JP2005507353A5 - - Google Patents

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Publication number
JP2005507353A5
JP2005507353A5 JP2002585343A JP2002585343A JP2005507353A5 JP 2005507353 A5 JP2005507353 A5 JP 2005507353A5 JP 2002585343 A JP2002585343 A JP 2002585343A JP 2002585343 A JP2002585343 A JP 2002585343A JP 2005507353 A5 JP2005507353 A5 JP 2005507353A5
Authority
JP
Japan
Prior art keywords
porous preform
euv lithography
glass
dense
burner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002585343A
Other languages
English (en)
Japanese (ja)
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JP2005507353A (ja
Filing date
Publication date
Priority claimed from US09/844,947 external-priority patent/US8047023B2/en
Application filed filed Critical
Publication of JP2005507353A publication Critical patent/JP2005507353A/ja
Publication of JP2005507353A5 publication Critical patent/JP2005507353A5/ja
Pending legal-status Critical Current

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JP2002585343A 2001-04-27 2002-03-25 チタニアドープ溶融シリカ極紫外線リソグラフィー用ガラス基板 Pending JP2005507353A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/844,947 US8047023B2 (en) 2001-04-27 2001-04-27 Method for producing titania-doped fused silica glass
PCT/US2002/009461 WO2002088036A1 (en) 2001-04-27 2002-03-25 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass

Publications (2)

Publication Number Publication Date
JP2005507353A JP2005507353A (ja) 2005-03-17
JP2005507353A5 true JP2005507353A5 (https=) 2005-12-22

Family

ID=25294029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002585343A Pending JP2005507353A (ja) 2001-04-27 2002-03-25 チタニアドープ溶融シリカ極紫外線リソグラフィー用ガラス基板

Country Status (5)

Country Link
US (1) US8047023B2 (https=)
EP (1) EP1390309B1 (https=)
JP (1) JP2005507353A (https=)
TW (1) TW568889B (https=)
WO (1) WO2002088036A1 (https=)

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JP4219718B2 (ja) * 2003-03-28 2009-02-04 Ｈｏｙａ株式会社 Ｅｕｖマスクブランクス用ガラス基板の製造方法及びｅｕｖマスクブランクスの製造方法
JP2010275189A (ja) * 2003-04-03 2010-12-09 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP4792705B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
JP5402975B2 (ja) * 2003-04-03 2014-01-29 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
JP4792706B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP5367204B2 (ja) 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2011168485A (ja) * 2003-04-03 2011-09-01 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびその製造法
EP1471038A3 (de) * 2003-04-26 2005-11-23 Schott Ag Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas
DE10359102A1 (de) * 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung
JP4492123B2 (ja) * 2004-01-05 2010-06-30 旭硝子株式会社 シリカガラス
DE102004015766B4 (de) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat
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JP4957249B2 (ja) 2004-07-01 2012-06-20 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP4487783B2 (ja) * 2005-01-25 2010-06-23 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材
KR100651453B1 (ko) * 2005-10-21 2006-11-29 삼성전자주식회사 수트 모재의 제조 장치
TW200940472A (en) 2007-12-27 2009-10-01 Asahi Glass Co Ltd TiO2-containing silica glass
JP5365247B2 (ja) 2008-02-25 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
WO2009107858A1 (en) * 2008-02-26 2009-09-03 Asahi Glass Co., Ltd. Tio2-containing silica glass and optical member for euv lithography using high energy densities as well as special temperature controlled process for its manufacture
JP5417884B2 (ja) * 2008-02-27 2014-02-19 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
EP2250133A1 (en) * 2008-02-29 2010-11-17 Asahi Glass Company, Limited Tio2-containing silica glass and optical member for lithography using the same
JP5644058B2 (ja) * 2008-03-21 2014-12-24 旭硝子株式会社 ＴｉＯ２を含有するシリカガラス
JP2009274947A (ja) 2008-04-16 2009-11-26 Asahi Glass Co Ltd ＴｉＯ２を含有するＥＵＶリソグラフィ光学部材用シリカガラス
JP2010135732A (ja) 2008-08-01 2010-06-17 Asahi Glass Co Ltd Ｅｕｖマスクブランクス用基板
US20100124709A1 (en) * 2008-11-20 2010-05-20 Daniel Warren Hawtof Image mask assembly for photolithography
EP2377826B2 (en) † 2009-01-13 2020-05-27 AGC Inc. OPTICAL MEMBER COMPRISING SILICA GLASS CONTAINING TiO2
US8735308B2 (en) * 2009-01-13 2014-05-27 Asahi Glass Company, Limited Optical member comprising TiO2-containing silica glass
WO2010098352A1 (ja) * 2009-02-24 2010-09-02 旭硝子株式会社 多孔質石英ガラス体の製造方法およびｅｕｖリソグラフィ用光学部材
EP2468692A1 (en) 2009-08-19 2012-06-27 Asahi Glass Company, Limited Tio2-containing silicia glass, and optical member for euv lithography
DE102010039779A1 (de) * 2009-08-28 2011-03-24 Corning Inc. Glas mit geringer wärmeausdehnung für euvl-anwendungen
DE102010028488A1 (de) * 2010-05-03 2011-11-03 Carl Zeiss Smt Gmbh Substrate für Spiegel für die EUV-Lithographie und deren Herstellung
US8567214B2 (en) * 2010-06-28 2013-10-29 Asahi Glass Company, Limited Method for producing glass body and method for producing optical member for EUV lithography
KR20140012053A (ko) 2011-01-31 2014-01-29 아사히 가라스 가부시키가이샤 티타니아를 함유하는 실리카 유리체의 제조 방법 및 티타니아를 함유하는 실리카 유리체
JP5640920B2 (ja) 2011-08-18 2014-12-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
DE102012013134B4 (de) * 2012-07-03 2014-04-03 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Zylindern aus Quarzglas
US8987155B2 (en) 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
US9382150B2 (en) * 2014-03-14 2016-07-05 Corning Incorporated Boron-doped titania-silica glass having very low CTE slope
WO2016064806A1 (en) 2014-10-20 2016-04-28 Navus Automation, Inc. Fused silica furnace system & method for continuous production of fused silica
ES2706877T3 (es) 2014-11-13 2019-04-01 Gerresheimer Glas Gmbh Filtro de partículas de máquina para conformar vidrio, unidad de émbolo, cabeza de soplado, soporte de cabeza de soplado y máquina para conformar vidrio adaptada a dicho filtro o que lo comprende
US9580350B2 (en) 2014-11-19 2017-02-28 Corning Incorporated High hydroxyl TiO2-SiO2 glass
JP2017536323A (ja) 2014-11-26 2017-12-07 コーニング インコーポレイテッド 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法

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JPS57100930A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Preparation of base material for optical fiber
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JP2818349B2 (ja) * 1993-03-18 1998-10-30 信越化学工業株式会社 石英ガラス母材の製造方法
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JP2002512169A (ja) 1998-04-22 2002-04-23 コーニング・インコーポレーテッド 超低膨張シリカチタニアガラスの製造方法
EP1010672A1 (en) * 1998-12-17 2000-06-21 PIRELLI CAVI E SISTEMI S.p.A. Method and apparatus for forming an optical fiber preform by combustionless hydrolysis
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6931097B1 (en) 1999-07-22 2005-08-16 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
AU5932500A (en) 1999-07-22 2001-02-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method and mask devices
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass

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