JP2005162947A5 - - Google Patents
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- Publication number
- JP2005162947A5 JP2005162947A5 JP2003406394A JP2003406394A JP2005162947A5 JP 2005162947 A5 JP2005162947 A5 JP 2005162947A5 JP 2003406394 A JP2003406394 A JP 2003406394A JP 2003406394 A JP2003406394 A JP 2003406394A JP 2005162947 A5 JP2005162947 A5 JP 2005162947A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- liquid composition
- cleaning liquid
- molecular weight
- low molecular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims 15
- 239000000203 mixture Substances 0.000 claims 9
- 239000007788 liquid Substances 0.000 claims 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 239000002798 polar solvent Substances 0.000 claims 5
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 4
- 238000005019 vapor deposition process Methods 0.000 claims 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- VVOLVFOSOPJKED-UHFFFAOYSA-N copper phthalocyanine Chemical compound [Cu].N=1C2=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC=1C1=CC=CC=C12 VVOLVFOSOPJKED-UHFFFAOYSA-N 0.000 claims 1
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 claims 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 claims 1
- 238000004506 ultrasonic cleaning Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003406394A JP3833650B2 (ja) | 2003-12-04 | 2003-12-04 | 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 |
| TW093135493A TWI323742B (en) | 2003-12-04 | 2004-11-18 | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device |
| KR1020040100242A KR100726518B1 (ko) | 2003-12-04 | 2004-12-02 | 저분자 유기형 ｅｌ 소자 제조의 진공증착 공정에 사용되는 마스크의 세정액 및 세정 방법 |
| US11/002,871 US20050124524A1 (en) | 2003-12-04 | 2004-12-02 | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device |
| CNB2004100983112A CN1320088C (zh) | 2003-12-04 | 2004-12-03 | 在有机电致发光元件制造中使用的掩模的清洗液以及清洗方法 |
| US11/185,290 US7073518B2 (en) | 2003-12-04 | 2005-07-20 | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003406394A JP3833650B2 (ja) | 2003-12-04 | 2003-12-04 | 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006146373A Division JP3877758B2 (ja) | 2006-05-26 | 2006-05-26 | 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005162947A JP2005162947A (ja) | 2005-06-23 |
| JP2005162947A5 true JP2005162947A5 (https=) | 2005-12-22 |
| JP3833650B2 JP3833650B2 (ja) | 2006-10-18 |
Family
ID=34631731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003406394A Expired - Lifetime JP3833650B2 (ja) | 2003-12-04 | 2003-12-04 | 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20050124524A1 (https=) |
| JP (1) | JP3833650B2 (https=) |
| KR (1) | KR100726518B1 (https=) |
| CN (1) | CN1320088C (https=) |
| TW (1) | TWI323742B (https=) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE392466T1 (de) * | 2003-06-27 | 2008-05-15 | Asahi Glass Co Ltd | Reinigungs- bzw. spülverfahren |
| JP4352880B2 (ja) * | 2003-12-02 | 2009-10-28 | セイコーエプソン株式会社 | 洗浄方法および洗浄装置 |
| KR100626037B1 (ko) * | 2004-11-18 | 2006-09-20 | 삼성에스디아이 주식회사 | 마스크 세정방법 |
| US7531470B2 (en) * | 2005-09-27 | 2009-05-12 | Advantech Global, Ltd | Method and apparatus for electronic device manufacture using shadow masks |
| JP2008293699A (ja) * | 2007-05-22 | 2008-12-04 | Toyota Industries Corp | メタルマスクの浄化方法 |
| TW201323102A (zh) * | 2011-12-15 | 2013-06-16 | Dongwoo Fine Chem Co Ltd | 清洗製造有機el裝置的氣相沉積掩模的方法及清洗液 |
| JP5944801B2 (ja) * | 2012-09-11 | 2016-07-05 | 株式会社エンプラス | 照明装置 |
| JP5964714B2 (ja) * | 2012-10-05 | 2016-08-03 | 株式会社エンプラス | 光束制御部材、発光装置および照明装置 |
| JP2017152330A (ja) * | 2016-02-26 | 2017-08-31 | 株式会社ジャパンディスプレイ | 表示装置の製造方法、表示装置及び表示装置の製造装置 |
| KR20180061621A (ko) | 2016-11-30 | 2018-06-08 | 동우 화인켐 주식회사 | 마스크 세정액 조성물 |
| KR101951860B1 (ko) * | 2017-02-14 | 2019-02-26 | 동우 화인켐 주식회사 | 마스크 세정액 조성물 |
| CN108424818A (zh) * | 2017-02-14 | 2018-08-21 | 东友精细化工有限公司 | 掩模清洗液组合物 |
| KR102469931B1 (ko) | 2017-03-28 | 2022-11-23 | 동우 화인켐 주식회사 | 마스크 세정액 조성물, 마스크 세정액 예비-조성물, 및 마스크 세정액 조성물의 제조방법 |
| KR102478194B1 (ko) * | 2017-06-26 | 2022-12-15 | 에이지씨 가부시키가이샤 | 진공 증착용의 마스크의 세정 방법 및 린스 조성물 |
| WO2019123759A1 (ja) * | 2017-12-22 | 2019-06-27 | Ａｇｃ株式会社 | 溶剤組成物、洗浄方法、塗膜形成用組成物、塗膜付き基材の製造方法、エアゾール組成物、リンス組成物、部材の洗浄方法および部材の洗浄装置 |
| WO2019138580A1 (ja) * | 2018-01-15 | 2019-07-18 | シャープ株式会社 | 表示デバイスの製造方法および蒸着マスクのクリーニング方法並びにリンス液 |
| JP7126830B2 (ja) * | 2018-01-19 | 2022-08-29 | スリーエム イノベイティブ プロパティズ カンパニー | フッ素化液体の再生方法、及び該方法を用いる再生装置 |
| WO2019156364A1 (ko) * | 2018-02-06 | 2019-08-15 | 동우 화인켐 주식회사 | 마스크 세정액 조성물 |
| KR20210105911A (ko) * | 2018-12-26 | 2021-08-27 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 기재로부터의 전계발광 재료의 제거 |
| CN114502709B (zh) * | 2019-10-21 | 2024-09-13 | 3M创新有限公司 | 从基底去除电致发光材料 |
| CN111172550B (zh) * | 2020-02-14 | 2022-03-11 | 福建省佑达环保材料有限公司 | 一种oled掩膜版清洗剂及其清洗工艺 |
| CN115873669B (zh) * | 2022-11-04 | 2024-07-16 | 三明市海斯福化工有限责任公司 | 一种漂洗剂及oled工艺用掩膜版的清洗方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4276186A (en) * | 1979-06-26 | 1981-06-30 | International Business Machines Corporation | Cleaning composition and use thereof |
| US5011621A (en) * | 1990-06-04 | 1991-04-30 | Arco Chemical Technology, Inc. | Paint stripper compositions containing N-methyl-2-pyrrolidone and renewable resources |
| US5073287A (en) * | 1990-07-16 | 1991-12-17 | Fremont Industries, Inc. | Coating remover and paint stripper containing N-methyl-2-pyrrolidone, methanol, and sodium methoxide |
| US5298184A (en) * | 1992-07-09 | 1994-03-29 | Specialty Environmental Technologies, Inc. | Paint stripper composition |
| US5597678A (en) * | 1994-04-18 | 1997-01-28 | Ocg Microelectronic Materials, Inc. | Non-corrosive photoresist stripper composition |
| TW467953B (en) * | 1998-11-12 | 2001-12-11 | Mitsubishi Gas Chemical Co | New detergent and cleaning method of using it |
| JP4273440B2 (ja) * | 1999-01-26 | 2009-06-03 | 栗田工業株式会社 | 電子材料用洗浄水及び電子材料の洗浄方法 |
| FR2792737B1 (fr) * | 1999-04-26 | 2001-05-18 | Atochem Elf Sa | Compositions pour le decapage de photoresists dans la fabrication de circuits integres |
| US6277799B1 (en) * | 1999-06-25 | 2001-08-21 | International Business Machines Corporation | Aqueous cleaning of paste residue |
| JP4889883B2 (ja) * | 2000-07-10 | 2012-03-07 | 株式会社半導体エネルギー研究所 | 成膜方法および成膜装置 |
| JP2002110345A (ja) | 2000-09-29 | 2002-04-12 | Toshiba Corp | マスク及びそれを用いた有機ｅｌ表示素子の製造方法 |
| JP4092914B2 (ja) | 2001-01-26 | 2008-05-28 | セイコーエプソン株式会社 | マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法 |
| JP2002313564A (ja) | 2001-04-17 | 2002-10-25 | Nec Corp | シャドウマスク、該シャドウマスクの製造方法、およびディスプレイ |
| JP2003109759A (ja) | 2001-09-27 | 2003-04-11 | Mitsumi Electric Co Ltd | 有機電界発光素子 |
| JP2003257664A (ja) | 2002-03-05 | 2003-09-12 | Sanyo Electric Co Ltd | 有機エレクトロルミネッセンス素子 |
| JP4352880B2 (ja) * | 2003-12-02 | 2009-10-28 | セイコーエプソン株式会社 | 洗浄方法および洗浄装置 |
-
2003
- 2003-12-04 JP JP2003406394A patent/JP3833650B2/ja not_active Expired - Lifetime
-
2004
- 2004-11-18 TW TW093135493A patent/TWI323742B/zh not_active IP Right Cessation
- 2004-12-02 US US11/002,871 patent/US20050124524A1/en not_active Abandoned
- 2004-12-02 KR KR1020040100242A patent/KR100726518B1/ko not_active Expired - Lifetime
- 2004-12-03 CN CNB2004100983112A patent/CN1320088C/zh not_active Expired - Lifetime
-
2005
- 2005-07-20 US US11/185,290 patent/US7073518B2/en not_active Expired - Lifetime
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