ATE466969T1 - Vorrichtung und verfahren zum abgeben von vorläufermaterial - Google Patents

Vorrichtung und verfahren zum abgeben von vorläufermaterial

Info

Publication number
ATE466969T1
ATE466969T1 AT04019503T AT04019503T ATE466969T1 AT E466969 T1 ATE466969 T1 AT E466969T1 AT 04019503 T AT04019503 T AT 04019503T AT 04019503 T AT04019503 T AT 04019503T AT E466969 T1 ATE466969 T1 AT E466969T1
Authority
AT
Austria
Prior art keywords
volume
lid
protrusion
precursor
sidewall
Prior art date
Application number
AT04019503T
Other languages
German (de)
English (en)
Inventor
Charles Michael Birtcher
Richard J Dunning
Robert Daniel Clark
Arthur Kenneth Hochberg
Thomas Andrew Steidl
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Application granted granted Critical
Publication of ATE466969T1 publication Critical patent/ATE466969T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0391—Affecting flow by the addition of material or energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/4891—With holder for solid, flaky or pulverized material to be dissolved or entrained

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
AT04019503T 2003-08-19 2004-08-17 Vorrichtung und verfahren zum abgeben von vorläufermaterial ATE466969T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US49618703P 2003-08-19 2003-08-19
US58729504P 2004-07-12 2004-07-12
US10/902,778 US7261118B2 (en) 2003-08-19 2004-08-02 Method and vessel for the delivery of precursor materials

Publications (1)

Publication Number Publication Date
ATE466969T1 true ATE466969T1 (de) 2010-05-15

Family

ID=34069125

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04019503T ATE466969T1 (de) 2003-08-19 2004-08-17 Vorrichtung und verfahren zum abgeben von vorläufermaterial

Country Status (10)

Country Link
US (1) US7261118B2 (enExample)
EP (1) EP1508631B1 (enExample)
JP (1) JP4012181B2 (enExample)
KR (1) KR100590463B1 (enExample)
CN (1) CN100523289C (enExample)
AT (1) ATE466969T1 (enExample)
DE (1) DE602004026968D1 (enExample)
IL (1) IL163536A0 (enExample)
SG (2) SG109618A1 (enExample)
TW (1) TWI257436B (enExample)

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Also Published As

Publication number Publication date
JP2005101564A (ja) 2005-04-14
TWI257436B (en) 2006-07-01
SG109618A1 (en) 2005-03-30
JP4012181B2 (ja) 2007-11-21
SG130188A1 (en) 2007-03-20
US7261118B2 (en) 2007-08-28
CN100523289C (zh) 2009-08-05
KR100590463B1 (ko) 2006-06-19
IL163536A0 (en) 2005-12-18
US20050039794A1 (en) 2005-02-24
KR20050020643A (ko) 2005-03-04
DE602004026968D1 (de) 2010-06-17
EP1508631B1 (en) 2010-05-05
EP1508631A1 (en) 2005-02-23
TW200525046A (en) 2005-08-01
CN1611636A (zh) 2005-05-04

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