JP2005508013A5 - - Google Patents

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Publication number
JP2005508013A5
JP2005508013A5 JP2002568097A JP2002568097A JP2005508013A5 JP 2005508013 A5 JP2005508013 A5 JP 2005508013A5 JP 2002568097 A JP2002568097 A JP 2002568097A JP 2002568097 A JP2002568097 A JP 2002568097A JP 2005508013 A5 JP2005508013 A5 JP 2005508013A5
Authority
JP
Japan
Prior art keywords
photoresist
group
layer
lactones
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002568097A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005508013A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/008153 external-priority patent/WO2002069038A2/en
Publication of JP2005508013A publication Critical patent/JP2005508013A/ja
Publication of JP2005508013A5 publication Critical patent/JP2005508013A5/ja
Pending legal-status Critical Current

Links

JP2002568097A 2001-02-25 2002-02-25 新規ポリマーおよびそれを含むフォトレジスト組成物 Pending JP2005508013A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27140201P 2001-02-25 2001-02-25
PCT/US2002/008153 WO2002069038A2 (en) 2001-02-25 2002-02-25 Novel polymers and photoresist compositions comprising same

Publications (2)

Publication Number Publication Date
JP2005508013A JP2005508013A (ja) 2005-03-24
JP2005508013A5 true JP2005508013A5 (enExample) 2005-12-22

Family

ID=23035391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002568097A Pending JP2005508013A (ja) 2001-02-25 2002-02-25 新規ポリマーおよびそれを含むフォトレジスト組成物

Country Status (5)

Country Link
US (1) US6849376B2 (enExample)
JP (1) JP2005508013A (enExample)
KR (1) KR20040024547A (enExample)
AU (1) AU2002255786A1 (enExample)
WO (1) WO2002069038A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538056B (en) * 2000-07-11 2003-06-21 Samsung Electronics Co Ltd Resist composition comprising photosensitive polymer having lactone in its backbone
TW573227B (en) * 2001-02-19 2004-01-21 Sumitomo Chemical Co Chemical amplifying type positive resist compositions
US7358027B2 (en) 2002-03-04 2008-04-15 International Business Machines Corporation Copolymer for use in chemical amplification resists
US7488565B2 (en) * 2003-10-01 2009-02-10 Chevron U.S.A. Inc. Photoresist compositions comprising diamondoid derivatives
US7427463B2 (en) * 2003-10-14 2008-09-23 Intel Corporation Photoresists with reduced outgassing for extreme ultraviolet lithography

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4384093A (en) * 1981-04-15 1983-05-17 Ashland Oil, Inc. Copolymers derived from 1,3 dioxepins and maleic anhydride or maleimides and methods
US6013416A (en) * 1995-06-28 2000-01-11 Fujitsu Limited Chemically amplified resist compositions and process for the formation of resist patterns
KR100265597B1 (ko) 1996-12-30 2000-09-15 김영환 Arf 감광막 수지 및 그 제조방법
KR100220953B1 (ko) * 1996-12-31 1999-10-01 김영환 아미드 또는 이미드를 도입한 ArF 감광막 수지
KR100225956B1 (ko) * 1997-01-10 1999-10-15 김영환 아민을 도입한 에이알에프 감광막 수지
US6312867B1 (en) * 1998-11-02 2001-11-06 Shin-Etsu Chemical Co., Ltd. Ester compounds, polymers, resist compositions and patterning process
TWI224241B (en) * 1999-04-28 2004-11-21 Jsr Corp Positive resist composition
US6306554B1 (en) * 2000-05-09 2001-10-23 Shipley Company, L.L.C. Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same

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