JP2004526334A5 - - Google Patents

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Publication number
JP2004526334A5
JP2004526334A5 JP2002590462A JP2002590462A JP2004526334A5 JP 2004526334 A5 JP2004526334 A5 JP 2004526334A5 JP 2002590462 A JP2002590462 A JP 2002590462A JP 2002590462 A JP2002590462 A JP 2002590462A JP 2004526334 A5 JP2004526334 A5 JP 2004526334A5
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JP
Japan
Prior art keywords
laser
gas
discharge
discharge region
programmable logic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002590462A
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English (en)
Japanese (ja)
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JP2004526334A (ja
Filing date
Publication date
Priority claimed from US09/854,097 external-priority patent/US6757316B2/en
Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US10/029,319 external-priority patent/US6765946B2/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/012,002 external-priority patent/US6625191B2/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Application filed filed Critical
Publication of JP2004526334A publication Critical patent/JP2004526334A/ja
Publication of JP2004526334A5 publication Critical patent/JP2004526334A5/ja
Pending legal-status Critical Current

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JP2002590462A 2001-05-11 2002-04-15 ４ＫＨｚガス放電レーザシステム Pending JP2004526334A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US09/854,097 US6757316B2 (en) 1999-12-27 2001-05-11 Four KHz gas discharge laser
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/029,319 US6765946B2 (en) 2000-01-25 2001-10-17 Fan for gas discharge laser
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/012,002 US6625191B2 (en) 1999-12-10 2001-11-30 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
PCT/US2002/012062 WO2002093699A1 (en) 2001-05-11 2002-04-15 FOUR KHz GAS DISCHARGE LASER SYSTEM

Publications (2)

Publication Number Publication Date
JP2004526334A JP2004526334A (ja) 2004-08-26
JP2004526334A5 true JP2004526334A5 (enExample) 2005-12-22

Family

ID=27555375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002590462A Pending JP2004526334A (ja) 2001-05-11 2002-04-15 ４ＫＨｚガス放電レーザシステム

Country Status (4)

Country Link
US (1) US6882674B2 (enExample)
EP (1) EP1391017A4 (enExample)
JP (1) JP2004526334A (enExample)
WO (1) WO2002093699A1 (enExample)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6757316B2 (en) * 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6912052B2 (en) 2000-11-17 2005-06-28 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US7079564B2 (en) * 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US7830934B2 (en) 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US20050100072A1 (en) * 2001-11-14 2005-05-12 Rao Rajasekhar M. High power laser output beam energy density reduction
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7277188B2 (en) * 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
US7317179B2 (en) * 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7598683B1 (en) 2007-07-31 2009-10-06 Lsi Industries, Inc. Control of light intensity using pulses of a fixed duration and frequency
US8903577B2 (en) 2009-10-30 2014-12-02 Lsi Industries, Inc. Traction system for electrically powered vehicles
US8604709B2 (en) 2007-07-31 2013-12-10 Lsi Industries, Inc. Methods and systems for controlling electrical power to DC loads
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
JP5174959B2 (ja) * 2009-05-19 2013-04-03 三菱電機株式会社 ガスレーザ発振器
US8254420B2 (en) * 2009-11-18 2012-08-28 Cymer, Inc. Advanced laser wavelength control
CN101807772B (zh) * 2010-04-12 2011-07-20 中国科学院长春光学精密机械与物理研究所 高功率tea气体激光器环形谐振激光腔
US10727642B2 (en) 2015-12-21 2020-07-28 Cymer, Llc Online calibration for repetition rate dependent performance variables
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
US20170202059A1 (en) * 2016-01-12 2017-07-13 Electrolux Home Products, Inc. Induction stirring apparatus for induction cooktops
WO2017158694A1 (ja) 2016-03-14 2017-09-21 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
CN112771444B (zh) 2018-11-26 2023-07-11 极光先进雷射株式会社 激光系统和电子器件的制造方法
CN113287236B (zh) 2019-02-26 2024-03-19 极光先进雷射株式会社 窄带化模块、气体激光装置和电子器件的制造方法
JP7411089B2 (ja) * 2019-12-31 2024-01-10 サイマー リミテッド ライアビリティ カンパニー 独立した電圧及びタイミング制御並びに電力消費削減を伴う、デュアルパルスパワーシステム
CN118202535A (zh) * 2021-10-21 2024-06-14 西默有限公司 调节激光电极的装置和方法

Family Cites Families (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5765018A (en) * 1980-10-07 1982-04-20 Nec Corp Pulse modulator
JPS61202530A (ja) * 1985-03-05 1986-09-08 Nec Corp パルス変調器
JPH0746738B2 (ja) * 1986-02-25 1995-05-17 株式会社アマダ レーザ発振器
JPS62214685A (ja) * 1986-03-17 1987-09-21 Amada Co Ltd ガスレ−ザ発振器の放電装置
JPS62177065U (enExample) * 1986-04-30 1987-11-10
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
JPS63100786A (ja) * 1986-10-17 1988-05-02 Komatsu Ltd ガスレ−ザ装置
JPS63229770A (ja) * 1987-03-19 1988-09-26 Toshiba Corp 高繰返しパルスレ−ザ電極
JPS6430867U (enExample) * 1987-08-19 1989-02-27
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
JPH01214184A (ja) * 1988-02-23 1989-08-28 Toshiba Corp パルスレーザ発振装置
JPH0239582A (ja) * 1988-07-29 1990-02-08 Toshiba Corp 狭帯域化レーザ装置
JP2631554B2 (ja) * 1989-05-23 1997-07-16 株式会社小松製作所 レーザの波長制御装置
JPH03129788A (ja) * 1989-10-16 1991-06-03 Kawasaki Steel Corp ガスレーザ装置
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
JPH0395970U (enExample) * 1990-01-19 1991-09-30
JP2989284B2 (ja) * 1991-02-14 1999-12-13 株式会社アマダ 三軸直交形炭酸ガスレーザの高周波放電電極
JPH06152004A (ja) * 1992-11-13 1994-05-31 Komatsu Ltd パルスレーザ装置
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
JPH09221665A (ja) * 1996-02-14 1997-08-26 Osaka Gas Co Ltd 蓄熱材用マイクロカプセル分散液
JP3719753B2 (ja) * 1996-01-31 2005-11-24 株式会社小松製作所 ガスレーザ装置
US5771258A (en) * 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
US5991324A (en) * 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5856991A (en) * 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
US6137821A (en) * 1997-06-04 2000-10-24 Cymer, Inc. Durable etalon based output coupler
DE69813812T2 (de) * 1997-07-01 2003-11-06 Cymer, Inc. Sehr schmalbandiger laser mit instabilem resonator
US6212217B1 (en) * 1997-07-01 2001-04-03 Cymer, Inc. Smart laser with automated beam quality control
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5978391A (en) * 1997-07-18 1999-11-02 Cymer, Inc. Wavelength reference for excimer laser
US6014398A (en) * 1997-10-10 2000-01-11 Cymer, Inc. Narrow band excimer laser with gas additive
US6330261B1 (en) * 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US6757316B2 (en) * 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US6853653B2 (en) 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
EP1010040B1 (en) * 1997-08-08 2009-06-24 Cymer, Inc. Laser-illuminated stepper or scanner with energy sensor feedback
WO1999019950A1 (en) * 1997-10-10 1999-04-22 Cymer, Inc. Pulse energy control for excimer laser
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
JPH11163447A (ja) * 1997-11-25 1999-06-18 Toshiba Corp パルスガスレーザ発振装置とそれを用いたレーザアニール装置
JP3224525B2 (ja) * 1997-12-08 2001-10-29 サイマー インコーポレイテッド エタロンベース出力カプラを備える狭帯域レーザ
US6240117B1 (en) * 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
AU2876199A (en) * 1998-03-11 1999-09-27 Cymer, Inc. Wavelength system for an excimer laser
JP2000058944A (ja) * 1998-05-20 2000-02-25 Cymer Inc 高信頼性・モジュラ製造高品質狭帯域高繰り返しレ―トｆ２レ―ザ
US6424666B1 (en) * 1999-06-23 2002-07-23 Lambda Physik Ag Line-narrowing module for high power laser
US6442181B1 (en) 1998-07-18 2002-08-27 Cymer, Inc. Extreme repetition rate gas discharge laser
US6477193B2 (en) * 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6208675B1 (en) * 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
WO2000038286A1 (en) * 1998-12-15 2000-06-29 Cymer, Inc. ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE
US6157662A (en) * 1999-02-12 2000-12-05 Lambda Physik Gmbh F2 (157nm) laser employing neon as the buffer gas
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
JP2000244038A (ja) * 1999-02-18 2000-09-08 Ebara Corp エキシマレーザ装置
JP3880285B2 (ja) * 1999-03-19 2007-02-14 サイマー， インコーポレイテッド ガス放電レーザに関する長パルスパルスパワーシステム
JP4041264B2 (ja) * 1999-03-19 2008-01-30 サイマー， インコーポレイテッド 可視赤及びｉｒコントロールを備えたｆ２レーザー
CA2266919A1 (fr) * 1999-03-23 2000-09-23 Vladimir Atejev Procede et dispositif pour l'excitation d'une decharge electrique a frequence elevee dans un laser au gaz
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
JP3296430B2 (ja) * 1999-10-08 2002-07-02 株式会社ウシオ総合技術研究所 露光用ＡｒＦエキシマレーザ装置
US6650666B2 (en) 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver

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