CA2457869A1 - Very narrow band, two chamber, high rep rate gas discharge laser system - Google Patents
Very narrow band, two chamber, high rep rate gas discharge laser system Download PDFInfo
- Publication number
- CA2457869A1 CA2457869A1 CA002457869A CA2457869A CA2457869A1 CA 2457869 A1 CA2457869 A1 CA 2457869A1 CA 002457869 A CA002457869 A CA 002457869A CA 2457869 A CA2457869 A CA 2457869A CA 2457869 A1 CA2457869 A1 CA 2457869A1
- Authority
- CA
- Canada
- Prior art keywords
- laser
- pulse
- discharge
- gas
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
- G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
- H01S3/0346—Protection of windows or mirrors against deleterious effects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2333—Double-pass amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
- H01S3/0387—Helical shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0404—Air- or gas cooling, e.g. by dry nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/08022—Longitudinal modes
- H01S3/08031—Single-mode emission
- H01S3/08036—Single-mode emission using intracavity dispersive, polarising or birefringent elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0943—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09702—Details of the driver electronics and electric discharge circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/2207—Noble gas ions, e.g. Ar+>, Kr+>
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Environmental & Geological Engineering (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/943,343 | 2001-08-29 | ||
| US09/943,343 US6567450B2 (en) | 1999-12-10 | 2001-08-29 | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US10/006,913 | 2001-11-29 | ||
| US10/006,913 US6535531B1 (en) | 2001-11-29 | 2001-11-29 | Gas discharge laser with pulse multiplier |
| US10/012,002 US6625191B2 (en) | 1999-12-10 | 2001-11-30 | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US10/012,002 | 2001-11-30 | ||
| PCT/US2002/027925 WO2003021728A2 (en) | 2001-08-29 | 2002-08-28 | Very narrow band, two chamber, high rep rate gas discharge laser system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2457869A1 true CA2457869A1 (en) | 2003-03-13 |
Family
ID=27358219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002457869A Abandoned CA2457869A1 (en) | 2001-08-29 | 2002-08-28 | Very narrow band, two chamber, high rep rate gas discharge laser system |
Country Status (11)
| Country | Link |
|---|---|
| US (4) | US6625191B2 (enExample) |
| EP (1) | EP1438774B1 (enExample) |
| JP (2) | JP2005502209A (enExample) |
| KR (2) | KR100907299B1 (enExample) |
| AU (1) | AU2002332801A1 (enExample) |
| CA (1) | CA2457869A1 (enExample) |
| IL (1) | IL160586A0 (enExample) |
| MY (1) | MY153277A (enExample) |
| RU (1) | RU2306649C2 (enExample) |
| TW (1) | TW569508B (enExample) |
| WO (1) | WO2003021728A2 (enExample) |
Families Citing this family (189)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6865210B2 (en) * | 2001-05-03 | 2005-03-08 | Cymer, Inc. | Timing control for two-chamber gas discharge laser system |
| US7856044B2 (en) * | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
| US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6801560B2 (en) * | 1999-05-10 | 2004-10-05 | Cymer, Inc. | Line selected F2 two chamber laser system |
| US6914919B2 (en) * | 2000-06-19 | 2005-07-05 | Cymer, Inc. | Six to ten KHz, or greater gas discharge laser system |
| US6912052B2 (en) * | 2000-11-17 | 2005-06-28 | Cymer, Inc. | Gas discharge MOPA laser spectral analysis module |
| US6704340B2 (en) | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
| JP4877692B2 (ja) * | 2001-03-21 | 2012-02-15 | 株式会社小松製作所 | 注入同期式又はmopa方式のレーザ装置 |
| US6690704B2 (en) * | 2001-04-09 | 2004-02-10 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
| US7079564B2 (en) * | 2001-04-09 | 2006-07-18 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
| US7039086B2 (en) * | 2001-04-09 | 2006-05-02 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
| US7230964B2 (en) * | 2001-04-09 | 2007-06-12 | Cymer, Inc. | Lithography laser with beam delivery and beam pointing control |
| US7009140B2 (en) * | 2001-04-18 | 2006-03-07 | Cymer, Inc. | Laser thin film poly-silicon annealing optical system |
| US7061959B2 (en) * | 2001-04-18 | 2006-06-13 | Tcz Gmbh | Laser thin film poly-silicon annealing system |
| US7167499B2 (en) * | 2001-04-18 | 2007-01-23 | Tcz Pte. Ltd. | Very high energy, high stability gas discharge laser surface treatment system |
| US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
| US7476886B2 (en) * | 2006-08-25 | 2009-01-13 | Cymer, Inc. | Source material collection unit for a laser produced plasma EUV light source |
| US7897947B2 (en) * | 2007-07-13 | 2011-03-01 | Cymer, Inc. | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave |
| US7465946B2 (en) | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
| US7518787B2 (en) * | 2006-06-14 | 2009-04-14 | Cymer, Inc. | Drive laser for EUV light source |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7916388B2 (en) * | 2007-12-20 | 2011-03-29 | Cymer, Inc. | Drive laser for EUV light source |
| US7415056B2 (en) * | 2006-03-31 | 2008-08-19 | Cymer, Inc. | Confocal pulse stretcher |
| US7491954B2 (en) * | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| US7378673B2 (en) | 2005-02-25 | 2008-05-27 | Cymer, Inc. | Source material dispenser for EUV light source |
| US7598509B2 (en) | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7843632B2 (en) * | 2006-08-16 | 2010-11-30 | Cymer, Inc. | EUV optics |
| US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
| US7928416B2 (en) * | 2006-12-22 | 2011-04-19 | Cymer, Inc. | Laser produced plasma EUV light source |
| JP2003008119A (ja) * | 2001-06-26 | 2003-01-10 | Komatsu Ltd | 注入同期式又はmopa方式のレーザ装置 |
| US7088758B2 (en) * | 2001-07-27 | 2006-08-08 | Cymer, Inc. | Relax gas discharge laser lithography light source |
| JP3977038B2 (ja) * | 2001-08-27 | 2007-09-19 | 株式会社半導体エネルギー研究所 | レーザ照射装置およびレーザ照射方法 |
| US7830934B2 (en) | 2001-08-29 | 2010-11-09 | Cymer, Inc. | Multi-chamber gas discharge laser bandwidth control through discharge timing |
| US6963595B2 (en) | 2001-08-29 | 2005-11-08 | Cymer, Inc. | Automatic gas control system for a gas discharge laser |
| US20050100072A1 (en) * | 2001-11-14 | 2005-05-12 | Rao Rajasekhar M. | High power laser output beam energy density reduction |
| US8653437B2 (en) | 2010-10-04 | 2014-02-18 | Cymer, Llc | EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods |
| US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
| JP3773858B2 (ja) * | 2002-01-30 | 2006-05-10 | 株式会社小松製作所 | 注入同期式又はmopa方式のガスレーザ装置 |
| US8654438B2 (en) | 2010-06-24 | 2014-02-18 | Cymer, Llc | Master oscillator-power amplifier drive laser with pre-pulse for EUV light source |
| US20040202220A1 (en) * | 2002-11-05 | 2004-10-14 | Gongxue Hua | Master oscillator-power amplifier excimer laser system |
| US7308013B2 (en) | 2002-11-05 | 2007-12-11 | Lambda Physik Ag | Excimer or molecular fluorine laser system with precision timing |
| US20040156414A1 (en) * | 2003-01-08 | 2004-08-12 | Govorkov Sergei V. | Excimer or molecular fluorine laser with bandwidth of less than 0.2 pm |
| US7741639B2 (en) * | 2003-01-31 | 2010-06-22 | Cymer, Inc. | Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control |
| US7158553B2 (en) * | 2003-02-14 | 2007-01-02 | Lambda Physik Ag | Master oscillator/power amplifier excimer laser system with pulse energy and pointing control |
| US6987790B2 (en) * | 2003-02-14 | 2006-01-17 | Lambda Physik Ag | Excimer or molecular fluorine laser with several discharge chambers |
| US7217941B2 (en) | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
| US8116347B2 (en) * | 2003-04-22 | 2012-02-14 | Komatsu Ltd. | Two-stage laser system for aligners |
| US7277188B2 (en) | 2003-04-29 | 2007-10-02 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7366213B2 (en) * | 2003-05-19 | 2008-04-29 | Lambda Physik Ag | MOPA excimer or molecular fluorine laser system with improved synchronization |
| US7184204B2 (en) * | 2003-07-01 | 2007-02-27 | Lambda Physik Ag | Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime |
| JP2007515774A (ja) * | 2003-07-30 | 2007-06-14 | ティーシーゼット ピーティーイー リミテッド | 超高エネルギ高安定性ガス放電レーザ表面処理システム |
| US6873418B1 (en) | 2003-09-30 | 2005-03-29 | Cymer, Inc. | Optical mountings for gas discharge MOPA laser spectral analysis module |
| US6894785B2 (en) * | 2003-09-30 | 2005-05-17 | Cymer, Inc. | Gas discharge MOPA laser spectral analysis module |
| US20060146906A1 (en) * | 2004-02-18 | 2006-07-06 | Cymer, Inc. | LLP EUV drive laser |
| US7087914B2 (en) * | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
| US7196342B2 (en) | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
| US7006547B2 (en) * | 2004-03-31 | 2006-02-28 | Cymer, Inc. | Very high repetition rate narrow band gas discharge laser system |
| US7522650B2 (en) * | 2004-03-31 | 2009-04-21 | Cymer, Inc. | Gas discharge laser chamber improvements |
| US20050286599A1 (en) * | 2004-06-29 | 2005-12-29 | Rafac Robert J | Method and apparatus for gas discharge laser output light coherency reduction |
| US7507203B2 (en) * | 2004-09-21 | 2009-03-24 | Digital Signal Corporation | System and method for remotely monitoring physiological functions |
| US7116695B2 (en) * | 2004-09-28 | 2006-10-03 | Cymer, Inc. | Laser output light pulse beam parameter transient correction system |
| US7109503B1 (en) * | 2005-02-25 | 2006-09-19 | Cymer, Inc. | Systems for protecting internal components of an EUV light source from plasma-generated debris |
| US7355191B2 (en) | 2004-11-01 | 2008-04-08 | Cymer, Inc. | Systems and methods for cleaning a chamber window of an EUV light source |
| US20060114956A1 (en) * | 2004-11-30 | 2006-06-01 | Sandstrom Richard L | High power high pulse repetition rate gas discharge laser system bandwidth management |
| US7643522B2 (en) * | 2004-11-30 | 2010-01-05 | Cymer, Inc. | Method and apparatus for gas discharge laser bandwidth and center wavelength control |
| CA2597712C (en) | 2005-02-14 | 2013-08-13 | Digital Signal Corporation | Laser radar system and system and method for providing chirped electromagnetic radiation |
| US7482609B2 (en) | 2005-02-28 | 2009-01-27 | Cymer, Inc. | LPP EUV light source drive laser system |
| US20060222034A1 (en) * | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
| US7317536B2 (en) | 2005-06-27 | 2008-01-08 | Cymer, Inc. | Spectral bandwidth metrology for high repetition rate gas discharge lasers |
| US7141806B1 (en) | 2005-06-27 | 2006-11-28 | Cymer, Inc. | EUV light source collector erosion mitigation |
| US7365349B2 (en) | 2005-06-27 | 2008-04-29 | Cymer, Inc. | EUV light source collector lifetime improvements |
| US7180083B2 (en) | 2005-06-27 | 2007-02-20 | Cymer, Inc. | EUV light source collector erosion mitigation |
| US7633989B2 (en) * | 2005-06-27 | 2009-12-15 | Cymer, Inc. | High pulse repetition rate gas discharge laser |
| US7653095B2 (en) * | 2005-06-30 | 2010-01-26 | Cymer, Inc. | Active bandwidth control for a laser |
| US7394083B2 (en) | 2005-07-08 | 2008-07-01 | Cymer, Inc. | Systems and methods for EUV light source metrology |
| JP5202315B2 (ja) * | 2005-08-09 | 2013-06-05 | サイマー インコーポレイテッド | 放電タイミングによる多室ガス放電レーザの帯域幅制御 |
| JP4677857B2 (ja) | 2005-08-23 | 2011-04-27 | ヤマハ株式会社 | 楽器用部材または楽器とその製造方法 |
| US7317179B2 (en) | 2005-10-28 | 2008-01-08 | Cymer, Inc. | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate |
| US7471455B2 (en) | 2005-10-28 | 2008-12-30 | Cymer, Inc. | Systems and methods for generating laser light shaped as a line beam |
| US7679029B2 (en) | 2005-10-28 | 2010-03-16 | Cymer, Inc. | Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations |
| US7746913B2 (en) | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
| US7643529B2 (en) | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
| US7885309B2 (en) | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
| US7920616B2 (en) * | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
| US20090296755A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| EP1952493A4 (en) * | 2005-11-01 | 2017-05-10 | Cymer, LLC | Laser system |
| US20090296758A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
| US7999915B2 (en) * | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US7630424B2 (en) * | 2005-11-01 | 2009-12-08 | Cymer, Inc. | Laser system |
| US7715459B2 (en) * | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
| US7453077B2 (en) | 2005-11-05 | 2008-11-18 | Cymer, Inc. | EUV light source |
| EP1959817B1 (en) * | 2005-12-14 | 2016-08-10 | Digital Signal Corporation | System and method for tracking eyeball motion |
| US8081670B2 (en) * | 2006-02-14 | 2011-12-20 | Digital Signal Corporation | System and method for providing chirped electromagnetic radiation |
| US7852889B2 (en) * | 2006-02-17 | 2010-12-14 | Cymer, Inc. | Active spectral control of DUV light source |
| US8158960B2 (en) * | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
| US8525138B2 (en) | 2006-03-31 | 2013-09-03 | Energetiq Technology, Inc. | Laser-driven light source |
| US7599413B2 (en) * | 2006-05-19 | 2009-10-06 | Pavilion Integration Corp. | Self-contained module for injecting signal into slave laser without any modifications or adaptations to it |
| US8803027B2 (en) * | 2006-06-05 | 2014-08-12 | Cymer, Llc | Device and method to create a low divergence, high power laser beam for material processing applications |
| JP4972427B2 (ja) * | 2007-02-15 | 2012-07-11 | 株式会社小松製作所 | 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置 |
| JP5178047B2 (ja) * | 2007-05-01 | 2013-04-10 | ギガフォトン株式会社 | 露光用放電励起レーザ装置 |
| US9018561B2 (en) * | 2007-05-23 | 2015-04-28 | Cymer, Llc | High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier |
| US8903577B2 (en) | 2009-10-30 | 2014-12-02 | Lsi Industries, Inc. | Traction system for electrically powered vehicles |
| US7598683B1 (en) | 2007-07-31 | 2009-10-06 | Lsi Industries, Inc. | Control of light intensity using pulses of a fixed duration and frequency |
| US8604709B2 (en) | 2007-07-31 | 2013-12-10 | Lsi Industries, Inc. | Methods and systems for controlling electrical power to DC loads |
| US7812329B2 (en) * | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
| US7655925B2 (en) * | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| US7830942B2 (en) * | 2007-09-11 | 2010-11-09 | Cymer, Inc. | Ultraviolet laser light source pulse energy control system |
| US20090095924A1 (en) * | 2007-10-12 | 2009-04-16 | International Business Machines Corporation | Electrode design for euv discharge plasma source |
| US7960701B2 (en) | 2007-12-20 | 2011-06-14 | Cymer, Inc. | EUV light source components and methods for producing, using and refurbishing same |
| DE102008003288A1 (de) | 2008-01-05 | 2009-07-09 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Überwachung des in einer Projektionsbelichtungsanlage verwendeten Lichts |
| US7872245B2 (en) * | 2008-03-17 | 2011-01-18 | Cymer, Inc. | Systems and methods for target material delivery in a laser produced plasma EUV light source |
| US20090250637A1 (en) * | 2008-04-02 | 2009-10-08 | Cymer, Inc. | System and methods for filtering out-of-band radiation in EUV exposure tools |
| US8198612B2 (en) * | 2008-07-31 | 2012-06-12 | Cymer, Inc. | Systems and methods for heating an EUV collector mirror |
| US8519366B2 (en) * | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
| US9618369B2 (en) | 2008-08-26 | 2017-04-11 | The University Court Of The University Of Glasgow | Uses of electromagnetic interference patterns |
| EP2166626A1 (en) * | 2008-09-17 | 2010-03-24 | Carl Zeiss SMT AG | Method of reducing a divergence of a laser beam |
| US7641349B1 (en) | 2008-09-22 | 2010-01-05 | Cymer, Inc. | Systems and methods for collector mirror temperature control using direct contact heat transfer |
| US7751453B2 (en) * | 2008-10-21 | 2010-07-06 | Cymer, Inc. | Method and apparatus for laser control in a two chamber gas discharge laser |
| US7756171B2 (en) * | 2008-10-21 | 2010-07-13 | Cymer, Inc. | Method and apparatus for laser control in a two chamber gas discharge laser |
| US7720120B2 (en) * | 2008-10-21 | 2010-05-18 | Cymer, Inc. | Method and apparatus for laser control in a two chamber gas discharge laser |
| US7995637B2 (en) * | 2008-10-21 | 2011-08-09 | Cymer, Inc. | Gas discharge laser chamber |
| US8283643B2 (en) * | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
| WO2010141120A2 (en) * | 2009-02-20 | 2010-12-09 | Digital Signal Corporation | System and method for generating three dimensional images using lidar and video measurements |
| US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
| USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
| US8969838B2 (en) * | 2009-04-09 | 2015-03-03 | Asml Netherlands B.V. | Systems and methods for protecting an EUV light source chamber from high pressure source material leaks |
| US8304752B2 (en) * | 2009-04-10 | 2012-11-06 | Cymer, Inc. | EUV light producing system and method utilizing an alignment laser |
| KR101709820B1 (ko) | 2009-08-26 | 2017-03-08 | 칼 짜이스 레이저 옵틱스 게엠베하 | 레이저 시스템용 계측 모듈 |
| US8000212B2 (en) * | 2009-12-15 | 2011-08-16 | Cymer, Inc. | Metrology for extreme ultraviolet light source |
| US8173985B2 (en) * | 2009-12-15 | 2012-05-08 | Cymer, Inc. | Beam transport system for extreme ultraviolet light source |
| KR101006937B1 (ko) * | 2009-12-31 | 2011-01-10 | 에이스웨이브텍(주) | 야외 고주파 시스템의 정재파비 측정과 전파 선로 불량점 검출장치 및 방법 |
| JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| US8368039B2 (en) | 2010-04-05 | 2013-02-05 | Cymer, Inc. | EUV light source glint reduction system |
| US8462425B2 (en) | 2010-10-18 | 2013-06-11 | Cymer, Inc. | Oscillator-amplifier drive laser with seed protection for an EUV light source |
| TWI426285B (zh) * | 2011-02-11 | 2014-02-11 | Univ Nat Taiwan | 擾動自我測試電路 |
| CN102810810A (zh) | 2012-03-02 | 2012-12-05 | 中国科学院光电研究院 | 单腔双电极放电腔及准分子激光器 |
| JP2015122341A (ja) * | 2012-04-09 | 2015-07-02 | 三菱電機株式会社 | レーザ装置 |
| RU2510109C1 (ru) * | 2012-07-23 | 2014-03-20 | Олег Борисович Христофоров | Газоразрядный лазер и способ генерации излучения |
| RU2514159C2 (ru) * | 2012-07-23 | 2014-04-27 | Олег Борисович Христофоров | Газоразрядный лазер, лазерная система и способ генерации излучения |
| RU2531069C2 (ru) * | 2012-07-23 | 2014-10-20 | Олег Борисович Христофоров | Газоразрядная лазерная система и способ генерации излучения |
| RU2507654C1 (ru) * | 2012-07-23 | 2014-02-20 | Олег Борисович Христофоров | Газоразрядный лазер, лазерная система и способ генерации излучения |
| RU2503104C1 (ru) * | 2012-07-23 | 2013-12-27 | Олег Борисович Христофоров | Газоразрядный лазер |
| RU2519867C2 (ru) * | 2012-07-23 | 2014-06-20 | Общество с ограниченной ответственностью "РнД-ИСАН" | Газоразрядный лазер |
| RU2519869C2 (ru) * | 2012-07-23 | 2014-06-20 | Общество с ограниченной ответственностью "РнД-ИСАН" | Эксимерная лазерная система и способ генерации излучения |
| RU2506671C1 (ru) * | 2012-07-23 | 2014-02-10 | Общество с ограниченной ответственностью "РнД-ИСАН" | Газоразрядный лазер и способ генерации излучения |
| WO2014022681A1 (en) | 2012-08-01 | 2014-02-06 | Gentex Corporation | Assembly with laser induced channel edge and method thereof |
| CN102931569B (zh) * | 2012-11-08 | 2014-07-30 | 中国科学院光电研究院 | 准分子激光器的自动温控系统 |
| CN103296572B (zh) * | 2013-06-05 | 2015-07-15 | 中国科学院光电研究院 | 一种采用环形腔结构的气体激光器放大系统 |
| EP2822113A3 (en) * | 2013-06-28 | 2015-03-25 | Canon Kabushiki Kaisha | Pulse laser and photoacoustic apparatus |
| US9280053B2 (en) | 2013-09-04 | 2016-03-08 | Cymer, Llc | Apparatus for and method of temperature compensation in high power focusing system for EUV LPP source |
| KR101738155B1 (ko) * | 2015-06-10 | 2017-05-22 | 주식회사 필옵틱스 | 라인 빔 형성 장치 |
| US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
| RU2713082C2 (ru) * | 2015-07-22 | 2020-02-03 | Академи Оф Опто-Электроникс, Чайнис Академи Оф Сайенсис | Эксимер-лазерная система с конструкцией кольцевого резонатора |
| JP6608939B2 (ja) * | 2015-09-14 | 2019-11-20 | ギガフォトン株式会社 | レーザシステム |
| US20170202059A1 (en) * | 2016-01-12 | 2017-07-13 | Electrolux Home Products, Inc. | Induction stirring apparatus for induction cooktops |
| US9634455B1 (en) * | 2016-02-16 | 2017-04-25 | Cymer, Llc | Gas optimization in a gas discharge light source |
| US9945730B2 (en) | 2016-09-02 | 2018-04-17 | Cymer, Llc | Adjusting an amount of coherence of a light beam |
| US10416471B2 (en) | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
| US9835959B1 (en) | 2016-10-17 | 2017-12-05 | Cymer, Llc | Controlling for wafer stage vibration |
| US9989866B2 (en) | 2016-10-17 | 2018-06-05 | Cymer, Llc | Wafer-based light source parameter control |
| US9997888B2 (en) | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
| US10096967B2 (en) | 2016-12-07 | 2018-10-09 | Cymer, Llc | Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light source |
| US10451890B2 (en) | 2017-01-16 | 2019-10-22 | Cymer, Llc | Reducing speckle in an excimer light source |
| ES2967496T3 (es) * | 2018-03-08 | 2024-04-30 | Alcon Inc | Detección de impulsos láser de pico mediante temporización de señales de control |
| CN109101738B (zh) * | 2018-08-24 | 2022-11-15 | 河北工业大学 | 一种igbt模块老化程度评估方法 |
| JP7203944B2 (ja) * | 2019-02-20 | 2023-01-13 | ギガフォトン株式会社 | ガスレーザ装置、ガスレーザ装置のレーザ光の出射方法、及び電子デバイスの製造方法 |
| CN113841309B (zh) * | 2019-05-22 | 2025-03-18 | 西默有限公司 | 生成多个激光束的设备和方法 |
| KR102695305B1 (ko) * | 2019-12-20 | 2024-08-13 | 사이머 엘엘씨 | 레이저 소스용 가스 퍼지 시스템 |
| JP7411089B2 (ja) * | 2019-12-31 | 2024-01-10 | サイマー リミテッド ライアビリティ カンパニー | 独立した電圧及びタイミング制御並びに電力消費削減を伴う、デュアルパルスパワーシステム |
| US11374167B2 (en) | 2020-03-05 | 2022-06-28 | International Business Machines Corporation | Reducing parasitic bottom electrode resistance of embedded MRAM |
| WO2021186656A1 (ja) * | 2020-03-19 | 2021-09-23 | ギガフォトン株式会社 | レーザ装置及び電子デバイスの製造方法 |
| US12540850B2 (en) | 2020-08-18 | 2026-02-03 | Cymer, Llc | Predictive calibration scheduling apparatus and method |
| US12578433B2 (en) | 2020-10-21 | 2026-03-17 | Lg Innotek Co., Ltd. | Heat transfer light detection and ranging device |
| CN116648834A (zh) * | 2020-12-22 | 2023-08-25 | 西默有限公司 | 用于光学系统的具有阻抗控制的磁性开关 |
| CN116803006A (zh) * | 2020-12-22 | 2023-09-22 | 西默有限公司 | 使用混合非线性磁性材料的脉冲功率电路和包含该电路的电感器 |
| EP4281824A4 (en) | 2021-01-21 | 2025-01-01 | Hamamatsu Photonics K.K. | SPECTRAL SHAPED LIGHT SOURCE |
| US20240170905A1 (en) * | 2021-04-01 | 2024-05-23 | Asml Netherlands B.V. | Laser system |
| CN113783097B (zh) * | 2021-04-15 | 2024-10-22 | 北京科益虹源光电技术有限公司 | 双腔激光器能量的控制方法及系统 |
| WO2022231784A1 (en) * | 2021-04-28 | 2022-11-03 | Cymer, Llc | Electronic module for a magnetic switching network to produce a pulse of the pulsed output light beam |
| US11587781B2 (en) | 2021-05-24 | 2023-02-21 | Hamamatsu Photonics K.K. | Laser-driven light source with electrodeless ignition |
| US12165856B2 (en) | 2022-02-21 | 2024-12-10 | Hamamatsu Photonics K.K. | Inductively coupled plasma light source |
| US12144072B2 (en) | 2022-03-29 | 2024-11-12 | Hamamatsu Photonics K.K. | All-optical laser-driven light source with electrodeless ignition |
| US12156322B2 (en) | 2022-12-08 | 2024-11-26 | Hamamatsu Photonics K.K. | Inductively coupled plasma light source with switched power supply |
| CN115755544B (zh) * | 2022-12-22 | 2023-10-20 | 上海凯矜新材料科技有限公司 | 一种具有辅助散热装置的光刻机 |
| CN116097960B (zh) * | 2022-12-30 | 2024-03-22 | 中电科卫星导航运营服务有限公司 | 一种播种机排种的控制方法 |
| US12693207B1 (en) * | 2023-04-12 | 2026-07-28 | Kineolabs, Inc. | Direct flow cell mountable spectroscopy system with internal gas cell |
| US12578076B2 (en) | 2023-06-05 | 2026-03-17 | Hamamatsu Photonics K.K. | Dual-output laser-driven light source |
Family Cites Families (76)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US691301A (en) | 1901-04-10 | 1902-01-14 | Ernest L Tschantre | Animal-trap. |
| GB1197123A (en) * | 1967-05-29 | 1970-07-01 | Laser Sciences Inc | Gas Coherent Radiation Generator and Discharge Tube Therefor |
| US3982200A (en) * | 1973-09-04 | 1976-09-21 | Avco Everett Research Laboratory, Inc. | Electron beam gas discharge laser pressure control |
| US4223279A (en) | 1977-07-18 | 1980-09-16 | Mathematical Sciences Northwest, Inc. | Pulsed electric discharge laser utilizing water dielectric blumlein transmission line |
| US4550408A (en) * | 1981-02-27 | 1985-10-29 | Heinrich Karning | Method and apparatus for operating a gas laser |
| US4455658A (en) | 1982-04-20 | 1984-06-19 | Sutter Jr Leroy V | Coupling circuit for use with a transversely excited gas laser |
| US4950840A (en) | 1983-08-08 | 1990-08-21 | Zetena Maurice F | Wall recess cable connector permitting simplified innerconnection and limiting protruding cables |
| US4891820A (en) * | 1985-12-19 | 1990-01-02 | Rofin-Sinar, Inc. | Fast axial flow laser circulating system |
| US5315611A (en) | 1986-09-25 | 1994-05-24 | The United States Of America As Represented By The United States Department Of Energy | High average power magnetic modulator for metal vapor lasers |
| US5189678A (en) | 1986-09-29 | 1993-02-23 | The United States Of America As Represented By The United States Department Of Energy | Coupling apparatus for a metal vapor laser |
| US5023884A (en) | 1988-01-15 | 1991-06-11 | Cymer Laser Technologies | Compact excimer laser |
| US4959840A (en) | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
| US5025446A (en) | 1988-04-01 | 1991-06-18 | Laserscope | Intra-cavity beam relay for optical harmonic generation |
| JPH077860B2 (ja) * | 1988-04-28 | 1995-01-30 | 株式会社東芝 | 多段増幅パルスレーザの同期制御装置 |
| JPH02129988A (ja) * | 1988-11-10 | 1990-05-18 | Toshiba Corp | 横流形炭酸ガスレーザ発振器 |
| US5005180A (en) * | 1989-09-01 | 1991-04-02 | Schneider (Usa) Inc. | Laser catheter system |
| US5025445A (en) | 1989-11-22 | 1991-06-18 | Cymer Laser Technologies | System for, and method of, regulating the wavelength of a light beam |
| RU2032259C1 (ru) * | 1990-11-02 | 1995-03-27 | Александр Иванович Миланич | Эксимерный лазер на хлоридах благородных газов |
| RU2019896C1 (ru) * | 1990-11-02 | 1994-09-15 | Асимов Мустафо Мухамедович | Способ получения мощной узкополосной генерации |
| US5471965A (en) | 1990-12-24 | 1995-12-05 | Kapich; Davorin D. | Very high speed radial inflow hydraulic turbine |
| US5359620A (en) | 1992-11-12 | 1994-10-25 | Cymer Laser Technologies | Apparatus for, and method of, maintaining a clean window in a laser |
| RU2073949C1 (ru) * | 1993-05-12 | 1997-02-20 | Институт лазерной физики СО РАН | Стабилизированный по частоте лазер |
| US5313481A (en) * | 1993-09-29 | 1994-05-17 | The United States Of America As Represented By The United States Department Of Energy | Copper laser modulator driving assembly including a magnetic compression laser |
| US5448580A (en) | 1994-07-05 | 1995-09-05 | The United States Of America As Represented By The United States Department Of Energy | Air and water cooled modulator |
| US6016323A (en) * | 1995-06-06 | 2000-01-18 | Spectra Physics Lasers, Inc. | Broadly tunable single longitudinal mode output produced from multi-longitudinal mode seed source |
| US6208458B1 (en) * | 1997-03-21 | 2001-03-27 | Imra America, Inc. | Quasi-phase-matched parametric chirped pulse amplification systems |
| US5991324A (en) * | 1998-03-11 | 1999-11-23 | Cymer, Inc. | Reliable. modular, production quality narrow-band KRF excimer laser |
| US5982800A (en) | 1997-04-23 | 1999-11-09 | Cymer, Inc. | Narrow band excimer laser |
| US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
| JP4102457B2 (ja) * | 1997-05-09 | 2008-06-18 | 株式会社小松製作所 | 狭帯域化レーザ装置 |
| US5856991A (en) * | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
| US6192064B1 (en) | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
| DE69813812T2 (de) * | 1997-07-01 | 2003-11-06 | Cymer, Inc. | Sehr schmalbandiger laser mit instabilem resonator |
| US6094448A (en) | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
| US6018537A (en) | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
| US5852621A (en) | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
| US6671294B2 (en) | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6621846B1 (en) * | 1997-07-22 | 2003-09-16 | Cymer, Inc. | Electric discharge laser with active wavelength chirp correction |
| US6529531B1 (en) * | 1997-07-22 | 2003-03-04 | Cymer, Inc. | Fast wavelength correction technique for a laser |
| US6757316B2 (en) * | 1999-12-27 | 2004-06-29 | Cymer, Inc. | Four KHz gas discharge laser |
| US5953360A (en) | 1997-10-24 | 1999-09-14 | Synrad, Inc. | All metal electrode sealed gas laser |
| US6240117B1 (en) | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
| US6151349A (en) | 1998-03-04 | 2000-11-21 | Cymer, Inc. | Automatic fluorine control system |
| US5978406A (en) | 1998-01-30 | 1999-11-02 | Cymer, Inc. | Fluorine control system for excimer lasers |
| US6016325A (en) | 1998-04-27 | 2000-01-18 | Cymer, Inc. | Magnetic modulator voltage and temperature timing compensation circuit |
| US6792023B1 (en) * | 1998-06-04 | 2004-09-14 | Lambda Physik Ag | Method and apparatus for reduction of spectral fluctuations |
| US6477193B2 (en) | 1998-07-18 | 2002-11-05 | Cymer, Inc. | Extreme repetition rate gas discharge laser with improved blower motor |
| US6442181B1 (en) * | 1998-07-18 | 2002-08-27 | Cymer, Inc. | Extreme repetition rate gas discharge laser |
| US6208675B1 (en) | 1998-08-27 | 2001-03-27 | Cymer, Inc. | Blower assembly for a pulsed laser system incorporating ceramic bearings |
| US6067311A (en) * | 1998-09-04 | 2000-05-23 | Cymer, Inc. | Excimer laser with pulse multiplier |
| JP2000091681A (ja) * | 1998-09-09 | 2000-03-31 | Japan Atom Energy Res Inst | 波面制御をすることにより媒質中にレーザー光を長距離伝播させる方法 |
| US6493374B1 (en) * | 1999-09-03 | 2002-12-10 | Cymer, Inc. | Smart laser with fast deformable grating |
| US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6208674B1 (en) | 1998-09-18 | 2001-03-27 | Cymer, Inc. | Laser chamber with fully integrated electrode feedthrough main insulator |
| JP3879889B2 (ja) * | 1998-11-20 | 2007-02-14 | 株式会社小松製作所 | インジェクションロック型狭帯域化パルスレーザ装置 |
| WO2000038286A1 (en) * | 1998-12-15 | 2000-06-29 | Cymer, Inc. | ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE |
| JP2000223408A (ja) * | 1999-02-03 | 2000-08-11 | Hitachi Ltd | 半導体製造装置および半導体装置の製造方法 |
| US6219368B1 (en) | 1999-02-12 | 2001-04-17 | Lambda Physik Gmbh | Beam delivery system for molecular fluorine (F2) laser |
| US6298080B1 (en) * | 1999-03-12 | 2001-10-02 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
| US6700915B2 (en) * | 1999-03-12 | 2004-03-02 | Lambda Physik Ag | Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
| US6104735A (en) | 1999-04-13 | 2000-08-15 | Cymer, Inc. | Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly |
| US6164116A (en) | 1999-05-06 | 2000-12-26 | Cymer, Inc. | Gas module valve automated test fixture |
| US6590922B2 (en) * | 1999-09-27 | 2003-07-08 | Cymer, Inc. | Injection seeded F2 laser with line selection and discrimination |
| US6414979B2 (en) | 2000-06-09 | 2002-07-02 | Cymer, Inc. | Gas discharge laser with blade-dielectric electrode |
| US6381257B1 (en) | 1999-09-27 | 2002-04-30 | Cymer, Inc. | Very narrow band injection seeded F2 lithography laser |
| US6795474B2 (en) | 2000-11-17 | 2004-09-21 | Cymer, Inc. | Gas discharge laser with improved beam path |
| US6535531B1 (en) * | 2001-11-29 | 2003-03-18 | Cymer, Inc. | Gas discharge laser with pulse multiplier |
| US6549551B2 (en) * | 1999-09-27 | 2003-04-15 | Cymer, Inc. | Injection seeded laser with precise timing control |
| US6370174B1 (en) * | 1999-10-20 | 2002-04-09 | Cymer, Inc. | Injection seeded F2 lithography laser |
| US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6532247B2 (en) | 2000-02-09 | 2003-03-11 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
| JP2001269789A (ja) * | 2000-01-20 | 2001-10-02 | Komatsu Ltd | レーザ加工装置 |
| US6466602B1 (en) * | 2000-06-09 | 2002-10-15 | Cymer, Inc. | Gas discharge laser long life electrodes |
| US6584132B2 (en) * | 2000-11-01 | 2003-06-24 | Cymer, Inc. | Spinodal copper alloy electrodes |
| US6538737B2 (en) | 2001-01-29 | 2003-03-25 | Cymer, Inc. | High resolution etalon-grating spectrometer |
| JP4877692B2 (ja) * | 2001-03-21 | 2012-02-15 | 株式会社小松製作所 | 注入同期式又はmopa方式のレーザ装置 |
-
2001
- 2001-11-30 US US10/012,002 patent/US6625191B2/en not_active Expired - Lifetime
-
2002
- 2002-08-28 KR KR1020077019695A patent/KR100907299B1/ko not_active Expired - Lifetime
- 2002-08-28 RU RU2004109147/28A patent/RU2306649C2/ru not_active IP Right Cessation
- 2002-08-28 KR KR1020047002982A patent/KR100965770B1/ko not_active Expired - Lifetime
- 2002-08-28 JP JP2003525954A patent/JP2005502209A/ja active Pending
- 2002-08-28 EP EP02797839A patent/EP1438774B1/en not_active Expired - Lifetime
- 2002-08-28 IL IL16058602A patent/IL160586A0/xx unknown
- 2002-08-28 WO PCT/US2002/027925 patent/WO2003021728A2/en not_active Ceased
- 2002-08-28 CA CA002457869A patent/CA2457869A1/en not_active Abandoned
- 2002-08-28 TW TW091119519A patent/TW569508B/zh not_active IP Right Cessation
- 2002-08-28 AU AU2002332801A patent/AU2002332801A1/en not_active Abandoned
- 2002-08-29 MY MYPI20070725A patent/MY153277A/en unknown
-
2003
- 2003-07-24 US US10/627,215 patent/US6985508B2/en not_active Expired - Lifetime
-
2005
- 2005-08-09 US US11/199,691 patent/US7061961B2/en not_active Expired - Lifetime
-
2006
- 2006-02-01 US US11/346,519 patent/US7567607B2/en not_active Expired - Fee Related
-
2007
- 2007-11-30 JP JP2007310433A patent/JP4489801B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6625191B2 (en) | 2003-09-23 |
| US20040047385A1 (en) | 2004-03-11 |
| EP1438774B1 (en) | 2010-02-24 |
| JP4489801B2 (ja) | 2010-06-23 |
| US20020154668A1 (en) | 2002-10-24 |
| US20060126697A1 (en) | 2006-06-15 |
| RU2306649C2 (ru) | 2007-09-20 |
| EP1438774A4 (en) | 2006-03-08 |
| KR100907299B1 (ko) | 2009-07-13 |
| AU2002332801A1 (en) | 2003-03-18 |
| RU2004109147A (ru) | 2005-02-27 |
| JP2008085364A (ja) | 2008-04-10 |
| IL160586A0 (en) | 2004-07-25 |
| US7567607B2 (en) | 2009-07-28 |
| US20050271109A1 (en) | 2005-12-08 |
| KR20040032984A (ko) | 2004-04-17 |
| US7061961B2 (en) | 2006-06-13 |
| JP2005502209A (ja) | 2005-01-20 |
| MY153277A (en) | 2015-01-29 |
| KR20070093464A (ko) | 2007-09-18 |
| KR100965770B1 (ko) | 2010-06-24 |
| WO2003021728A2 (en) | 2003-03-13 |
| TW569508B (en) | 2004-01-01 |
| WO2003021728A3 (en) | 2004-03-04 |
| US6985508B2 (en) | 2006-01-10 |
| EP1438774A2 (en) | 2004-07-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1438774B1 (en) | Very narrow band, two chamber, high rep rate gas discharge laser system | |
| US6567450B2 (en) | Very narrow band, two chamber, high rep rate gas discharge laser system | |
| US6882674B2 (en) | Four KHz gas discharge laser system | |
| US6757316B2 (en) | Four KHz gas discharge laser | |
| EP1458066B1 (en) | Line selected F2 two chamber laser system | |
| US6798812B2 (en) | Two chamber F2 laser system with F2 pressure based line selection | |
| JP2008294477A (ja) | 超狭帯域2室式高繰返し率放電ガスレーザシステム | |
| EP1147582A4 (en) | ARF LASER WITH LOW PULSE ENERGY AND HIGH REPLAY RATE |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |