JP2004503946A5 - - Google Patents

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Publication number
JP2004503946A5
JP2004503946A5 JP2002511442A JP2002511442A JP2004503946A5 JP 2004503946 A5 JP2004503946 A5 JP 2004503946A5 JP 2002511442 A JP2002511442 A JP 2002511442A JP 2002511442 A JP2002511442 A JP 2002511442A JP 2004503946 A5 JP2004503946 A5 JP 2004503946A5
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JP
Japan
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JP2002511442A
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JP5433124B2 (ja
JP2004503946A (ja
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Priority claimed from US09/590,961 external-priority patent/US6466602B1/en
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Publication of JP2004503946A publication Critical patent/JP2004503946A/ja
Publication of JP2004503946A5 publication Critical patent/JP2004503946A5/ja
Application granted granted Critical
Publication of JP5433124B2 publication Critical patent/JP5433124B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002511442A 2000-06-09 2001-04-24 ガス放電レーザの長寿命電極 Expired - Lifetime JP5433124B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/590,961 US6466602B1 (en) 2000-06-09 2000-06-09 Gas discharge laser long life electrodes
US09/590,961 2000-06-09
PCT/US2001/013202 WO2001097345A1 (en) 2000-06-09 2001-04-24 Gas discharge laser long life electrodes

Publications (3)

Publication Number Publication Date
JP2004503946A JP2004503946A (ja) 2004-02-05
JP2004503946A5 true JP2004503946A5 (ja) 2008-06-19
JP5433124B2 JP5433124B2 (ja) 2014-03-05

Family

ID=24364444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002511442A Expired - Lifetime JP5433124B2 (ja) 2000-06-09 2001-04-24 ガス放電レーザの長寿命電極

Country Status (5)

Country Link
US (1) US6466602B1 (ja)
EP (1) EP1297594B1 (ja)
JP (1) JP5433124B2 (ja)
AU (1) AU2001262949A1 (ja)
WO (1) WO2001097345A1 (ja)

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US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
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US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
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US7633989B2 (en) * 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
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US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
CN102768926B (zh) * 2011-10-20 2015-07-22 中国科学院光电研究院 一种气体放电电极结构
US9246298B2 (en) * 2012-06-07 2016-01-26 Cymer, Llc Corrosion resistant electrodes for laser chambers
WO2015125286A1 (ja) * 2014-02-21 2015-08-27 ギガフォトン株式会社 レーザチャンバ
JP7095084B2 (ja) * 2017-10-24 2022-07-04 サイマー リミテッド ライアビリティ カンパニー レーザチャンバ内の電極の寿命を延ばす方法及び装置
CN109411996A (zh) * 2018-11-29 2019-03-01 北京科益虹源光电技术有限公司 一种准分子激光器电极结构及准分子激光器
WO2021138019A1 (en) * 2019-12-31 2021-07-08 Cymer, Llc Undercut electrodes for a gas discharge laser chamber

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