JP2005175187A5 - - Google Patents

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Publication number
JP2005175187A5
JP2005175187A5 JP2003412776A JP2003412776A JP2005175187A5 JP 2005175187 A5 JP2005175187 A5 JP 2005175187A5 JP 2003412776 A JP2003412776 A JP 2003412776A JP 2003412776 A JP2003412776 A JP 2003412776A JP 2005175187 A5 JP2005175187 A5 JP 2005175187A5
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JP
Japan
Prior art keywords
exposure apparatus
refrigerant
light
temperature
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003412776A
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English (en)
Japanese (ja)
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JP2005175187A (ja
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Publication date
Application filed filed Critical
Priority to JP2003412776A priority Critical patent/JP2005175187A/ja
Priority claimed from JP2003412776A external-priority patent/JP2005175187A/ja
Priority to US11/006,759 priority patent/US20050128446A1/en
Publication of JP2005175187A publication Critical patent/JP2005175187A/ja
Publication of JP2005175187A5 publication Critical patent/JP2005175187A5/ja
Pending legal-status Critical Current

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JP2003412776A 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス Pending JP2005175187A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003412776A JP2005175187A (ja) 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
US11/006,759 US20050128446A1 (en) 2003-12-11 2004-12-08 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003412776A JP2005175187A (ja) 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス

Publications (2)

Publication Number Publication Date
JP2005175187A JP2005175187A (ja) 2005-06-30
JP2005175187A5 true JP2005175187A5 (cg-RX-API-DMAC7.html) 2007-04-26

Family

ID=34650484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003412776A Pending JP2005175187A (ja) 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス

Country Status (2)

Country Link
US (1) US20050128446A1 (cg-RX-API-DMAC7.html)
JP (1) JP2005175187A (cg-RX-API-DMAC7.html)

Families Citing this family (19)

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Publication number Priority date Publication date Assignee Title
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US8052289B2 (en) * 2006-06-07 2011-11-08 Asml Netherlands B.V. Mirror array for lithography
JP2009192569A (ja) * 2008-02-12 2009-08-27 Canon Inc 露光装置およびデバイス製造方法
DE102009045193A1 (de) 2009-09-30 2011-04-14 Carl Zeiss Smt Gmbh Optische Anordnung in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
US8153994B2 (en) * 2009-12-02 2012-04-10 Media Lario S.R.L. Cooling systems and methods for grazing incidence EUV lightography collectors
DE102011010462A1 (de) 2011-01-28 2012-08-02 Carl Zeiss Laser Optics Gmbh Optische Anordnung für eine EUV-Projektionsbelichtungsanlage sowie Verfahren zum Kühlen eines optischen Bauelements
JP5708310B2 (ja) * 2011-07-01 2015-04-30 東京エレクトロン株式会社 基板処理装置
DE102014219770A1 (de) * 2014-09-30 2016-03-31 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung
NL2015584A (en) * 2014-10-28 2016-08-31 Asml Netherlands Bv A component for a lithography tool, a lithography apparatus, an inspection tool and a method of manufacturing a device.
JP6798137B2 (ja) * 2016-04-28 2020-12-09 岩崎電気株式会社 光源ユニット
KR102678312B1 (ko) 2018-10-18 2024-06-25 삼성전자주식회사 Euv 노광 장치와 노광 방법, 및 그 노광 방법을 포함한 반도체 소자 제조 방법
JP7008055B2 (ja) * 2019-07-12 2022-01-25 浜松ホトニクス株式会社 レーザ媒質ユニット及びレーザ光増幅装置
DE102019219231A1 (de) * 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102020206697B4 (de) * 2020-05-28 2025-05-22 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Temperieren von Elementen in mikrolithographischen Projektionsbelichtungsanlagen
WO2022028710A1 (en) * 2020-08-07 2022-02-10 Carl Zeiss Smt Gmbh Optical system and method of operating an optical system
EP4063955A1 (en) * 2021-03-25 2022-09-28 ASML Netherlands B.V. Lithographic apparatus and method for illumination uniformity correction

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US5209291A (en) * 1991-06-28 1993-05-11 Hughes Aircraft Company Cooling apparatus for optical devices
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JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
JP4006251B2 (ja) * 2002-03-20 2007-11-14 キヤノン株式会社 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
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JP2004029314A (ja) * 2002-06-25 2004-01-29 Nikon Corp 光学素子冷却装置、光学素子冷却方法及び露光装置
US20040051984A1 (en) * 2002-06-25 2004-03-18 Nikon Corporation Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments
EP1387054B1 (en) * 2002-07-31 2012-07-25 Canon Kabushiki Kaisha Cooling apparatus for an optical element, exposure apparatus comprising said cooling apparatus, and device fabrication method
JP4666908B2 (ja) * 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法

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