JP2004524564A5 - - Google Patents

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Publication number
JP2004524564A5
JP2004524564A5 JP2002568099A JP2002568099A JP2004524564A5 JP 2004524564 A5 JP2004524564 A5 JP 2004524564A5 JP 2002568099 A JP2002568099 A JP 2002568099A JP 2002568099 A JP2002568099 A JP 2002568099A JP 2004524564 A5 JP2004524564 A5 JP 2004524564A5
Authority
JP
Japan
Prior art keywords
polymerization
polymer
photoresist
mixture over
reaction mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002568099A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004524564A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/005609 external-priority patent/WO2002069040A1/en
Publication of JP2004524564A publication Critical patent/JP2004524564A/ja
Publication of JP2004524564A5 publication Critical patent/JP2004524564A5/ja
Pending legal-status Critical Current

Links

JP2002568099A 2001-02-27 2002-02-26 新規ポリマー、ポリマー合成方法およびフォトレジスト組成物 Pending JP2004524564A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27140101P 2001-02-27 2001-02-27
PCT/US2002/005609 WO2002069040A1 (en) 2001-02-27 2002-02-26 Novel polymers, processes for polymer synthesis and photoresist compositions

Publications (2)

Publication Number Publication Date
JP2004524564A JP2004524564A (ja) 2004-08-12
JP2004524564A5 true JP2004524564A5 (enExample) 2005-12-22

Family

ID=23035387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002568099A Pending JP2004524564A (ja) 2001-02-27 2002-02-26 新規ポリマー、ポリマー合成方法およびフォトレジスト組成物

Country Status (4)

Country Link
US (2) US6841331B2 (enExample)
JP (1) JP2004524564A (enExample)
KR (3) KR100970661B1 (enExample)
WO (1) WO2002069040A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004524564A (ja) * 2001-02-27 2004-08-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 新規ポリマー、ポリマー合成方法およびフォトレジスト組成物
DE10203839B4 (de) * 2002-01-31 2007-10-18 Infineon Technologies Ag Resist für die Fotolithografie mit reaktiven Gruppen für eine nachträgliche Modifikation der Resiststrukturen
TWI349831B (en) * 2003-02-20 2011-10-01 Maruzen Petrochem Co Ltd Resist polymer and method for producing the polymer
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
TWI371657B (en) * 2004-02-20 2012-09-01 Fujifilm Corp Positive resist composition for immersion exposure and method of pattern formation with the same
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
JP4774252B2 (ja) * 2005-08-17 2011-09-14 富士フイルム株式会社 ポジ型レジスト組成物、該ポジ型レジスト組成物の製造方法及び該ポジ型レジスト組成物を用いたパターン形成方法
KR100688569B1 (ko) * 2005-08-30 2007-03-02 삼성전자주식회사 플루오르를 함유하는 탑 코팅 조성물과 이를 이용한포토레지스트 패턴 형성 방법
US8142703B2 (en) 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
JP5215228B2 (ja) * 2009-04-16 2013-06-19 株式会社ダイセル フォトレジスト用樹脂組成物の製造法
US8541523B2 (en) 2010-04-05 2013-09-24 Promerus, Llc Norbornene-type polymers, compositions thereof and lithographic process using such compositions
US9733564B2 (en) * 2010-10-18 2017-08-15 Mitsubishi Chemical Corporation Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
JP5743858B2 (ja) * 2011-11-14 2015-07-01 丸善石油化学株式会社 低分子量レジスト用共重合体の製造方法
US9796815B2 (en) * 2013-07-31 2017-10-24 Dow Global Technologies Llc Process for preparing polycarbamate and reaction product thereof
US9006379B2 (en) * 2013-07-31 2015-04-14 Dow Global Technologies Llc Process to produce polycarbamate using a gradient feed of urea
CN108264605A (zh) * 2016-12-30 2018-07-10 罗门哈斯电子材料韩国有限公司 单体、聚合物和光致抗蚀剂组合物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
US5514526A (en) * 1992-06-02 1996-05-07 Mitsubishi Chemical Corporation Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method
EP0779308B1 (en) * 1995-12-11 2001-01-24 Mitsui Chemicals, Inc. Heat-resistant high-nitrile polymer compositions and process for preparing same
JPH1060214A (ja) 1996-08-22 1998-03-03 Nippon Oil Co Ltd カラーフィルター用アクリル樹脂組成物
TWI225865B (en) 1998-03-27 2005-01-01 Mitsubishi Rayon Co Copolymer, preparation thereof and resist composition
DE60033338T2 (de) * 1999-06-07 2007-11-29 Canon Kabushiki Kaisha Toner und Bildaufzeichnungsverfahren
TWI227377B (en) * 1999-10-06 2005-02-01 Fuji Photo Film Co Ltd Positive-type resist composition
JP2004524564A (ja) * 2001-02-27 2004-08-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 新規ポリマー、ポリマー合成方法およびフォトレジスト組成物

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