JP2005235959A - 光発生装置及び露光装置 - Google Patents

光発生装置及び露光装置 Download PDF

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Publication number
JP2005235959A
JP2005235959A JP2004042142A JP2004042142A JP2005235959A JP 2005235959 A JP2005235959 A JP 2005235959A JP 2004042142 A JP2004042142 A JP 2004042142A JP 2004042142 A JP2004042142 A JP 2004042142A JP 2005235959 A JP2005235959 A JP 2005235959A
Authority
JP
Japan
Prior art keywords
laser
debris
light
optical system
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004042142A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005235959A5 (enExample
Inventor
Buntaro Masaki
文太郎 正木
Akira Miyake
明 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004042142A priority Critical patent/JP2005235959A/ja
Priority to US11/060,198 priority patent/US7091507B2/en
Publication of JP2005235959A publication Critical patent/JP2005235959A/ja
Publication of JP2005235959A5 publication Critical patent/JP2005235959A5/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma Technology (AREA)
  • X-Ray Techniques (AREA)
JP2004042142A 2004-02-18 2004-02-18 光発生装置及び露光装置 Pending JP2005235959A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004042142A JP2005235959A (ja) 2004-02-18 2004-02-18 光発生装置及び露光装置
US11/060,198 US7091507B2 (en) 2004-02-18 2005-02-17 Light generator and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004042142A JP2005235959A (ja) 2004-02-18 2004-02-18 光発生装置及び露光装置

Publications (2)

Publication Number Publication Date
JP2005235959A true JP2005235959A (ja) 2005-09-02
JP2005235959A5 JP2005235959A5 (enExample) 2007-04-05

Family

ID=34836448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004042142A Pending JP2005235959A (ja) 2004-02-18 2004-02-18 光発生装置及び露光装置

Country Status (2)

Country Link
US (1) US7091507B2 (enExample)
JP (1) JP2005235959A (enExample)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007173804A (ja) * 2005-12-20 2007-07-05 Asml Netherlands Bv 汚染を検出するためのモニタデバイスを有するリソグラフィ装置
JP2008085074A (ja) * 2006-09-27 2008-04-10 Komatsu Ltd 極端紫外光源装置
JP2008097883A (ja) * 2006-10-06 2008-04-24 Komatsu Ltd 極端紫外光源装置
JP2008103151A (ja) * 2006-10-18 2008-05-01 Komatsu Ltd 極端紫外光源装置
JP2008277529A (ja) * 2007-04-27 2008-11-13 Komatsu Ltd 極端紫外光源装置の光学素子洗浄方法及び光学素子洗浄装置
JP2010045357A (ja) * 2008-08-14 2010-02-25 Asml Netherlands Bv 放射源および放射を生成する方法
JP2010087388A (ja) * 2008-10-02 2010-04-15 Ushio Inc 露光装置
JP2010186995A (ja) * 2009-01-19 2010-08-26 Komatsu Ltd 極端紫外光源装置及びクリーニング方法
JP2010205577A (ja) * 2009-03-04 2010-09-16 Ushio Inc 光源装置を点灯する方法
JP2011082473A (ja) * 2008-12-16 2011-04-21 Komatsu Ltd 極端紫外光源装置
WO2011122397A1 (ja) * 2010-03-29 2011-10-06 ギガフォトン株式会社 極端紫外光生成装置
US8173984B2 (en) 2009-01-06 2012-05-08 Komatsu Ltd. Extreme ultraviolet light source apparatus
JP2012160565A (ja) * 2011-01-31 2012-08-23 Komatsu Ltd チャンバ装置およびそれを備える極端紫外光生成装置
JP2013051939A (ja) * 2011-09-06 2013-03-21 Nikon Corp 照射装置、ロボット、および植物栽培プラント
JP2013179330A (ja) * 2013-04-25 2013-09-09 Gigaphoton Inc 極端紫外光源装置
JP2014121876A (ja) * 2012-12-20 2014-07-03 Heiderberger Druckmaschinen Ag Ｌｅｄ・ｕｖ乾燥機の温度を監視する装置
US8901524B2 (en) 2009-02-12 2014-12-02 Gigaphoton Inc. Extreme ultraviolet light source apparatus
US9072153B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
US9072152B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a variation value formula for the intensity
TWI580316B (zh) * 2011-03-16 2017-04-21 Gigaphoton Inc Extreme UV light generation device

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4574211B2 (ja) * 2004-04-19 2010-11-04 キヤノン株式会社 光源装置、当該光源装置を有する露光装置
JP2006167728A (ja) * 2004-12-13 2006-06-29 Yamazaki Mazak Corp レーザ加工機における集光レンズの汚れ検出方法及び装置
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
JP2008277585A (ja) * 2007-04-27 2008-11-13 Canon Inc 露光装置の洗浄装置及び露光装置
CN102819196B (zh) * 2008-03-20 2016-03-09 卡尔蔡司Smt有限责任公司 用于微光刻的投射物镜
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
JP5702164B2 (ja) * 2010-03-18 2015-04-15 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法及びターゲット供給装置
US20120113513A1 (en) * 2010-10-22 2012-05-10 The Regents Of The University Of Colorado, A Body Corporate Self-cleaning of optical surfaces in low-pressure reactive gas environments in advanced optical systems
WO2014095261A1 (en) * 2012-12-20 2014-06-26 Asml Netherlands B.V. Beam delivery for euv lithography
JP6214880B2 (ja) 2013-02-21 2017-10-18 株式会社東芝 レーザイオン源及び重粒子線治療装置
US10165664B1 (en) * 2017-11-21 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for decontaminating windows of an EUV source module
US10802405B2 (en) * 2018-07-27 2020-10-13 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source for lithography exposure process
KR102869765B1 (ko) 2019-05-17 2025-10-13 삼성전자주식회사 소스 용기용 잔류물 제거 장치, 소스 용기 및 극자외선 노광장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9308981D0 (en) * 1993-04-30 1993-06-16 Science And Engineering Resear Laser-excited x-ray source
CA2137632A1 (en) * 1993-12-17 1995-06-18 Douglas S. Dunn Ablative flashlamp imaging
US6156030A (en) * 1997-06-04 2000-12-05 Y-Beam Technologies, Inc. Method and apparatus for high precision variable rate material removal and modification
US6320937B1 (en) * 2000-04-24 2001-11-20 Takayasu Mochizuki Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US6324256B1 (en) 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
JP2002214400A (ja) * 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
FR2823949A1 (fr) * 2001-04-18 2002-10-25 Commissariat Energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
JP4111487B2 (ja) * 2002-04-05 2008-07-02 ギガフォトン株式会社 極端紫外光源装置
JP2005141158A (ja) * 2003-11-10 2005-06-02 Canon Inc 照明光学系及び露光装置
JP4535732B2 (ja) * 2004-01-07 2010-09-01 株式会社小松製作所 光源装置及びそれを用いた露光装置
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
JP2005317611A (ja) * 2004-04-27 2005-11-10 Canon Inc 露光方法及び装置
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007173804A (ja) * 2005-12-20 2007-07-05 Asml Netherlands Bv 汚染を検出するためのモニタデバイスを有するリソグラフィ装置
JP2008085074A (ja) * 2006-09-27 2008-04-10 Komatsu Ltd 極端紫外光源装置
JP2008097883A (ja) * 2006-10-06 2008-04-24 Komatsu Ltd 極端紫外光源装置
JP2008103151A (ja) * 2006-10-18 2008-05-01 Komatsu Ltd 極端紫外光源装置
JP2008277529A (ja) * 2007-04-27 2008-11-13 Komatsu Ltd 極端紫外光源装置の光学素子洗浄方法及び光学素子洗浄装置
US8256441B2 (en) 2007-04-27 2012-09-04 Gigaphoton Inc. Method for cleaning optical element of EUV light source device and optical element cleaning device
JP2010045357A (ja) * 2008-08-14 2010-02-25 Asml Netherlands Bv 放射源および放射を生成する方法
JP2010087388A (ja) * 2008-10-02 2010-04-15 Ushio Inc 露光装置
JP2011082473A (ja) * 2008-12-16 2011-04-21 Komatsu Ltd 極端紫外光源装置
US8173984B2 (en) 2009-01-06 2012-05-08 Komatsu Ltd. Extreme ultraviolet light source apparatus
US8294129B2 (en) 2009-01-06 2012-10-23 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP2010186995A (ja) * 2009-01-19 2010-08-26 Komatsu Ltd 極端紫外光源装置及びクリーニング方法
US8901524B2 (en) 2009-02-12 2014-12-02 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP2010205577A (ja) * 2009-03-04 2010-09-16 Ushio Inc 光源装置を点灯する方法
WO2011122397A1 (ja) * 2010-03-29 2011-10-06 ギガフォトン株式会社 極端紫外光生成装置
US9072153B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
US9072152B2 (en) 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a variation value formula for the intensity
US9402297B2 (en) 2010-03-29 2016-07-26 Gigaphoton Inc. Extreme ultraviolet light generation system
JP2012160565A (ja) * 2011-01-31 2012-08-23 Komatsu Ltd チャンバ装置およびそれを備える極端紫外光生成装置
TWI580316B (zh) * 2011-03-16 2017-04-21 Gigaphoton Inc Extreme UV light generation device
JP2013051939A (ja) * 2011-09-06 2013-03-21 Nikon Corp 照射装置、ロボット、および植物栽培プラント
JP2014121876A (ja) * 2012-12-20 2014-07-03 Heiderberger Druckmaschinen Ag Ｌｅｄ・ｕｖ乾燥機の温度を監視する装置
JP2013179330A (ja) * 2013-04-25 2013-09-09 Gigaphoton Inc 極端紫外光源装置

Also Published As

Publication number Publication date
US20050178979A1 (en) 2005-08-18
US7091507B2 (en) 2006-08-15

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