JP2005512333A5 - - Google Patents

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Publication number
JP2005512333A5
JP2005512333A5 JP2003550325A JP2003550325A JP2005512333A5 JP 2005512333 A5 JP2005512333 A5 JP 2005512333A5 JP 2003550325 A JP2003550325 A JP 2003550325A JP 2003550325 A JP2003550325 A JP 2003550325A JP 2005512333 A5 JP2005512333 A5 JP 2005512333A5
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JP
Japan
Prior art keywords
laser
discharge
laser system
pulse
gas
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JP2003550325A
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English (en)
Japanese (ja)
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JP3971385B2 (ja
JP2005512333A (ja
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Priority claimed from US10/012,002 external-priority patent/US6625191B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Application filed filed Critical
Publication of JP2005512333A publication Critical patent/JP2005512333A/ja
Publication of JP2005512333A5 publication Critical patent/JP2005512333A5/ja
Application granted granted Critical
Publication of JP3971385B2 publication Critical patent/JP3971385B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003550325A 2001-11-30 2002-10-23 ２室ガス放電レーザシステムのタイミング制御 Expired - Lifetime JP3971385B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/012,002 US6625191B2 (en) 1999-12-10 2001-11-30 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
PCT/US2002/034045 WO2003049241A1 (en) 2001-11-30 2002-10-23 Timing control for two-chamber gas discharge laser system

Publications (3)

Publication Number Publication Date
JP2005512333A JP2005512333A (ja) 2005-04-28
JP2005512333A5 true JP2005512333A5 (enExample) 2006-01-05
JP3971385B2 JP3971385B2 (ja) 2007-09-05

Family

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Family Applications (1)

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JP2003550325A Expired - Lifetime JP3971385B2 (ja) 2001-11-30 2002-10-23 ２室ガス放電レーザシステムのタイミング制御

Country Status (10)

Country Link
US (3) US6865210B2 (enExample)
EP (1) EP1449284B1 (enExample)
JP (1) JP3971385B2 (enExample)
KR (2) KR100598552B1 (enExample)
CN (1) CN100350686C (enExample)
AT (1) ATE443358T1 (enExample)
AU (1) AU2002353869A1 (enExample)
DE (1) DE60233746D1 (enExample)
IL (1) IL161818A0 (enExample)
WO (1) WO2003049241A1 (enExample)

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CN108964487B (zh) * 2018-07-19 2019-08-16 中国科学院合肥物质科学研究院 一种用于磁压缩等离子体聚变的电源系统
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CN110086074B (zh) * 2019-05-06 2020-01-24 南京瑞贻电子科技有限公司 一种大功率光纤激光器线性补偿的动态耦合控制装置及控制方法
CN113841309B (zh) * 2019-05-22 2025-03-18 西默有限公司 生成多个激光束的设备和方法
KR102560079B1 (ko) 2019-05-22 2023-07-25 사이머 엘엘씨 복수의 심자외 광학 발진기를 위한 제어 시스템
JP7411089B2 (ja) * 2019-12-31 2024-01-10 サイマー リミテッド ライアビリティ カンパニー 独立した電圧及びタイミング制御並びに電力消費削減を伴う、デュアルパルスパワーシステム
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