JP2004294565A - 反射防止膜 - Google Patents

反射防止膜 Download PDF

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Publication number
JP2004294565A
JP2004294565A JP2003083917A JP2003083917A JP2004294565A JP 2004294565 A JP2004294565 A JP 2004294565A JP 2003083917 A JP2003083917 A JP 2003083917A JP 2003083917 A JP2003083917 A JP 2003083917A JP 2004294565 A JP2004294565 A JP 2004294565A
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JP
Japan
Prior art keywords
thin film
metal oxide
fine voids
refractive index
amorphous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003083917A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004294565A5 (https=
Inventor
Morio Taniguchi
彬雄 谷口
Yasushi Murakami
泰 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinshu University NUC
Original Assignee
Shinshu University NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinshu University NUC filed Critical Shinshu University NUC
Priority to JP2003083917A priority Critical patent/JP2004294565A/ja
Priority to PCT/JP2004/004160 priority patent/WO2004086104A1/ja
Publication of JP2004294565A publication Critical patent/JP2004294565A/ja
Publication of JP2004294565A5 publication Critical patent/JP2004294565A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Liquid Crystal (AREA)
JP2003083917A 2003-03-25 2003-03-25 反射防止膜 Withdrawn JP2004294565A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003083917A JP2004294565A (ja) 2003-03-25 2003-03-25 反射防止膜
PCT/JP2004/004160 WO2004086104A1 (ja) 2003-03-25 2004-03-25 反射防止膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003083917A JP2004294565A (ja) 2003-03-25 2003-03-25 反射防止膜

Publications (2)

Publication Number Publication Date
JP2004294565A true JP2004294565A (ja) 2004-10-21
JP2004294565A5 JP2004294565A5 (https=) 2006-05-11

Family

ID=33094978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003083917A Withdrawn JP2004294565A (ja) 2003-03-25 2003-03-25 反射防止膜

Country Status (2)

Country Link
JP (1) JP2004294565A (https=)
WO (1) WO2004086104A1 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008522931A (ja) * 2004-12-06 2008-07-03 コロロッビア イタリア ソシエタ ペル アチオニ ナノ微粒子形状のＴｉＯ２分散の調製方法、並びにこの方法により得られる分散及びＴｉＯ２分散利用による表面特性変化
JP2009237306A (ja) * 2008-03-27 2009-10-15 Seiko Epson Corp 光学物品およびその製造方法
WO2011043018A1 (ja) * 2009-10-09 2011-04-14 国立大学法人信州大学 高屈折率材料の製造方法および当該材料と高分子材料との複合体
JP2011119739A (ja) * 2009-12-03 2011-06-16 Lg Innotek Co Ltd 発光装置及びその製造方法
US10473823B2 (en) 2012-07-04 2019-11-12 Canon Kabushiki Kaisha Fine structure, optical member, antireflection film, water-repellent film, substrate for mass spectrometry, phase plate, process for producing fine structure, and process for producing antireflection film

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1773729B1 (en) 2004-07-12 2007-11-07 Cardinal CG Company Low-maintenance coatings
WO2007121215A1 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
KR101512166B1 (ko) 2007-09-14 2015-04-14 카디날 씨지 컴퍼니 관리가 용이한 코팅 기술
WO2011139856A2 (en) 2010-04-29 2011-11-10 Battelle Memorial Institute High refractive index composition
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology
KR102692564B1 (ko) * 2018-09-21 2024-08-06 삼성전자주식회사 다층 박막 구조물 및 이를 이용한 위상 변환 소자

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3387204B2 (ja) * 1993-04-15 2003-03-17 セイコーエプソン株式会社 偏光板、偏光板の製造方法および液晶表示装置
JP2001310423A (ja) * 2000-02-23 2001-11-06 Fuji Photo Film Co Ltd 耐傷性透明支持体、および反射防止膜

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008522931A (ja) * 2004-12-06 2008-07-03 コロロッビア イタリア ソシエタ ペル アチオニ ナノ微粒子形状のＴｉＯ２分散の調製方法、並びにこの方法により得られる分散及びＴｉＯ２分散利用による表面特性変化
JP2009237306A (ja) * 2008-03-27 2009-10-15 Seiko Epson Corp 光学物品およびその製造方法
WO2011043018A1 (ja) * 2009-10-09 2011-04-14 国立大学法人信州大学 高屈折率材料の製造方法および当該材料と高分子材料との複合体
JP2011080007A (ja) * 2009-10-09 2011-04-21 Shinshu Univ 高屈折率材料の製造方法および当該材料と高分子材料との複合体
JP2011119739A (ja) * 2009-12-03 2011-06-16 Lg Innotek Co Ltd 発光装置及びその製造方法
US10473823B2 (en) 2012-07-04 2019-11-12 Canon Kabushiki Kaisha Fine structure, optical member, antireflection film, water-repellent film, substrate for mass spectrometry, phase plate, process for producing fine structure, and process for producing antireflection film

Also Published As

Publication number Publication date
WO2004086104A1 (ja) 2004-10-07
WO2004086104A8 (ja) 2006-06-29

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