JP2005502208A5 - - Google Patents

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Publication number
JP2005502208A5
JP2005502208A5 JP2003525953A JP2003525953A JP2005502208A5 JP 2005502208 A5 JP2005502208 A5 JP 2005502208A5 JP 2003525953 A JP2003525953 A JP 2003525953A JP 2003525953 A JP2003525953 A JP 2003525953A JP 2005502208 A5 JP2005502208 A5 JP 2005502208A5
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JP
Japan
Prior art keywords
laser
pulse
laser system
gas
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003525953A
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English (en)
Japanese (ja)
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JP2005502208A (ja
Filing date
Publication date
Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US09/970,503 external-priority patent/US20020071468A1/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/012,002 external-priority patent/US6625191B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Priority claimed from US10/056,619 external-priority patent/US6801560B2/en
Application filed filed Critical
Publication of JP2005502208A publication Critical patent/JP2005502208A/ja
Publication of JP2005502208A5 publication Critical patent/JP2005502208A5/ja
Pending legal-status Critical Current

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JP2003525953A 2001-08-29 2002-08-19 線幅選択型２室式レーザシステム Pending JP2005502208A (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US09/970,503 US20020071468A1 (en) 1999-09-27 2001-10-03 Injection seeded F2 laser with pre-injection filter
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/012,002 US6625191B2 (en) 1999-12-10 2001-11-30 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
US10/056,619 US6801560B2 (en) 1999-05-10 2002-01-23 Line selected F2 two chamber laser system
PCT/US2002/026394 WO2003021727A2 (en) 2001-08-29 2002-08-19 Line selected f2 two chamber laser system

Publications (2)

Publication Number Publication Date
JP2005502208A JP2005502208A (ja) 2005-01-20
JP2005502208A5 true JP2005502208A5 (enExample) 2006-01-05

Family

ID=27573861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003525953A Pending JP2005502208A (ja) 2001-08-29 2002-08-19 線幅選択型２室式レーザシステム

Country Status (9)

Country Link
US (3) US6801560B2 (enExample)
EP (2) EP1458066B1 (enExample)
JP (1) JP2005502208A (enExample)
KR (1) KR20040032988A (enExample)
AU (1) AU2002336374A1 (enExample)
CA (1) CA2458619A1 (enExample)
IL (1) IL160584A0 (enExample)
MY (1) MY130568A (enExample)
WO (1) WO2003021727A2 (enExample)

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US7598683B1 (en) 2007-07-31 2009-10-06 Lsi Industries, Inc. Control of light intensity using pulses of a fixed duration and frequency
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CN102969645B (zh) * 2012-11-21 2015-07-15 中国科学院光电研究院 双电极放电腔的导流装置及应用其的放电腔、准分子激光器
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CN107315343B (zh) * 2017-02-21 2020-02-07 中国人民解放军海军工程大学 一种机械主动隔振的多振源多参考窄带自适应方法
WO2019160548A1 (en) * 2018-02-15 2019-08-22 Cymer, Llc Gas management system
CN112397987B (zh) * 2019-08-15 2022-01-18 中国科学院大连化学物理研究所 一种多气室气体池
CN112397986B (zh) * 2019-08-15 2021-09-21 中国科学院大连化学物理研究所 一种轮转式拉曼池的拉曼激光器
CN121710035A (zh) 2019-12-23 2026-03-20 西默有限公司 用于改进duv激光对准的量测
JP7411089B2 (ja) * 2019-12-31 2024-01-10 サイマー リミテッド ライアビリティ カンパニー 独立した電圧及びタイミング制御並びに電力消費削減を伴う、デュアルパルスパワーシステム
US20240283210A1 (en) * 2021-07-15 2024-08-22 Cymer, Llc Pulsed power systems with controlled reactor reset
CN114122871A (zh) * 2021-10-11 2022-03-01 沈阳东镭光电技术有限公司 一种激光器系统
CN116247978A (zh) * 2021-12-08 2023-06-09 北京科益虹源光电技术有限公司 电机的同步控制方法、控制设备及激光器
CN114512297B (zh) * 2022-01-17 2022-12-02 华中科技大学 一种基于平顶脉冲磁场的磁增益开关及方法
CN119154078B (zh) * 2024-11-15 2025-02-07 厦门纽立特电子科技有限公司 一种多通激光放大器

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