JP2005235959A5 - - Google Patents

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Publication number
JP2005235959A5
JP2005235959A5 JP2004042142A JP2004042142A JP2005235959A5 JP 2005235959 A5 JP2005235959 A5 JP 2005235959A5 JP 2004042142 A JP2004042142 A JP 2004042142A JP 2004042142 A JP2004042142 A JP 2004042142A JP 2005235959 A5 JP2005235959 A5 JP 2005235959A5
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JP
Japan
Prior art keywords
laser
optical system
light
debris
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004042142A
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English (en)
Japanese (ja)
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JP2005235959A (ja
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Publication date
Application filed filed Critical
Priority to JP2004042142A priority Critical patent/JP2005235959A/ja
Priority claimed from JP2004042142A external-priority patent/JP2005235959A/ja
Priority to US11/060,198 priority patent/US7091507B2/en
Publication of JP2005235959A publication Critical patent/JP2005235959A/ja
Publication of JP2005235959A5 publication Critical patent/JP2005235959A5/ja
Pending legal-status Critical Current

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JP2004042142A 2004-02-18 2004-02-18 光発生装置及び露光装置 Pending JP2005235959A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004042142A JP2005235959A (ja) 2004-02-18 2004-02-18 光発生装置及び露光装置
US11/060,198 US7091507B2 (en) 2004-02-18 2005-02-17 Light generator and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004042142A JP2005235959A (ja) 2004-02-18 2004-02-18 光発生装置及び露光装置

Publications (2)

Publication Number Publication Date
JP2005235959A JP2005235959A (ja) 2005-09-02
JP2005235959A5 true JP2005235959A5 (enExample) 2007-04-05

Family

ID=34836448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004042142A Pending JP2005235959A (ja) 2004-02-18 2004-02-18 光発生装置及び露光装置

Country Status (2)

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US (1) US7091507B2 (enExample)
JP (1) JP2005235959A (enExample)

Families Citing this family (37)

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JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4574211B2 (ja) * 2004-04-19 2010-11-04 キヤノン株式会社 光源装置、当該光源装置を有する露光装置
JP2006167728A (ja) * 2004-12-13 2006-06-29 Yamazaki Mazak Corp レーザ加工機における集光レンズの汚れ検出方法及び装置
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
US7405417B2 (en) * 2005-12-20 2008-07-29 Asml Netherlands B.V. Lithographic apparatus having a monitoring device for detecting contamination
JP4884152B2 (ja) * 2006-09-27 2012-02-29 株式会社小松製作所 極端紫外光源装置
JP5076078B2 (ja) * 2006-10-06 2012-11-21 ギガフォトン株式会社 極端紫外光源装置
JP5076079B2 (ja) * 2006-10-18 2012-11-21 ギガフォトン株式会社 極端紫外光源装置
JP5098019B2 (ja) 2007-04-27 2012-12-12 ギガフォトン株式会社 極端紫外光源装置
JP2008277585A (ja) * 2007-04-27 2008-11-13 Canon Inc 露光装置の洗浄装置及び露光装置
CN102819196B (zh) * 2008-03-20 2016-03-09 卡尔蔡司Smt有限责任公司 用于微光刻的投射物镜
ATE536567T1 (de) * 2008-08-14 2011-12-15 Asml Netherlands Bv Strahlungsquelle und verfahren zur strahlungserzeugung
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP2010087388A (ja) * 2008-10-02 2010-04-15 Ushio Inc 露光装置
US8436328B2 (en) * 2008-12-16 2013-05-07 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5314433B2 (ja) 2009-01-06 2013-10-16 ギガフォトン株式会社 極端紫外光源装置
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
US20100192973A1 (en) * 2009-01-19 2010-08-05 Yoshifumi Ueno Extreme ultraviolet light source apparatus and cleaning method
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
JP2010205577A (ja) * 2009-03-04 2010-09-16 Ushio Inc 光源装置を点灯する方法
JP5702164B2 (ja) * 2010-03-18 2015-04-15 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法及びターゲット供給装置
JP5802410B2 (ja) * 2010-03-29 2015-10-28 ギガフォトン株式会社 極端紫外光生成装置
US9072153B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
US9072152B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a variation value formula for the intensity
US20120113513A1 (en) * 2010-10-22 2012-05-10 The Regents Of The University Of Colorado, A Body Corporate Self-cleaning of optical surfaces in low-pressure reactive gas environments in advanced optical systems
JP5641958B2 (ja) * 2011-01-31 2014-12-17 ギガフォトン株式会社 チャンバ装置およびそれを備える極端紫外光生成装置
TWI580316B (zh) * 2011-03-16 2017-04-21 Gigaphoton Inc Extreme UV light generation device
JP2013051939A (ja) * 2011-09-06 2013-03-21 Nikon Corp 照射装置、ロボット、および植物栽培プラント
WO2014095261A1 (en) * 2012-12-20 2014-06-26 Asml Netherlands B.V. Beam delivery for euv lithography
DE102013019814A1 (de) * 2012-12-20 2014-06-26 Heidelberger Druckmaschinen Ag Vorrichtung zur Temperaturüberwachung an einem LED-UV-Trockner
JP6214880B2 (ja) 2013-02-21 2017-10-18 株式会社東芝 レーザイオン源及び重粒子線治療装置
JP2013179330A (ja) * 2013-04-25 2013-09-09 Gigaphoton Inc 極端紫外光源装置
US10165664B1 (en) * 2017-11-21 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for decontaminating windows of an EUV source module
US10802405B2 (en) * 2018-07-27 2020-10-13 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source for lithography exposure process
KR102869765B1 (ko) 2019-05-17 2025-10-13 삼성전자주식회사 소스 용기용 잔류물 제거 장치, 소스 용기 및 극자외선 노광장치

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US6156030A (en) * 1997-06-04 2000-12-05 Y-Beam Technologies, Inc. Method and apparatus for high precision variable rate material removal and modification
US6320937B1 (en) * 2000-04-24 2001-11-20 Takayasu Mochizuki Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US6324256B1 (en) 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
JP2002214400A (ja) * 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
FR2823949A1 (fr) * 2001-04-18 2002-10-25 Commissariat Energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
JP4111487B2 (ja) * 2002-04-05 2008-07-02 ギガフォトン株式会社 極端紫外光源装置
JP2005141158A (ja) * 2003-11-10 2005-06-02 Canon Inc 照明光学系及び露光装置
JP4535732B2 (ja) * 2004-01-07 2010-09-01 株式会社小松製作所 光源装置及びそれを用いた露光装置
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
JP2005317611A (ja) * 2004-04-27 2005-11-10 Canon Inc 露光方法及び装置
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置

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