JP2005519332A - 屈折型投影対物レンズ - Google Patents

屈折型投影対物レンズ Download PDF

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Publication number
JP2005519332A
JP2005519332A JP2003573496A JP2003573496A JP2005519332A JP 2005519332 A JP2005519332 A JP 2005519332A JP 2003573496 A JP2003573496 A JP 2003573496A JP 2003573496 A JP2003573496 A JP 2003573496A JP 2005519332 A JP2005519332 A JP 2005519332A
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JP
Japan
Prior art keywords
projection objective
lens
lens group
refractive projection
refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003573496A
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English (en)
Japanese (ja)
Other versions
JP2005519332A5 (enExample
Inventor
ユーリッヒ，ウィルヘルム
フディマ，ラッセル
ロスタルスキ，ハンス−ユルゲン
シュスター，カール−ハインツ
Original Assignee
カール・ツアイス・エスエムテイ・アーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツアイス・エスエムテイ・アーゲー filed Critical カール・ツアイス・エスエムテイ・アーゲー
Publication of JP2005519332A publication Critical patent/JP2005519332A/ja
Publication of JP2005519332A5 publication Critical patent/JP2005519332A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Prostheses (AREA)
  • Endoscopes (AREA)
JP2003573496A 2002-03-01 2003-02-06 屈折型投影対物レンズ Pending JP2005519332A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
PCT/EP2003/001147 WO2003075096A2 (de) 2002-03-01 2003-02-06 Refraktives projektionsobjektiv

Publications (2)

Publication Number Publication Date
JP2005519332A true JP2005519332A (ja) 2005-06-30
JP2005519332A5 JP2005519332A5 (enExample) 2006-03-23

Family

ID=27789034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003573496A Pending JP2005519332A (ja) 2002-03-01 2003-02-06 屈折型投影対物レンズ

Country Status (5)

Country Link
EP (1) EP1483626A2 (enExample)
JP (1) JP2005519332A (enExample)
KR (1) KR20040089688A (enExample)
AU (2) AU2003210214A1 (enExample)
WO (2) WO2003075096A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010032753A1 (ja) * 2008-09-18 2010-03-25 株式会社ニコン 開口絞り、光学系、露光装置及び電子デバイスの製造方法

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10229249A1 (de) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
AU2003304557A1 (en) * 2003-10-22 2005-06-08 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
EP1690139B1 (en) 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
US7508488B2 (en) 2004-10-13 2009-03-24 Carl Zeiss Smt Ag Projection exposure system and method of manufacturing a miniaturized device
DE102005045862A1 (de) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
US7508489B2 (en) 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
CN101107570B (zh) 2004-12-30 2011-02-09 卡尔蔡司Smt股份公司 投影光学系统
JP2007114750A (ja) 2005-09-09 2007-05-10 Asml Netherlands Bv 投影システム設計方法、リソグラフィー装置およびデバイス製造方法
CN101479667B (zh) 2006-07-03 2011-12-07 卡尔蔡司Smt有限责任公司 修正/修复光刻投影物镜的方法
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
WO2008064859A2 (en) 2006-12-01 2008-06-05 Carl Zeiss Smt Ag Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
DE102008000790A1 (de) 2007-03-20 2008-09-25 Carl Zeiss Smt Ag Verfahren zum Verbessern von Abbildungseigenschaften eines optischen Systems sowie derartiges optisches System
EP2188673A1 (en) 2007-08-03 2010-05-26 Carl Zeiss SMT AG Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
DE102008041144A1 (de) 2007-08-21 2009-03-05 Carl Zeiss Smt Ag Optische Anordnung und optisches Abbildungssystem damit, Verfahren zu deren Optimierung und Verfahren zum Herstellen eines optischen Elements
EP2181357A1 (en) 2007-08-24 2010-05-05 Carl Zeiss SMT AG Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
EP2048540A1 (en) 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
DE102008042356A1 (de) 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
WO2011116792A1 (en) 2010-03-26 2011-09-29 Carl Zeiss Smt Gmbh Optical system, exposure apparatus, and waverfront correction method
JP6282742B2 (ja) 2013-09-09 2018-02-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びそのような装置における光学波面変形を補正する方法
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
DE102024111454A1 (de) 2024-04-24 2025-10-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
WO2001050171A1 (de) * 1999-12-29 2001-07-12 Carl Zeiss Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010032753A1 (ja) * 2008-09-18 2010-03-25 株式会社ニコン 開口絞り、光学系、露光装置及び電子デバイスの製造方法
JP5533656B2 (ja) * 2008-09-18 2014-06-25 株式会社ニコン 結像光学系、露光装置及び電子デバイスの製造方法
TWI486716B (zh) * 2008-09-18 2015-06-01 尼康股份有限公司 A aperture shutter, an optical system, an exposure apparatus, and an electronic device

Also Published As

Publication number Publication date
WO2003075096A2 (de) 2003-09-12
AU2003230593A8 (en) 2003-09-16
EP1483626A2 (de) 2004-12-08
WO2003075049A3 (en) 2004-04-08
KR20040089688A (ko) 2004-10-21
AU2003210214A1 (en) 2003-09-16
WO2003075049A2 (en) 2003-09-12
WO2003075096A3 (de) 2003-11-13
AU2003230593A1 (en) 2003-09-16

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