JP2004361692A - 光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法 - Google Patents
光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法 Download PDFInfo
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- JP2004361692A JP2004361692A JP2003160302A JP2003160302A JP2004361692A JP 2004361692 A JP2004361692 A JP 2004361692A JP 2003160302 A JP2003160302 A JP 2003160302A JP 2003160302 A JP2003160302 A JP 2003160302A JP 2004361692 A JP2004361692 A JP 2004361692A
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- Japan
- Prior art keywords
- optical transmission
- transmission member
- monovalent
- organopolysiloxane resin
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/003—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor characterised by the choice of material
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
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- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
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- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
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- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C08L2201/02—Flame or fire retardant/resistant
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003160302A JP2004361692A (ja) | 2003-04-07 | 2003-06-05 | 光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法 |
| US10/552,191 US20070025678A1 (en) | 2003-04-07 | 2004-04-07 | Curable organopolysiloxane resin composition for optical transmission components, optical transmission components, and fabrication process thereof |
| AT04726300T ATE504634T1 (de) | 2003-04-07 | 2004-04-07 | Vernetzbare organopolysiloxanharzzusammensetzung für optisch leitfähige komponente, optisch leitfähige komponente und deren herstellungsverfahren |
| CA2521736A CA2521736C (en) | 2003-04-07 | 2004-04-07 | Curable organopolysiloxane resin composition for optical waveguides, optical waveguide, and fabrication process thereof |
| DE602004032121T DE602004032121D1 (de) | 2003-04-07 | 2004-04-07 | Vernetzbare organopolysiloxanharzzusammensetzung für optisch leitfähige komponente, optisch leitfähige komponente und deren herstellungsverfahren |
| EP04726300A EP1611203B1 (en) | 2003-04-07 | 2004-04-07 | Curable organopolysiloxane resin composition for optical transmission components, optical transmission components, and fabrication process thereof |
| PCT/JP2004/005014 WO2004090041A2 (en) | 2003-04-07 | 2004-04-07 | Curable organopolysiloxane resin composition for optical transmission components, optical transmission components, and fabrication process thereof |
| KR1020057019042A KR101092249B1 (ko) | 2003-04-07 | 2005-10-06 | 광 도파관용 경화성 오가노폴리실록산 수지 조성물, 광 도파관 및 이들의 제조방법 |
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| JP2003103252 | 2003-04-07 | ||
| JP2003160302A JP2004361692A (ja) | 2003-04-07 | 2003-06-05 | 光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法 |
Publications (2)
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| JP2004361692A true JP2004361692A (ja) | 2004-12-24 |
| JP2004361692A5 JP2004361692A5 (enExample) | 2006-07-06 |
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Country Status (8)
| Country | Link |
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| US (1) | US20070025678A1 (enExample) |
| EP (1) | EP1611203B1 (enExample) |
| JP (1) | JP2004361692A (enExample) |
| KR (1) | KR101092249B1 (enExample) |
| AT (1) | ATE504634T1 (enExample) |
| CA (1) | CA2521736C (enExample) |
| DE (1) | DE602004032121D1 (enExample) |
| WO (1) | WO2004090041A2 (enExample) |
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| JP2006299099A (ja) * | 2005-04-21 | 2006-11-02 | Shin Etsu Chem Co Ltd | 光半導体素子封止用樹脂組成物及び光半導体素子 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54130948A (en) * | 1978-03-23 | 1979-10-11 | Dow Corning | Contact lens |
| JPS61275706A (ja) * | 1985-05-30 | 1986-12-05 | Sumitomo Electric Ind Ltd | 光導波路 |
| JPH04214730A (ja) * | 1990-12-13 | 1992-08-05 | Shin Etsu Chem Co Ltd | オルガノポリシロキサンの製造方法 |
| JPH07306301A (ja) * | 1994-05-13 | 1995-11-21 | Dow Corning Kk | 光学素子及びその製造方法 |
| JPH10218995A (ja) * | 1997-02-05 | 1998-08-18 | Shin Etsu Chem Co Ltd | オルガノポリシロキサン樹脂組成物 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3948848A (en) * | 1975-08-04 | 1976-04-06 | Dow Corning Corporation | Low temperature solventless silicone resins |
| CA1230192A (en) | 1984-03-23 | 1987-12-08 | Loretta A. Kroupa | Liquid curable polyorganosiloxane compositions |
| US4529789A (en) * | 1984-03-23 | 1985-07-16 | Dow Corning Corporation | Liquid curable polyorganosiloxane compositions |
| JP2726043B2 (ja) | 1987-03-06 | 1998-03-11 | 株式会社ブリヂストン | 可撓性光導波路 |
| US4830461A (en) * | 1987-01-29 | 1989-05-16 | Bridgestone Corporation | Pressure-sensitive sensors |
| JPH01143605A (ja) | 1987-11-30 | 1989-06-06 | Kagawa Atsuko | 多孔質フィルムの製造方法 |
| JPH08176444A (ja) * | 1994-10-26 | 1996-07-09 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光学材料及びこれを用いた光導波路 |
-
2003
- 2003-06-05 JP JP2003160302A patent/JP2004361692A/ja active Pending
-
2004
- 2004-04-07 WO PCT/JP2004/005014 patent/WO2004090041A2/en not_active Ceased
- 2004-04-07 AT AT04726300T patent/ATE504634T1/de not_active IP Right Cessation
- 2004-04-07 CA CA2521736A patent/CA2521736C/en not_active Expired - Fee Related
- 2004-04-07 EP EP04726300A patent/EP1611203B1/en not_active Expired - Lifetime
- 2004-04-07 US US10/552,191 patent/US20070025678A1/en not_active Abandoned
- 2004-04-07 DE DE602004032121T patent/DE602004032121D1/de not_active Expired - Lifetime
-
2005
- 2005-10-06 KR KR1020057019042A patent/KR101092249B1/ko not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54130948A (en) * | 1978-03-23 | 1979-10-11 | Dow Corning | Contact lens |
| JPS61275706A (ja) * | 1985-05-30 | 1986-12-05 | Sumitomo Electric Ind Ltd | 光導波路 |
| JPH04214730A (ja) * | 1990-12-13 | 1992-08-05 | Shin Etsu Chem Co Ltd | オルガノポリシロキサンの製造方法 |
| JPH07306301A (ja) * | 1994-05-13 | 1995-11-21 | Dow Corning Kk | 光学素子及びその製造方法 |
| JPH10218995A (ja) * | 1997-02-05 | 1998-08-18 | Shin Etsu Chem Co Ltd | オルガノポリシロキサン樹脂組成物 |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5297589B2 (ja) * | 2004-05-14 | 2013-09-25 | 東レ・ダウコーニング株式会社 | オルガノポリシロキサン樹脂硬化物からなる独立フィルム、その製造方法および積層フィルム |
| WO2005111149A1 (ja) * | 2004-05-14 | 2005-11-24 | Dow Corning Toray Co., Ltd. | オルガノポリシロキサン樹脂硬化物からなる独立フィルム、その製造方法および積層フィルム |
| US7960030B2 (en) | 2004-05-14 | 2011-06-14 | Dow Corning Corporation | Free films made of cured organopolysiloxane resins, process for production thereof, and laminated films |
| KR100857754B1 (ko) * | 2005-04-20 | 2008-09-09 | 닛뽕 뻬인또 가부시키가이샤 | 폴리실란 조성물, 광 도파로 및 그 제조 방법 |
| JP2006299099A (ja) * | 2005-04-21 | 2006-11-02 | Shin Etsu Chem Co Ltd | 光半導体素子封止用樹脂組成物及び光半導体素子 |
| JP2009523856A (ja) * | 2006-01-17 | 2009-06-25 | ダウ・コーニング・コーポレイション | 熱安定性の透明なシリコーン樹脂組成物、並びにその調製方法及び使用 |
| KR101325792B1 (ko) | 2006-01-17 | 2013-11-04 | 다우 코닝 코포레이션 | 열 안정성 투명 실리콘 수지 조성물 및 이의 제조 방법 및용도 |
| JP2008291124A (ja) * | 2007-05-25 | 2008-12-04 | Shin Etsu Chem Co Ltd | 光導波板用液状シリコーンゴム組成物 |
| JP2012052045A (ja) * | 2010-09-02 | 2012-03-15 | Shin-Etsu Chemical Co Ltd | 低ガス透過性シリコーン樹脂組成物及び光半導体装置 |
| JP2012074512A (ja) * | 2010-09-28 | 2012-04-12 | Sekisui Chem Co Ltd | 光半導体装置用ダイボンド材及びそれを用いた光半導体装置 |
| JP2016534162A (ja) * | 2013-08-29 | 2016-11-04 | ダウ コーニング コーポレーションDow Corning Corporation | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| WO2018235200A1 (ja) * | 2017-06-21 | 2018-12-27 | 三菱電機株式会社 | 光導波路、光回路および半導体レーザ |
| JP2023046799A (ja) * | 2021-09-24 | 2023-04-05 | パナソニックIpマネジメント株式会社 | 光導波路の製造方法、及び、光導波路用材料 |
| JP7696089B2 (ja) | 2021-09-24 | 2025-06-20 | パナソニックIpマネジメント株式会社 | 光導波路用材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1611203A2 (en) | 2006-01-04 |
| ATE504634T1 (de) | 2011-04-15 |
| KR101092249B1 (ko) | 2011-12-12 |
| KR20060030465A (ko) | 2006-04-10 |
| CA2521736C (en) | 2013-07-02 |
| WO2004090041A3 (en) | 2005-01-27 |
| EP1611203B1 (en) | 2011-04-06 |
| DE602004032121D1 (de) | 2011-05-19 |
| US20070025678A1 (en) | 2007-02-01 |
| CA2521736A1 (en) | 2004-10-21 |
| WO2004090041A2 (en) | 2004-10-21 |
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