JP2005068117A - 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法。 - Google Patents
新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法。 Download PDFInfo
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- JP2005068117A JP2005068117A JP2003304060A JP2003304060A JP2005068117A JP 2005068117 A JP2005068117 A JP 2005068117A JP 2003304060 A JP2003304060 A JP 2003304060A JP 2003304060 A JP2003304060 A JP 2003304060A JP 2005068117 A JP2005068117 A JP 2005068117A
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- -1 sulfonyldiazomethane compound Chemical class 0.000 title claims abstract description 268
- 239000002253 acid Substances 0.000 title claims abstract description 111
- 239000000463 material Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims abstract description 27
- 150000001875 compounds Chemical class 0.000 claims abstract description 67
- 239000011347 resin Substances 0.000 claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 41
- 239000003513 alkali Substances 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 230000005855 radiation Effects 0.000 claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 239000007788 liquid Substances 0.000 claims abstract 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 88
- 229920000642 polymer Polymers 0.000 claims description 63
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 52
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 34
- 125000000217 alkyl group Chemical group 0.000 claims description 33
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 32
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 32
- 125000001424 substituent group Chemical group 0.000 claims description 32
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 26
- 239000002904 solvent Substances 0.000 claims description 26
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 25
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 24
- 125000004122 cyclic group Chemical group 0.000 claims description 19
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 claims description 17
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 125000002947 alkylene group Chemical group 0.000 claims description 12
- 150000007514 bases Chemical class 0.000 claims description 11
- 150000005215 alkyl ethers Chemical class 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 125000000623 heterocyclic group Chemical group 0.000 claims description 8
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 125000005842 heteroatom Chemical group 0.000 claims description 7
- 150000002430 hydrocarbons Chemical group 0.000 claims description 7
- 125000005188 oxoalkyl group Chemical group 0.000 claims description 6
- 125000004665 trialkylsilyl group Chemical group 0.000 claims description 6
- 150000007524 organic acids Chemical class 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 125000005396 acrylic acid ester group Chemical group 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- 150000002469 indenes Chemical class 0.000 claims description 4
- 125000005397 methacrylic acid ester group Chemical group 0.000 claims description 4
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N Lactic Acid Natural products CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims 1
- 235000014655 lactic acid Nutrition 0.000 claims 1
- 239000004310 lactic acid Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 6
- 230000003321 amplification Effects 0.000 abstract description 4
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 4
- 229920001577 copolymer Polymers 0.000 description 52
- 230000015572 biosynthetic process Effects 0.000 description 36
- 238000003786 synthesis reaction Methods 0.000 description 36
- 150000001412 amines Chemical class 0.000 description 33
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 31
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 29
- 239000007983 Tris buffer Substances 0.000 description 27
- CSYSRRCOBYEGPI-UHFFFAOYSA-N diazo(sulfonyl)methane Chemical compound [N-]=[N+]=C=S(=O)=O CSYSRRCOBYEGPI-UHFFFAOYSA-N 0.000 description 24
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 23
- 239000000203 mixture Substances 0.000 description 22
- 229910052757 nitrogen Inorganic materials 0.000 description 21
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 20
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 20
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 15
- 238000011161 development Methods 0.000 description 14
- 230000018109 developmental process Effects 0.000 description 14
- 239000007787 solid Substances 0.000 description 13
- KZJRKRQSDZGHEC-UHFFFAOYSA-N 2,2,2-trifluoro-1-phenylethanone Chemical compound FC(F)(F)C(=O)C1=CC=CC=C1 KZJRKRQSDZGHEC-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 238000004090 dissolution Methods 0.000 description 12
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 12
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 9
- 239000012044 organic layer Substances 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- JAGRUUPXPPLSRX-UHFFFAOYSA-N 4-prop-1-en-2-ylphenol Chemical compound CC(=C)C1=CC=C(O)C=C1 JAGRUUPXPPLSRX-UHFFFAOYSA-N 0.000 description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 8
- 235000013772 propylene glycol Nutrition 0.000 description 8
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 8
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 8
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 8
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000003431 cross linking reagent Substances 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 7
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 6
- 229940077388 benzenesulfonate Drugs 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 239000003112 inhibitor Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 6
- VINRTVDNUHIWCB-UHFFFAOYSA-N 2,2,2-trifluoro-1-(2,4,6-trimethylphenyl)ethanone Chemical compound CC1=CC(C)=C(C(=O)C(F)(F)F)C(C)=C1 VINRTVDNUHIWCB-UHFFFAOYSA-N 0.000 description 5
- NCJZVRPXSSYDBG-UHFFFAOYSA-N 2,2,2-trifluoro-1-(4-methoxyphenyl)ethanone Chemical compound COC1=CC=C(C(=O)C(F)(F)F)C=C1 NCJZVRPXSSYDBG-UHFFFAOYSA-N 0.000 description 5
- IKMBXKGUMLSBOT-UHFFFAOYSA-M 2,3,4,5,6-pentafluorobenzenesulfonate Chemical compound [O-]S(=O)(=O)C1=C(F)C(F)=C(F)C(F)=C1F IKMBXKGUMLSBOT-UHFFFAOYSA-M 0.000 description 5
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 5
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 5
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 5
- RLTPXEAFDJVHSN-UHFFFAOYSA-N 4-(trifluoromethyl)benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C(F)(F)F)C=C1 RLTPXEAFDJVHSN-UHFFFAOYSA-N 0.000 description 5
- KFABWRQACOZELL-UHFFFAOYSA-N 4-ethenylphenol;methyl prop-2-enoate Chemical compound COC(=O)C=C.OC1=CC=C(C=C)C=C1 KFABWRQACOZELL-UHFFFAOYSA-N 0.000 description 5
- QTIUDCKTDDTUJM-UHFFFAOYSA-N 4-ethenylphenol;styrene Chemical compound C=CC1=CC=CC=C1.OC1=CC=C(C=C)C=C1 QTIUDCKTDDTUJM-UHFFFAOYSA-N 0.000 description 5
- WVSYONICNIDYBE-UHFFFAOYSA-M 4-fluorobenzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=C(F)C=C1 WVSYONICNIDYBE-UHFFFAOYSA-M 0.000 description 5
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 5
- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 5
- SVSARCCKBMZNMR-UHFFFAOYSA-N [1-[2-[methyl-[2-[4-(oxoazaniumylmethylidene)pyridin-1-yl]ethyl]amino]ethyl]pyridin-4-ylidene]methyl-oxoazanium;dichloride Chemical compound [Cl-].[Cl-].C1=CC(=C[NH+]=O)C=CN1CCN(C)CCN1C=CC(=C[NH+]=O)C=C1 SVSARCCKBMZNMR-UHFFFAOYSA-N 0.000 description 5
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- FWBXAOOHHILPSR-UHFFFAOYSA-N cyclohexylmethanethiol Chemical compound SCC1CCCCC1 FWBXAOOHHILPSR-UHFFFAOYSA-N 0.000 description 5
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 5
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 5
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 5
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 5
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 5
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- WLGDAKIJYPIYLR-UHFFFAOYSA-M octane-1-sulfonate Chemical compound CCCCCCCCS([O-])(=O)=O WLGDAKIJYPIYLR-UHFFFAOYSA-M 0.000 description 5
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 5
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 5
- 229960004889 salicylic acid Drugs 0.000 description 5
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 5
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 5
- 230000005469 synchrotron radiation Effects 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 150000003573 thiols Chemical class 0.000 description 5
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 5
- 229940070710 valerate Drugs 0.000 description 5
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 description 4
- KYXIHKXHBSORRJ-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)-2,2,2-trifluoroethanone Chemical compound CC1=CC=C(C(=O)C(F)(F)F)C(C)=C1 KYXIHKXHBSORRJ-UHFFFAOYSA-N 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- XGMDYIYCKWMWLY-UHFFFAOYSA-N 2,2,2-trifluoroethanesulfonic acid Chemical compound OS(=O)(=O)CC(F)(F)F XGMDYIYCKWMWLY-UHFFFAOYSA-N 0.000 description 4
- YHGKEORTCHVBQH-UHFFFAOYSA-M 2,4,6-tri(propan-2-yl)benzenesulfonate Chemical compound CC(C)C1=CC(C(C)C)=C(S([O-])(=O)=O)C(C(C)C)=C1 YHGKEORTCHVBQH-UHFFFAOYSA-M 0.000 description 4
- MAWMJWPWEVGOLS-UHFFFAOYSA-N 2-[4-[[diazo-[[4-(1,3-dioxolan-2-yl)cyclohexyl]methylsulfonyl]methyl]sulfonylmethyl]cyclohexyl]-1,3-dioxolane Chemical compound C1CC(C2OCCO2)CCC1CS(=O)(=O)C(=[N+]=[N-])S(=O)(=O)CC(CC1)CCC1C1OCCO1 MAWMJWPWEVGOLS-UHFFFAOYSA-N 0.000 description 4
- CFFZDZCDUFSOFZ-UHFFFAOYSA-N 3,4-Dihydroxy-phenylacetic acid Chemical compound OC(=O)CC1=CC=C(O)C(O)=C1 CFFZDZCDUFSOFZ-UHFFFAOYSA-N 0.000 description 4
- CJBDUOMQLFKVQC-UHFFFAOYSA-N 3-(2-hydroxyphenyl)propanoic acid Chemical compound OC(=O)CCC1=CC=CC=C1O CJBDUOMQLFKVQC-UHFFFAOYSA-N 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- XQXPVVBIMDBYFF-UHFFFAOYSA-N 4-hydroxyphenylacetic acid Chemical compound OC(=O)CC1=CC=C(O)C=C1 XQXPVVBIMDBYFF-UHFFFAOYSA-N 0.000 description 4
- 125000004864 4-thiomethylphenyl group Chemical group 0.000 description 4
- UZOPBVPWPWOJGF-UHFFFAOYSA-N 5-(4-hydroxyphenyl)-2-methylidenepent-4-enoic acid Chemical compound OC(=O)C(=C)CC=CC1=CC=C(O)C=C1 UZOPBVPWPWOJGF-UHFFFAOYSA-N 0.000 description 4
- CYYTUYSFBHDJRH-UHFFFAOYSA-N 5-(4-hydroxyphenyl)penta-2,4-dienoic acid Chemical compound OC(=O)C=CC=CC1=CC=C(O)C=C1 CYYTUYSFBHDJRH-UHFFFAOYSA-N 0.000 description 4
- XGWFJBFNAQHLEF-UHFFFAOYSA-N 9-anthroic acid Chemical compound C1=CC=C2C(C(=O)O)=C(C=CC=C3)C3=CC2=C1 XGWFJBFNAQHLEF-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 4
- 229920002125 Sokalan® Polymers 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 4
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- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- NRZWQKGABZFFKE-UHFFFAOYSA-N trimethylsulfonium Chemical compound C[S+](C)C NRZWQKGABZFFKE-UHFFFAOYSA-N 0.000 description 1
- PHYFQTYBJUILEZ-IUPFWZBJSA-N triolein Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CCCCCCCC)COC(=O)CCCCCCC\C=C/CCCCCCCC PHYFQTYBJUILEZ-IUPFWZBJSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- QKFJVDSYTSWPII-UHFFFAOYSA-N tris(4-methylphenyl)sulfanium Chemical compound C1=CC(C)=CC=C1[S+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 QKFJVDSYTSWPII-UHFFFAOYSA-N 0.000 description 1
- ZMOJTPABCOWEOS-UHFFFAOYSA-N tris(4-tert-butylphenyl)sulfanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[S+](C=1C=CC(=CC=1)C(C)(C)C)C1=CC=C(C(C)(C)C)C=C1 ZMOJTPABCOWEOS-UHFFFAOYSA-N 0.000 description 1
- DMJFWVWYOPMJIK-UHFFFAOYSA-N tris[3,4-bis[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound C1=C(OC(C)(C)C)C(OC(C)(C)C)=CC=C1[S+](C=1C=C(OC(C)(C)C)C(OC(C)(C)C)=CC=1)C1=CC=C(OC(C)(C)C)C(OC(C)(C)C)=C1 DMJFWVWYOPMJIK-UHFFFAOYSA-N 0.000 description 1
- HENPLGIMUIZOJQ-UHFFFAOYSA-N tris[3-[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound CC(C)(C)OC1=CC=CC([S+](C=2C=C(OC(C)(C)C)C=CC=2)C=2C=C(OC(C)(C)C)C=CC=2)=C1 HENPLGIMUIZOJQ-UHFFFAOYSA-N 0.000 description 1
- YNIMTIPTLNZOMC-UHFFFAOYSA-N tris[4-(dimethylamino)phenyl]sulfanium Chemical compound C1=CC(N(C)C)=CC=C1[S+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 YNIMTIPTLNZOMC-UHFFFAOYSA-N 0.000 description 1
- PNXQORBBJALXKA-UHFFFAOYSA-N tris[4-[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound C1=CC(OC(C)(C)C)=CC=C1[S+](C=1C=CC(OC(C)(C)C)=CC=1)C1=CC=C(OC(C)(C)C)C=C1 PNXQORBBJALXKA-UHFFFAOYSA-N 0.000 description 1
- JXPBRQHHMIKAPW-UHFFFAOYSA-N tris[4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]sulfanium Chemical compound C1=CC(OCC(=O)OC(C)(C)C)=CC=C1[S+](C=1C=CC(OCC(=O)OC(C)(C)C)=CC=1)C1=CC=C(OCC(=O)OC(C)(C)C)C=C1 JXPBRQHHMIKAPW-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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Abstract
【解決手段】 下記一般式(1)で示されるスルホニルジアゾメタン化合物及び該化合物を含んでなる光酸発生剤。また、(A)酸の作用でアルカリ現像液に対する溶解性が変化する樹脂と、(B)放射線照射により酸を発生する上記一般式(1)で示されるスルホニルジアゾメタン化合物とを含んでなる化学増幅型レジスト材料。さらに、このレジスト材料を基板上に塗布する工程と、次いで加熱処理する工程と、露光する工程と、その後、必要に応じて加熱処理した後、現像液を用いて現像する工程とを含んでなるパターン形成方法。
例えば、
【選択図】 なし
Description
本発明は、まず第1に上記一般式(1)で示される新規なスルホニルジアゾメタン化合物を提供するものである。一般式(1)で示されるスルホニルジアゾメタン化合物としては、特に好ましくは下記式(1a)(1a')(1a'')で示されるアルキルシクロヘキシルメチル基を有するスルホニルジアゾメタン化合物である。
具体的には、水素原子、メチル基、エチル基、n−プロピル基、イソプロピル基、シクロプロピル基、n−ブチル基、sec−ブチル基、イソブチル基、tert−ブチル基、n−ペンチル基、sec−ペンチル基、イソペンチル基、tert−ペンチル基、ネオペンチル基、n−ヘキシル基、イソヘキシル基、テキシル基、また、上記アルキル基の水素原子の一部又は全部が塩素やフッ素等のハロゲンで置換されたもの等が挙げられるが、これらに限定されるものではない。中でも水素原子、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基が好適に用いられ、特には水素原子がより好適に用いられる。
なお、炭素数が少ない場合は比較的分子量の低い酸を発生し、レジスト中での拡散の問題が解決されず、多い場合は原料チオールの沸点が高すぎる等の合成上の問題点があるため、好ましくは炭素数10〜18のシクロヘキシル基であることが好ましい。より好ましくは炭素数10〜12である。また、現像後のパターン形成時、更にはレジスト剥離時に異物を生ずる問題を解決するためケタール性炭素を有するシクロヘキシル基であることが好ましい。
具体的には、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、イソブチル基、tert−ブチル基、n−ペンチル基、sec−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基等の直鎖状、分岐状又は環状のアルキル基、あるいはフェニル基、4−メチルフェニル基、4−エチルフェニル基、4−メトキシフェニル基、4−tert−ブチルフェニル基、4−tert−ブトキシフェニル基、4−シクロヘキシルフェニル基、4−シクロヘキシロキシフェニル基、2,4−ジメチルフェニル基、2,4,6−トリメチルフェニル基、2,4,6−トリイソプロピルフェニル基、1−ナフチル基、2−ナフチル基、また、上記アルキル基やアリール基の水素原子の一部又は全部が塩素やフッ素等のハロゲンで置換されたもの等が挙げられるが、これらに限定されるものではない。中でもtert−ブチル基、シクロへキシル基が好適に用いられる。
具体的には、水素原子、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、イソブチル基、tert−ブチル基、n−ペンチル基、sec−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基等の直鎖状、分岐状又は環状のアルキル基等が挙げられるが、これらに限定されるものではない。中でも水素原子、メチル基が好適に用いられる。
また、複数のR3が相互に共同してそれらが結合している炭素原子を含めた炭素数6〜12の脂環式炭化水素構造又は複素環状構造を形成してもよい。具体的にはメチレン基、エチレン基等が挙げられるが、これらに限定されるものではない。mは0〜9の整数である。
具体的には、エチレン基、トリメチレン基、2,2−ジメチルトリメチレン基、プロピレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基等の直鎖状、分岐状のアルキレン基が挙げられるが、これらに限定されるものではない。中でもエチレン基が好適に用いられる。
まず、p=2の場合、即ち対称型のビススルホニルジアゾメタンの場合には、特開平3−103854号公報のように、対応するチオールをジクロロメタンと塩基性条件下で縮合することが望ましい。より具体的には、シクロヘキシルメタンチオール等のアルキル基含有のチオールをメタノール、エタノール等のアルコール溶媒中で塩基として水酸化ナトリウム、水酸化カリウムを用いてジクロロメタンと縮合させ、スルフェニルメタンを得る方法がある。
あるいはチオールをパラホルムアルデヒドと硫酸あるいはトリフルオロメタンスルホン酸のような酸性条件下で縮合することにより得ることもできる。
<1>(A)酸の作用でアルカリ現像液に対する溶解性が変化する樹脂、
(B)上記一般式(1)又は(1a)(1a')(1a'')で示される放射線照射により酸を発生するスルホニルジアゾメタン化合物、
(F)有機溶剤、
を含むことを特徴とする化学増幅ポジ型レジスト材料、
<2>更に、
(C)放射線照射により酸を発生する(B)成分以外の光酸発生剤、
を含むことを特徴とする<1>記載の化学増幅ポジ型レジスト材料、
<3>更に、
(D)塩基性添加物、
を含むことを特徴とする<1>又は<2>に記載の化学増幅ポジ型レジスト材料、
<4>更に、
(E)有機酸誘導体
を含むことを特徴とする<1>〜<3>のいずれかに記載の化学増幅ポジ型レジスト材料、
<5>更に、
(G)酸の作用でアルカリ現像液に対する溶解性が変化する分子量3,000以下の化合物、
を含むことを特徴とする<1>〜<4>のいずれかに記載の化学増幅ポジ型レジスト材料、
<6>(B)上記一般式(1)又は(1a)(1a')(1a'')で示される放射線照射により酸を発生するスルホニルジアゾメタン化合物、
(F)有機溶剤、
(H)アルカリ可溶性樹脂、
(I)酸の作用により架橋構造を形成する酸架橋剤、
を含むことを特徴とする化学増幅ネガ型レジスト材料、
<7>更に、
(C)を含むことを特徴とする<6>に記載の化学増幅ネガ型レジスト材料、
<8>更に、
(D)を含むことを特徴とする<6>又は<7>に記載の化学増幅ネガ型レジスト材料
<9>更に
(J)分子量2500以下のアルカリ可溶性化合物、
を含むことを特徴とする<6>〜<8>記載の化学増幅ネガ型レジスト材料、
が挙げられるが、これに限定されるものではない。
(A)成分の酸の作用でアルカリ現像液に対する溶解性が変化する樹脂としては、特に制限されないが、アルカリ可溶性樹脂のフェノール性水酸基及び/又はカルボキシル基の一部あるいは全部をC−O−Cを有する酸に不安定な保護基で保護したものである。
上記式(2’’)の高分子化合物を合成するには1つの方法としては、アセトキシスチレンモノマーと(メタ)アクリル酸三級アルキルエステルモノマーとインデンモノマーを有機溶媒中でラジカル開始剤を加えて加熱重合を行なう。その後、得られた高分子化合物を有機溶媒中でアルカリ加水分解してアセトキシ基を脱保護しヒドロキシスチレンと(メタ)アクリル酸三級エステルとインデンの3成分共重合体を得ることができる。なお、(メタ)アクリル酸は、メタクル酸又はアクリル酸を示す。
これらは特開2000-344836号公報を参考に合成する事ができる。
また、分散度は3.5以下、好ましくは1.5以下が好ましい。分散度が3.5より大きいと解像性が劣化する場合が多い。
製造方法は、特に限定されないが、ポリ−p−ヒドロキシスチレン等にはリビングアニオン重合を用いることで分散度の低い(挟分散性の)ポリマーを合成することができる。
R9、R10としては、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、シクロペンチル基、シクロヘキシル基、2−エチルヘキシル基、n−オクチル基等を例示できる。
R12は、三級アルキル基として、具体的には、tert−ブチル基、tert−ペンチル基、1,1−ジエチルプロピル基、1−エチルシクロペンチル基、1−ブチルシクロペンチル基、1−エチルシクロヘキシル基、1−ブチルシクロヘキシル基、1−エチル−2−シクロペンテニル基、1−エチル−2−シクロヘキセニル基、2−メチル−2−アダマンチル基、2−エチル-2-アダマンチル基、1−アダマンチル-1-メチル-エチル基等が挙げられる。トリアルキルシリル基として、具体的には、トリメチルシリル基、トリエチルシリル基、ジメチル−tert−ブチルシリル基等が挙げられる。オキソアルキル基として、具体的には、3−オキソシクロヘキシル基、4−メチル−2−オキソオキサン−4−イル基、5−メチル−5−オキソオキソラン−4−イル基等が挙げられる。zは、0〜6の整数である。
直鎖状、分岐状、環状のアルキル基としては、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、tert−ペンチル基、n−ペンチル基、n−ヘキシル基、シクロペンチル基、シクロヘキシル基、シクロペンチルメチル基、シクロペンチルエチル基、シクロヘキシルメチル基、シクロヘキシルエチル基等を例示できる。
置換されていてもよいアリール基としては、具体的には、フェニル基、メチルフェニル基、ナフチル基、アンスリル基、フェナンスリル基、ピレニル基等を例示できる。iは0又は1、jは0、1、2、3のいずれかであり、2i+j=2又は3を満足する数である。
R15〜R24は、互いに環を形成していてもよく(例えば、R15とR16、R15とR17、R16とR18、R17とR18、R19とR20、R21とR22等)、その場合には炭素数1〜15のヘテロ原子を含んでもよい2価の炭化水素基を示し、上記1価の炭化水素基で例示したものから水素原子を1個除いたもの等を例示できる。また、R15〜R24は隣接する炭素に結合するもの同士で何も介さずに結合し、二重結合を形成してもよい(例えば、R15とR17、R17とR23、R21とR23等)。
好ましくは、(8)式において、R25がメチル基、R26が水素原子、aが1、bが0、AAがエチレン、1,4−ブチレン又は1,4−シクロヘキシレンである。
また、酸触媒条件の下で他の酸不安定基の分解が進行する場合には、上記のアルケニルエーテルを塩酸等と反応させハロゲン化アルキルエーテルとした後、常法により塩基性条件下で高分子化合物と反応させ、目的物を得ることができる。
これら置換基は、同一ポリマー内に単独でも、2種以上存在していてもよい。なお、違う種類の置換基を有するポリマーのブレンドでもよい。
カルボキシル基の割合が多いポリマーを用いた場合には、アルカリ溶解速度を下げるため置換率を高くする、或いは後述する非酸分解性の置換基を導入することが必要である。
好適な光酸発生剤としては、スルホニウム塩、ヨードニウム塩、スルホニルジアゾメタン、N−スルホニルオキシジカルボキシイミド型酸発生剤等がある。以下に詳述するが、これらは単独或いは2種以上混合して用いることができる。
酸増殖化合物の例としては、tert−ブチル−2−メチル−2−トシロキシメチルアセトアセテート、2−フェニル2−(2−トシロキシエチル)1,3−ジオキソラン等が挙げられるがこれらに限定されるものではない。公知の光酸発生剤の中で安定性、特に熱安定性に劣る化合物は酸増殖化合物的な性質を示す場合が多い。
これらの溶剤は単独又は2種以上混合してもよい。
好ましい混合溶剤の例はプロピレングリコールアルキルエーテルアセテートと乳酸アルキルエステルである。
なお、本発明におけるプロピレングリコールアルキルエーテルアセテートのアルキル基は炭素数1〜4のもの、例えばメチル基、エチル基、プロピル基等が挙げられるが、中でもメチル基、エチル基が好適である。また、このプロピレングリコールアルキルエーテルアセテートには1,2置換体と1,3置換体があり、置換位置の組み合わせで3種の異性体があるが、単独あるいは混合いずれの場合でもよい。
また、分散度は、3.5以下、好ましくは1.5以下が好ましい。分散度が3.5より大きいと解像性が劣化する場合が多い。製造方法には特に限定されないが、ポリ−p−ヒドロキシスチレン等にはリビングアニオン重合を用いることで分散性の低い(挟分散性の)ポリマーを合成することができる。
集積回路製造用の基板(Si,SiO2,SiN,SiON,TiN,WSi,BPSG,SOG,有機反射防止膜等)上にスピンコート、ロールコート、フローコート、ディップコート、スプレーコート、ドクターコート等の適当な塗布方法により塗布膜厚が0.1〜2.0μmとなるように塗布し、ホットプレート上で60〜150℃、1〜10分間、より好ましくは80〜120℃、1〜5分間プリベークする。
次いで、紫外線、遠紫外線、電子線、X線、エキシマーレーザー、γ線、シンクロトロン放射線などから選ばれる光源好ましくは300nm以下の露光波長で目的とするパターンを所定のマスクを通じて露光を行う。露光量は1〜200mJ/cm2程度、より好ましくは10〜100mJ/cm2程度となるように露光することが好ましい。
必要に応じて、ホットプレート上で60〜150℃、1〜5分間、より好ましくは80〜120℃、1〜3分間ポストエクスポージャベーク(PEB)する。この加熱が必要となるのは、例えば、加熱なしでは酸不安定基の解離反応が起こりにくく、充分な解像性が得られない場合である。
合成例1 ((4−(1,3−ジオキソラン−2−イル)−1−ヒドロキシシクロヘキシル)メチル)トリメチルシランの合成
(クロロメチル)トリメチルシラン44.6g(0.36モル)と金属マグネシウム8.8g(0.36モル)、ジエチルエーテル194gを用いて、常法によりGrignard試薬を調製した。このGrignard試薬に1,4−シクロヘキサンジオンモノケタール50.9g(0.33モル)を氷水浴上で20℃を超えない温度で加えた。40℃で2時間撹拌した後、氷水浴上で水125gを加えた。分離した上澄みだけを分取し飽和食塩水200gで洗浄した後、溶媒を減圧除去して((4−(1,3−ジオキソラン−2−イル)−1−ヒドロキシシクロヘキシル)メチル)トリメチルシラン77.6gを得た。
水素化ナトリウム15.7g(0.39モル)をn−ヘキサンで洗浄しテトラヒドロフラン199gに懸濁させた。そこへ上記ヒドロキシシランをテトラヒドロフラン112gに溶解させた溶液を滴下し、加熱還流下41時間熟成した。水140gを加え反応を停止した後、有機層を分取した。その有機層を飽和食塩水60gで洗浄した後、溶媒を減圧除去し、目的とする1−(1,3−ジオキソラン−2−イル)−4−メチレンシクロヘキサン46.8gを得た(二段階収率77%)。ガスクロマトグラフィーから純度は83%。
上記メチレンシクロヘキサン46.8g(0.25モル)をテトラヒドロフラン188gに溶解させた。そこへチオ酢酸22.0ml(0.31モル)を内温が上がらない程度にゆっくり滴下し、そのまま1時間熟成した。チオ酢酸を3.5ml(0.05モル)追加して30分熟成した後、飽和炭酸水素ナトリウム水溶液200gで反応を停止させた。有機層を分取して、飽和食塩水50gで洗浄した。溶媒を減圧除去し、目的とするチオ酢酸 S−((4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチル)76.7gを得た。
上記チオ酢酸 S−(シクロヘキシル)メチル76.7gをメタノール239gに溶解させた。そこへ水酸化ナトリウム11.3g(0.28モル)を水77gに溶解させた溶液を加え、そのまま30分熟成した。水230gを加え、メタノールを減圧除去した後、濃塩酸(12N)27.8gを水60gで希釈した溶液を加え酸性にした後、ジエチルエーテル150gで抽出を行なった。分取した有機層を飽和食塩水40gで洗浄した後、溶媒を減圧除去し、目的とする4−(1,3−ジオキソラン−2−イル)シクロヘキシルメタンチオール46.7gを得た(二段階収率78%)。ガスクロマトグラフィーから純度は78%。
上記シクロヘキシルメタンチオール48.7g(0.23モル)、水酸化ナトリウム9.7g(0.24モル)、ジクロロメタン12.4g(0.15モル)をエタノール97gに溶解した。水浴上で60℃に加温し、2時間熟成した。室温まで放冷した後に水216gを加え、有機層を分取し、目的とするビス((4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルフェニル)メタン51.0gを得た。
上記ビススルフェニルメタン51.0g(0.11モル)、タングステン酸ナトリウム二水和物1.1g(0.0034モル)を酢酸アンモニウム17.7g(0.23モル)とエタノール153gに加え、油浴上で75℃に加温し、80℃を超えない温度で過酸化水素水54.7g(0.56モル)を滴下した。この温度で2時間半熟成し、過酸化水素水14.0g(0.14モル)を追加し1時間熟成した。次いで水を174g氷浴上で冷却する事により白色結晶が析出した。この結晶を濾別して目的とするビス((4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルホニル)メタン28.1gを得た(二段階収率55%)。
上記ビススルホニルメタン5.0g(0.011モル)、p-トルエンスルホニルアジド3.7g(0.019モル)をジクロロメタン45gに溶解した。氷浴で冷却し5℃を超えない温度でジアザビシクロ[5,4,0]-7-ウンデセン(DBU)1.7ml(0.011モル)を滴下して、そのまま15分熟成した。水28gと濃塩酸(12N)7gを加え反応を停止した後、有機層を分取した。その有機層を水30gを用いて洗浄した後に溶媒を減圧除去し、粗生成物を油状物として得た。これを再結晶で精製し、目的とするビス((4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルホニル)ジアゾメタン2.2gを得た(収率42%)。
得られたビス((4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルホニル)ジアゾメタンのNMR、IRの結果を示す。
IR(KBr);ν(cm-1) 2981、2942、2869、2125、1349、1340、1330、1319、1205、1133、1103、1012、925、657、611、576
n−ペンチルトリフェニルホスホニウムブロミド272.4g(0.66モル)とt−ブトキシカリウム74.1g(0.66モル)、テトラヒドロフラン408.5gを用いて、常法によりWittig試薬を調製した。このWittig試薬に1,4−シクロヘキサンジオンモノケタール70.6g(0.45モル)を氷水浴上で20℃を超えない温度で加えた。室温で2時間撹拌した後、酢酸エチル200g、水200gに反応液を注ぎ入れ、有機層を分取した。その有機層を飽和食塩水100gで洗浄した後、溶媒を減圧除去し、減圧蒸留を行ない、目的とする1−(1,3−ジオキソラン−2−イル)−4−ペンテニリデンシクロヘキサン46.8gを得た(収率90%)。ガスクロマトグラフィーから純度は99%。
合成例3の1−(1,3−ジオキソラン−2−イル)−4−メチレンシクロヘキサンに換えて1−(1,3−ジオキソラン−2−イル)−4−ペンテニリデンシクロヘキサンを用いる以外は合成例3〜7と同様にして目的とするビス(n−ブチル(4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルホニル)ジアゾメタンを合成した。
得られたビス(n−ブチル(4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルホニル)ジアゾメタンのNMR、IRの結果を示す。
IR(KBr);ν(cm-1) 2954、2873、2117、1448、1338、1230、1133、1103、1035、970、611、588、543
合成例8の1,4−シクロヘキサンジオンモノエチレンケタールに換えてシクロヘキサノンを用いる以外は合成例3〜8と同様にして目的とするビス(n−ブチル(シクロヘキシル)メチルスルホニル)ジアゾメタンを合成した。
得られたビス((4−(1,3−ジオキソラン−2−イル)シクロヘキシル)メチルスルホニル)ジアゾメタンのNMR、IRの結果を示す。
IR(KBr);ν(cm-1) 2931、2856、2107、1467、1452、1338、1322、1238、1135、968、582
合成例8の1,4−シクロヘキサンジオンモノエチレンケタールに換えて4−tert−ブチルシクロヘキサノンを用いる以外は合成例3〜8と同様にして目的とするビス((tert−ブチルシクロヘキシル)メチルスルホニル)ジアゾメタンを合成した。
得られたビス((tert−ブチルシクロヘキシル)メチルスルホニル)ジアゾメタンのNMR、IRの結果を示す。
IR(KBr);ν(cm-1) 2942、2861、2130、2113、1363、1346、1322、1236、1139、998、987、765、659、605、578、528
表1〜3に示すレジスト材料を調製した。ここで、表1〜3に挙げるレジスト材料の成分は次の通りである。
重合体A:ポリp−ヒドロキシスチレンの水酸基を1−エトキシエチル基15モル%、tert−ブトキシカルボニル基15モル%ずつ保護した、重量平均分子量12,000の重合体。
重合体B:ポリp−ヒドロキシスチレンの水酸基を1−エトキシエチル基30モル%保護した、重量平均分子量12,000の重合体。
重合体C:ポリp−ヒドロキシスチレンの水酸基を1−エトキシエチル基25モル%、更に1,2−プロパンジオールジビニルエーテルで3モル%架橋した、重量平均分子量13,000の重合体。
重合体D:ポリp−ヒドロキシスチレンの水酸基をtert−ペンチル基28モル%保護した、重量平均分子量8,000の重合体。
重合体E:p−ヒドロキシスチレンと2−エチル−2−アダマンチルアクリレートのコポリマーで、その組成比(モル比)が70:30、更に重量平均分子量15,000の重合体。
重合体F:p−ヒドロキシスチレンと1−エチル−1−ノルボルネンメタクリレートのコポリマーで、その組成比(モル比)が70:30、更に重量平均分子量15,000の重合体。
重合体G:p−ヒドロキシスチレンとtert−ブチルアクリレートのコポリマーで、その組成比(モル比)が65:35、更に重量平均分子量15,000の重合体。
重合体H:p−ヒドロキシスチレンと1−エチルシクロペンチルメタクリレートのコポリマーで、その組成比(モル比)が65:35、更に重量平均分子量15,000の重合体。
重合体I:p−ヒドロキシスチレンと1−エチルシクロペンチルメタクリレート、p−tert−ペンチルオキシスチレンのコポリマーでその組成比(モル比)が70:8:22、更に重量平均分子量16,000の重合体。
重合体J:p−ヒドロキシスチレンと1−エチルシクロペンチルメタクリレート、スチレンのコポリマーでその組成比(モル比)が65:10:25、更に重量平均分子量12,000の重合体。
重合体K:p−ヒドロキシスチレンとインデンのコポリマーで、その組成比(モル比)が80:20、更にヒドロキシスチレンの水酸基をtert−ブトキシカルボニル基20%保護した、重量平均分子量10,000の重合体。
重合体L:p−ヒドロキシスチレンとインデン、2−エチル−2−アダマンチルメタクリレートのコポリマーで、その組成比(モル比)が82:4:14、更に重量平均分子量8,000の重合体。
重合体M:p−ヒドロキシスチレンとインデン、1−エチル−1−ノルボルネンメタクリレートのコポリマーで、その組成比(モル比)が84:4:12、更に重量平均分子量8,000の重合体。
重合体N:ポリp−ヒドロキシスチレンの水酸基をアセチル基8モル%で保護した、重量平均分子量8,000の重合体。
PAG1:ビス(4−メトキシフェニルスルホニル)ジアゾメタン
PAG2:ビス(4−メチルフェニルスルホニル)ジアゾメタン
PAG3:ビス(2,4−ジメチルフェニルスルホニル)ジアゾメタン
PAG4:(4−tert−ブトキシフェニル)ジフェニルスルホニウム10−カンファースルホネート
PAG5:合成例7の化合物
PAG6:合成例9の化合物
PAG7:合成例10の化合物
PAG8:合成例11の化合物
PAG9:ビス(シクロヘキシルスルホニル)ジアゾメタン
PAG10:N−10−カンファースルホニルオキシコハク酸イミド
架橋剤A:1,3,5,7−テトラメトキシメチルグリコールウリル
溶解阻止剤:ビス(4−(2’−テトラヒドロピラニルオキシ)フェニル)メタン
塩基性化合物A:トリn−ブチルアミン
塩基性化合物B:トリス(2−メトキシエチル)アミン
有機酸誘導体A:4,4−ビス(4’−ヒドロキシフェニル)吉草酸
有機酸誘導体B:サリチル酸
界面活性剤A:FC−430(住友スリーエム社製)
界面活性剤B:サーフロンS−381(旭硝子社製)
紫外線吸収剤:9,10−ジメチルアントラセン
溶剤A:プロピレングリコールメチルエーテルアセテート
溶剤B:乳酸エチル
次いで、このシリコーンウェハーを100℃のホットプレート上で90秒間ベークした。更に、エキシマレーザーステッパー(ニコン社製、NSR−S202A NA=0.6)を用い、2/3の輪帯照明を通して露光し、110℃で90秒間ベーク(PEB:post exposure bake)を施し、2.38%のテトラメチルアンモニウムヒドロキシドの水溶液で現像を行なうと、ポジ型のパターン(実施例1〜23、比較例1〜3)もしくはネガ型のパターン(実施例24)を得ることができた。(上記塗布操作及びベーク、現像操作には東京エレクトロン社製コーターデベロッパー、クリーントラック マーク8を用いた。)
レジストパターン評価方法:
0.18μmのラインアンドスペースのトップとボトムを1:1で解像する露光量を最適露光量(感度:Eop)として、この露光量における分離しているラインアンドスペースの最小線幅を評価レジストの解像度とした。また、解像したレジストパターンの形状は、走査型電子顕微鏡を用いてレジスト断面を観察した。焦点をずらした場合にレジストパターン形状が矩形性を保ちつつ、かつレジストパターンの膜厚が(焦点が合っている場合に比べて)8割を保っているものを有効として焦点深度の深さ(Depth of Focus)を測定した。
なお、レジストのPED安定性は、最適露光量で露光後、24時間の放置後PEB(post exposure bake)を行ない、線幅の変動値で評価した。この変動値が少ないほどPED安定性に富む。
レジストパターン評価結果を表4に示す。
レジスト材料の混合溶剤への溶解性は、目視及び濾過時の詰まりの有無で判断した。
塗布性に関しては、目視で塗りむらの有無、及び膜厚計(大日本スクリーン製造社製、光干渉式膜厚測定計 ラムダエースVM−3010)を用いて同一ウエハー上での膜厚のばらつきが塗布膜厚(0.6μm)に対して0.5%以内(0.003μm以内)であるとき良好、0.5%より多く1%以内であるときやや悪、1%より多いとき悪と表記した。
保存安定性は、経時変化における異物の析出あるいは感度変化で判断した。異物は最長100日間、パーティクルカウンター(リオン社製、KL−20A)でレジスト溶液1ml中に含まれる0.3μm以上の粒子の数が5個以下であること、あるいは製造直後からの感度(上述のEop)の経時変化の変動が5%以内のものを良好とし、それ以上のものを悪と表記した。
レジスト剥離後の異物は、サーフスキャン(テンコールインストルメンツ社製、サーフスキャン6220)を用いて判断した。パターン露光せずに全面露光したレジストウエハーを通常のプロセスで処理し、2.38%のテトラメチルアンモニウムヒドロキシド水溶液で現像を行い、レジストの剥離を行った(露光部分のみレジストが剥離)。レジスト剥離後の8インチウエハー上に、0.20μm以上の異物が100個以下のとき良好、101個以上150個以下のときやや悪、151個以上のとき悪と表記した。
以上の結果を表5に示す。
Claims (17)
- 下記一般式(1)で示されるスルホニルジアゾメタン化合物。
- 請求項1〜4のいずれかに記載のスルホニルジアゾメタン化合物を含んでなる化学増幅型レジスト材料用の光酸発生剤。
- (A)酸の作用でアルカリ現像液に対する溶解性が変化する樹脂と、
(B)放射線照射により酸を発生する請求項1〜4のいずれかに記載のスルホニルジアゾメタン化合物と
を含んでなる化学増幅型レジスト材料。 - 更に、(C)上記(B)成分以外の放射線照射により酸を発生する化合物を含んでなる請求項6に記載のレジスト材料。
- 上記(A)成分の樹脂が、上記酸の作用で除去されることにより上記アルカリ現像液に対する溶解性を変化させる置換基を有する樹脂である請求項6又は請求項7に記載のレジスト材料。
- 上記(A)成分の樹脂が、上記酸の作用で除去されることにより上記アルカリ現像液に対する溶解性を変化させる置換基によってフェノール性水酸基の水素原子全体の平均0モル%を超え80モル%以下の割合で置換された構造を含んでなり、重量平均分子量3,000〜100,000の高分子化合物である請求項8に記載のレジスト材料。
- 上記(A)成分の樹脂が、下記一般式(2a’)の繰り返し単位を含み、アクリル酸エステル及びメタクリル酸エステルに基づく繰り返し単位が平均0モル%を超え50モル%以下の割合で含有される、重量平均分子量3,000〜100,000の高分子化合物であり、上記酸の作用で除去されることによりアルカリ現像液に対する溶解性を変化させる置換基を含む繰り返し単位が、上記(A)成分の樹脂全体に対し、平均0モル%を超え80モル%以下の割合で含まれる請求項8に記載のレジスト材料。
- 上記(A)成分の樹脂が、下記一般式(2a’’)の繰り返し単位を含み、インデン及び/又は置換インデンに基づく繰り返し単位が平均0モル%を超え50モル%以下の割合で含有される、重量平均分子量3,000〜100,000の高分子化合物であり、上記酸の作用で除去されることによりアルカリ現像液に対する溶解性を変化させる置換基を含む繰り返し単位が、上記(A)成分の樹脂全体に対し、平均0モル%を超え80モル%以下の割合で含まれる請求項8に記載のレジスト材料。
- 上記酸の作用で除去されることによりアルカリ現像液に対する溶解性を変化させる置換基が、下記一般式(4)〜(7)で示される基、炭素数4〜20の三級アルキル基、各アルキル基がそれぞれ炭素数1〜6のトリアルキルシリル基、炭素数4〜20のオキソアルキル基、及び炭素数7〜20のアリール基置換アルキル基からなる一群から選ばれる請求項8〜12のいずれかに記載のレジスト材料。
- 更に、(D)塩基性化合物を含んでなる請求項6〜13のいずれかに記載のレジスト材料。
- 更に、(E)有機酸誘導体を含んでなる請求項6〜14のいずれかに記載のレジスト材料。
- 更に、溶剤の成分として、プロピレングリコールアルキルエーテルアセテート及び/又は乳酸アルキルエステルを含んでなる請求項6〜15のいずれかに記載のレジスト材料。
- 請求項6〜16のいずれかに記載のレジスト材料を基板上に塗布する工程と、次いで加熱処理する工程と、該加熱処理後にフォトマスクを介して波長300nm以下の高エネルギー線又は電子線で露光する工程と、その後、必要に応じて加熱処理した後、現像液を用いて現像する工程とを含んでなるパターン形成方法。
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Cited By (4)
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JP2009237173A (ja) * | 2008-03-26 | 2009-10-15 | Fujifilm Corp | レジスト組成物及びそれを用いたパターン形成方法 |
JP2011035173A (ja) * | 2009-07-31 | 2011-02-17 | Fujifilm Corp | ネガ型化学増幅レジスト組成物及びこれを用いたモールドの作成方法 |
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Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2354229A (en) | 1942-02-28 | 1944-07-25 | Maltbie Chemical Company | Allylchloromethyl sulphide |
DE3930086A1 (de) | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
JP3024621B2 (ja) | 1990-01-30 | 2000-03-21 | 和光純薬工業株式会社 | レジスト材料用酸発生剤 |
US5216135A (en) * | 1990-01-30 | 1993-06-01 | Wako Pure Chemical Industries, Ltd. | Diazodisulfones |
JP2970879B2 (ja) | 1990-01-30 | 1999-11-02 | 和光純薬工業株式会社 | 化学増幅型レジスト材料 |
JP2906999B2 (ja) | 1994-04-26 | 1999-06-21 | 信越化学工業株式会社 | レジスト材料 |
JP2942167B2 (ja) | 1994-09-02 | 1999-08-30 | 和光純薬工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
JP3830183B2 (ja) | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
JP3587413B2 (ja) | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
JP3798458B2 (ja) | 1996-02-02 | 2006-07-19 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
JP3879139B2 (ja) | 1996-05-08 | 2007-02-07 | 住友化学株式会社 | グリオキシム系エステル、その製法および用途 |
US5945517A (en) * | 1996-07-24 | 1999-08-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemical-sensitization photoresist composition |
JP3816638B2 (ja) | 1996-07-24 | 2006-08-30 | 東京応化工業株式会社 | 化学増幅型レジスト組成物 |
JP3865473B2 (ja) | 1997-07-24 | 2007-01-10 | 東京応化工業株式会社 | 新規なジアゾメタン化合物 |
TW550439B (en) | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
JP3966430B2 (ja) | 1997-07-15 | 2007-08-29 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 感放射線性組成物 |
JP3677963B2 (ja) | 1997-08-28 | 2005-08-03 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP3796559B2 (ja) | 1997-10-08 | 2006-07-12 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP4420152B2 (ja) | 1999-03-26 | 2010-02-24 | 信越化学工業株式会社 | 高分子化合物及びその製造方法 |
SG78412A1 (en) | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
US6338931B1 (en) * | 1999-08-16 | 2002-01-15 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
JP4235779B2 (ja) | 1999-08-16 | 2009-03-11 | 信越化学工業株式会社 | 新規スルホニルジアゾメタン化合物及びレジスト材料用の光酸発生剤 |
US6395446B1 (en) * | 1999-10-06 | 2002-05-28 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
JP4235781B2 (ja) | 1999-10-06 | 2009-03-11 | 信越化学工業株式会社 | 新規スルホニルジアゾメタン化合物及びレジスト材料用の光酸発生剤 |
JP4438218B2 (ja) | 2000-11-16 | 2010-03-24 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP3991214B2 (ja) * | 2001-09-28 | 2007-10-17 | 信越化学工業株式会社 | 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 |
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JP2007132998A (ja) * | 2005-11-08 | 2007-05-31 | Shin Etsu Chem Co Ltd | レジスト材料及びパターン形成方法 |
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JP2009237173A (ja) * | 2008-03-26 | 2009-10-15 | Fujifilm Corp | レジスト組成物及びそれを用いたパターン形成方法 |
JP2011035173A (ja) * | 2009-07-31 | 2011-02-17 | Fujifilm Corp | ネガ型化学増幅レジスト組成物及びこれを用いたモールドの作成方法 |
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