TWI323742B - Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device - Google Patents

Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device Download PDF

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Publication number
TWI323742B
TWI323742B TW093135493A TW93135493A TWI323742B TW I323742 B TWI323742 B TW I323742B TW 093135493 A TW093135493 A TW 093135493A TW 93135493 A TW93135493 A TW 93135493A TW I323742 B TWI323742 B TW I323742B
Authority
TW
Taiwan
Prior art keywords
cleaning
mask
low molecular
washing
organic
Prior art date
Application number
TW093135493A
Other languages
English (en)
Chinese (zh)
Other versions
TW200523352A (en
Inventor
Norio Ishikawa
Yoshitaka Kinomura
Hideki Hijiya
Original Assignee
Kanto Kagaku
Sanyo Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanto Kagaku, Sanyo Electric Co filed Critical Kanto Kagaku
Publication of TW200523352A publication Critical patent/TW200523352A/zh
Application granted granted Critical
Publication of TWI323742B publication Critical patent/TWI323742B/zh

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/06—Luminescent materials, e.g. electroluminescent or chemiluminescent containing organic luminescent materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Detergent Compositions (AREA)
TW093135493A 2003-12-04 2004-11-18 Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device TWI323742B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003406394A JP3833650B2 (ja) 2003-12-04 2003-12-04 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法

Publications (2)

Publication Number Publication Date
TW200523352A TW200523352A (en) 2005-07-16
TWI323742B true TWI323742B (en) 2010-04-21

Family

ID=34631731

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093135493A TWI323742B (en) 2003-12-04 2004-11-18 Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device

Country Status (5)

Country Link
US (2) US20050124524A1 (https=)
JP (1) JP3833650B2 (https=)
KR (1) KR100726518B1 (https=)
CN (1) CN1320088C (https=)
TW (1) TWI323742B (https=)

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ATE392466T1 (de) * 2003-06-27 2008-05-15 Asahi Glass Co Ltd Reinigungs- bzw. spülverfahren
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置
KR100626037B1 (ko) * 2004-11-18 2006-09-20 삼성에스디아이 주식회사 마스크 세정방법
US7531470B2 (en) * 2005-09-27 2009-05-12 Advantech Global, Ltd Method and apparatus for electronic device manufacture using shadow masks
JP2008293699A (ja) * 2007-05-22 2008-12-04 Toyota Industries Corp メタルマスクの浄化方法
TW201323102A (zh) * 2011-12-15 2013-06-16 Dongwoo Fine Chem Co Ltd 清洗製造有機el裝置的氣相沉積掩模的方法及清洗液
JP5944801B2 (ja) * 2012-09-11 2016-07-05 株式会社エンプラス 照明装置
JP5964714B2 (ja) * 2012-10-05 2016-08-03 株式会社エンプラス 光束制御部材、発光装置および照明装置
JP2017152330A (ja) * 2016-02-26 2017-08-31 株式会社ジャパンディスプレイ 表示装置の製造方法、表示装置及び表示装置の製造装置
KR20180061621A (ko) 2016-11-30 2018-06-08 동우 화인켐 주식회사 마스크 세정액 조성물
KR101951860B1 (ko) * 2017-02-14 2019-02-26 동우 화인켐 주식회사 마스크 세정액 조성물
CN108424818A (zh) * 2017-02-14 2018-08-21 东友精细化工有限公司 掩模清洗液组合物
KR102469931B1 (ko) 2017-03-28 2022-11-23 동우 화인켐 주식회사 마스크 세정액 조성물, 마스크 세정액 예비-조성물, 및 마스크 세정액 조성물의 제조방법
KR102478194B1 (ko) * 2017-06-26 2022-12-15 에이지씨 가부시키가이샤 진공 증착용의 마스크의 세정 방법 및 린스 조성물
WO2019123759A1 (ja) * 2017-12-22 2019-06-27 Ａｇｃ株式会社 溶剤組成物、洗浄方法、塗膜形成用組成物、塗膜付き基材の製造方法、エアゾール組成物、リンス組成物、部材の洗浄方法および部材の洗浄装置
WO2019138580A1 (ja) * 2018-01-15 2019-07-18 シャープ株式会社 表示デバイスの製造方法および蒸着マスクのクリーニング方法並びにリンス液
JP7126830B2 (ja) * 2018-01-19 2022-08-29 スリーエム イノベイティブ プロパティズ カンパニー フッ素化液体の再生方法、及び該方法を用いる再生装置
WO2019156364A1 (ko) * 2018-02-06 2019-08-15 동우 화인켐 주식회사 마스크 세정액 조성물
KR20210105911A (ko) * 2018-12-26 2021-08-27 쓰리엠 이노베이티브 프로퍼티즈 컴파니 기재로부터의 전계발광 재료의 제거
CN114502709B (zh) * 2019-10-21 2024-09-13 3M创新有限公司 从基底去除电致发光材料
CN111172550B (zh) * 2020-02-14 2022-03-11 福建省佑达环保材料有限公司 一种oled掩膜版清洗剂及其清洗工艺
CN115873669B (zh) * 2022-11-04 2024-07-16 三明市海斯福化工有限责任公司 一种漂洗剂及oled工艺用掩膜版的清洗方法

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JP2002110345A (ja) 2000-09-29 2002-04-12 Toshiba Corp マスク及びそれを用いた有機ｅｌ表示素子の製造方法
JP4092914B2 (ja) 2001-01-26 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法
JP2002313564A (ja) 2001-04-17 2002-10-25 Nec Corp シャドウマスク、該シャドウマスクの製造方法、およびディスプレイ
JP2003109759A (ja) 2001-09-27 2003-04-11 Mitsumi Electric Co Ltd 有機電界発光素子
JP2003257664A (ja) 2002-03-05 2003-09-12 Sanyo Electric Co Ltd 有機エレクトロルミネッセンス素子
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置

Also Published As

Publication number Publication date
KR20050054452A (ko) 2005-06-10
CN1320088C (zh) 2007-06-06
JP3833650B2 (ja) 2006-10-18
CN1660983A (zh) 2005-08-31
US20050252523A1 (en) 2005-11-17
KR100726518B1 (ko) 2007-06-11
TW200523352A (en) 2005-07-16
US7073518B2 (en) 2006-07-11
US20050124524A1 (en) 2005-06-09
JP2005162947A (ja) 2005-06-23

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