JP2005108806A5 - - Google Patents

Download PDF

Info

Publication number
JP2005108806A5
JP2005108806A5 JP2004111682A JP2004111682A JP2005108806A5 JP 2005108806 A5 JP2005108806 A5 JP 2005108806A5 JP 2004111682 A JP2004111682 A JP 2004111682A JP 2004111682 A JP2004111682 A JP 2004111682A JP 2005108806 A5 JP2005108806 A5 JP 2005108806A5
Authority
JP
Japan
Prior art keywords
electron
electron beam
application apparatus
vacuum vessel
beam application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004111682A
Other languages
English (en)
Japanese (ja)
Other versions
JP4349964B2 (ja
JP2005108806A (ja
Filing date
Publication date
Priority claimed from JP2004111682A external-priority patent/JP4349964B2/ja
Priority to JP2004111682A priority Critical patent/JP4349964B2/ja
Application filed filed Critical
Priority to US10/873,358 priority patent/US7238939B2/en
Priority to EP04015558A priority patent/EP1515358A3/en
Publication of JP2005108806A publication Critical patent/JP2005108806A/ja
Publication of JP2005108806A5 publication Critical patent/JP2005108806A5/ja
Priority to US11/806,196 priority patent/US20070236143A1/en
Priority to US12/461,195 priority patent/US8232712B2/en
Publication of JP4349964B2 publication Critical patent/JP4349964B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004111682A 2003-09-10 2004-04-06 小型電子銃 Expired - Fee Related JP4349964B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004111682A JP4349964B2 (ja) 2003-09-10 2004-04-06 小型電子銃
US10/873,358 US7238939B2 (en) 2003-09-10 2004-06-23 Small electron gun
EP04015558A EP1515358A3 (en) 2003-09-10 2004-07-01 Small electron gun
US11/806,196 US20070236143A1 (en) 2003-09-10 2007-05-30 Small electron gun
US12/461,195 US8232712B2 (en) 2003-09-10 2009-08-04 Small electron gun

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003317703 2003-09-10
JP2004111682A JP4349964B2 (ja) 2003-09-10 2004-04-06 小型電子銃

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006291965A Division JP4538441B2 (ja) 2003-09-10 2006-10-27 電子線応用装置

Publications (3)

Publication Number Publication Date
JP2005108806A JP2005108806A (ja) 2005-04-21
JP2005108806A5 true JP2005108806A5 (enExample) 2007-01-25
JP4349964B2 JP4349964B2 (ja) 2009-10-21

Family

ID=34138017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004111682A Expired - Fee Related JP4349964B2 (ja) 2003-09-10 2004-04-06 小型電子銃

Country Status (3)

Country Link
US (3) US7238939B2 (enExample)
EP (1) EP1515358A3 (enExample)
JP (1) JP4349964B2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4349964B2 (ja) 2003-09-10 2009-10-21 株式会社日立ハイテクノロジーズ 小型電子銃
JP4538441B2 (ja) * 2003-09-10 2010-09-08 株式会社日立ハイテクノロジーズ 電子線応用装置
JP2006066272A (ja) * 2004-08-27 2006-03-09 Canon Inc 画像表示装置
JP2008511958A (ja) * 2004-09-01 2008-04-17 シーイービーティー・カンパニー・リミティッド 電子カラム用モーショニング装置
JP4751635B2 (ja) 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
JP4977399B2 (ja) * 2005-11-10 2012-07-18 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP4795847B2 (ja) * 2006-05-17 2011-10-19 株式会社日立ハイテクノロジーズ 電子レンズ及びそれを用いた荷電粒子線装置
JP5016988B2 (ja) * 2007-06-19 2012-09-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびその真空立上げ方法
JP5086105B2 (ja) * 2008-01-07 2012-11-28 株式会社日立ハイテクノロジーズ ガス電界電離イオン源
US8334510B2 (en) 2008-07-03 2012-12-18 B-Nano Ltd. Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US8981294B2 (en) 2008-07-03 2015-03-17 B-Nano Ltd. Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
KR20110076934A (ko) * 2008-09-28 2011-07-06 비-나노 리미티드 진공 디바이스 및 주사 전자 현미경
US20110062353A1 (en) * 2009-09-17 2011-03-17 Ushio America, Inc. Irradiation systems
KR101236489B1 (ko) * 2010-06-10 2013-02-25 한국표준과학연구원 전계 방출 주사 전자 현미경용 전자빔 가속 장치의 초고진공 발생 장치
JP5259688B2 (ja) 2010-12-09 2013-08-07 本田技研工業株式会社 走査型電子顕微鏡
KR101156124B1 (ko) 2011-04-13 2012-07-03 (주)펨트론 전자빔 방출 장치
CN107068513B (zh) * 2011-07-04 2019-03-08 利乐拉瓦尔集团及财务有限公司 一种电子束装置、吸气器片和制造装配有所述吸气器片的电子束装置的方法
EP2959287A4 (en) 2013-02-20 2016-10-19 Nano Ltd B scanning Electron Microscope
WO2015101537A1 (en) * 2013-12-30 2015-07-09 Mapper Lithography Ip B.V. Cathode arrangement, electron gun, and lithography system comprising such electron gun
US10249471B2 (en) * 2014-12-26 2019-04-02 Hitachi High-Technologies Corporation Composite charged particle beam apparatus and control method thereof
CN113707522B (zh) * 2021-08-26 2022-07-08 北京中科科仪股份有限公司 固定装置、扫描电镜和电子束曝光机
US20230197399A1 (en) * 2021-12-21 2023-06-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron microscope, electron source for electron microscope, and methods of operating an electron microscope

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT307203B (de) 1971-08-04 1973-05-10 Gfm Fertigungstechnik Werkzeug zum Rundschmieden für Schmiedemaschinen mit zwei gegeneinander schlagenden Hämmern
IT998681B (it) * 1973-10-01 1976-02-20 Getters Spa Pompa getter
JPS6332846A (ja) 1986-07-25 1988-02-12 Tadao Suganuma 電子銃
JPS63202832A (ja) 1987-02-17 1988-08-22 Fujitsu Ltd 電子銃
JPH0665015B2 (ja) 1987-05-22 1994-08-22 日本電子株式会社 電子顕微鏡
US4833362A (en) 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
US5059859A (en) * 1989-04-14 1991-10-22 Hitachi, Ltd. Charged particle beam generating apparatus of multi-stage acceleration type
JP2898658B2 (ja) 1989-08-28 1999-06-02 株式会社日立製作所 多段加速方式荷電粒子線加速装置
JPH04215240A (ja) * 1990-12-13 1992-08-06 Hitachi Ltd 荷電粒子線装置
JP3730263B2 (ja) 1992-05-27 2005-12-21 ケーエルエー・インストルメンツ・コーポレーション 荷電粒子ビームを用いた自動基板検査の装置及び方法
JP2851213B2 (ja) * 1992-09-28 1999-01-27 株式会社東芝 走査電子顕微鏡
JPH06275218A (ja) 1993-03-23 1994-09-30 Dainippon Printing Co Ltd 電子線描画装置
JPH07230778A (ja) 1994-02-17 1995-08-29 Hitachi Medical Corp Ｘ線管
JPH0822787A (ja) * 1994-07-11 1996-01-23 Hitachi Ltd 電界放射型電子銃
US6509564B1 (en) * 1998-04-20 2003-01-21 Hitachi, Ltd. Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
JP3505386B2 (ja) 1998-05-11 2004-03-08 三洋電機株式会社 電子機器のシールド構造
JP2000149850A (ja) 1999-01-01 2000-05-30 Hitachi Ltd 荷電粒子線装置
JP3766763B2 (ja) 1999-04-05 2006-04-19 日本電子株式会社 電界放射電子銃
JP2001325912A (ja) 2000-05-16 2001-11-22 Hitachi Ltd 電子ビーム検査装置
JP4261806B2 (ja) * 2002-02-15 2009-04-30 株式会社日立ハイテクノロジーズ 電子線装置及びその高電圧放電防止方法
JP4215240B2 (ja) 2003-02-26 2009-01-28 Ｔｄｋ株式会社 水素粉砕方法、希土類永久磁石の製造方法
JP4349964B2 (ja) 2003-09-10 2009-10-21 株式会社日立ハイテクノロジーズ 小型電子銃
JP4825650B2 (ja) 2006-12-01 2011-11-30 株式会社フジタ 簡易動的コーン貫入試験装置

Similar Documents

Publication Publication Date Title
JP2005108806A5 (enExample)
JP5260575B2 (ja) 電子顕微鏡、および試料ホルダ
JP5540033B2 (ja) Ｘ線管
JP2014161531A5 (enExample)
JP2011129518A5 (enExample)
IL157999A (en) Process for engraving on materials with a chemical reaction caused by a focused electronic beam over the above materials
WO2007129244A3 (en) X-ray tube with oscillating anode
JP2009535788A5 (enExample)
WO2005104168A2 (en) Improved source for energetic electrons
EP1515358A3 (en) Small electron gun
US20130003913A1 (en) Tomosynthesis system
DE60213389D1 (de) Röntgen-bestrahlungsvorrichtung
WO2008123301A1 (ja) 異極像結晶を用いたｘ線発生装置
WO2018055715A1 (ja) 電子顕微鏡
JP2006019223A5 (enExample)
US4139774A (en) Apparatus for irradiating a specimen by an electron beam
KR101737399B1 (ko) 세라믹 재질을 갖는 x선관의 스템부 접합 방법
PL2283508T3 (pl) Źródło promieniowania i sposób wytwarzania promieniowania rentgenowskiego
KR20150051820A (ko) 투과형 평판 엑스레이 발생 장치 및 엑스레이 영상 시스템
JP2003346672A5 (enExample)
JP2011171212A (ja) アルカリ金属導入装置、及びアルカリ金属導入方法
JP4767646B2 (ja) Ｘ線管
JP2012079449A5 (enExample)
JP2004207053A (ja) Ｘ線管
JP2017168216A (ja) Ｘ線ターゲットおよびそれを備えたｘ線発生装置