE
Germany
Prior art keywords
rays
serves
optical unit
method therefor
optical arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60308645T
Other languages
English (en)
Other versions
DE60308645T2 (de
Inventor
Peter Hoghoj
Aurelien Dariel
Sergio Rodrigues
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XENOCS
Original Assignee
XENOCS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR0207546A external-priority patent/FR2841371B1/fr
Priority claimed from FR0300623A external-priority patent/FR2850171B1/fr
Application filed by XENOCS filed Critical XENOCS
Application granted granted Critical
Publication of DE60308645D1 publication Critical patent/DE60308645D1/de
Publication of DE60308645T2 publication Critical patent/DE60308645T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
  • Glass Compositions (AREA)
  • Prostheses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Light Guides In General And Applications Therefor (AREA)
DE60308645T 2002-06-19 2003-06-19 Optische anordnung und verfahren dazu Expired - Lifetime DE60308645T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
FR0207546 2002-06-19
FR0207546A FR2841371B1 (fr) 2002-06-19 2002-06-19 Ensemble optique et procede associe
FR0300623 2003-01-21
FR0300623A FR2850171B1 (fr) 2003-01-21 2003-01-21 Dispositif optique pour applications rayons x
PCT/FR2003/001896 WO2004001770A1 (fr) 2002-06-19 2003-06-19 Ensemble optique et procede associe

Publications (2)

Publication Number Publication Date
DE60308645D1 true DE60308645D1 (de) 2006-11-09
DE60308645T2 DE60308645T2 (de) 2007-10-18

Family

ID=30001927

Family Applications (3)

Application Number Title Priority Date Filing Date
DE60308645T Expired - Lifetime DE60308645T2 (de) 2002-06-19 2003-06-19 Optische anordnung und verfahren dazu
DE60325853T Expired - Lifetime DE60325853D1 (de) 2002-06-19 2003-06-19 Optische vorrichtung für röntgenstrahlungsanwendungen
DE20320792U Expired - Lifetime DE20320792U1 (de) 2002-06-19 2003-06-19 Optische Anordnung und zugehörige Vorrichtung

Family Applications After (2)

Application Number Title Priority Date Filing Date
DE60325853T Expired - Lifetime DE60325853D1 (de) 2002-06-19 2003-06-19 Optische vorrichtung für röntgenstrahlungsanwendungen
DE20320792U Expired - Lifetime DE20320792U1 (de) 2002-06-19 2003-06-19 Optische Anordnung und zugehörige Vorrichtung

Country Status (8)

Country Link
US (2) US7430277B2 (de)
EP (3) EP1732087A3 (de)
JP (2) JP2005530168A (de)
CN (2) CN1324613C (de)
AT (2) ATE421152T1 (de)
AU (2) AU2003264670A1 (de)
DE (3) DE60308645T2 (de)
WO (2) WO2004001770A1 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030199425A1 (en) * 1997-06-27 2003-10-23 Desai Neil P. Compositions and methods for treatment of hyperplasia
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US20060040091A1 (en) 2004-08-23 2006-02-23 Bletsos Ioannis V Breathable low-emissivity metalized sheets
DE102005057700A1 (de) * 2005-11-25 2007-06-06 Axo Dresden Gmbh Röntgen-Optisches-Element
JP4278108B2 (ja) 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
FR2918501B1 (fr) * 2007-07-02 2009-11-06 Xenocs Soc Par Actions Simplif Dispositif de delivrance d'un faisceau de rayons x a haute energie
US7706503B2 (en) * 2007-11-20 2010-04-27 Rigaku Innovative Technologies, Inc. X-ray optic with varying focal points
ATE545858T1 (de) * 2007-12-31 2012-03-15 Xenocs S A Röntgenstrahlvorrichtung
JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
US7741626B2 (en) * 2008-09-12 2010-06-22 Cymer, Inc. Spectral purity filters and methods therefor
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
US8249220B2 (en) * 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8488740B2 (en) * 2010-11-18 2013-07-16 Panalytical B.V. Diffractometer
FR2967887B1 (fr) 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
CN102903413B (zh) * 2012-10-30 2015-06-03 同济大学 一种在小尺寸背光下工作的四通道kb显微成像系统
US20140161233A1 (en) 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
EP2762862B1 (de) 2013-01-30 2017-03-08 Bruker AXS GmbH XRF-Messvorrichtung zum Erkennen von Kontaminierungen auf einem Waferkegel
EP2896960B1 (de) * 2014-01-15 2017-07-26 PANalytical B.V. Röntgenvorrichtung für SAXS und Bragg-Brentano Messungen
JP6202684B2 (ja) * 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
CN105092618A (zh) * 2015-09-18 2015-11-25 北京师范大学 一种微束能量色散的x射线衍射仪及其使用方法
CN105873344A (zh) * 2016-03-22 2016-08-17 中国工程物理研究院流体物理研究所 一种基于横向梯度多层膜反射元件的x射线单能成像方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
CN106706157B (zh) * 2017-01-11 2023-06-13 中国工程物理研究院激光聚变研究中心 一种基于准同视轴的icf热斑电子温度探测设备
KR102621750B1 (ko) * 2019-06-24 2024-01-05 에스엠에스 그룹 게엠베하 다결정 제품의 소재 특성 측정 장치 및 방법
JP2022108210A (ja) * 2021-01-12 2022-07-25 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP2022108209A (ja) * 2021-01-12 2022-07-25 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8300421A (nl) 1983-02-04 1984-09-03 Philips Nv Roentgen onderzoek apparaat met dubbel focusserend kristal.
US4599741A (en) * 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
US4562583A (en) * 1984-01-17 1985-12-31 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Spectral slicing X-ray telescope with variable magnification
ATE121555T1 (de) 1988-03-11 1995-05-15 Rosser Roy J Optische vorrichtungen und methoden für ihre herstellung.
US5127028A (en) 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
US5142561A (en) 1991-05-28 1992-08-25 Grumman Aerospace Corporation X-ray lithography scanning mirror
US5373544A (en) * 1992-08-12 1994-12-13 Siemens Aktiengesellschaft X-ray diffractometer
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
US5619548A (en) 1995-08-11 1997-04-08 Oryx Instruments And Materials Corp. X-ray thickness gauge
DE19615366B4 (de) 1996-04-19 2006-02-09 Carl Zeiss Jena Gmbh Verfahren und Einrichtung zum Nachweis physikalischer, chemischer, biologischer oder biochemischer Reaktionen und Wechselwirkungen
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
DE19833524B4 (de) 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
US6285506B1 (en) * 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6278764B1 (en) 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6829327B1 (en) * 2000-09-22 2004-12-07 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
JP2005512020A (ja) 2001-06-19 2005-04-28 エックス−レイ オプティカル システムズ インコーポレーテッド Ｘ線蛍光分光システム及びｘ線蛍光分光方法
DE10254026C5 (de) 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung

Also Published As

Publication number Publication date
WO2004001769A1 (fr) 2003-12-31
US20050117239A1 (en) 2005-06-02
EP1468428A1 (de) 2004-10-20
CN1332399C (zh) 2007-08-15
DE60308645T2 (de) 2007-10-18
CN1675720A (zh) 2005-09-28
WO2004001769A8 (fr) 2005-01-06
EP1514279B1 (de) 2009-01-14
DE60325853D1 (de) 2009-03-05
ATE421152T1 (de) 2009-01-15
US7430277B2 (en) 2008-09-30
AU2003260613A1 (en) 2004-01-06
US20060018429A1 (en) 2006-01-26
JP2005530170A (ja) 2005-10-06
WO2004001770A1 (fr) 2003-12-31
US7248670B2 (en) 2007-07-24
ATE341083T1 (de) 2006-10-15
EP1514279A1 (de) 2005-03-16
EP1468428B1 (de) 2006-09-27
EP1732087A2 (de) 2006-12-13
AU2003264670A1 (en) 2004-01-06
EP1732087A3 (de) 2007-03-28
CN1324613C (zh) 2007-07-04
DE20320792U1 (de) 2005-05-04
JP2005530168A (ja) 2005-10-06
CN1662999A (zh) 2005-08-31

Similar Documents

Publication Publication Date Title
DE60308645D1 (de) Optische anordnung und verfahren dazu
WO2005024969A3 (en) Substrate-guided optical devices
JP2007329368A5 (de)
TW200717039A (en) Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
JP2007147583A5 (de)
JP2013508852A5 (de)
EP1380873A3 (de) Vorrichtung und Methode zur Bestrahlung eines Substrats
JP2007010659A5 (de)
EA201000088A1 (ru) Оптическая кювета
EP1848004A3 (de) Spiegel zur Fokussierung von EUV Strahlung und EUV Strahlungsquelle
SG169987A1 (en) Plane position detecting apparatus, exposure apparatus and device manufacturing method
JP2021501657A5 (de)
WO2009013706A3 (en) Microelectronic sensor device for optical examinations with total internal reflection
WO2010010311A3 (fr) Dispositif optique et procede de mesure de rotation d'un objet
JP2005321196A5 (de)
BRPI0409418A (pt) sistema de visualização de marcações ópticas de uma lente oftálmica, dispositivo de tamponagem e processo de orientação de lentes que utilizam um tal sistema
JP2006251397A5 (de)
JP2011237732A5 (de)
JP2009198434A5 (de)
ATE397782T1 (de) Hybrides optisches element für röntgenstrahl- anwendungen und zugehöriges verfahren
WO2008013930A3 (en) Method and apparatus for communicating radiation pressure provided by a light wave
ATE467114T1 (de) Streumesser und verfahren zur untersuchung einer oberfläche
ATE439567T1 (de) MAßSTAB MIT EINEM REFLEKTIERENDEN PHASENGITTER
DE502006002553D1 (de) Strahlteiler für optische Messsysteme zur Bestimmung von Kenngrössen an Werkzeugmaschinen
JP2016535278A (ja) 光学的な表面粗さ測定

Legal Events

Date Code Title Description
8364 No opposition during term of opposition