CN1320088C - 在有机电致发光元件制造中使用的掩模的清洗液以及清洗方法 - Google Patents

在有机电致发光元件制造中使用的掩模的清洗液以及清洗方法 Download PDF

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Publication number
CN1320088C
CN1320088C CNB2004100983112A CN200410098311A CN1320088C CN 1320088 C CN1320088 C CN 1320088C CN B2004100983112 A CNB2004100983112 A CN B2004100983112A CN 200410098311 A CN200410098311 A CN 200410098311A CN 1320088 C CN1320088 C CN 1320088C
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CN
China
Prior art keywords
mask
scavenging solution
purging method
low molecule
type organic
Prior art date
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Expired - Lifetime
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CNB2004100983112A
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English (en)
Chinese (zh)
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CN1660983A (zh
Inventor
石川典夫
木野村芳孝
泥谷秀树
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Kanto Chemical Co Inc
Sanyo Electric Co Ltd
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Kanto Chemical Co Inc
Sanyo Electric Co Ltd
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Publication of CN1660983A publication Critical patent/CN1660983A/zh
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/06—Luminescent materials, e.g. electroluminescent or chemiluminescent containing organic luminescent materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Detergent Compositions (AREA)
CNB2004100983112A 2003-12-04 2004-12-03 在有机电致发光元件制造中使用的掩模的清洗液以及清洗方法 Expired - Lifetime CN1320088C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003406394A JP3833650B2 (ja) 2003-12-04 2003-12-04 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法
JP406394/2003 2003-12-04

Publications (2)

Publication Number Publication Date
CN1660983A CN1660983A (zh) 2005-08-31
CN1320088C true CN1320088C (zh) 2007-06-06

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CNB2004100983112A Expired - Lifetime CN1320088C (zh) 2003-12-04 2004-12-03 在有机电致发光元件制造中使用的掩模的清洗液以及清洗方法

Country Status (5)

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US (2) US20050124524A1 (https=)
JP (1) JP3833650B2 (https=)
KR (1) KR100726518B1 (https=)
CN (1) CN1320088C (https=)
TW (1) TWI323742B (https=)

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CN111601873A (zh) * 2018-01-19 2020-08-28 3M创新有限公司 氟化液体再生方法及使用此类方法的再生设备

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ATE392466T1 (de) * 2003-06-27 2008-05-15 Asahi Glass Co Ltd Reinigungs- bzw. spülverfahren
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置
KR100626037B1 (ko) * 2004-11-18 2006-09-20 삼성에스디아이 주식회사 마스크 세정방법
US7531470B2 (en) * 2005-09-27 2009-05-12 Advantech Global, Ltd Method and apparatus for electronic device manufacture using shadow masks
JP2008293699A (ja) * 2007-05-22 2008-12-04 Toyota Industries Corp メタルマスクの浄化方法
TW201323102A (zh) * 2011-12-15 2013-06-16 Dongwoo Fine Chem Co Ltd 清洗製造有機el裝置的氣相沉積掩模的方法及清洗液
JP5944801B2 (ja) * 2012-09-11 2016-07-05 株式会社エンプラス 照明装置
JP5964714B2 (ja) * 2012-10-05 2016-08-03 株式会社エンプラス 光束制御部材、発光装置および照明装置
JP2017152330A (ja) * 2016-02-26 2017-08-31 株式会社ジャパンディスプレイ 表示装置の製造方法、表示装置及び表示装置の製造装置
KR20180061621A (ko) 2016-11-30 2018-06-08 동우 화인켐 주식회사 마스크 세정액 조성물
KR101951860B1 (ko) * 2017-02-14 2019-02-26 동우 화인켐 주식회사 마스크 세정액 조성물
CN108424818A (zh) * 2017-02-14 2018-08-21 东友精细化工有限公司 掩模清洗液组合物
KR102469931B1 (ko) 2017-03-28 2022-11-23 동우 화인켐 주식회사 마스크 세정액 조성물, 마스크 세정액 예비-조성물, 및 마스크 세정액 조성물의 제조방법
KR102478194B1 (ko) * 2017-06-26 2022-12-15 에이지씨 가부시키가이샤 진공 증착용의 마스크의 세정 방법 및 린스 조성물
WO2019123759A1 (ja) * 2017-12-22 2019-06-27 Ａｇｃ株式会社 溶剤組成物、洗浄方法、塗膜形成用組成物、塗膜付き基材の製造方法、エアゾール組成物、リンス組成物、部材の洗浄方法および部材の洗浄装置
WO2019138580A1 (ja) * 2018-01-15 2019-07-18 シャープ株式会社 表示デバイスの製造方法および蒸着マスクのクリーニング方法並びにリンス液
WO2019156364A1 (ko) * 2018-02-06 2019-08-15 동우 화인켐 주식회사 마스크 세정액 조성물
KR20210105911A (ko) * 2018-12-26 2021-08-27 쓰리엠 이노베이티브 프로퍼티즈 컴파니 기재로부터의 전계발광 재료의 제거
CN114502709B (zh) * 2019-10-21 2024-09-13 3M创新有限公司 从基底去除电致发光材料
CN111172550B (zh) * 2020-02-14 2022-03-11 福建省佑达环保材料有限公司 一种oled掩膜版清洗剂及其清洗工艺
CN115873669B (zh) * 2022-11-04 2024-07-16 三明市海斯福化工有限责任公司 一种漂洗剂及oled工艺用掩膜版的清洗方法

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CN1288589A (zh) * 1998-11-12 2001-03-21 夏普株式会社 新型清洗剂以及使用它的清洗方法
US6277799B1 (en) * 1999-06-25 2001-08-21 International Business Machines Corporation Aqueous cleaning of paste residue

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US5011621A (en) * 1990-06-04 1991-04-30 Arco Chemical Technology, Inc. Paint stripper compositions containing N-methyl-2-pyrrolidone and renewable resources
US5073287A (en) * 1990-07-16 1991-12-17 Fremont Industries, Inc. Coating remover and paint stripper containing N-methyl-2-pyrrolidone, methanol, and sodium methoxide
US5298184A (en) * 1992-07-09 1994-03-29 Specialty Environmental Technologies, Inc. Paint stripper composition
US5597678A (en) * 1994-04-18 1997-01-28 Ocg Microelectronic Materials, Inc. Non-corrosive photoresist stripper composition
FR2792737B1 (fr) * 1999-04-26 2001-05-18 Atochem Elf Sa Compositions pour le decapage de photoresists dans la fabrication de circuits integres
JP4889883B2 (ja) * 2000-07-10 2012-03-07 株式会社半導体エネルギー研究所 成膜方法および成膜装置
JP2002110345A (ja) 2000-09-29 2002-04-12 Toshiba Corp マスク及びそれを用いた有機ｅｌ表示素子の製造方法
JP4092914B2 (ja) 2001-01-26 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法
JP2002313564A (ja) 2001-04-17 2002-10-25 Nec Corp シャドウマスク、該シャドウマスクの製造方法、およびディスプレイ
JP2003109759A (ja) 2001-09-27 2003-04-11 Mitsumi Electric Co Ltd 有機電界発光素子
JP2003257664A (ja) 2002-03-05 2003-09-12 Sanyo Electric Co Ltd 有機エレクトロルミネッセンス素子
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1288589A (zh) * 1998-11-12 2001-03-21 夏普株式会社 新型清洗剂以及使用它的清洗方法
JP2000216130A (ja) * 1999-01-26 2000-08-04 Kurita Water Ind Ltd 電子材料用洗浄水及び電子材料の洗浄方法
US6277799B1 (en) * 1999-06-25 2001-08-21 International Business Machines Corporation Aqueous cleaning of paste residue

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111601873A (zh) * 2018-01-19 2020-08-28 3M创新有限公司 氟化液体再生方法及使用此类方法的再生设备
CN111601873B (zh) * 2018-01-19 2022-04-12 3M创新有限公司 氟化液体再生方法及使用此类方法的再生设备

Also Published As

Publication number Publication date
KR20050054452A (ko) 2005-06-10
TWI323742B (en) 2010-04-21
JP3833650B2 (ja) 2006-10-18
CN1660983A (zh) 2005-08-31
US20050252523A1 (en) 2005-11-17
KR100726518B1 (ko) 2007-06-11
TW200523352A (en) 2005-07-16
US7073518B2 (en) 2006-07-11
US20050124524A1 (en) 2005-06-09
JP2005162947A (ja) 2005-06-23

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Granted publication date: 20070606