JP3833650B2 - 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 - Google Patents

低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 Download PDF

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Publication number
JP3833650B2
JP3833650B2 JP2003406394A JP2003406394A JP3833650B2 JP 3833650 B2 JP3833650 B2 JP 3833650B2 JP 2003406394 A JP2003406394 A JP 2003406394A JP 2003406394 A JP2003406394 A JP 2003406394A JP 3833650 B2 JP3833650 B2 JP 3833650B2
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Japan
Prior art keywords
cleaning
liquid composition
cleaning liquid
mask
low molecular
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JP2003406394A
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Japanese (ja)
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JP2005162947A5 (https=
JP2005162947A (ja
Inventor
典夫 石川
芳孝 木野村
秀樹 泥谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanto Chemical Co Inc
Sanyo Electric Co Ltd
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Kanto Chemical Co Inc
Sanyo Electric Co Ltd
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Application filed by Kanto Chemical Co Inc, Sanyo Electric Co Ltd filed Critical Kanto Chemical Co Inc
Priority to JP2003406394A priority Critical patent/JP3833650B2/ja
Priority to TW093135493A priority patent/TWI323742B/zh
Priority to US11/002,871 priority patent/US20050124524A1/en
Priority to KR1020040100242A priority patent/KR100726518B1/ko
Priority to CNB2004100983112A priority patent/CN1320088C/zh
Publication of JP2005162947A publication Critical patent/JP2005162947A/ja
Priority to US11/185,290 priority patent/US7073518B2/en
Publication of JP2005162947A5 publication Critical patent/JP2005162947A5/ja
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/06—Luminescent materials, e.g. electroluminescent or chemiluminescent containing organic luminescent materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Detergent Compositions (AREA)
JP2003406394A 2003-12-04 2003-12-04 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法 Expired - Lifetime JP3833650B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2003406394A JP3833650B2 (ja) 2003-12-04 2003-12-04 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法
TW093135493A TWI323742B (en) 2003-12-04 2004-11-18 Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device
KR1020040100242A KR100726518B1 (ko) 2003-12-04 2004-12-02 저분자 유기형 ｅｌ 소자 제조의 진공증착 공정에 사용되는 마스크의 세정액 및 세정 방법
US11/002,871 US20050124524A1 (en) 2003-12-04 2004-12-02 Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device
CNB2004100983112A CN1320088C (zh) 2003-12-04 2004-12-03 在有机电致发光元件制造中使用的掩模的清洗液以及清洗方法
US11/185,290 US7073518B2 (en) 2003-12-04 2005-07-20 Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003406394A JP3833650B2 (ja) 2003-12-04 2003-12-04 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法

Related Child Applications (1)

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JP2006146373A Division JP3877758B2 (ja) 2006-05-26 2006-05-26 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法

Publications (3)

Publication Number Publication Date
JP2005162947A JP2005162947A (ja) 2005-06-23
JP2005162947A5 JP2005162947A5 (https=) 2005-12-22
JP3833650B2 true JP3833650B2 (ja) 2006-10-18

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JP2003406394A Expired - Lifetime JP3833650B2 (ja) 2003-12-04 2003-12-04 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法

Country Status (5)

Country Link
US (2) US20050124524A1 (https=)
JP (1) JP3833650B2 (https=)
KR (1) KR100726518B1 (https=)
CN (1) CN1320088C (https=)
TW (1) TWI323742B (https=)

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ATE392466T1 (de) * 2003-06-27 2008-05-15 Asahi Glass Co Ltd Reinigungs- bzw. spülverfahren
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置
KR100626037B1 (ko) * 2004-11-18 2006-09-20 삼성에스디아이 주식회사 마스크 세정방법
US7531470B2 (en) * 2005-09-27 2009-05-12 Advantech Global, Ltd Method and apparatus for electronic device manufacture using shadow masks
JP2008293699A (ja) * 2007-05-22 2008-12-04 Toyota Industries Corp メタルマスクの浄化方法
TW201323102A (zh) * 2011-12-15 2013-06-16 Dongwoo Fine Chem Co Ltd 清洗製造有機el裝置的氣相沉積掩模的方法及清洗液
JP5944801B2 (ja) * 2012-09-11 2016-07-05 株式会社エンプラス 照明装置
JP5964714B2 (ja) * 2012-10-05 2016-08-03 株式会社エンプラス 光束制御部材、発光装置および照明装置
JP2017152330A (ja) * 2016-02-26 2017-08-31 株式会社ジャパンディスプレイ 表示装置の製造方法、表示装置及び表示装置の製造装置
KR20180061621A (ko) 2016-11-30 2018-06-08 동우 화인켐 주식회사 마스크 세정액 조성물
KR101951860B1 (ko) * 2017-02-14 2019-02-26 동우 화인켐 주식회사 마스크 세정액 조성물
CN108424818A (zh) * 2017-02-14 2018-08-21 东友精细化工有限公司 掩模清洗液组合物
KR102469931B1 (ko) 2017-03-28 2022-11-23 동우 화인켐 주식회사 마스크 세정액 조성물, 마스크 세정액 예비-조성물, 및 마스크 세정액 조성물의 제조방법
KR102478194B1 (ko) * 2017-06-26 2022-12-15 에이지씨 가부시키가이샤 진공 증착용의 마스크의 세정 방법 및 린스 조성물
WO2019123759A1 (ja) * 2017-12-22 2019-06-27 Ａｇｃ株式会社 溶剤組成物、洗浄方法、塗膜形成用組成物、塗膜付き基材の製造方法、エアゾール組成物、リンス組成物、部材の洗浄方法および部材の洗浄装置
WO2019138580A1 (ja) * 2018-01-15 2019-07-18 シャープ株式会社 表示デバイスの製造方法および蒸着マスクのクリーニング方法並びにリンス液
JP7126830B2 (ja) * 2018-01-19 2022-08-29 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の再生方法、及び該方法を用いる再生装置
WO2019156364A1 (ko) * 2018-02-06 2019-08-15 동우 화인켐 주식회사 마스크 세정액 조성물
KR20210105911A (ko) * 2018-12-26 2021-08-27 쓰리엠 이노베이티브 프로퍼티즈 컴파니 기재로부터의 전계발광 재료의 제거
CN114502709B (zh) * 2019-10-21 2024-09-13 3M创新有限公司 从基底去除电致发光材料
CN111172550B (zh) * 2020-02-14 2022-03-11 福建省佑达环保材料有限公司 一种oled掩膜版清洗剂及其清洗工艺
CN115873669B (zh) * 2022-11-04 2024-07-16 三明市海斯福化工有限责任公司 一种漂洗剂及oled工艺用掩膜版的清洗方法

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JP4092914B2 (ja) 2001-01-26 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法
JP2002313564A (ja) 2001-04-17 2002-10-25 Nec Corp シャドウマスク、該シャドウマスクの製造方法、およびディスプレイ
JP2003109759A (ja) 2001-09-27 2003-04-11 Mitsumi Electric Co Ltd 有機電界発光素子
JP2003257664A (ja) 2002-03-05 2003-09-12 Sanyo Electric Co Ltd 有機エレクトロルミネッセンス素子
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置

Also Published As

Publication number Publication date
KR20050054452A (ko) 2005-06-10
TWI323742B (en) 2010-04-21
CN1320088C (zh) 2007-06-06
CN1660983A (zh) 2005-08-31
US20050252523A1 (en) 2005-11-17
KR100726518B1 (ko) 2007-06-11
TW200523352A (en) 2005-07-16
US7073518B2 (en) 2006-07-11
US20050124524A1 (en) 2005-06-09
JP2005162947A (ja) 2005-06-23

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