JP2005183905A - 窒化物半導体の製造方法とこれを利用した窒化物半導体 - Google Patents
窒化物半導体の製造方法とこれを利用した窒化物半導体 Download PDFInfo
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Abstract
【解決手段】本発明により、サファイア基板102に自己組織化金属層を形成する。上記自己組織化金属層を有するサファイア基板102を加熱し、該サファイア基板102の表面を不規則に露出させるよう自己組織化金属を凝結させる。上記自己組織化金属凝結体(cluster)をマスクとして上記サファイア基板102の露出した部分をプラズマでエッチングする。上記自己組織化金属の凝結体をウェットエッチングで除去する。本発明はナノ寸法の凹凸構造をサファイア基板102の表面に形成し、サファイア基板102と窒化物半導体層間112〜118の量子効率を増大させながら、これら同士のストレスとそれに伴う転位を減少させることができる。
【選択図】図7
Description
また、サファイア基板の表面にナノ寸法の凹凸構造が形成されると、光の全反射条件を改善し量子効率を増大させる。
さらに、先述したナノ寸法の凹凸構造はサファイア基板の表面とGaN層との格子定数の相違によるこれら同士のストレス及びそれによる転位もやはり減少させることができる。そうすると、上記窒化物半導体及びこれを用いたLEDの信頼性を大幅に改善させることができる。
先ず、適宜な寸法のサファイア基板(102)を用意して所望の作業を行える反応機内に装着する。次いで、上記サファイア基板(102)の表面に自己組織化金属(self−organized metal)を塗布して図1に示したように予め定められた厚さの金属層(104)を形成する。
先述した(イ)段階から得た構造、即ち上記自己組織化金属層(104)が形成されたサファイア基板(102)を予め定められた条件で加熱する。本加熱段階は反応機内の窒素雰囲気において500ないし1000℃の区間で約2ないし10分間行われ、好ましくは窒素雰囲気において700ないし1000℃の区間で約7ないし10分間行われる。
次いで、先述した(ロ)段階から得た構造、即ち表面に自己組織化金属の凝結体(106)が形成された上記サファイア基板(102)を図3に示したようにプラズマでエッチングする。
次いでウェットエッチング段階を行いサファイア基板(102)の表面に残っている自己組織化金属の凝結体(106)を除去する。本ウェットエッチング段階は、上記プラズマエッチングされたサファイア基板を王水(aqua regia)に浸し約80ないし90℃において約30秒ないし2分間加熱して行う。王水は濃塩酸(HCl)と濃硝酸(HNO3)との混合溶液で、その混合比は3:1が好ましい。
このように気孔(108)と突起(110)の凹凸構造が形成されたサファイア基板(102)に、図6に示したように窒化物、具体的には窒化ガリウム(GaN)から成る核生成層(112)を形成する。GaN核生成層(112)は通常0.1μm以下の厚さで形成する。
108 気孔
110 突起
112 GaN核生成層
114 n型GaN層
116 活性層
118 p型GaN層
Claims (21)
- 窒化物半導体の製造方法において、
(イ)サファイア基板に自己組織化金属層を形成する段階と、
(ロ)上記自己組織化金属層を有するサファイア基板を加熱し、上記サファイア基板の表面を不規則に露出させるよう自己組織化金属を凝結させナノ寸法の金属凝結体(cluster)を形成する段階と、
(ハ)上記自己組織化金属凝結体(cluster)をマスクとして上記サファイア基板の露出した部分をプラズマでエッチングしてナノ寸法の凹凸構造をサファイア基板の表面に形成する段階と、
(ニ)上記自己組織化金属凝結体をウェットエッチングにより除去する段階と、
を有することを特徴とする窒化物半導体の製造方法。 - 上記(イ)の金属層の形成段階において、上記金属層は約10ないし200nmの厚さで形成されることを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(イ)の金属層の形成段階において、上記金属層は約30ないし100nmの厚さで形成されることを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(イ)の金属層の形成段階は気相蒸着により上記金属層を形成することを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記気相蒸着は電子ビーム蒸着方式を用いてフィラメントと電子ビームポケット内側のルツボ間の5kVの電圧及び2mAの放出電流において5ないし10分間行われることを特徴とする請求項4に記載の窒化物半導体の製造方法。
- 上記自己組織化金属はPt、Au、Cr及びその合金を含むグループのうち、少なくとも一種であることを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(ロ)の自己組織化金属の凝結段階は窒素雰囲気において500ないし1000℃の区間で約2ないし10分間行われることを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(ロ)の自己組織化金属の凝結段階は窒素雰囲気において700ないし1000℃の区間で約7ないし10分間行われることを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(ハ)のプラズマエッチング段階はICP−RIE(Inductive Coupled Plasma−Reactive Ion Etching)を用いることを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記ICP−RIEは臭化水素(HBr)または三塩化硼素(BCl3)を1分当たり1ないし200ccの流量で注入させながら、50ないし100Wの高周波電力、1ないし10mmTorrの圧力、及び100ないし300VのDCバイアスで常温ないし100℃において約5ないし20間行われることを特徴とする請求項9に記載の窒化物半導体の製造方法。
- 上記(ハ)のプラズマエッチング段階は上記サファイア基板表面の露出した部分に直径50ないし500nmで深さ3ないし50nmの不規則な気孔(pore)を形成することを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(ハ)のプラズマエッチング段階は上記サファイア基板表面の露出した部分に直径50ないし500nmで深さ5ないし20nmの不規則な気孔を形成することを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(ニ)のウェットエッチング段階は上記エッチングされたサファイア基板を王水に浸し、約80ないし90℃において約30秒ないし2分間加熱することを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記(ニ)のウェットエッチング段階以降に、上記サファイア基板の上面に窒化物層を形成する段階をさらに有することを特徴とする請求項1に記載の窒化物半導体の製造方法。
- 上記サファイア基板を炭化珪素(SiC)基板、酸化物基板、及び炭化物基板のうち、いずれかで代替することを特徴とする請求項1に記載の窒化物半導体の製造方法。
- サファイア基板と該基板の上面に順次に形成された窒化物核生成層、n型GaN層、活性層、及びp型GaN層を含む窒化物半導体において、
上記サファイア基板の上面に請求項1に記載の方法により形成されたナノ寸法の凹凸構造をさらに有することを特徴とする窒化物半導体。 - 上記凹凸構造は直径50ないし500nmで深さ3ないし50nmの不規則な気孔(pore)を有することを特徴とする請求項16記載の窒化物半導体。
- 上記凹凸構造は直径50ないし500nmで深さ5ないし20nmの不規則な気孔を有することを特徴とする請求項16に記載の窒化物半導体。
- 上記サファイア基板は炭化珪素(SiC)基板、酸化物基板、及び炭化物基板のうち、いずれかで代替されることを特徴とする請求項16に記載の窒化物半導体。
- 発光ダイオード用窒化物半導体において、
サファイア基板と、
上記基板の上面に順次に形成された窒化物核生成層、n型GaN層、活性層、及びp型GaN層と、
直径50ないし500nmで深さ3ないし50nmの不規則な気孔(pore)を有し上記サファイア基板の上面に形成された凹凸構造と、
を有することを特徴とする窒化物半導体。 - 上記気孔は直径50ないし500nmで深さ5ないし20nmであることを特徴とする請求項20に記載の窒化物半導体。
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KR20050062280A (ko) | 2005-06-23 |
US6844569B1 (en) | 2005-01-18 |
KR100576854B1 (ko) | 2006-05-10 |
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