RU2004109147A - Система очень узкополосного двухкамерного газоразрядного лазера с высокой частотой следования импульсов - Google Patents
Система очень узкополосного двухкамерного газоразрядного лазера с высокой частотой следования импульсов Download PDFInfo
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- RU2004109147A RU2004109147A RU2004109147/28A RU2004109147A RU2004109147A RU 2004109147 A RU2004109147 A RU 2004109147A RU 2004109147/28 A RU2004109147/28 A RU 2004109147/28A RU 2004109147 A RU2004109147 A RU 2004109147A RU 2004109147 A RU2004109147 A RU 2004109147A
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- 239000003990 capacitor Substances 0.000 claims 15
- 239000007789 gas Substances 0.000 claims 13
- 238000007906 compression Methods 0.000 claims 12
- 230000006835 compression Effects 0.000 claims 12
- 230000005855 radiation Effects 0.000 claims 7
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 3
- 229910052731 fluorine Inorganic materials 0.000 claims 3
- 239000011737 fluorine Substances 0.000 claims 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- 230000003321 amplification Effects 0.000 claims 2
- 230000001276 controlling effect Effects 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 2
- 229910052734 helium Inorganic materials 0.000 claims 2
- 239000001307 helium Substances 0.000 claims 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 229910052754 neon Inorganic materials 0.000 claims 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 229910052786 argon Inorganic materials 0.000 claims 1
- 238000009472 formulation Methods 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 230000000977 initiatory effect Effects 0.000 claims 1
- 229910052743 krypton Inorganic materials 0.000 claims 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 claims 1
- 238000001228 spectrum Methods 0.000 claims 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
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Claims (24)
1. Система очень узкополосного двухкамерного газоразрядного лазера с высокой частотой следования импульсов, содержащая:
A) первое лазерное устройство, содержащее:
1) первую разрядную камеру, содержащую:
a) первый лазерный газ,
b) первую пару удлиненных пространственно разнесенных электродов, определяющих первую область разряда, в которой происходят разряды в первом лазерном газе, при этом каждый из них создает первый выходной импульс светового лазерного излучения,
2) первый вентилятор, обеспечивающий перемещение вышеупомянутого первого лазерного газа, находящегося в вышеупомянутой первой области разряда, достаточное для освобождения вышеупомянутой первой области разряда после каждого разряда, по существу, от всех ионов, созданных вследствие разряда, до возникновения следующего разряда при работе на частоте следования разрядов в диапазоне от 4000 разрядов в секунду и выше,
3) первую систему теплообменников, способную обеспечивать отвод тепловой энергии из вышеупомянутого первого лазерного газа,
4) модуль сужения линии излучения, обеспечивающий сужение ширины спектра первых выходных импульсов светового лазерного излучения, созданных в вышеупомянутой первой разрядной камере,
B) второе лазерное устройство, содержащее:
1) вторую разрядную камеру, содержащую:
a) второй лазерный газ,
b) вторую пару удлиненных пространственно разнесенных электродов, определяющих вторую область разряда, в которой происходят разряды во втором лазерном газе, при этом каждый из них создает второй выходной импульс светового лазерного излучения,
2) второй вентилятор, обеспечивающий перемещение вышеупомянутого второго лазерного газа, находящегося в вышеупомянутой второй области разряда, для освобождения вышеупомянутой второй области разряда после каждого разряда, по существу, от всех ионов, созданных вследствие разряда, до возникновения следующего разряда при работе на частоте следования разрядов в диапазоне от 4000 разрядов в секунду и выше,
3) вторую систему теплообменников, обеспечивающую отвод тепловой энергии из вышеупомянутого второго лазерного газа,
C) систему импульсного электропитания, обеспечивающую подачу на вышеупомянутую первую пару электродов и на вышеупомянутую вторую пару электродов электрических импульсов, для создания вышеупомянутых первого и второго выходных импульсов светового лазерного излучения с частотой, приблизительно, 4000 импульсов светового лазерного излучения в секунду с управляемой энергией импульса, содержащую
1) источник питания постоянного тока,
2) модуль первого коммутатора, содержащий:
a) первый зарядный конденсатор, электрически соединенный с вышеупомянутым источником питания постоянного тока;
b) первый переключатель, периодически переключаемый для обеспечения подачи энергии, накопленной в вышеупомянутом первом зарядном конденсаторе, в первую схему сжатия импульсов, электрически соединенную с вышеупомянутым первым зарядным конденсатором;
c) первый повышающий трансформатор напряжения с неполным витком и множеством сердечников, электрически соединенный с вышеупомянутой первой схемой сжатия импульсов;
3) модуль первой головки сжатия импульсов, содержащий:
a) вторую схему сжатия импульсов, электрически соединенную с вышеупомянутым первым повышающим трансформатором напряжения;
b) первый импульсный конденсатор, электрически соединенный с вышеупомянутой второй схемой сжатия импульсов и электрически соединенный с вышеупомянутой первой парой пространственно разнесенных электродов;
4) модуль второго коммутатора, содержащий:
a) второй зарядный конденсатор, электрически соединенный с вышеупомянутым источником питания постоянного тока;
b) второй переключатель, периодически переключаемый для обеспечения подачи энергии, накопленной в вышеупомянутом втором зарядном конденсаторе, в третью схему сжатия импульсов, электрически соединенную с вышеупомянутым вторым зарядным конденсатором;
c) второй повышающий трансформатор напряжения с неполным витком и множеством сердечников, электрически соединенный с вышеупомянутой третьей схемой сжатия импульсов;
5) модуль второй головки сжатия импульсов, содержащий:
a) четвертую схему сжатия импульсов, электрически соединенную с вышеупомянутым вторым повышающим трансформатором напряжения;
b) второй пиковый конденсатор, электрически соединенный с вышеупомянутой второй схемой сжатия импульсов и электрически соединенный с вышеупомянутой второй парой пространственно разнесенных электродов; и
D) систему измерения и управления параметрами луча лазера, обеспечивающую измерение, по меньшей мере, одного из следующих параметров: энергии импульса, длины волны или ширины спектра излучения созданных вторых выходных импульсов светового лазерного излучения, и управление параметрами вышеупомянутых вторых выходных импульсов светового лазерного излучения посредством регулятора с обратной связью.
2. Система лазера по п.1, в которой вышеупомянутое первое лазерное устройство является задающим генератором, а вышеупомянутое второе лазерное устройство является усилителем мощности.
3. Система лазера по п.2, в которой вышеупомянутый лазерный газ содержит аргон, фтор и инертный газ.
4. Система лазера по п.2, в которой вышеупомянутый лазерный газ содержит криптон, фтор и буферный газ.
5. Система лазера по п.2, в которой вышеупомянутый лазерный газ содержит фтор и буферный газ, выбранный из группы, состоящей из неона, гелия или смеси неона с гелием.
6. Система лазера по п.2, в которой в вышеупомянутом усилителе мощности обеспечивают усиление, по меньшей мере, частично за счет двукратного прохождения луча через вышеупомянутую вторую область разряда.
7. Система лазера по п.2, в которой в вышеупомянутом усилителе мощности обеспечивают усиление, по меньшей мере, частично за счет четырехкратного прохождения луча через вышеупомянутую вторую область разряда.
8. Система лазера по п.2, в которой вышеупомянутый задающий генератор содержит резонатор с двукратным прохождением луча через вышеупомянутую первую область разряда.
9. Система лазера по п.2, в котором вышеупомянутый задающий генератор содержит резонатор с двукратным прохождением луча через вышеупомянутую первую область разряда, и в которой вышеупомянутый усилитель мощности содержит тракт, обеспечивающий четырехкратное прохождение луча через вышеупомянутую вторую область разряда.
10. Система лазера по п.1, в которой вышеупомянутая система импульсного электропитания содержит электрические компоненты с водяным охлаждением.
11. Система лазера по п.10, в которой, по меньшей мере, одним из вышеупомянутых компонентов с водяным охлаждением является компонент, работающий при высоком напряжении, превышающем 12000 В.
12. Система лазера по п.11, в которой обеспечивают изоляцию высокого напряжения от напряжения "земли" посредством катушки индуктивности с водяным охлаждением.
13. Система лазера по п.1, в которой вышеупомянутый источник питания постоянного тока содержит систему резонансной зарядки, которая обеспечивает зарядку первого и второго зарядных конденсаторов до напряжения, регулируемого с высокой точностью.
14. Система лазера по п.13, в которой вышеупомянутая система резонансной зарядки содержит диодно-индуктивную цепь (De-Qing).
15. Система лазера по п.13, в которой вышеупомянутая система резонансной зарядки содержит цепь утечки.
16. Система лазера по п.13, в которой вышеупомянутая система резонансной зарядки содержит диодно-индуктивную цепь (De-Qing) и цепь утечки.
17. Система лазера по п.1, в которой вышеупомянутая система импульсного электропитания содержит систему зарядки, состоящую, по меньшей мере, из трех блоков питания, подключенных параллельно.
18. Система лазера по п.1, в которой, по существу, все компоненты расположены внутри корпуса лазера, но вышеупомянутая система содержит модуль переменного/постоянного тока, физически расположенный отдельно от вышеупомянутого корпуса.
19. Система лазера по п.1, в которой вышеупомянутая система импульсного электропитания содержит батарею зарядных конденсаторов задающего генератора и батарею зарядных конденсаторов усилителя мощности, а также устройство резонансной зарядки, выполненное с возможностью обеспечения параллельной зарядки обеих батарей зарядных конденсаторов.
20. Система лазера по п.19, в которой вышеупомянутая система импульсного электропитания содержит источник питания, выполненный с возможностью обеспечения подачи в вышеупомянутые устройства резонансной зарядки напряжения величиной, по меньшей мере, 2000 В.
21. Система лазера по п.2, которая дополнительно содержит контроллер синхронизации разряда, обеспечивающий инициирование разрядов в вышеупомянутом усилителе мощности таким образом, чтобы они возникали в интервале времени между 20 и 60 нс после разрядов в вышеупомянутом задающем генераторе.
22. Система лазера по п.2, которая дополнительно содержит контроллер разряда, запрограммированный таким образом, что при заданных условиях инициирует создание разрядов в моменты времени для избежания генерации выходных импульсов с существенной энергией.
23. Система лазера по п.22, в которой вышеупомянутый контроллер запрограммирован таким образом, что при вышеупомянутых заданных условиях инициирует создание разрядов в вышеупомянутом усилителе мощности, по меньшей мере, за 20 нс до момента возникновения разряда в вышеупомянутом задающем генераторе.
24. Система лазера по п. 1, в которой вышеупомянутая система импульсного электропитания содержит первую батарею зарядных конденсаторов и первую схему сжатия импульсов, которые обеспечивают подачу электрических импульсов на вышеупомянутую первую пару электродов, и вторую батарею зарядных конденсаторов и вторую схему сжатия импульсов, которые обеспечивают подачу электрических импульсов на вышеупомянутую вторую пару электродов, и систему резонансной зарядки, обеспечивающую параллельную зарядку вышеупомянутых первой и второй батарей зарядных конденсаторов до напряжения, регулируемого с высокой точностью.
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US10/012,002 | 2001-11-30 | ||
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EP (1) | EP1438774B1 (ru) |
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AU (1) | AU2002332801A1 (ru) |
CA (1) | CA2457869A1 (ru) |
IL (1) | IL160586A0 (ru) |
MY (1) | MY153277A (ru) |
RU (1) | RU2306649C2 (ru) |
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KR100907299B1 (ko) | 2009-07-13 |
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US7061961B2 (en) | 2006-06-13 |
KR100965770B1 (ko) | 2010-06-24 |
RU2306649C2 (ru) | 2007-09-20 |
US20060126697A1 (en) | 2006-06-15 |
US20020154668A1 (en) | 2002-10-24 |
US6985508B2 (en) | 2006-01-10 |
TW569508B (en) | 2004-01-01 |
JP2005502209A (ja) | 2005-01-20 |
EP1438774A4 (en) | 2006-03-08 |
EP1438774B1 (en) | 2010-02-24 |
JP4489801B2 (ja) | 2010-06-23 |
IL160586A0 (en) | 2004-07-25 |
US7567607B2 (en) | 2009-07-28 |
CA2457869A1 (en) | 2003-03-13 |
AU2002332801A1 (en) | 2003-03-18 |
MY153277A (en) | 2015-01-29 |
US6625191B2 (en) | 2003-09-23 |
WO2003021728A2 (en) | 2003-03-13 |
US20050271109A1 (en) | 2005-12-08 |
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