JP2005247516A - 浮上式基板搬送処理装置 - Google Patents
浮上式基板搬送処理装置 Download PDFInfo
- Publication number
- JP2005247516A JP2005247516A JP2004061510A JP2004061510A JP2005247516A JP 2005247516 A JP2005247516 A JP 2005247516A JP 2004061510 A JP2004061510 A JP 2004061510A JP 2004061510 A JP2004061510 A JP 2004061510A JP 2005247516 A JP2005247516 A JP 2005247516A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- roller
- resist
- floating
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 150
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 238000007667 floating Methods 0.000 claims description 28
- 238000005339 levitation Methods 0.000 claims description 20
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 31
- 239000011248 coating agent Substances 0.000 description 30
- 230000032258 transport Effects 0.000 description 30
- 230000007246 mechanism Effects 0.000 description 16
- 230000007723 transport mechanism Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 7
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- 230000006837 decompression Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Landscapes
- Coating Apparatus (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Materials For Photolithography (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004061510A JP2005247516A (ja) | 2004-03-05 | 2004-03-05 | 浮上式基板搬送処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004061510A JP2005247516A (ja) | 2004-03-05 | 2004-03-05 | 浮上式基板搬送処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005247516A true JP2005247516A (ja) | 2005-09-15 |
| JP2005247516A5 JP2005247516A5 (enExample) | 2006-02-02 |
Family
ID=35028385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004061510A Pending JP2005247516A (ja) | 2004-03-05 | 2004-03-05 | 浮上式基板搬送処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005247516A (enExample) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100727001B1 (ko) | 2006-05-04 | 2007-06-14 | 주식회사 디엠에스 | 인라인 타입 코팅장치 |
| JP2007158005A (ja) * | 2005-12-05 | 2007-06-21 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
| JP2009061380A (ja) * | 2007-09-05 | 2009-03-26 | Dainippon Screen Mfg Co Ltd | 塗布装置および塗布方法 |
| JP2009061395A (ja) * | 2007-09-06 | 2009-03-26 | Tokyo Ohka Kogyo Co Ltd | 塗布装置及び塗布方法 |
| JP2009072650A (ja) * | 2007-09-19 | 2009-04-09 | Tokyo Ohka Kogyo Co Ltd | 浮上搬送塗布装置 |
| JP2010098126A (ja) * | 2008-10-16 | 2010-04-30 | Tokyo Electron Ltd | 基板搬送処理装置 |
| JP2011219250A (ja) * | 2010-04-14 | 2011-11-04 | Oiles Corp | 非接触搬送装置 |
| KR101133266B1 (ko) | 2009-11-02 | 2012-04-05 | 주식회사 나래나노텍 | 코팅 영역의 기판 이송 장치 및 이를 구비한 코팅 장치, 및 기판 이송 방법 |
| KR101202456B1 (ko) | 2010-06-24 | 2012-11-16 | 주식회사 나래나노텍 | 코팅 영역에서 기판을 안정적으로 이송시키기 위한 리니어 모션 가이드 구조, 및 이를 구비한 기판 이송 장치 및 코팅 장치 |
| JP2014133655A (ja) * | 2014-03-17 | 2014-07-24 | Oiles Ind Co Ltd | 非接触搬送装置 |
| KR20180027065A (ko) * | 2016-09-06 | 2018-03-14 | 주식회사 케이씨텍 | 기판 처리 장치 및 기판 처리 시스템 |
| CN113412535A (zh) * | 2018-09-20 | 2021-09-17 | 株式会社Nsc | 悬浮输送装置 |
-
2004
- 2004-03-05 JP JP2004061510A patent/JP2005247516A/ja active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007158005A (ja) * | 2005-12-05 | 2007-06-21 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
| KR100727001B1 (ko) | 2006-05-04 | 2007-06-14 | 주식회사 디엠에스 | 인라인 타입 코팅장치 |
| JP2009061380A (ja) * | 2007-09-05 | 2009-03-26 | Dainippon Screen Mfg Co Ltd | 塗布装置および塗布方法 |
| JP2009061395A (ja) * | 2007-09-06 | 2009-03-26 | Tokyo Ohka Kogyo Co Ltd | 塗布装置及び塗布方法 |
| JP2009072650A (ja) * | 2007-09-19 | 2009-04-09 | Tokyo Ohka Kogyo Co Ltd | 浮上搬送塗布装置 |
| JP2010098126A (ja) * | 2008-10-16 | 2010-04-30 | Tokyo Electron Ltd | 基板搬送処理装置 |
| KR101133266B1 (ko) | 2009-11-02 | 2012-04-05 | 주식회사 나래나노텍 | 코팅 영역의 기판 이송 장치 및 이를 구비한 코팅 장치, 및 기판 이송 방법 |
| JP2011219250A (ja) * | 2010-04-14 | 2011-11-04 | Oiles Corp | 非接触搬送装置 |
| KR101202456B1 (ko) | 2010-06-24 | 2012-11-16 | 주식회사 나래나노텍 | 코팅 영역에서 기판을 안정적으로 이송시키기 위한 리니어 모션 가이드 구조, 및 이를 구비한 기판 이송 장치 및 코팅 장치 |
| JP2014133655A (ja) * | 2014-03-17 | 2014-07-24 | Oiles Ind Co Ltd | 非接触搬送装置 |
| KR20180027065A (ko) * | 2016-09-06 | 2018-03-14 | 주식회사 케이씨텍 | 기판 처리 장치 및 기판 처리 시스템 |
| KR101965571B1 (ko) * | 2016-09-06 | 2019-04-04 | 주식회사 케이씨텍 | 기판 처리 장치 및 기판 처리 시스템 |
| CN113412535A (zh) * | 2018-09-20 | 2021-09-17 | 株式会社Nsc | 悬浮输送装置 |
| CN113412535B (zh) * | 2018-09-20 | 2024-06-07 | 株式会社Nsc | 悬浮输送装置 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100594584C (zh) | 基板处理装置 | |
| JP4553376B2 (ja) | 浮上式基板搬送処理装置及び浮上式基板搬送処理方法 | |
| JP4896236B2 (ja) | 基板搬送装置及び基板搬送方法 | |
| JP4884039B2 (ja) | 基板バッファ装置、基板バッファリング方法、基板処理装置、制御プログラムおよびコンピュータ読取可能な記憶媒体 | |
| JP4554397B2 (ja) | ステージ装置および塗布処理装置 | |
| JP4495752B2 (ja) | 基板処理装置及び塗布装置 | |
| JP4592787B2 (ja) | 基板処理装置 | |
| JP4876640B2 (ja) | ワーク搬送装置およびワーク搬送方法 | |
| KR101603343B1 (ko) | 기판 반송 처리 장치 | |
| JP4272230B2 (ja) | 減圧乾燥装置 | |
| JP4745040B2 (ja) | 基板搬送装置及び基板処理装置 | |
| TWI462215B (zh) | 基板處理裝置、轉換方法、及轉移方法 | |
| JP2007027495A5 (enExample) | ||
| JP3868223B2 (ja) | 搬送装置 | |
| JP2005247516A (ja) | 浮上式基板搬送処理装置 | |
| JP4743716B2 (ja) | 基板処理装置 | |
| JP2010098125A (ja) | 基板搬送装置及び基板搬送方法 | |
| WO2008032456A1 (fr) | Appareil de transfert de substrat et procédé de mise en oeuvre associé | |
| JP4638931B2 (ja) | 基板処理装置 | |
| JP4721289B2 (ja) | 基板処理装置 | |
| JP2007046859A (ja) | 減圧乾燥装置 | |
| JP5165718B2 (ja) | 基板処理装置 | |
| JP5254269B2 (ja) | 基板処理装置および移載方法 | |
| KR20160023999A (ko) | 반송 유닛, 이를 포함하는 기판 처리 장치 및 방법 | |
| JP2007250871A (ja) | 基板搬送装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051213 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20051213 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081030 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20081031 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081127 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090312 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20090629 |