WO2004086104A8 - 反射防止膜 - Google Patents
反射防止膜Info
- Publication number
- WO2004086104A8 WO2004086104A8 PCT/JP2004/004160 JP2004004160W WO2004086104A8 WO 2004086104 A8 WO2004086104 A8 WO 2004086104A8 JP 2004004160 W JP2004004160 W JP 2004004160W WO 2004086104 A8 WO2004086104 A8 WO 2004086104A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- reflection coating
- interstices
- transparent
- refractive index
- light
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
- Liquid Crystal (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Laminated Bodies (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003083917A JP2004294565A (ja) | 2003-03-25 | 2003-03-25 | 反射防止膜 |
JP2003-083917 | 2003-03-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004086104A1 WO2004086104A1 (ja) | 2004-10-07 |
WO2004086104A8 true WO2004086104A8 (ja) | 2006-06-29 |
Family
ID=33094978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/004160 WO2004086104A1 (ja) | 2003-03-25 | 2004-03-25 | 反射防止膜 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2004294565A (ja) |
WO (1) | WO2004086104A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7820309B2 (en) | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
US7862910B2 (en) | 2006-04-11 | 2011-01-04 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITFI20040252A1 (it) * | 2004-12-06 | 2005-03-06 | Colorobbia Italiana Spa | Processo per la preparazione di dispersioni di ti02 in forma di nanoparticelle, e dispersioni ottenibili con questo processo |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
JP2009237306A (ja) * | 2008-03-27 | 2009-10-15 | Seiko Epson Corp | 光学物品およびその製造方法 |
JP4942053B2 (ja) * | 2009-10-09 | 2012-05-30 | 国立大学法人信州大学 | 高屈折率材料の製造方法 |
KR101028313B1 (ko) * | 2009-12-03 | 2011-04-11 | 엘지이노텍 주식회사 | 발광 장치 및 그 제조 방법 |
US8883935B2 (en) | 2010-04-29 | 2014-11-11 | Battelle Memorial Institute | High refractive index composition |
JP6386700B2 (ja) | 2012-07-04 | 2018-09-05 | キヤノン株式会社 | 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法 |
EP3541762B1 (en) | 2016-11-17 | 2022-03-02 | Cardinal CG Company | Static-dissipative coating technology |
KR20200034500A (ko) | 2018-09-21 | 2020-03-31 | 삼성전자주식회사 | 다층 박막 구조물 및 이를 이용한 위상 변환 소자 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3387204B2 (ja) * | 1993-04-15 | 2003-03-17 | セイコーエプソン株式会社 | 偏光板、偏光板の製造方法および液晶表示装置 |
JP2001310423A (ja) * | 2000-02-23 | 2001-11-06 | Fuji Photo Film Co Ltd | 耐傷性透明支持体、および反射防止膜 |
-
2003
- 2003-03-25 JP JP2003083917A patent/JP2004294565A/ja not_active Withdrawn
-
2004
- 2004-03-25 WO PCT/JP2004/004160 patent/WO2004086104A1/ja active Application Filing
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
USRE44155E1 (en) | 2004-07-12 | 2013-04-16 | Cardinal Cg Company | Low-maintenance coatings |
US7862910B2 (en) | 2006-04-11 | 2011-01-04 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
US7820309B2 (en) | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
US7820296B2 (en) | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coating technology |
Also Published As
Publication number | Publication date |
---|---|
JP2004294565A (ja) | 2004-10-21 |
WO2004086104A1 (ja) | 2004-10-07 |
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121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
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Free format text: IN PCT GAZETTE 41/2004 UNDER (71) REPLACE "JAPAN AS REPRESENTED BY PRESIDENT OF SHINSHU UNIVERSITY"BY "ORGANIZATION OF SHINSHU UNIVERSITY" |
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122 | Ep: pct application non-entry in european phase |