CN1332399C - 用于x射线应用的光学装置 - Google Patents

用于x射线应用的光学装置 Download PDF

Info

Publication number
CN1332399C
CN1332399C CNB038145081A CN03814508A CN1332399C CN 1332399 C CN1332399 C CN 1332399C CN B038145081 A CNB038145081 A CN B038145081A CN 03814508 A CN03814508 A CN 03814508A CN 1332399 C CN1332399 C CN 1332399C
Authority
CN
China
Prior art keywords
optical
reflecting surface
optical devices
ray
monochromator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB038145081A
Other languages
English (en)
Chinese (zh)
Other versions
CN1662999A (zh
Inventor
P·霍格霍伊
A·达里埃尔
S·罗格里格斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XENOCS
Original Assignee
XENOCS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR0207546A external-priority patent/FR2841371B1/fr
Priority claimed from FR0300623A external-priority patent/FR2850171B1/fr
Application filed by XENOCS filed Critical XENOCS
Publication of CN1662999A publication Critical patent/CN1662999A/zh
Application granted granted Critical
Publication of CN1332399C publication Critical patent/CN1332399C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
  • Glass Compositions (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Prostheses (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
CNB038145081A 2002-06-19 2003-06-19 用于x射线应用的光学装置 Expired - Fee Related CN1332399C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR02/07546 2002-06-19
FR0207546A FR2841371B1 (fr) 2002-06-19 2002-06-19 Ensemble optique et procede associe
FR0300623A FR2850171B1 (fr) 2003-01-21 2003-01-21 Dispositif optique pour applications rayons x
FR03/00623 2003-01-21

Publications (2)

Publication Number Publication Date
CN1662999A CN1662999A (zh) 2005-08-31
CN1332399C true CN1332399C (zh) 2007-08-15

Family

ID=30001927

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB038145081A Expired - Fee Related CN1332399C (zh) 2002-06-19 2003-06-19 用于x射线应用的光学装置
CNB038195275A Expired - Lifetime CN1324613C (zh) 2002-06-19 2003-06-19 光学单元及有关方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNB038195275A Expired - Lifetime CN1324613C (zh) 2002-06-19 2003-06-19 光学单元及有关方法

Country Status (8)

Country Link
US (2) US7248670B2 (enExample)
EP (3) EP1732087A3 (enExample)
JP (2) JP2005530170A (enExample)
CN (2) CN1332399C (enExample)
AT (2) ATE421152T1 (enExample)
AU (2) AU2003260613A1 (enExample)
DE (3) DE20320792U1 (enExample)
WO (2) WO2004001770A1 (enExample)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030199425A1 (en) * 1997-06-27 2003-10-23 Desai Neil P. Compositions and methods for treatment of hyperplasia
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US20060040091A1 (en) 2004-08-23 2006-02-23 Bletsos Ioannis V Breathable low-emissivity metalized sheets
DE102005057700A1 (de) * 2005-11-25 2007-06-06 Axo Dresden Gmbh Röntgen-Optisches-Element
JP4278108B2 (ja) 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
FR2918501B1 (fr) * 2007-07-02 2009-11-06 Xenocs Soc Par Actions Simplif Dispositif de delivrance d'un faisceau de rayons x a haute energie
US7706503B2 (en) * 2007-11-20 2010-04-27 Rigaku Innovative Technologies, Inc. X-ray optic with varying focal points
ATE545858T1 (de) * 2007-12-31 2012-03-15 Xenocs S A Röntgenstrahlvorrichtung
JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
US7741626B2 (en) * 2008-09-12 2010-06-22 Cymer, Inc. Spectral purity filters and methods therefor
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
US8249220B2 (en) * 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8488740B2 (en) * 2010-11-18 2013-07-16 Panalytical B.V. Diffractometer
FR2967887B1 (fr) 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
CN102903413B (zh) * 2012-10-30 2015-06-03 同济大学 一种在小尺寸背光下工作的四通道kb显微成像系统
US20140161233A1 (en) * 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
EP2762862B1 (en) * 2013-01-30 2017-03-08 Bruker AXS GmbH XRF measurement apparatus for detecting contaminations on the bevel of a wafer
US9692202B2 (en) * 2013-11-07 2017-06-27 Macom Technology Solutions Holdings, Inc. Lasers with beam shape and beam direction modification
EP2896960B1 (en) * 2014-01-15 2017-07-26 PANalytical B.V. X-ray apparatus for SAXS and Bragg-Brentano measurements
JP6202684B2 (ja) * 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
CN105092618A (zh) * 2015-09-18 2015-11-25 北京师范大学 一种微束能量色散的x射线衍射仪及其使用方法
CN105873344A (zh) * 2016-03-22 2016-08-17 中国工程物理研究院流体物理研究所 一种基于横向梯度多层膜反射元件的x射线单能成像方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
CN106706157B (zh) * 2017-01-11 2023-06-13 中国工程物理研究院激光聚变研究中心 一种基于准同视轴的icf热斑电子温度探测设备
EP3987279B1 (de) * 2019-06-24 2023-11-08 SMS Group GmbH Vorrichtung und verfahren zum bestimmen der werkstoffeigenschaften eines polykristallinen produkts
JP7564522B2 (ja) 2021-01-12 2024-10-09 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637879B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637878B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
CN115389537A (zh) * 2022-08-26 2022-11-25 同济大学 一种具有高通量的小焦斑中子聚焦系统
CN119688594B (zh) * 2025-02-24 2025-06-20 泸州市镀膜科技有限公司 一种用于电容器金属化薄膜加工的缺陷检测系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999262A (en) * 1996-04-19 1999-12-07 Carl Zeiss Jena Gmbh Process and apparatus for detecting structural changes of specimens
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8300421A (nl) 1983-02-04 1984-09-03 Philips Nv Roentgen onderzoek apparaat met dubbel focusserend kristal.
US4599741A (en) * 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
US4562583A (en) * 1984-01-17 1985-12-31 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Spectral slicing X-ray telescope with variable magnification
EP0403561B1 (en) * 1988-03-11 1995-04-19 Btg International Limited Optical devices and methods of fabrication thereof
US5127028A (en) * 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
US5142561A (en) 1991-05-28 1992-08-25 Grumman Aerospace Corporation X-ray lithography scanning mirror
US5373544A (en) * 1992-08-12 1994-12-13 Siemens Aktiengesellschaft X-ray diffractometer
US5646976A (en) 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
US5619548A (en) * 1995-08-11 1997-04-08 Oryx Instruments And Materials Corp. X-ray thickness gauge
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
DE19833524B4 (de) 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
US6285506B1 (en) 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
US6829327B1 (en) * 2000-09-22 2004-12-07 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
ES2271277T3 (es) 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
DE10254026C5 (de) 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999262A (en) * 1996-04-19 1999-12-07 Carl Zeiss Jena Gmbh Process and apparatus for detecting structural changes of specimens
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
A point-focusing small-angle x-ray scattering camera using adoubly curved monochromator of a W/Si multilayer SASANUMA Y ET AL,REVIEW OF SCIENTIFIC INSTRUMENTS,AMERICAN INSTITUTE OF PHYSICS.NEW YORK,Vol.67 No.3 1996 *

Also Published As

Publication number Publication date
DE60308645D1 (de) 2006-11-09
CN1662999A (zh) 2005-08-31
EP1514279B1 (fr) 2009-01-14
WO2004001769A1 (fr) 2003-12-31
CN1675720A (zh) 2005-09-28
ATE421152T1 (de) 2009-01-15
US7248670B2 (en) 2007-07-24
DE60325853D1 (de) 2009-03-05
EP1468428B1 (fr) 2006-09-27
DE60308645T2 (de) 2007-10-18
EP1732087A3 (fr) 2007-03-28
EP1732087A2 (fr) 2006-12-13
EP1514279A1 (fr) 2005-03-16
JP2005530168A (ja) 2005-10-06
US20050117239A1 (en) 2005-06-02
EP1468428A1 (fr) 2004-10-20
AU2003260613A1 (en) 2004-01-06
AU2003264670A1 (en) 2004-01-06
US20060018429A1 (en) 2006-01-26
JP2005530170A (ja) 2005-10-06
DE20320792U1 (de) 2005-05-04
US7430277B2 (en) 2008-09-30
ATE341083T1 (de) 2006-10-15
CN1324613C (zh) 2007-07-04
WO2004001770A1 (fr) 2003-12-31
WO2004001769A8 (fr) 2005-01-06

Similar Documents

Publication Publication Date Title
CN1332399C (zh) 用于x射线应用的光学装置
US6421417B1 (en) Multilayer optics with adjustable working wavelength
EP1060477B1 (en) Single corner kirkpatrick-baez beam conditioning optic assembly
US7933383B2 (en) X-ray generator with polycapillary optic
US5016267A (en) Instrumentation for conditioning X-ray or neutron beams
US6317483B1 (en) Doubly curved optical device with graded atomic planes
JP2013210377A (ja) ビーム調整システム
US7280634B2 (en) Beam conditioning system with sequential optic
US11217357B2 (en) X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles
JP3830908B2 (ja) 高光度の平行ビーム生成装置
US7706503B2 (en) X-ray optic with varying focal points
US6282259B1 (en) X-ray mirror system providing enhanced signal concentration
US7298822B2 (en) X-ray optical element

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20070815

Termination date: 20190619