JP2005191508A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JP2005191508A JP2005191508A JP2004017752A JP2004017752A JP2005191508A JP 2005191508 A JP2005191508 A JP 2005191508A JP 2004017752 A JP2004017752 A JP 2004017752A JP 2004017752 A JP2004017752 A JP 2004017752A JP 2005191508 A JP2005191508 A JP 2005191508A
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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Abstract
【解決手段】半導体基板1と、半導体基板1の一方表面に形成された突起電極2または配線の少なくとも一方を有するとともに、半導体基板1の一方表面に形成された第1樹脂膜3と半導体基板1の他方表面に形成された第2樹脂膜4とを有し、第2樹脂膜4が、半導体基板1の他方表面への衝撃を吸収する程度に低弾性であること及び半導体基板の厚みよりも薄いことを特徴とする。
【選択図】 図1
Description
2 突起電極
3 第1樹脂膜
4 第2樹脂膜
5 半導体チップ
Claims (7)
- 半導体基板と、該半導体基板の一方表面に形成された突起電極または配線の少なくとも一方を有するとともに、前記半導体基板の一方表面に形成された第1樹脂膜と前記半導体基板の他方表面に形成された第2樹脂膜とを有し、該第2樹脂膜が、前記半導体基板の他方表面への衝撃を吸収する程度に低弾性であること及び半導体基板の厚みよりも薄いことを特徴とする半導体装置。
- 半導体基板と、該半導体基板の一方表面に形成された突起電極または配線の少なくとも一方を有するとともに、前記半導体基板の一方表面に形成された第1樹脂膜と前記半導体基板の他方表面に形成された第2樹脂膜とを有し、該第2樹脂膜の弾性率が15GPS以下であることを特徴とする半導体装置。
- 前記第2樹脂膜の厚みが第1樹脂膜の厚みよりも薄いことを特徴とする請求項1または請求項2に記載の半導体装置。
- 前記第2樹脂膜の厚みが30μm以下であることを特徴とする請求項1乃至請求項3記載の半導体装置。
- 前記第2樹脂膜は前記半導体基板表面のマーキングを確認できる程度に透光性を有することを特徴とする請求項1乃至請求項4記載の半導体装置。
- 前記第1樹脂膜の厚みが50μm以上であることを特徴とする請求項1乃至請求項5記載の半導体装置。
- 半導体基板の一方表面に突起電極または配線のうち少なくとも一方を形成する工程と、前記半導体基板の一方表面に前記半導体基板との物理的変形に耐える程度に低弾性である第1樹脂膜を形成する工程と、前記半導体基板の他方表面を研磨または研削、または及び化学エッチングすることによって前記半導体基板を薄くする薄型化工程と、該薄型化工程の後に第1樹脂膜と同等に低弾性であり且つ第1樹脂膜の厚みよりも薄い第2樹脂膜を前記半導体基板の他方表面に形成する工程と、第2樹脂膜形成後に前記半導体基板を個片に切り出す工程と、を含むことを特徴とする半導体装置の製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004017752A JP2005191508A (ja) | 2003-12-05 | 2004-01-27 | 半導体装置およびその製造方法 |
TW093137304A TWI353013B (en) | 2003-12-05 | 2004-12-03 | Semiconductor device and the manufacturing method |
CNB2004100980241A CN100517590C (zh) | 2003-12-05 | 2004-12-03 | 半导体装置及其制造方法 |
US11/004,291 US7345368B2 (en) | 2003-12-05 | 2004-12-03 | Semiconductor device and the manufacturing method for the same |
KR1020040101675A KR20050054864A (ko) | 2003-12-05 | 2004-12-06 | 반도체 장치 및 그 제조 방법 |
US11/900,800 US20080014719A1 (en) | 2003-12-05 | 2007-09-13 | Semiconductor device and manufacturing method for the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003406703 | 2003-12-05 | ||
JP2004017752A JP2005191508A (ja) | 2003-12-05 | 2004-01-27 | 半導体装置およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
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JP2005191508A true JP2005191508A (ja) | 2005-07-14 |
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ID=34797621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2004017752A Pending JP2005191508A (ja) | 2003-12-05 | 2004-01-27 | 半導体装置およびその製造方法 |
Country Status (5)
Country | Link |
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US (2) | US7345368B2 (ja) |
JP (1) | JP2005191508A (ja) |
KR (1) | KR20050054864A (ja) |
CN (1) | CN100517590C (ja) |
TW (1) | TWI353013B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016072316A (ja) * | 2014-09-29 | 2016-05-09 | 日立オートモティブシステムズ株式会社 | 半導体装置の製造方法 |
JPWO2016189986A1 (ja) * | 2015-05-25 | 2018-03-15 | リンテック株式会社 | 半導体装置の製造方法 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8535379B2 (en) | 2006-04-04 | 2013-09-17 | Nathan C. Moskowitz | Artificial cervical and lumbar discs, disc plate insertion gun for performing sequential single plate intervertebral implantation enabling symmetric bi-disc plate alignment for interplate mobile core placement |
US11806244B2 (en) | 2004-05-13 | 2023-11-07 | Moskowitz Family Llc | Artificial cervical and lumbar disc system |
US7854766B2 (en) | 2004-05-13 | 2010-12-21 | Moskowitz Nathan C | Artificial total lumbar disc for unilateral safe and simple posterior placement in the lumbar spine, and removable bifunctional screw which drives vertical sliding expansile plate expansion, and interplate widening, and angled traction spikes |
KR20080031192A (ko) | 2005-06-29 | 2008-04-08 | 로무 가부시키가이샤 | 반도체 장치 및 반도체 장치 집합체 |
KR100660868B1 (ko) * | 2005-07-06 | 2006-12-26 | 삼성전자주식회사 | 칩의 배면이 몰딩된 반도체 패키지 및 그의 제조방법 |
US7388297B2 (en) * | 2005-08-26 | 2008-06-17 | Oki Electric Industry Co., Ltd. | Semiconductor device with reduced thickness of the semiconductor substrate |
US20070246820A1 (en) * | 2006-04-19 | 2007-10-25 | Tessera, Inc. | Die protection process |
EP2723276B1 (en) * | 2011-06-17 | 2017-08-09 | Globus Medical, Inc. | Expandable spinal implant and flexible driver |
JP2014225598A (ja) * | 2013-05-17 | 2014-12-04 | 富士通株式会社 | 半導体装置の製造方法及び半導体装置 |
TWI524437B (zh) * | 2013-11-06 | 2016-03-01 | 矽品精密工業股份有限公司 | 半導體封裝件之製法 |
US10163709B2 (en) * | 2015-02-13 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method |
JP2016174102A (ja) * | 2015-03-17 | 2016-09-29 | 株式会社東芝 | 半導体製造方法および積層体 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
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US5229646A (en) * | 1989-01-13 | 1993-07-20 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device with a copper wires ball bonded to aluminum electrodes |
JP3189799B2 (ja) | 1991-08-23 | 2001-07-16 | ソニー株式会社 | 半導体装置の製造方法 |
JP2833996B2 (ja) * | 1994-05-25 | 1998-12-09 | 日本電気株式会社 | フレキシブルフィルム及びこれを有する半導体装置 |
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JP2000311921A (ja) * | 1999-04-27 | 2000-11-07 | Sony Corp | 半導体装置およびその製造方法 |
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JP2001144204A (ja) * | 1999-11-16 | 2001-05-25 | Nec Corp | 半導体装置及びその製造方法 |
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JP3717899B2 (ja) * | 2002-04-01 | 2005-11-16 | Necエレクトロニクス株式会社 | 半導体装置及びその製造方法 |
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2004
- 2004-01-27 JP JP2004017752A patent/JP2005191508A/ja active Pending
- 2004-12-03 US US11/004,291 patent/US7345368B2/en not_active Expired - Fee Related
- 2004-12-03 CN CNB2004100980241A patent/CN100517590C/zh not_active Expired - Fee Related
- 2004-12-03 TW TW093137304A patent/TWI353013B/zh active
- 2004-12-06 KR KR1020040101675A patent/KR20050054864A/ko not_active Application Discontinuation
-
2007
- 2007-09-13 US US11/900,800 patent/US20080014719A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016072316A (ja) * | 2014-09-29 | 2016-05-09 | 日立オートモティブシステムズ株式会社 | 半導体装置の製造方法 |
JPWO2016189986A1 (ja) * | 2015-05-25 | 2018-03-15 | リンテック株式会社 | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20060273434A1 (en) | 2006-12-07 |
CN100517590C (zh) | 2009-07-22 |
TW200529311A (en) | 2005-09-01 |
US20080014719A1 (en) | 2008-01-17 |
US7345368B2 (en) | 2008-03-18 |
KR20050054864A (ko) | 2005-06-10 |
CN1624879A (zh) | 2005-06-08 |
TWI353013B (en) | 2011-11-21 |
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