JP2005175187A - 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス - Google Patents

光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス Download PDF

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Publication number
JP2005175187A
JP2005175187A JP2003412776A JP2003412776A JP2005175187A JP 2005175187 A JP2005175187 A JP 2005175187A JP 2003412776 A JP2003412776 A JP 2003412776A JP 2003412776 A JP2003412776 A JP 2003412776A JP 2005175187 A JP2005175187 A JP 2005175187A
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JP
Japan
Prior art keywords
optical member
mirror
illumination light
exposure apparatus
cooling
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Pending
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JP2003412776A
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English (en)
Japanese (ja)
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JP2005175187A5 (cg-RX-API-DMAC7.html
Inventor
Giichi Miyajima
義一 宮島
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003412776A priority Critical patent/JP2005175187A/ja
Priority to US11/006,759 priority patent/US20050128446A1/en
Publication of JP2005175187A publication Critical patent/JP2005175187A/ja
Publication of JP2005175187A5 publication Critical patent/JP2005175187A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2003412776A 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス Pending JP2005175187A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003412776A JP2005175187A (ja) 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
US11/006,759 US20050128446A1 (en) 2003-12-11 2004-12-08 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003412776A JP2005175187A (ja) 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス

Publications (2)

Publication Number Publication Date
JP2005175187A true JP2005175187A (ja) 2005-06-30
JP2005175187A5 JP2005175187A5 (cg-RX-API-DMAC7.html) 2007-04-26

Family

ID=34650484

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JP2003412776A Pending JP2005175187A (ja) 2003-12-11 2003-12-11 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス

Country Status (2)

Country Link
US (1) US20050128446A1 (cg-RX-API-DMAC7.html)
JP (1) JP2005175187A (cg-RX-API-DMAC7.html)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007335859A (ja) * 2006-06-07 2007-12-27 Asml Netherlands Bv リソグラフィ用ミラーアレイ
JP2009192569A (ja) * 2008-02-12 2009-08-27 Canon Inc 露光装置およびデバイス製造方法
JP2011139043A (ja) * 2009-12-02 2011-07-14 Media Lario Srl 斜入射ｅｕｖリソグラフィ集光器用の冷却システム及び冷却方法
JP2013016595A (ja) * 2011-07-01 2013-01-24 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP2013506279A (ja) * 2009-09-30 2013-02-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学システムの、特にマイクロリソグラフィ投影露光装置の光学構成体
JP2017199882A (ja) * 2016-04-28 2017-11-02 岩崎電気株式会社 光源ユニット
JP2017535801A (ja) * 2014-09-30 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー機構及びミラー機構から熱流を放散する方法
JP2019197909A (ja) * 2019-07-12 2019-11-14 浜松ホトニクス株式会社 レーザ媒質、レーザ媒質ユニット及びレーザ光増幅装置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
DE102011010462A1 (de) 2011-01-28 2012-08-02 Carl Zeiss Laser Optics Gmbh Optische Anordnung für eine EUV-Projektionsbelichtungsanlage sowie Verfahren zum Kühlen eines optischen Bauelements
NL2015584A (en) * 2014-10-28 2016-08-31 Asml Netherlands Bv A component for a lithography tool, a lithography apparatus, an inspection tool and a method of manufacturing a device.
KR102678312B1 (ko) 2018-10-18 2024-06-25 삼성전자주식회사 Euv 노광 장치와 노광 방법, 및 그 노광 방법을 포함한 반도체 소자 제조 방법
DE102019219231A1 (de) * 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102020206697B4 (de) * 2020-05-28 2025-05-22 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Temperieren von Elementen in mikrolithographischen Projektionsbelichtungsanlagen
WO2022028710A1 (en) * 2020-08-07 2022-02-10 Carl Zeiss Smt Gmbh Optical system and method of operating an optical system
EP4063955A1 (en) * 2021-03-25 2022-09-28 ASML Netherlands B.V. Lithographic apparatus and method for illumination uniformity correction

Citations (7)

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JPH0422958A (ja) * 1990-05-18 1992-01-27 Orc Mfg Co Ltd 露光装置用冷却構造
JP2001013297A (ja) * 1999-06-30 2001-01-19 Nikon Corp 反射光学素子および露光装置
JP2002318334A (ja) * 2001-04-24 2002-10-31 Nikon Corp 反射鏡の保持方法、反射鏡及び露光装置
JP2003068626A (ja) * 2001-08-29 2003-03-07 Canon Inc 露光装置内ユニットの輻射冷却方法及び輻射冷却装置
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
JP2003282398A (ja) * 2002-03-20 2003-10-03 Canon Inc ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
JP2004029314A (ja) * 2002-06-25 2004-01-29 Nikon Corp 光学素子冷却装置、光学素子冷却方法及び露光装置

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US4743104A (en) * 1986-10-14 1988-05-10 The United States Of America As Represented By The Secretary Of The Air Force Variable area manifolds for ring mirror heat exchangers
US4844603A (en) * 1987-12-24 1989-07-04 United Technologies Corporation Cooled flexible mirror arrangement
US5004319A (en) * 1988-12-29 1991-04-02 The United States Of America As Represented By The Department Of Energy Crystal diffraction lens with variable focal length
US5209291A (en) * 1991-06-28 1993-05-11 Hughes Aircraft Company Cooling apparatus for optical devices
JPH06331812A (ja) * 1993-05-18 1994-12-02 Ekuesutorian:Kk 冷却反射鏡装置
US6091494A (en) * 1999-05-25 2000-07-18 Venturedyne, Ltd. Particle sensor with cooled light trap and related method
US20050099611A1 (en) * 2002-06-20 2005-05-12 Nikon Corporation Minimizing thermal distortion effects on EUV mirror
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system
US20040051984A1 (en) * 2002-06-25 2004-03-18 Nikon Corporation Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments
EP1387054B1 (en) * 2002-07-31 2012-07-25 Canon Kabushiki Kaisha Cooling apparatus for an optical element, exposure apparatus comprising said cooling apparatus, and device fabrication method
JP4666908B2 (ja) * 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422958A (ja) * 1990-05-18 1992-01-27 Orc Mfg Co Ltd 露光装置用冷却構造
JP2001013297A (ja) * 1999-06-30 2001-01-19 Nikon Corp 反射光学素子および露光装置
JP2002318334A (ja) * 2001-04-24 2002-10-31 Nikon Corp 反射鏡の保持方法、反射鏡及び露光装置
JP2003068626A (ja) * 2001-08-29 2003-03-07 Canon Inc 露光装置内ユニットの輻射冷却方法及び輻射冷却装置
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
JP2003282398A (ja) * 2002-03-20 2003-10-03 Canon Inc ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
JP2004029314A (ja) * 2002-06-25 2004-01-29 Nikon Corp 光学素子冷却装置、光学素子冷却方法及び露光装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007335859A (ja) * 2006-06-07 2007-12-27 Asml Netherlands Bv リソグラフィ用ミラーアレイ
JP2009192569A (ja) * 2008-02-12 2009-08-27 Canon Inc 露光装置およびデバイス製造方法
JP2013506279A (ja) * 2009-09-30 2013-02-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学システムの、特にマイクロリソグラフィ投影露光装置の光学構成体
US9134504B2 (en) 2009-09-30 2015-09-15 Carl Zeiss Smt Gmbh Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
US9639007B2 (en) 2009-09-30 2017-05-02 Carl Zeiss Smt Gmbh Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
JP2011139043A (ja) * 2009-12-02 2011-07-14 Media Lario Srl 斜入射ｅｕｖリソグラフィ集光器用の冷却システム及び冷却方法
JP2013016595A (ja) * 2011-07-01 2013-01-24 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP2017535801A (ja) * 2014-09-30 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー機構及びミラー機構から熱流を放散する方法
US10663873B2 (en) 2014-09-30 2020-05-26 Carl Zeiss Smt Gmbh Mirror arrangement for microlithographic projection exposure apparatus and related method
JP2017199882A (ja) * 2016-04-28 2017-11-02 岩崎電気株式会社 光源ユニット
JP2019197909A (ja) * 2019-07-12 2019-11-14 浜松ホトニクス株式会社 レーザ媒質、レーザ媒質ユニット及びレーザ光増幅装置
JP7008055B2 (ja) 2019-07-12 2022-01-25 浜松ホトニクス株式会社 レーザ媒質ユニット及びレーザ光増幅装置

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