AU2002336374A1 - Line selected f¿2? two chamber laser system - Google Patents

Line selected f¿2? two chamber laser system

Info

Publication number
AU2002336374A1
AU2002336374A1 AU2002336374A AU2002336374A AU2002336374A1 AU 2002336374 A1 AU2002336374 A1 AU 2002336374A1 AU 2002336374 A AU2002336374 A AU 2002336374A AU 2002336374 A AU2002336374 A AU 2002336374A AU 2002336374 A1 AU2002336374 A1 AU 2002336374A1
Authority
AU
Australia
Prior art keywords
laser system
line selected
chamber laser
chamber
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002336374A
Other languages
English (en)
Inventor
Herve A. Besaucele
Daniel J. W. Brown
Alexander I. Ershov
Igor V. Fomenkov
William G. Hulburd
David S. Knowles
David W. Myers
Richard M. Ness
Eckehard D. Onkels
William N. Partlo
German E. Rylov
Richard L. Sandstrom
Scot T. Smith
Richard C. Ujazdowski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US09/970,503 external-priority patent/US20020071468A1/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/012,002 external-priority patent/US6625191B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2002336374A1 publication Critical patent/AU2002336374A1/en
Abandoned legal-status Critical Current

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    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
    • H—ELECTRICITY
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H—ELECTRICITY
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/2207—Noble gas ions, e.g. Ar+>, Kr+>
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
    • H—ELECTRICITY
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm

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AU2002336374A 2001-08-29 2002-08-19 Line selected f¿2? two chamber laser system Abandoned AU2002336374A1 (en)

Applications Claiming Priority (17)

Application Number Priority Date Filing Date Title
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US09/943,343 2001-08-29
US09/970,503 US20020071468A1 (en) 1999-09-27 2001-10-03 Injection seeded F2 laser with pre-injection filter
US09/970,503 2001-10-03
US10/000,991 2001-11-14
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/006,913 2001-11-29
US10/012,002 US6625191B2 (en) 1999-12-10 2001-11-30 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/012,002 2001-11-30
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
US10/036,676 2001-12-21
US10/036,727 2001-12-21
US10/056,619 US6801560B2 (en) 1999-05-10 2002-01-23 Line selected F2 two chamber laser system
US10/056,619 2002-01-23
PCT/US2002/026394 WO2003021727A2 (en) 2001-08-29 2002-08-19 Line selected f2 two chamber laser system

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EP (2) EP1458066B1 (enExample)
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KR (1) KR20040032988A (enExample)
AU (1) AU2002336374A1 (enExample)
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IL (1) IL160584A0 (enExample)
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US20020154671A1 (en) 2002-10-24
US20040174919A1 (en) 2004-09-09
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US20040258122A1 (en) 2004-12-23
WO2003021727A3 (en) 2003-11-06
MY130568A (en) 2007-06-29
US7058107B2 (en) 2006-06-06
JP2005502208A (ja) 2005-01-20
KR20040032988A (ko) 2004-04-17
US6801560B2 (en) 2004-10-05
EP1458066A2 (en) 2004-09-15
EP1458066B1 (en) 2009-01-21
US7218661B2 (en) 2007-05-15
EP1458066A3 (en) 2006-04-19

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