JP2005502209A5 - - Google Patents

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Publication number
JP2005502209A5
JP2005502209A5 JP2003525954A JP2003525954A JP2005502209A5 JP 2005502209 A5 JP2005502209 A5 JP 2005502209A5 JP 2003525954 A JP2003525954 A JP 2003525954A JP 2003525954 A JP2003525954 A JP 2003525954A JP 2005502209 A5 JP2005502209 A5 JP 2005502209A5
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JP
Japan
Prior art keywords
laser
discharge
pulse
laser system
discharge region
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003525954A
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English (en)
Japanese (ja)
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JP2005502209A (ja
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Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/012,002 external-priority patent/US6625191B2/en
Application filed filed Critical
Publication of JP2005502209A publication Critical patent/JP2005502209A/ja
Publication of JP2005502209A5 publication Critical patent/JP2005502209A5/ja
Pending legal-status Critical Current

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JP2003525954A 2001-08-29 2002-08-28 超狭帯域２室式高繰返し率放電ガスレーザシステム Pending JP2005502209A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/012,002 US6625191B2 (en) 1999-12-10 2001-11-30 Very narrow band, two chamber, high rep rate gas discharge laser system
PCT/US2002/027925 WO2003021728A2 (en) 2001-08-29 2002-08-28 Very narrow band, two chamber, high rep rate gas discharge laser system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007310433A Division JP4489801B2 (ja) 2001-08-29 2007-11-30 超狭帯域２室式高繰返し率放電ガスレーザシステム

Publications (2)

Publication Number Publication Date
JP2005502209A JP2005502209A (ja) 2005-01-20
JP2005502209A5 true JP2005502209A5 (enExample) 2006-01-05

Family

ID=27358219

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003525954A Pending JP2005502209A (ja) 2001-08-29 2002-08-28 超狭帯域２室式高繰返し率放電ガスレーザシステム
JP2007310433A Expired - Lifetime JP4489801B2 (ja) 2001-08-29 2007-11-30 超狭帯域２室式高繰返し率放電ガスレーザシステム

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2007310433A Expired - Lifetime JP4489801B2 (ja) 2001-08-29 2007-11-30 超狭帯域２室式高繰返し率放電ガスレーザシステム

Country Status (11)

Country Link
US (4) US6625191B2 (enExample)
EP (1) EP1438774B1 (enExample)
JP (2) JP2005502209A (enExample)
KR (2) KR100907299B1 (enExample)
AU (1) AU2002332801A1 (enExample)
CA (1) CA2457869A1 (enExample)
IL (1) IL160586A0 (enExample)
MY (1) MY153277A (enExample)
RU (1) RU2306649C2 (enExample)
TW (1) TW569508B (enExample)
WO (1) WO2003021728A2 (enExample)

Families Citing this family (189)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6865210B2 (en) * 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6801560B2 (en) * 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6912052B2 (en) * 2000-11-17 2005-06-28 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US7079564B2 (en) * 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7167499B2 (en) * 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7476886B2 (en) * 2006-08-25 2009-01-13 Cymer, Inc. Source material collection unit for a laser produced plasma EUV light source
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7518787B2 (en) * 2006-06-14 2009-04-14 Cymer, Inc. Drive laser for EUV light source
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7916388B2 (en) * 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7415056B2 (en) * 2006-03-31 2008-08-19 Cymer, Inc. Confocal pulse stretcher
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7928416B2 (en) * 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
JP2003008119A (ja) * 2001-06-26 2003-01-10 Komatsu Ltd 注入同期式又はｍｏｐａ方式のレーザ装置
US7088758B2 (en) * 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
JP3977038B2 (ja) * 2001-08-27 2007-09-19 株式会社半導体エネルギー研究所 レーザ照射装置およびレーザ照射方法
US7830934B2 (en) 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US6963595B2 (en) 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
US20050100072A1 (en) * 2001-11-14 2005-05-12 Rao Rajasekhar M. High power laser output beam energy density reduction
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
JP3773858B2 (ja) * 2002-01-30 2006-05-10 株式会社小松製作所 注入同期式又はｍｏｐａ方式のガスレーザ装置
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US20040202220A1 (en) * 2002-11-05 2004-10-14 Gongxue Hua Master oscillator-power amplifier excimer laser system
US7308013B2 (en) 2002-11-05 2007-12-11 Lambda Physik Ag Excimer or molecular fluorine laser system with precision timing
US20040156414A1 (en) * 2003-01-08 2004-08-12 Govorkov Sergei V. Excimer or molecular fluorine laser with bandwidth of less than 0.2 pm
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7158553B2 (en) * 2003-02-14 2007-01-02 Lambda Physik Ag Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
US6987790B2 (en) * 2003-02-14 2006-01-17 Lambda Physik Ag Excimer or molecular fluorine laser with several discharge chambers
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US8116347B2 (en) * 2003-04-22 2012-02-14 Komatsu Ltd. Two-stage laser system for aligners
US7277188B2 (en) 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7366213B2 (en) * 2003-05-19 2008-04-29 Lambda Physik Ag MOPA excimer or molecular fluorine laser system with improved synchronization
US7184204B2 (en) * 2003-07-01 2007-02-27 Lambda Physik Ag Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
JP2007515774A (ja) * 2003-07-30 2007-06-14 ティーシーゼット ピーティーイー リミテッド 超高エネルギ高安定性ガス放電レーザ表面処理システム
US6873418B1 (en) 2003-09-30 2005-03-29 Cymer, Inc. Optical mountings for gas discharge MOPA laser spectral analysis module
US6894785B2 (en) * 2003-09-30 2005-05-17 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7196342B2 (en) 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
US7522650B2 (en) * 2004-03-31 2009-04-21 Cymer, Inc. Gas discharge laser chamber improvements
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US7507203B2 (en) * 2004-09-21 2009-03-24 Digital Signal Corporation System and method for remotely monitoring physiological functions
US7116695B2 (en) * 2004-09-28 2006-10-03 Cymer, Inc. Laser output light pulse beam parameter transient correction system
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US20060114956A1 (en) * 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7643522B2 (en) * 2004-11-30 2010-01-05 Cymer, Inc. Method and apparatus for gas discharge laser bandwidth and center wavelength control
CA2597712C (en) 2005-02-14 2013-08-13 Digital Signal Corporation Laser radar system and system and method for providing chirped electromagnetic radiation
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7633989B2 (en) * 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
JP5202315B2 (ja) * 2005-08-09 2013-06-05 サイマー インコーポレイテッド 放電タイミングによる多室ガス放電レーザの帯域幅制御
JP4677857B2 (ja) 2005-08-23 2011-04-27 ヤマハ株式会社 楽器用部材または楽器とその製造方法
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7471455B2 (en) 2005-10-28 2008-12-30 Cymer, Inc. Systems and methods for generating laser light shaped as a line beam
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
EP1959817B1 (en) * 2005-12-14 2016-08-10 Digital Signal Corporation System and method for tracking eyeball motion
US8081670B2 (en) * 2006-02-14 2011-12-20 Digital Signal Corporation System and method for providing chirped electromagnetic radiation
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US8525138B2 (en) 2006-03-31 2013-09-03 Energetiq Technology, Inc. Laser-driven light source
US7599413B2 (en) * 2006-05-19 2009-10-06 Pavilion Integration Corp. Self-contained module for injecting signal into slave laser without any modifications or adaptations to it
US8803027B2 (en) * 2006-06-05 2014-08-12 Cymer, Llc Device and method to create a low divergence, high power laser beam for material processing applications
JP4972427B2 (ja) * 2007-02-15 2012-07-11 株式会社小松製作所 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置
JP5178047B2 (ja) * 2007-05-01 2013-04-10 ギガフォトン株式会社 露光用放電励起レーザ装置
US9018561B2 (en) * 2007-05-23 2015-04-28 Cymer, Llc High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier
US8903577B2 (en) 2009-10-30 2014-12-02 Lsi Industries, Inc. Traction system for electrically powered vehicles
US7598683B1 (en) 2007-07-31 2009-10-06 Lsi Industries, Inc. Control of light intensity using pulses of a fixed duration and frequency
US8604709B2 (en) 2007-07-31 2013-12-10 Lsi Industries, Inc. Methods and systems for controlling electrical power to DC loads
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7830942B2 (en) * 2007-09-11 2010-11-09 Cymer, Inc. Ultraviolet laser light source pulse energy control system
US20090095924A1 (en) * 2007-10-12 2009-04-16 International Business Machines Corporation Electrode design for euv discharge plasma source
US7960701B2 (en) 2007-12-20 2011-06-14 Cymer, Inc. EUV light source components and methods for producing, using and refurbishing same
DE102008003288A1 (de) 2008-01-05 2009-07-09 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Überwachung des in einer Projektionsbelichtungsanlage verwendeten Lichts
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
US20090250637A1 (en) * 2008-04-02 2009-10-08 Cymer, Inc. System and methods for filtering out-of-band radiation in EUV exposure tools
US8198612B2 (en) * 2008-07-31 2012-06-12 Cymer, Inc. Systems and methods for heating an EUV collector mirror
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US9618369B2 (en) 2008-08-26 2017-04-11 The University Court Of The University Of Glasgow Uses of electromagnetic interference patterns
EP2166626A1 (en) * 2008-09-17 2010-03-24 Carl Zeiss SMT AG Method of reducing a divergence of a laser beam
US7641349B1 (en) 2008-09-22 2010-01-05 Cymer, Inc. Systems and methods for collector mirror temperature control using direct contact heat transfer
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7995637B2 (en) * 2008-10-21 2011-08-09 Cymer, Inc. Gas discharge laser chamber
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
WO2010141120A2 (en) * 2009-02-20 2010-12-09 Digital Signal Corporation System and method for generating three dimensional images using lidar and video measurements
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8969838B2 (en) * 2009-04-09 2015-03-03 Asml Netherlands B.V. Systems and methods for protecting an EUV light source chamber from high pressure source material leaks
US8304752B2 (en) * 2009-04-10 2012-11-06 Cymer, Inc. EUV light producing system and method utilizing an alignment laser
KR101709820B1 (ko) 2009-08-26 2017-03-08 칼 짜이스 레이저 옵틱스 게엠베하 레이저 시스템용 계측 모듈
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
KR101006937B1 (ko) * 2009-12-31 2011-01-10 에이스웨이브텍(주) 야외 고주파 시스템의 정재파비 측정과 전파 선로 불량점 검출장치 및 방법
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8368039B2 (en) 2010-04-05 2013-02-05 Cymer, Inc. EUV light source glint reduction system
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
TWI426285B (zh) * 2011-02-11 2014-02-11 Univ Nat Taiwan 擾動自我測試電路
CN102810810A (zh) 2012-03-02 2012-12-05 中国科学院光电研究院 单腔双电极放电腔及准分子激光器
JP2015122341A (ja) * 2012-04-09 2015-07-02 三菱電機株式会社 レーザ装置
RU2510109C1 (ru) * 2012-07-23 2014-03-20 Олег Борисович Христофоров Газоразрядный лазер и способ генерации излучения
RU2514159C2 (ru) * 2012-07-23 2014-04-27 Олег Борисович Христофоров Газоразрядный лазер, лазерная система и способ генерации излучения
RU2531069C2 (ru) * 2012-07-23 2014-10-20 Олег Борисович Христофоров Газоразрядная лазерная система и способ генерации излучения
RU2507654C1 (ru) * 2012-07-23 2014-02-20 Олег Борисович Христофоров Газоразрядный лазер, лазерная система и способ генерации излучения
RU2503104C1 (ru) * 2012-07-23 2013-12-27 Олег Борисович Христофоров Газоразрядный лазер
RU2519867C2 (ru) * 2012-07-23 2014-06-20 Общество с ограниченной ответственностью "РнД-ИСАН" Газоразрядный лазер
RU2519869C2 (ru) * 2012-07-23 2014-06-20 Общество с ограниченной ответственностью "РнД-ИСАН" Эксимерная лазерная система и способ генерации излучения
RU2506671C1 (ru) * 2012-07-23 2014-02-10 Общество с ограниченной ответственностью "РнД-ИСАН" Газоразрядный лазер и способ генерации излучения
WO2014022681A1 (en) 2012-08-01 2014-02-06 Gentex Corporation Assembly with laser induced channel edge and method thereof
CN102931569B (zh) * 2012-11-08 2014-07-30 中国科学院光电研究院 准分子激光器的自动温控系统
CN103296572B (zh) * 2013-06-05 2015-07-15 中国科学院光电研究院 一种采用环形腔结构的气体激光器放大系统
EP2822113A3 (en) * 2013-06-28 2015-03-25 Canon Kabushiki Kaisha Pulse laser and photoacoustic apparatus
US9280053B2 (en) 2013-09-04 2016-03-08 Cymer, Llc Apparatus for and method of temperature compensation in high power focusing system for EUV LPP source
KR101738155B1 (ko) * 2015-06-10 2017-05-22 주식회사 필옵틱스 라인 빔 형성 장치
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
RU2713082C2 (ru) * 2015-07-22 2020-02-03 Академи Оф Опто-Электроникс, Чайнис Академи Оф Сайенсис Эксимер-лазерная система с конструкцией кольцевого резонатора
JP6608939B2 (ja) * 2015-09-14 2019-11-20 ギガフォトン株式会社 レーザシステム
US20170202059A1 (en) * 2016-01-12 2017-07-13 Electrolux Home Products, Inc. Induction stirring apparatus for induction cooktops
US9634455B1 (en) * 2016-02-16 2017-04-25 Cymer, Llc Gas optimization in a gas discharge light source
US9945730B2 (en) 2016-09-02 2018-04-17 Cymer, Llc Adjusting an amount of coherence of a light beam
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US10096967B2 (en) 2016-12-07 2018-10-09 Cymer, Llc Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light source
US10451890B2 (en) 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
ES2967496T3 (es) * 2018-03-08 2024-04-30 Alcon Inc Detección de impulsos láser de pico mediante temporización de señales de control
CN109101738B (zh) * 2018-08-24 2022-11-15 河北工业大学 一种igbt模块老化程度评估方法
JP7203944B2 (ja) * 2019-02-20 2023-01-13 ギガフォトン株式会社 ガスレーザ装置、ガスレーザ装置のレーザ光の出射方法、及び電子デバイスの製造方法
CN113841309B (zh) * 2019-05-22 2025-03-18 西默有限公司 生成多个激光束的设备和方法
KR102695305B1 (ko) * 2019-12-20 2024-08-13 사이머 엘엘씨 레이저 소스용 가스 퍼지 시스템
JP7411089B2 (ja) * 2019-12-31 2024-01-10 サイマー リミテッド ライアビリティ カンパニー 独立した電圧及びタイミング制御並びに電力消費削減を伴う、デュアルパルスパワーシステム
US11374167B2 (en) 2020-03-05 2022-06-28 International Business Machines Corporation Reducing parasitic bottom electrode resistance of embedded MRAM
WO2021186656A1 (ja) * 2020-03-19 2021-09-23 ギガフォトン株式会社 レーザ装置及び電子デバイスの製造方法
US12540850B2 (en) 2020-08-18 2026-02-03 Cymer, Llc Predictive calibration scheduling apparatus and method
US12578433B2 (en) 2020-10-21 2026-03-17 Lg Innotek Co., Ltd. Heat transfer light detection and ranging device
CN116648834A (zh) * 2020-12-22 2023-08-25 西默有限公司 用于光学系统的具有阻抗控制的磁性开关
CN116803006A (zh) * 2020-12-22 2023-09-22 西默有限公司 使用混合非线性磁性材料的脉冲功率电路和包含该电路的电感器
EP4281824A4 (en) 2021-01-21 2025-01-01 Hamamatsu Photonics K.K. SPECTRAL SHAPED LIGHT SOURCE
US20240170905A1 (en) * 2021-04-01 2024-05-23 Asml Netherlands B.V. Laser system
CN113783097B (zh) * 2021-04-15 2024-10-22 北京科益虹源光电技术有限公司 双腔激光器能量的控制方法及系统
WO2022231784A1 (en) * 2021-04-28 2022-11-03 Cymer, Llc Electronic module for a magnetic switching network to produce a pulse of the pulsed output light beam
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
CN115755544B (zh) * 2022-12-22 2023-10-20 上海凯矜新材料科技有限公司 一种具有辅助散热装置的光刻机
CN116097960B (zh) * 2022-12-30 2024-03-22 中电科卫星导航运营服务有限公司 一种播种机排种的控制方法
US12693207B1 (en) * 2023-04-12 2026-07-28 Kineolabs, Inc. Direct flow cell mountable spectroscopy system with internal gas cell
US12578076B2 (en) 2023-06-05 2026-03-17 Hamamatsu Photonics K.K. Dual-output laser-driven light source

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US691301A (en) 1901-04-10 1902-01-14 Ernest L Tschantre Animal-trap.
GB1197123A (en) * 1967-05-29 1970-07-01 Laser Sciences Inc Gas Coherent Radiation Generator and Discharge Tube Therefor
US3982200A (en) * 1973-09-04 1976-09-21 Avco Everett Research Laboratory, Inc. Electron beam gas discharge laser pressure control
US4223279A (en) 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US4550408A (en) * 1981-02-27 1985-10-29 Heinrich Karning Method and apparatus for operating a gas laser
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US4950840A (en) 1983-08-08 1990-08-21 Zetena Maurice F Wall recess cable connector permitting simplified innerconnection and limiting protruding cables
US4891820A (en) * 1985-12-19 1990-01-02 Rofin-Sinar, Inc. Fast axial flow laser circulating system
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
JPH077860B2 (ja) * 1988-04-28 1995-01-30 株式会社東芝 多段増幅パルスレーザの同期制御装置
JPH02129988A (ja) * 1988-11-10 1990-05-18 Toshiba Corp 横流形炭酸ガスレーザ発振器
US5005180A (en) * 1989-09-01 1991-04-02 Schneider (Usa) Inc. Laser catheter system
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
RU2032259C1 (ru) * 1990-11-02 1995-03-27 Александр Иванович Миланич Эксимерный лазер на хлоридах благородных газов
RU2019896C1 (ru) * 1990-11-02 1994-09-15 Асимов Мустафо Мухамедович Способ получения мощной узкополосной генерации
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
RU2073949C1 (ru) * 1993-05-12 1997-02-20 Институт лазерной физики СО РАН Стабилизированный по частоте лазер
US5313481A (en) * 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US6016323A (en) * 1995-06-06 2000-01-18 Spectra Physics Lasers, Inc. Broadly tunable single longitudinal mode output produced from multi-longitudinal mode seed source
US6208458B1 (en) * 1997-03-21 2001-03-27 Imra America, Inc. Quasi-phase-matched parametric chirped pulse amplification systems
US5991324A (en) * 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6128323A (en) * 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
JP4102457B2 (ja) * 1997-05-09 2008-06-18 株式会社小松製作所 狭帯域化レーザ装置
US5856991A (en) * 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US6192064B1 (en) 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
DE69813812T2 (de) * 1997-07-01 2003-11-06 Cymer, Inc. Sehr schmalbandiger laser mit instabilem resonator
US6094448A (en) 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6621846B1 (en) * 1997-07-22 2003-09-16 Cymer, Inc. Electric discharge laser with active wavelength chirp correction
US6529531B1 (en) * 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6757316B2 (en) * 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
US6151349A (en) 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
US5978406A (en) 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6016325A (en) 1998-04-27 2000-01-18 Cymer, Inc. Magnetic modulator voltage and temperature timing compensation circuit
US6792023B1 (en) * 1998-06-04 2004-09-14 Lambda Physik Ag Method and apparatus for reduction of spectral fluctuations
US6477193B2 (en) 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6442181B1 (en) * 1998-07-18 2002-08-27 Cymer, Inc. Extreme repetition rate gas discharge laser
US6208675B1 (en) 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) * 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
JP2000091681A (ja) * 1998-09-09 2000-03-31 Japan Atom Energy Res Inst 波面制御をすることにより媒質中にレーザー光を長距離伝播させる方法
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
JP3879889B2 (ja) * 1998-11-20 2007-02-14 株式会社小松製作所 インジェクションロック型狭帯域化パルスレーザ装置
WO2000038286A1 (en) * 1998-12-15 2000-06-29 Cymer, Inc. ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE
JP2000223408A (ja) * 1999-02-03 2000-08-11 Hitachi Ltd 半導体製造装置および半導体装置の製造方法
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6298080B1 (en) * 1999-03-12 2001-10-02 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US6700915B2 (en) * 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6104735A (en) 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6414979B2 (en) 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6381257B1 (en) 1999-09-27 2002-04-30 Cymer, Inc. Very narrow band injection seeded F2 lithography laser
US6795474B2 (en) 2000-11-17 2004-09-21 Cymer, Inc. Gas discharge laser with improved beam path
US6535531B1 (en) * 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
US6549551B2 (en) * 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6370174B1 (en) * 1999-10-20 2002-04-09 Cymer, Inc. Injection seeded F2 lithography laser
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6532247B2 (en) 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
JP2001269789A (ja) * 2000-01-20 2001-10-02 Komatsu Ltd レーザ加工装置
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US6584132B2 (en) * 2000-11-01 2003-06-24 Cymer, Inc. Spinodal copper alloy electrodes
US6538737B2 (en) 2001-01-29 2003-03-25 Cymer, Inc. High resolution etalon-grating spectrometer
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置

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