JP2004212067A5 - - Google Patents

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Publication number
JP2004212067A5
JP2004212067A5 JP2002378663A JP2002378663A JP2004212067A5 JP 2004212067 A5 JP2004212067 A5 JP 2004212067A5 JP 2002378663 A JP2002378663 A JP 2002378663A JP 2002378663 A JP2002378663 A JP 2002378663A JP 2004212067 A5 JP2004212067 A5 JP 2004212067A5
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JP
Japan
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JP2002378663A
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JP4121849B2 (ja
JP2004212067A (ja
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Priority to JP2002378663A priority Critical patent/JP4121849B2/ja
Priority claimed from JP2002378663A external-priority patent/JP4121849B2/ja
Priority to US10/773,524 priority patent/US7706597B2/en
Publication of JP2004212067A publication Critical patent/JP2004212067A/ja
Publication of JP2004212067A5 publication Critical patent/JP2004212067A5/ja
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Publication of JP4121849B2 publication Critical patent/JP4121849B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2002378663A 2002-12-26 2002-12-26 欠陥検査装置及び欠陥検査方法 Expired - Fee Related JP4121849B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002378663A JP4121849B2 (ja) 2002-12-26 2002-12-26 欠陥検査装置及び欠陥検査方法
US10/773,524 US7706597B2 (en) 2002-12-26 2004-02-06 Defect inspection apparatus and defect inspection method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002378663A JP4121849B2 (ja) 2002-12-26 2002-12-26 欠陥検査装置及び欠陥検査方法
US10/773,524 US7706597B2 (en) 2002-12-26 2004-02-06 Defect inspection apparatus and defect inspection method

Publications (3)

Publication Number Publication Date
JP2004212067A JP2004212067A (ja) 2004-07-29
JP2004212067A5 true JP2004212067A5 (ja) 2006-02-16
JP4121849B2 JP4121849B2 (ja) 2008-07-23

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Family Applications (1)

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JP2002378663A Expired - Fee Related JP4121849B2 (ja) 2002-12-26 2002-12-26 欠陥検査装置及び欠陥検査方法

Country Status (2)

Country Link
US (1) US7706597B2 (ja)
JP (1) JP4121849B2 (ja)

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JP4713391B2 (ja) * 2006-04-19 2011-06-29 日本分光株式会社 赤外顕微鏡
JP2007322482A (ja) * 2006-05-30 2007-12-13 Nuflare Technology Inc フォーカス合わせ装置、フォーカス合わせ方法及び検査装置
JP5018004B2 (ja) * 2006-10-11 2012-09-05 株式会社ニコン 顕微鏡、マーク検出方法、ウェハ接合装置、および、積層3次元半導体装置の製造方法
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JP5466811B2 (ja) * 2006-11-22 2014-04-09 オリンパス株式会社 基板検査装置および基板検査方法
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JP5242106B2 (ja) * 2007-09-14 2013-07-24 オリンパス株式会社 電動顕微鏡
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JP2011069676A (ja) * 2009-09-25 2011-04-07 Hitachi High-Technologies Corp 検査装置及び検査方法
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JP5579109B2 (ja) * 2011-03-17 2014-08-27 三菱電機株式会社 エッジ検出装置
JP5846844B2 (ja) * 2011-10-14 2016-01-20 株式会社キーエンス 拡大観察装置
JP5818651B2 (ja) 2011-11-22 2015-11-18 株式会社キーエンス 画像処理装置
JP2014035326A (ja) * 2012-08-10 2014-02-24 Toshiba Corp 欠陥検査装置
GB201318919D0 (en) 2013-10-25 2013-12-11 Isis Innovation Compact microscope
GB201507021D0 (en) 2015-04-24 2015-06-10 Isis Innovation Compact microscope
US20200355900A1 (en) * 2017-10-30 2020-11-12 Wdi Wise Device Inc. Method and apparatus for autofocussing an optical microscope and dynamic focus tracking
JP7126285B1 (ja) * 2021-09-17 2022-08-26 上野精機株式会社 電子部品の処理装置
CN117314926B (zh) * 2023-11-30 2024-01-30 湖南大学 激光改质加工设备维护的确认方法、设备及存储介质

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