JP2005101564A5 - - Google Patents
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- Publication number
- JP2005101564A5 JP2005101564A5 JP2004239630A JP2004239630A JP2005101564A5 JP 2005101564 A5 JP2005101564 A5 JP 2005101564A5 JP 2004239630 A JP2004239630 A JP 2004239630A JP 2004239630 A JP2004239630 A JP 2004239630A JP 2005101564 A5 JP2005101564 A5 JP 2005101564A5
- Authority
- JP
- Japan
- Prior art keywords
- container
- precursor
- volume
- fluid stream
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 claims 33
- 239000002243 precursor Substances 0.000 claims 30
- 238000010438 heat treatment Methods 0.000 claims 11
- 239000000463 material Substances 0.000 claims 9
- 239000012159 carrier gas Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 5
- 239000007789 gas Substances 0.000 claims 4
- 241000219793 Trifolium Species 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 229910001220 stainless steel Inorganic materials 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 claims 1
- 238000011144 upstream manufacturing Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49618703P | 2003-08-19 | 2003-08-19 | |
| US58729504P | 2004-07-12 | 2004-07-12 | |
| US10/902,778 US7261118B2 (en) | 2003-08-19 | 2004-08-02 | Method and vessel for the delivery of precursor materials |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005101564A JP2005101564A (ja) | 2005-04-14 |
| JP2005101564A5 true JP2005101564A5 (enExample) | 2006-04-06 |
| JP4012181B2 JP4012181B2 (ja) | 2007-11-21 |
Family
ID=34069125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004239630A Expired - Fee Related JP4012181B2 (ja) | 2003-08-19 | 2004-08-19 | 前駆体物質送給方法及び容器 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7261118B2 (enExample) |
| EP (1) | EP1508631B1 (enExample) |
| JP (1) | JP4012181B2 (enExample) |
| KR (1) | KR100590463B1 (enExample) |
| CN (1) | CN100523289C (enExample) |
| AT (1) | ATE466969T1 (enExample) |
| DE (1) | DE602004026968D1 (enExample) |
| IL (1) | IL163536A0 (enExample) |
| SG (2) | SG109618A1 (enExample) |
| TW (1) | TWI257436B (enExample) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7601225B2 (en) * | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
| US7300038B2 (en) | 2002-07-23 | 2007-11-27 | Advanced Technology Materials, Inc. | Method and apparatus to help promote contact of gas with vaporized material |
| US6921062B2 (en) * | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US6909839B2 (en) | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
| JP4312555B2 (ja) * | 2003-09-18 | 2009-08-12 | 富士フイルム株式会社 | 真空蒸着用ルツボおよび蛍光体シート製造装置 |
| GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
| FI121430B (fi) * | 2006-04-28 | 2010-11-15 | Beneq Oy | Kuuma lähde |
| DE102006022534A1 (de) * | 2006-05-15 | 2007-11-22 | Aixtron Ag | Quellenbehälter einse VPE-Reaktors |
| DE102006023046B4 (de) * | 2006-05-17 | 2009-02-05 | Qimonda Ag | Verfahren und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors |
| US20100242835A1 (en) * | 2006-06-09 | 2010-09-30 | S.O.I.T.E.C. Silicon On Insulator Technologies | High volume delivery system for gallium trichloride |
| US20080018004A1 (en) * | 2006-06-09 | 2008-01-24 | Air Products And Chemicals, Inc. | High Flow GaCl3 Delivery |
| KR100840783B1 (ko) | 2006-08-21 | 2008-06-23 | 삼성전자주식회사 | 전구체 기화 방법 및 장치, 및 이를 이용한 유전막 형성방법 |
| US20080241805A1 (en) * | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
| CN101522943B (zh) * | 2006-10-10 | 2013-04-24 | Asm美国公司 | 前体输送系统 |
| US9109287B2 (en) * | 2006-10-19 | 2015-08-18 | Air Products And Chemicals, Inc. | Solid source container with inlet plenum |
| US9481944B2 (en) | 2006-11-22 | 2016-11-01 | Soitec | Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same |
| US9481943B2 (en) * | 2006-11-22 | 2016-11-01 | Soitec | Gallium trichloride injection scheme |
| EP2055804A1 (en) * | 2007-10-29 | 2009-05-06 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Method for preparing a deposition from a vapour |
| US8343583B2 (en) * | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
| JP5898624B2 (ja) | 2009-11-02 | 2016-04-06 | シグマ−アルドリッチ・カンパニー、エルエルシー | 蒸発器 |
| US9809711B2 (en) | 2012-01-17 | 2017-11-07 | Versum Materials Us, Llc | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process |
| US20130243968A1 (en) | 2012-03-16 | 2013-09-19 | Air Products And Chemicals, Inc. | Catalyst synthesis for organosilane sol-gel reactions |
| US9598766B2 (en) | 2012-05-27 | 2017-03-21 | Air Products And Chemicals, Inc. | Vessel with filter |
| KR20200124780A (ko) | 2012-05-31 | 2020-11-03 | 엔테그리스, 아이엔씨. | 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송 |
| US9279604B2 (en) | 2012-06-05 | 2016-03-08 | Applied Materials, Inc. | Compact ampoule thermal management system |
| WO2014018740A1 (en) * | 2012-07-25 | 2014-01-30 | William Kimmerle | Chemical precursor bubbler assembly |
| US10170297B2 (en) | 2013-08-22 | 2019-01-01 | Versum Materials Us, Llc | Compositions and methods using same for flowable oxide deposition |
| US10443128B2 (en) * | 2015-04-18 | 2019-10-15 | Versum Materials Us, Llc | Vessel and method for delivery of precursor materials |
| KR101606681B1 (ko) * | 2016-01-13 | 2016-03-28 | (주)서일퍼시픽 | 이동식 기침 유발기 |
| US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| KR102344996B1 (ko) * | 2017-08-18 | 2021-12-30 | 삼성전자주식회사 | 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
| US10597773B2 (en) * | 2017-08-22 | 2020-03-24 | Praxair Technology, Inc. | Antimony-containing materials for ion implantation |
| JP7230067B2 (ja) | 2018-06-15 | 2023-02-28 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | シロキサン組成物、及び前記組成物を使用してケイ素含有膜を堆積させるための方法 |
| KR20200020608A (ko) | 2018-08-16 | 2020-02-26 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 승화기 |
| CN109576675B (zh) * | 2019-01-15 | 2021-08-13 | 北京北方华创微电子装备有限公司 | 原子层沉积装置及方法 |
| US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| EP4298262A4 (en) | 2021-02-26 | 2025-04-09 | Entegris, Inc. | Solids vaporizer |
| US20240011160A1 (en) * | 2022-07-11 | 2024-01-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thin film deposition with improved control of precursor |
| WO2024166518A1 (ja) * | 2023-02-08 | 2024-08-15 | 株式会社堀場エステック | 液体材料気化装置、液体材料気化システム |
| DE102023136171A1 (de) * | 2023-12-21 | 2025-06-26 | Element 3-5 Gmbh | Vorrichtung zur Herstellung von elektronischen oder opto-elektronischen Bauelementen oder Festkörperbatterieschichten oder von metallischen Einfach- oder Mehrfachschichten |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4723967A (en) * | 1987-04-27 | 1988-02-09 | Advanced Technology Materials, Inc. | Valve block and container for semiconductor source reagent dispensing and/or purification |
| JPH01168331A (ja) * | 1987-12-24 | 1989-07-03 | Mitsui Toatsu Chem Inc | 有機金属化合物の飽和方法 |
| DE3801147A1 (de) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
| JPH0269389A (ja) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
| US5227340A (en) * | 1990-02-05 | 1993-07-13 | Motorola, Inc. | Process for fabricating semiconductor devices using a solid reactant source |
| JPH0632695A (ja) | 1992-07-14 | 1994-02-08 | Fujitsu Ltd | バブラー |
| US5276585A (en) * | 1992-11-16 | 1994-01-04 | Thermalloy, Inc. | Heat sink mounting apparatus |
| US5381605A (en) * | 1993-01-08 | 1995-01-17 | Photonics Research Incorporated | Method and apparatus for delivering gas |
| US5377429A (en) * | 1993-04-19 | 1995-01-03 | Micron Semiconductor, Inc. | Method and appartus for subliming precursors |
| US5607002A (en) * | 1993-04-28 | 1997-03-04 | Advanced Delivery & Chemical Systems, Inc. | Chemical refill system for high purity chemicals |
| US5707424A (en) * | 1994-10-13 | 1998-01-13 | Advanced Technology Materials, Inc. | Process system with integrated gas storage and delivery unit |
| JP3417751B2 (ja) * | 1995-02-13 | 2003-06-16 | 株式会社東芝 | 半導体装置の製造方法 |
| US5989305A (en) * | 1995-03-09 | 1999-11-23 | Shin-Etsu Chemical Co., Ltd. | Feeder of a solid organometallic compound |
| US5674574A (en) * | 1996-05-20 | 1997-10-07 | Micron Technology, Inc. | Vapor delivery system for solid precursors and method regarding same |
| US6058012A (en) * | 1996-08-26 | 2000-05-02 | Compaq Computer Corporation | Apparatus, method and system for thermal management of an electronic system having semiconductor devices |
| KR100364115B1 (ko) * | 1996-12-17 | 2002-12-11 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 화학 증착용 시약 공급 용기 |
| US6089184A (en) * | 1997-06-11 | 2000-07-18 | Tokyo Electron Limited | CVD apparatus and CVD method |
| US6520218B1 (en) * | 1998-09-03 | 2003-02-18 | Advanced Technology Materials, Inc. | Container chemical guard |
| US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
| JP2000345345A (ja) * | 1999-06-04 | 2000-12-12 | Mitsubishi Electric Corp | Cvd装置およびcvd装置用気化装置 |
| US6444038B1 (en) * | 1999-12-27 | 2002-09-03 | Morton International, Inc. | Dual fritted bubbler |
| KR100360494B1 (ko) * | 1999-09-21 | 2002-11-13 | 삼성전자 주식회사 | 기화장치 |
| US6244331B1 (en) * | 1999-10-22 | 2001-06-12 | Intel Corporation | Heatsink with integrated blower for improved heat transfer |
| GB9929279D0 (en) | 1999-12-11 | 2000-02-02 | Epichem Ltd | An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites |
| EP1160355B1 (en) * | 2000-05-31 | 2004-10-27 | Shipley Company LLC | Bubbler |
| US6837251B1 (en) * | 2000-06-21 | 2005-01-04 | Air Products And Chemicals, Inc. | Multiple contents container assembly for ultrapure solvent purging |
| US6581649B2 (en) * | 2001-07-13 | 2003-06-24 | L'air Liquide - Societe Anonyme A'directiore Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Methods and apparatus for delivering high purity liquids with low vapor pressure |
| US7780785B2 (en) * | 2001-10-26 | 2010-08-24 | Applied Materials, Inc. | Gas delivery apparatus for atomic layer deposition |
| US20030111014A1 (en) * | 2001-12-18 | 2003-06-19 | Donatucci Matthew B. | Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds |
| JP2003318170A (ja) | 2002-04-26 | 2003-11-07 | Japan Pionics Co Ltd | 気化器 |
| JP3822135B2 (ja) | 2002-05-13 | 2006-09-13 | 日本パイオニクス株式会社 | 気化供給装置 |
| US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
| US7186385B2 (en) * | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
| US6921062B2 (en) * | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US6915592B2 (en) * | 2002-07-29 | 2005-07-12 | Applied Materials, Inc. | Method and apparatus for generating gas to a processing chamber |
| US6797337B2 (en) * | 2002-08-19 | 2004-09-28 | Micron Technology, Inc. | Method for delivering precursors |
| US6740586B1 (en) * | 2002-11-06 | 2004-05-25 | Advanced Technology Materials, Inc. | Vapor delivery system for solid precursors and method of using same |
| US6909839B2 (en) * | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
-
2004
- 2004-08-02 US US10/902,778 patent/US7261118B2/en not_active Expired - Lifetime
- 2004-08-12 IL IL16353604A patent/IL163536A0/xx unknown
- 2004-08-13 SG SG200405525A patent/SG109618A1/en unknown
- 2004-08-13 SG SG200700792-5A patent/SG130188A1/en unknown
- 2004-08-16 TW TW93124581A patent/TWI257436B/zh not_active IP Right Cessation
- 2004-08-17 EP EP20040019503 patent/EP1508631B1/en not_active Expired - Lifetime
- 2004-08-17 KR KR1020040064595A patent/KR100590463B1/ko not_active Expired - Fee Related
- 2004-08-17 AT AT04019503T patent/ATE466969T1/de not_active IP Right Cessation
- 2004-08-17 DE DE200460026968 patent/DE602004026968D1/de not_active Expired - Lifetime
- 2004-08-19 JP JP2004239630A patent/JP4012181B2/ja not_active Expired - Fee Related
- 2004-08-19 CN CNB2004100832841A patent/CN100523289C/zh not_active Expired - Lifetime
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