JP2004292190A - 二酸化ケイ素薄膜とその製造法 - Google Patents

二酸化ケイ素薄膜とその製造法 Download PDF

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Publication number
JP2004292190A
JP2004292190A JP2003083915A JP2003083915A JP2004292190A JP 2004292190 A JP2004292190 A JP 2004292190A JP 2003083915 A JP2003083915 A JP 2003083915A JP 2003083915 A JP2003083915 A JP 2003083915A JP 2004292190 A JP2004292190 A JP 2004292190A
Authority
JP
Japan
Prior art keywords
thin film
silicon dioxide
derivative
dioxide thin
amorphous silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003083915A
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English (en)
Japanese (ja)
Other versions
JP2004292190A5 (enExample
Inventor
Yasushi Murakami
泰 村上
Masayuki Harano
正幸 原野
Yoshio Takasu
芳雄 高須
Morio Taniguchi
彬雄 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinshu University NUC
Hioki EE Corp
Original Assignee
Shinshu University NUC
Hioki EE Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinshu University NUC, Hioki EE Corp filed Critical Shinshu University NUC
Priority to JP2003083915A priority Critical patent/JP2004292190A/ja
Priority to US10/550,859 priority patent/US20060194453A1/en
Priority to PCT/JP2004/004142 priority patent/WO2004085313A1/ja
Publication of JP2004292190A publication Critical patent/JP2004292190A/ja
Publication of JP2004292190A5 publication Critical patent/JP2004292190A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP2003083915A 2003-03-25 2003-03-25 二酸化ケイ素薄膜とその製造法 Pending JP2004292190A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003083915A JP2004292190A (ja) 2003-03-25 2003-03-25 二酸化ケイ素薄膜とその製造法
US10/550,859 US20060194453A1 (en) 2003-03-25 2004-03-25 Silicon dioxide film and process for preparation of the same
PCT/JP2004/004142 WO2004085313A1 (ja) 2003-03-25 2004-03-25 二酸化ケイ素薄膜とその製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003083915A JP2004292190A (ja) 2003-03-25 2003-03-25 二酸化ケイ素薄膜とその製造法

Publications (2)

Publication Number Publication Date
JP2004292190A true JP2004292190A (ja) 2004-10-21
JP2004292190A5 JP2004292190A5 (enExample) 2006-04-13

Family

ID=33094977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003083915A Pending JP2004292190A (ja) 2003-03-25 2003-03-25 二酸化ケイ素薄膜とその製造法

Country Status (3)

Country Link
US (1) US20060194453A1 (enExample)
JP (1) JP2004292190A (enExample)
WO (1) WO2004085313A1 (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006036598A (ja) * 2004-07-28 2006-02-09 Ube Nitto Kasei Co Ltd 多孔質シリカ系薄膜の製造方法、多孔質シリカ系薄膜及び構造物
JP2006342048A (ja) * 2005-05-09 2006-12-21 Hitachi Chem Co Ltd シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の形成方法及び積層体
JP2006342049A (ja) * 2005-05-09 2006-12-21 Hitachi Chem Co Ltd シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の形成方法及び積層体
JP2007279613A (ja) * 2006-04-12 2007-10-25 Totoku Electric Co Ltd 光ファイバ耐熱固定方法およびレンズ付耐熱光ファイバ
JP2008174617A (ja) * 2007-01-17 2008-07-31 Shinshu Univ 超親水性膜
JP2011032455A (ja) * 2009-07-06 2011-02-17 Shinshu Univ コーティング液及びハードコート構造
US12310172B2 (en) 2021-07-29 2025-05-20 Samsung Display Co., Ltd. Display device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7863579B2 (en) * 2007-05-09 2011-01-04 Avraham Suhami Directional neutron detector
US8357618B2 (en) * 2007-10-26 2013-01-22 Applied Materials, Inc. Frequency doubling using a photo-resist template mask
JP5007416B2 (ja) * 2009-02-17 2012-08-22 国立大学法人信州大学 多孔質シリカ膜の製造方法
CN102576100B (zh) * 2009-10-24 2016-05-04 3M创新有限公司 梯度低折射率制品和方法
TWI457586B (zh) * 2011-06-30 2014-10-21 Nat Univ Tsing Hua 一種雙穩態光子晶體
US10405044B1 (en) 2014-09-30 2019-09-03 Apple Inc. Content notification system and method
US20160168035A1 (en) 2014-12-15 2016-06-16 Cpfilms Inc. Abrasion-resistant optical product with improved gas permeability

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3301635A (en) * 1965-07-01 1967-01-31 Du Pont Molded amorphous silica bodies and molding powders for manufacture of same
US4788164A (en) * 1987-01-28 1988-11-29 Hoechst Celanese Corporation Inorganic-organic composite compositions with sustained release properties
US5256386A (en) * 1987-06-29 1993-10-26 Eka Nobel Ab Method for preparation of silica particles
GB8721644D0 (en) * 1987-09-15 1987-10-21 Unilever Plc Silicas
US4965091A (en) * 1987-10-01 1990-10-23 At&T Bell Laboratories Sol gel method for forming thin luminescent films
US4979973A (en) * 1988-09-13 1990-12-25 Shin-Etsu Chemical Co., Ltd. Preparation of fused silica glass by hydrolysis of methyl silicate
US5175027A (en) * 1990-02-23 1992-12-29 Lord Corporation Ultra-thin, uniform sol-gel coatings
US5807430A (en) * 1995-11-06 1998-09-15 Chemat Technology, Inc. Method and composition useful treating metal surfaces
JPH1087316A (ja) * 1995-11-16 1998-04-07 Texas Instr Inc <Ti> ナノ多孔質アエロゲル用の低揮発性溶剤基前駆物質
US5869141A (en) * 1996-11-04 1999-02-09 The Boeing Company Surface pretreatment for sol coating of metals
JPH1129316A (ja) * 1997-07-09 1999-02-02 Teikoku Chem Ind Corp Ltd シリカ膜作成用塗布液組成物およびシリカ膜形成方法
JP3813022B2 (ja) * 1998-07-07 2006-08-23 泰 村上 フォトクロミック性を有する酸化チタンゲルおよびガラス物品
JP4284083B2 (ja) * 2002-08-27 2009-06-24 株式会社アルバック 多孔質シリカ膜の形成方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006036598A (ja) * 2004-07-28 2006-02-09 Ube Nitto Kasei Co Ltd 多孔質シリカ系薄膜の製造方法、多孔質シリカ系薄膜及び構造物
JP2006342048A (ja) * 2005-05-09 2006-12-21 Hitachi Chem Co Ltd シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の形成方法及び積層体
JP2006342049A (ja) * 2005-05-09 2006-12-21 Hitachi Chem Co Ltd シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の形成方法及び積層体
JP2007279613A (ja) * 2006-04-12 2007-10-25 Totoku Electric Co Ltd 光ファイバ耐熱固定方法およびレンズ付耐熱光ファイバ
JP2008174617A (ja) * 2007-01-17 2008-07-31 Shinshu Univ 超親水性膜
JP2011032455A (ja) * 2009-07-06 2011-02-17 Shinshu Univ コーティング液及びハードコート構造
US12310172B2 (en) 2021-07-29 2025-05-20 Samsung Display Co., Ltd. Display device

Also Published As

Publication number Publication date
US20060194453A1 (en) 2006-08-31
WO2004085313A1 (ja) 2004-10-07

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