JP2005516382A5 - - Google Patents
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- JP2005516382A5 JP2005516382A5 JP2003560974A JP2003560974A JP2005516382A5 JP 2005516382 A5 JP2005516382 A5 JP 2005516382A5 JP 2003560974 A JP2003560974 A JP 2003560974A JP 2003560974 A JP2003560974 A JP 2003560974A JP 2005516382 A5 JP2005516382 A5 JP 2005516382A5
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- JP
- Japan
- Prior art keywords
- aryl
- formula
- alkyl
- group
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000003118 aryl group Chemical group 0.000 claims 13
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 claims 8
- 239000000203 mixture Substances 0.000 claims 8
- 229910052739 hydrogen Inorganic materials 0.000 claims 7
- 239000001257 hydrogen Substances 0.000 claims 7
- 239000003361 porogen Substances 0.000 claims 6
- 125000003107 substituted aryl group Chemical group 0.000 claims 6
- 229920001187 thermosetting polymer Polymers 0.000 claims 5
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 125000002947 alkylene group Chemical group 0.000 claims 4
- 229910052736 halogen Inorganic materials 0.000 claims 4
- 150000002367 halogens Chemical class 0.000 claims 4
- 229920001519 homopolymer Polymers 0.000 claims 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 4
- 239000000178 monomer Substances 0.000 claims 4
- 125000005418 aryl aryl group Chemical group 0.000 claims 3
- 125000000732 arylene group Chemical group 0.000 claims 3
- 125000002843 carboxylic acid group Chemical group 0.000 claims 3
- 125000002993 cycloalkylene group Chemical group 0.000 claims 3
- 125000000524 functional group Chemical group 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- -1 polysiloxanes Polymers 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 3
- UVHXEHGUEKARKZ-UHFFFAOYSA-N 1-ethenylanthracene Chemical compound C1=CC=C2C=C3C(C=C)=CC=CC3=CC2=C1 UVHXEHGUEKARKZ-UHFFFAOYSA-N 0.000 claims 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N Adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 claims 2
- 229920001157 Poly(2-vinylnaphthalene) Polymers 0.000 claims 2
- 239000004793 Polystyrene Substances 0.000 claims 2
- 239000002318 adhesion promoter Substances 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- 150000008378 aryl ethers Chemical class 0.000 claims 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 229920001577 copolymer Polymers 0.000 claims 2
- 239000003989 dielectric material Substances 0.000 claims 2
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 claims 2
- 125000001072 heteroaryl group Chemical group 0.000 claims 2
- 125000005020 hydroxyalkenyl group Chemical group 0.000 claims 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 2
- 125000005016 hydroxyalkynyl group Chemical group 0.000 claims 2
- 125000005027 hydroxyaryl group Chemical group 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 229920002223 polystyrene Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- ZICQBHNGXDOVJF-UHFFFAOYSA-N Diamantane Chemical compound C1C2C3CC(C4)CC2C2C4C3CC1C2 ZICQBHNGXDOVJF-UHFFFAOYSA-N 0.000 claims 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N Diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- 125000004054 acenaphthylenyl group Chemical group C1(=CC2=CC=CC3=CC=CC1=C23)* 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 230000001588 bifunctional Effects 0.000 claims 1
- 239000004305 biphenyl Chemical group 0.000 claims 1
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 claims 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 125000005842 heteroatoms Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229920001568 phenolic resin Polymers 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 229920000747 poly(lactic acid) polymer Polymers 0.000 claims 1
- 229920000636 poly(norbornene) polymer Polymers 0.000 claims 1
- 229920002492 poly(sulfones) Polymers 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- 229920001610 polycaprolactone Polymers 0.000 claims 1
- 239000004632 polycaprolactone Substances 0.000 claims 1
- 229920000515 polycarbonate Polymers 0.000 claims 1
- 239000004417 polycarbonate Substances 0.000 claims 1
- 229920000728 polyester Polymers 0.000 claims 1
- 229920000570 polyether Polymers 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 150000004756 silanes Chemical class 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 claims 1
- 0 CC1(C*(C2)C3)CC3(C)CC2(C)C1 Chemical compound CC1(C*(C2)C3)CC3(C)CC2(C)C1 0.000 description 1
- ADNKSNPUSAWRNM-UHFFFAOYSA-N CCC1(C)CC(C)(CCC2)CC2C1 Chemical compound CCC1(C)CC(C)(CCC2)CC2C1 ADNKSNPUSAWRNM-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US35018702P | 2002-01-15 | 2002-01-15 | |
| US35055702P | 2002-01-22 | 2002-01-22 | |
| US35301102P | 2002-01-30 | 2002-01-30 | |
| US37621902P | 2002-04-29 | 2002-04-29 | |
| US37842402P | 2002-05-07 | 2002-05-07 | |
| US10/158,513 US7141188B2 (en) | 2001-05-30 | 2002-05-30 | Organic compositions |
| PCT/US2003/000948 WO2003060979A2 (en) | 2002-01-15 | 2003-01-14 | Organic compositions for low dielectric constant materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005516382A JP2005516382A (ja) | 2005-06-02 |
| JP2005516382A5 true JP2005516382A5 (xx) | 2006-03-23 |
Family
ID=27558468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003560974A Pending JP2005516382A (ja) | 2002-01-15 | 2003-01-14 | 有機組成物 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1466356A2 (xx) |
| JP (1) | JP2005516382A (xx) |
| KR (1) | KR20040104454A (xx) |
| CN (1) | CN1643669A (xx) |
| AU (1) | AU2003210504A1 (xx) |
| WO (1) | WO2003060979A2 (xx) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4878779B2 (ja) * | 2004-06-10 | 2012-02-15 | 富士フイルム株式会社 | 膜形成用組成物、絶縁膜及び電子デバイス |
| US7491658B2 (en) * | 2004-10-13 | 2009-02-17 | International Business Machines Corporation | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality |
| US7531209B2 (en) | 2005-02-24 | 2009-05-12 | Michael Raymond Ayers | Porous films and bodies with enhanced mechanical strength |
| JP4659486B2 (ja) * | 2005-03-01 | 2011-03-30 | 富士フイルム株式会社 | 電子デバイス用絶縁膜、電子デバイス及び電子デバイス用絶縁膜の製造方法 |
| JP2006257212A (ja) * | 2005-03-16 | 2006-09-28 | Fuji Photo Film Co Ltd | 膜形成用組成物、それを用いた絶縁膜および電子デバイス |
| JP2007031663A (ja) * | 2005-07-29 | 2007-02-08 | Fujifilm Corp | 膜形成用組成物、それを用いて形成された絶縁膜及び電子デバイス |
| JP2007314778A (ja) * | 2006-04-26 | 2007-12-06 | Fujifilm Corp | 膜形成用組成物、該組成物を用いて形成した絶縁膜及び電子デバイス |
| WO2007143029A1 (en) | 2006-05-31 | 2007-12-13 | Roskilde Semiconductor Llc | Porous materials derived from polymer composites |
| WO2007143026A2 (en) | 2006-05-31 | 2007-12-13 | Roskilde Semiconductor Llc | Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials |
| US7790234B2 (en) | 2006-05-31 | 2010-09-07 | Michael Raymond Ayers | Low dielectric constant materials prepared from soluble fullerene clusters |
| US7875315B2 (en) | 2006-05-31 | 2011-01-25 | Roskilde Semiconductor Llc | Porous inorganic solids for use as low dielectric constant materials |
| CA2669970A1 (en) * | 2006-11-17 | 2008-05-22 | University Of Massachusetts Lowell | Functional hydrocarbon polymers and process for producing same |
| JP2008231259A (ja) * | 2007-03-20 | 2008-10-02 | Sumitomo Bakelite Co Ltd | 有機絶縁材料 |
| JP2009013116A (ja) | 2007-07-05 | 2009-01-22 | Daicel Chem Ind Ltd | エチニルフェニルビアダマンタン誘導体 |
| GB2451865A (en) | 2007-08-15 | 2009-02-18 | Univ Liverpool | Microporous polymers from alkynyl monomers |
| US20240087880A1 (en) * | 2022-08-26 | 2024-03-14 | Applied Materials, Inc. | Systems and methods for depositing low-k dielectric films |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3415741B2 (ja) * | 1997-03-31 | 2003-06-09 | 東レ・ダウコーニング・シリコーン株式会社 | 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法 |
| IL143207A0 (en) * | 1998-11-24 | 2002-04-21 | Dow Chemical Co | A composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom |
| JP3483500B2 (ja) * | 1999-05-28 | 2004-01-06 | 富士通株式会社 | 絶縁膜形成材料、絶縁膜形成方法及び半導体装置 |
| JP2001192539A (ja) * | 2000-01-13 | 2001-07-17 | Jsr Corp | 熱硬化性樹脂組成物、その硬化物およびその硬化物を含む回路基板 |
| US6509415B1 (en) * | 2000-04-07 | 2003-01-21 | Honeywell International Inc. | Low dielectric constant organic dielectrics based on cage-like structures |
| JP4651774B2 (ja) * | 2000-04-11 | 2011-03-16 | 新日鐵化学株式会社 | 芳香族オリゴマー、それを配合したフェノール樹脂組成物並びにエポキシ樹脂組成物およびその硬化物 |
| JP2002003683A (ja) * | 2000-06-26 | 2002-01-09 | Hitachi Chem Co Ltd | 低吸湿低複屈折樹脂組成物、これから得られる成形材、シート又はフィルムおよび光学用部品 |
| EP1197998A3 (en) * | 2000-10-10 | 2005-12-21 | Shipley Company LLC | Antireflective porogens |
| US20030006477A1 (en) * | 2001-05-23 | 2003-01-09 | Shipley Company, L.L.C. | Porous materials |
| JP2003131001A (ja) * | 2001-05-25 | 2003-05-08 | Shipley Co Llc | 多孔性光学物質 |
| US7049005B2 (en) * | 2001-05-30 | 2006-05-23 | Honeywell International Inc. | Organic compositions |
-
2003
- 2003-01-14 CN CNA03805938XA patent/CN1643669A/zh active Pending
- 2003-01-14 AU AU2003210504A patent/AU2003210504A1/en not_active Abandoned
- 2003-01-14 JP JP2003560974A patent/JP2005516382A/ja active Pending
- 2003-01-14 WO PCT/US2003/000948 patent/WO2003060979A2/en not_active Application Discontinuation
- 2003-01-14 KR KR10-2004-7010994A patent/KR20040104454A/ko not_active Application Discontinuation
- 2003-01-14 EP EP03729654A patent/EP1466356A2/en not_active Withdrawn
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