KR100590463B1 - 선구 물질 이송 방법 및 이송 용기 - Google Patents

선구 물질 이송 방법 및 이송 용기 Download PDF

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Publication number
KR100590463B1
KR100590463B1 KR1020040064595A KR20040064595A KR100590463B1 KR 100590463 B1 KR100590463 B1 KR 100590463B1 KR 1020040064595 A KR1020040064595 A KR 1020040064595A KR 20040064595 A KR20040064595 A KR 20040064595A KR 100590463 B1 KR100590463 B1 KR 100590463B1
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South Korea
Prior art keywords
container
volume
lid
vessel
precursor
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Expired - Fee Related
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KR1020040064595A
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English (en)
Korean (ko)
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KR20050020643A (ko
Inventor
버쳐샤를리즈마이클
더닝리차드제이
클라크로버트다니엘
호치버그아더케네스
스테이들토마스앤드류
Original Assignee
에어 프로덕츠 앤드 케미칼스, 인코오포레이티드
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Publication of KR20050020643A publication Critical patent/KR20050020643A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0391—Affecting flow by the addition of material or energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/4891—With holder for solid, flaky or pulverized material to be dissolved or entrained

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
KR1020040064595A 2003-08-19 2004-08-17 선구 물질 이송 방법 및 이송 용기 Expired - Fee Related KR100590463B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US49618703P 2003-08-19 2003-08-19
US60/496187 2003-08-19
US58729504P 2004-07-12 2004-07-12
US60/587295 2004-07-12
US10/902,778 US7261118B2 (en) 2003-08-19 2004-08-02 Method and vessel for the delivery of precursor materials
US10/902778 2004-08-02

Publications (2)

Publication Number Publication Date
KR20050020643A KR20050020643A (ko) 2005-03-04
KR100590463B1 true KR100590463B1 (ko) 2006-06-19

Family

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KR1020040064595A Expired - Fee Related KR100590463B1 (ko) 2003-08-19 2004-08-17 선구 물질 이송 방법 및 이송 용기

Country Status (10)

Country Link
US (1) US7261118B2 (enExample)
EP (1) EP1508631B1 (enExample)
JP (1) JP4012181B2 (enExample)
KR (1) KR100590463B1 (enExample)
CN (1) CN100523289C (enExample)
AT (1) ATE466969T1 (enExample)
DE (1) DE602004026968D1 (enExample)
IL (1) IL163536A0 (enExample)
SG (2) SG109618A1 (enExample)
TW (1) TWI257436B (enExample)

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WO2014018740A1 (en) * 2012-07-25 2014-01-30 William Kimmerle Chemical precursor bubbler assembly

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014018740A1 (en) * 2012-07-25 2014-01-30 William Kimmerle Chemical precursor bubbler assembly

Also Published As

Publication number Publication date
JP2005101564A (ja) 2005-04-14
TWI257436B (en) 2006-07-01
SG109618A1 (en) 2005-03-30
JP4012181B2 (ja) 2007-11-21
SG130188A1 (en) 2007-03-20
US7261118B2 (en) 2007-08-28
CN100523289C (zh) 2009-08-05
IL163536A0 (en) 2005-12-18
US20050039794A1 (en) 2005-02-24
ATE466969T1 (de) 2010-05-15
KR20050020643A (ko) 2005-03-04
DE602004026968D1 (de) 2010-06-17
EP1508631B1 (en) 2010-05-05
EP1508631A1 (en) 2005-02-23
TW200525046A (en) 2005-08-01
CN1611636A (zh) 2005-05-04

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